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公开(公告)号:US10858732B2
公开(公告)日:2020-12-08
申请号:US16273037
申请日:2019-02-11
Applicant: Exogenesis Corporation
Inventor: Sean R. Kirkpatrick , Allen R. Kirkpatrick , Michael J. Walsh
IPC: C23C14/00 , C23C14/58 , H01J37/32 , G02B1/12 , G02B1/02 , H01J37/05 , H01J37/317 , H01J37/147
Abstract: A method for Neutral Beam irradiation derived from gas cluster ion beams and articles produced thereby including optical elements.
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2.
公开(公告)号:US09799488B2
公开(公告)日:2017-10-24
申请号:US14571533
申请日:2014-12-16
Applicant: Exogenesis Corporation
Inventor: Sean R. Kirkpatrick , Allen R. Kirkpatrick , Michael J. Walsh , Richard C. Svrluga
IPC: H01J37/05 , H01J37/317 , H01J37/08 , H01J37/147
CPC classification number: H01J37/3171 , C03C23/005 , C03C2204/08 , H01J37/05 , H01J37/08 , H01J37/147 , H01J37/317 , H01J2237/0041 , H01J2237/0812 , H01J2237/15 , H01J2237/31701 , H01L21/02115 , H01L21/02238 , H01L21/02274 , H01L21/26506 , H01L21/26513 , H01L21/26566 , H01L21/31105 , H01L21/31116 , H01L21/32115 , H01L29/36 , H01M4/04 , H01M10/04 , H01M10/0585 , H01M2004/021 , Y10T428/24355 , Y10T428/24479 , Y10T428/30
Abstract: A method of improving the surface of an object treats the surface with a neutral beam formed from a gas cluster ion mean to create a surface texture and/or increase surface area.
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公开(公告)号:US20200083048A1
公开(公告)日:2020-03-12
申请号:US16566649
申请日:2019-09-10
Applicant: Exogenesis Corporation
Inventor: Allen R. Kirkpatrick
IPC: H01L21/263 , H01J37/147 , H01J37/305
Abstract: An improved ANAB system or process substantially or fully eliminating contaminant particles from reaching a beam target by adding to the usual primary (first) ionizer of the ANAB system or process an additional (second) ionizer to ionize contaminant particles and means to block or retard the ionized particles to prevent their reaching the beam target.
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4.
公开(公告)号:US20190185991A1
公开(公告)日:2019-06-20
申请号:US16273037
申请日:2019-02-11
Applicant: Exogenesis Corporation
Inventor: Sean R. Kirkpatrick , Allen R. Kirkpatrick , Michael J. Walsh
CPC classification number: C23C14/5833 , G02B1/02 , G02B1/12 , H01J37/05 , H01J37/147 , H01J37/3171 , H01J37/32816 , H01J2237/0041 , H01J2237/0812 , H01J2237/15 , Y10T428/30
Abstract: A method for Neutral Beam irradiation derived from gas cluster ion beams and articles produced thereby including optical elements.
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5.METHOD AND APPARATUS FOR NEUTRAL BEAM PROCESSING BASED ON GAS CLUSTER ION BEAM TECHNOLOGY 审中-公开
Title translation: 基于气体离子束技术的中性光束处理方法与装置公开(公告)号:US20150213996A1
公开(公告)日:2015-07-30
申请号:US14496412
申请日:2014-09-25
Applicant: Exogenesis Corporation
Inventor: Sean R. Kirkpatrick , Allen R. Kirkpatrick
IPC: H01J37/05 , H01J37/317
CPC classification number: G03F1/80 , B24B37/04 , G03F1/82 , H01J37/05 , H01J37/147 , H01J37/317 , H01J37/3171 , H01J2237/0041 , H01J2237/0812 , H01J2237/15 , H01L21/02115 , H01L21/02274 , H01L21/26506 , H01L21/26513 , H01L21/26566 , H01L21/31105 , H01L21/31111 , H01L29/36 , H05H3/02 , Y10T428/24355 , Y10T428/24479 , Y10T428/30
Abstract: An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.
Abstract translation: 其装置,方法和产品提供从用于加工材料的加速气体簇离子束衍生的加速中性束。
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公开(公告)号:US20210405523A1
公开(公告)日:2021-12-30
申请号:US17222467
申请日:2021-04-05
Applicant: Exogenesis Corporation
Inventor: Joseph Khoury , Sean R. Kirkpatrick , Michael J. Walsh , James G. Bachand , Allen R. Kirkpatrick , Thomas J. Webster
IPC: G03F1/80 , H05H3/02 , H01J37/317 , H01L21/02 , H01L21/265 , H01L21/311 , H01J37/05 , H01J37/147 , G03F1/82
Abstract: A device such as a medical device and a method for making same provides a device surfaces modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets or to match surface energy of the device to that of a protein with the property of inhibition of bacterial colonization that can coat the all or part of the device surface to effect such inhibition.
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公开(公告)号:US10825685B2
公开(公告)日:2020-11-03
申请号:US16246634
申请日:2019-01-14
Applicant: Exogenesis Corporation
Inventor: Sean R. Kirkpatrick , Allen R. Kirkpatrick , Michael J. Walsh , Richard C. Svrluga
IPC: H01J37/05 , H01L21/02 , H01L21/265 , H01L21/311 , H01L21/321 , C03C23/00 , H01J37/08 , H01J37/317 , H01J37/147 , H01L29/167 , H01L29/36 , H01L21/324
Abstract: A method for treating a silicon substrate, and a silicon substrate, provide a surface treated with an accelerated neutral beam.
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8.
公开(公告)号:US20190279872A1
公开(公告)日:2019-09-12
申请号:US16246634
申请日:2019-01-14
Applicant: Exogenesis Corporation
Inventor: Sean R. Kirkpatrick , Allen R. Kirkpatrick , Michael J. Walsh , Richard C. Svrluga
IPC: H01L21/265 , H01L29/167 , H01J37/05 , H01L21/02 , H01L21/311 , H01L21/321 , C03C23/00 , H01J37/08 , H01J37/317 , H01J37/147
Abstract: A method for treating a silicon substrate, and a silicon substrate, provide a surface treated with an accelerated neutral beam.
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9.
公开(公告)号:US10409155B2
公开(公告)日:2019-09-10
申请号:US14496412
申请日:2014-09-25
Applicant: Exogenesis Corporation
Inventor: Sean R. Kirkpatrick , Allen R. Kirkpatrick
IPC: H01J37/05 , G03F1/80 , H01J37/317 , H01J37/147 , H05H3/02 , G03F1/82 , H01L21/02 , H01L21/265 , H01L21/311 , B24B37/04 , H01L29/36
Abstract: An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.
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公开(公告)号:US20180190468A1
公开(公告)日:2018-07-05
申请号:US15909482
申请日:2018-03-01
Applicant: Exogenesis Corporation
Inventor: Joseph Khoury , Sean R. Kirkpatrick , Michael J. Walsh , James G. Bachand , Allen R. Kirkpatrick
IPC: H01J37/05 , H05H3/02 , H01J37/317 , H01J37/147
CPC classification number: H01J37/05 , H01J37/147 , H01J37/317 , H01J37/3171 , H01J2237/0041 , H01J2237/0812 , H01J2237/15 , H05H3/02 , H05H5/04 , Y10T428/24355 , Y10T428/24479 , Y10T428/30
Abstract: A device such as a medical device and a method for making same provides a surface modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets.
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