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    Charged particle beam drawing apparatus and charged particle beam drawing method
    32.
    发明授权
    Charged particle beam drawing apparatus and charged particle beam drawing method 有权

    公开(公告)号：US09812284B2

    公开(公告)日：2017-11-07

    申请号：US15070679

    申请日：2016-03-15

    Applicant: NUFLARE TECHNOLOGY, INC.

    Inventor： Hideki Matsui

    IPC: H01J37/147 ,  H01J37/317

    CPC classification number: H01J37/1472 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/103 ,  H01J2237/1504 ,  H01J2237/2485 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31766

    Abstract: In one embodiment, a charged particle beam drawing apparatus deflects a charged particle beam with a deflector to draw a pattern. The apparatus includes a storage unit that stores an approximate formula indicating a correspondence relationship between a settling time for a DAC amplifier that controls the deflector, and a position shift amount, from a design position, of a drawn position of each evaluation pattern drawn on a first substrate while the settling time and an amount of deflection by the deflector are changed, a shot position correction unit that creates a correction formula indicating a relationship between an amount of deflection and a shot position shift amount at the settling time, from the approximate formula and the settling time for the DAC amplifier based on an amount of deflection of a shot, obtains a position correction amount by using the amount of deflection of the shot and the correction formula, and corrects a shot position defined by the shot data based on the position correction amount, and a drawing unit that performs drawing by using the shot data with a corrected shot position.

    CHARGED PARTICLE BEAM DEVICE AND DETECTION METHOD USING SAID DEVICE
    34.
    发明申请
    CHARGED PARTICLE BEAM DEVICE AND DETECTION METHOD USING SAID DEVICE 有权
    充电颗粒光束装置和使用上述装置的检测方法

    公开(公告)号：US20170053777A1

    公开(公告)日：2017-02-23

    申请号：US15306977

    申请日：2015-04-24

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Tomoyasu SHOJO ,  Hajime KAWANO ,  Yasunari SOHDA

    IPC: H01J37/12 ,  H01J37/28 ,  H01J37/147 ,  H01J37/09

    CPC classification number: H01J37/12 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/103 ,  H01J2237/21 ,  H01J2237/24592 ,  H01J2237/28 ,  H01J2237/2809 ,  H01J2237/2814 ,  H01J2237/2817

    Abstract: In the present invention, a charged particle beam device has a charged particle source (1), a first condenser lens (4) arranged downstream from the charged particle source (1), an aperture (5) arranged downstream from the first condenser lens (4), and a second condenser lens (6) arranged downstream from the aperture (5), wherein, when a sample (12) is to be irradiated at a second charged particle beam amount which is greater than a first charged particle beam amount, the first and second condenser lenses are controlled such that a charged particle beam is formed downstream from the aperture (5), and such that the focal point of the second condenser lens does not vary between the first charged particle beam amount and the second charged particle beam amount.

    Abstract translation: 在本发明中，带电粒子束装置具有带电粒子源（1），布置在带电粒子源（1）下游的第一聚光透镜（4），设置在第一聚光透镜 以及布置在所述孔（5）的下游的第二聚光透镜（6），其中当要以大于第一带电粒子束量的第二带电粒子束量照射样品（12）时， 控制第一和第二聚光透镜，使得带电粒子束形成在孔（5）的下游，并且使得第二聚光透镜的焦点在第一带电粒子束量和第二带电粒子之间不变化 光束量。

    Apparatus of Plural Charged-Particle Beams
    35.
    发明申请
    Apparatus of Plural Charged-Particle Beams 审中-公开
    多次充电粒子束装置

    公开(公告)号：US20170025243A1

    公开(公告)日：2017-01-26

    申请号：US15216258

    申请日：2016-07-21

    Applicant: Hermes Microvision, Inc.

    Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

    IPC: H01J37/147 ,  H01J37/10 ,  H01J37/06

    CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

    Abstract translation: 提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。 在该装置中，源极转换单元通过偏转平行的一次电子束的多个子束形成一个单个电子源的多个并行图像，并且一个物镜将多个偏转的子束聚焦在样本表面上并形成多个探针点 上。 使用可移动聚光透镜来准直一次电子束并改变多个探针点的电流，前束形成装置削弱一次电子束的库仑效应，并且源转换单元使尺寸最小化 通过最小化和补偿物镜和聚光透镜的离轴像差来实现多个探测点。

    Scanning electron microscope
    36.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US09536703B2

    公开(公告)日：2017-01-03

    申请号：US14899795

    申请日：2014-07-11

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Toshihide Agemura ,  Hideo Morishita

    IPC: H01J37/26 ,  H01J37/244 ,  H01J37/28

    CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/24475 ,  H01J2237/2448

    Abstract: This scanning electron microscope is provided with: a deceleration means that decelerates an electron beam (5) when the electron beam is passing through an objective lens; and a first detector (8) and a second detector (7) that are disposed between the electron beam and the objective lens and have a sensitive surface having an axially symmetric shape with respect to the optical axis of the electron beam. The first detector is provided at the sample side with respect to the second detector, and exclusively detects the signal electrons having a high energy that have passed through a retarding field energy filter (9A). When the distance between the tip (13) at the sample side of the objective lens and the sensitive surface of the first detector is L1 and the distance between the tip at the sample side of the objective lens and the sensitive surface of the second detector is L2, then L1/L2≦5/9. As a result, when performing low-acceleration observation using a deceleration method by means of a scanning electron microscope, it is possible to detect signal electrons without the effect of shading in a magnification range of a low magnification on the order of hundreds of times to a high magnification of at least 100,000×. Also, it is possible to highly efficiently detect backscattered electrons, of which the amount generated is less than that of secondary electrons.

    Abstract translation: 该扫描电子显微镜具备：当电子束通过物镜时减速电子束（5）的减速装置; 以及设置在电子束和物镜之间并且具有相对于电子束的光轴具有轴对称形状的敏感表面的第一检测器（8）和第二检测器（7）。 第一检测器相对于第二检测器在样本侧设置，并且专门检测已经通过延迟场能量滤波器（9A）的具有高能量的信号电子。 当物镜的样品侧的尖端（13）和第一检测器的敏感表面之间的距离为L1，物镜的样品侧的尖端与第二检测器的敏感表面之间的距离为 L2，则L1 /L2≤5/ 9。 结果，当利用扫描电子显微镜使用减速方法进行低加速度观察时，可以在几百倍数倍的低倍数的倍率范围内检测信号电子而不影响阴影效果 高倍数至少为100,000×。 此外，可以高效地检测产生的量小于二次电子的反向散射电子。

    Scanning Electron Microscope
    37.
    发明申请
    Scanning Electron Microscope 有权
    扫描电子显微镜

    公开(公告)号：US20160148782A1

    公开(公告)日：2016-05-26

    申请号：US14899795

    申请日：2014-07-11

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Toshihide AGEMURA ,  Hideo MORISHITA

    IPC: H01J37/26 ,  H01J37/244 ,  H01J37/28

    CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/24475 ,  H01J2237/2448

    Abstract: This scanning electron microscope is provided with: a deceleration means that decelerates an electron beam (5) when the electron beam is passing through an objective lens; and a first detector (8) and a second detector (7) that are disposed between the electron beam and the objective lens and have a sensitive surface having an axially symmetric shape with respect to the optical axis of the electron beam. The first detector is provided at the sample side with respect to the second detector, and exclusively detects the signal electrons having a high energy that have passed through a retarding field energy filter (9A). When the distance between the tip (13) at the sample side of the objective lens and the sensitive surface of the first detector is L1 and the distance between the tip at the sample side of the objective lens and the sensitive surface of the second detector is L2, then L1/L2≦5/9. As a result, when performing low-acceleration observation using a deceleration method by means of a scanning electron microscope, it is possible to detect signal electrons without the effect of shading in a magnification range of a low magnification on the order of hundreds of times to a high magnification of at least 100,000×. Also, it is possible to highly efficiently detect backscattered electrons, of which the amount generated is less than that of secondary electrons.

    Abstract translation: 该扫描电子显微镜具备：当电子束通过物镜时减速电子束（5）的减速装置; 以及设置在电子束和物镜之间并且具有相对于电子束的光轴具有轴对称形状的敏感表面的第一检测器（8）和第二检测器（7）。 第一检测器相对于第二检测器在样本侧设置，并且专门检测已经通过延迟场能量滤波器（9A）的具有高能量的信号电子。 当物镜的样品侧的尖端（13）和第一检测器的敏感表面之间的距离为L1，物镜的样品侧的尖端与第二检测器的敏感表面之间的距离为 L2，然后L1 / L2＆nlE; 5/9。 结果，当利用扫描电子显微镜使用减速方法进行低加速度观察时，可以在几百倍数倍的低倍数的倍率范围内检测信号电子而不影响阴影效果 高倍数至少为100,000×。 此外，可以高效地检测产生的量小于二次电子的反向散射电子。

    DEVICE FOR DEFLECTING OR GUIDING IN A PARTICLE BEAM
    39.
    发明申请
    DEVICE FOR DEFLECTING OR GUIDING IN A PARTICLE BEAM 有权
    用于在颗粒束中进行偏转或引导的装置

    公开(公告)号：US20100258738A1

    公开(公告)日：2010-10-14

    申请号：US12733931

    申请日：2008-09-26

    Applicant: Dirk Preikszas

    Inventor： Dirk Preikszas

    IPC: H01J3/22 ,  H01J3/26

    CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/045 ,  H01J37/14 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/26

    Abstract: A device for deflecting a particle beam out of a beam axis, or for guiding a particle beam into the beam axis, has a simple design, requires little space, and additionally ensures that no area of an object that is not to be struck is struck by a particle beam. The device may include components in the following sequence along the beam axis: first deflection element, a magnetic apparatus for providing a magnetic field axially to the beam axis, and a second deflection element. A particle beam apparatus may have a device of this type.

    Abstract translation: 用于将粒子束偏离射束轴线或用于将粒子束引导到射束轴线中的装置具有简单的设计，需要很小的空间，并且另外确保不会撞击不被撞击的物体的区域 通过粒子束。 装置可以沿着光束轴线包括以下顺序的部件：第一偏转元件，用于向光束轴线轴向提供磁场的磁性装置和第二偏转元件。 粒子束装置可以具有这种类型的装置。

    Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors
    40.
    发明申请
    Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors 审中-公开
    用于带电粒子束光学系统的低像差偏转器以及用于制造这种偏转器的方法

    公开(公告)号：US20050040137A1

    公开(公告)日：2005-02-24

    申请号：US10934016

    申请日：2004-09-02

    Applicant: Katsushi Nakano

    Inventor： Katsushi Nakano

    IPC: G03F7/20 ,  H01B13/00 ,  H01F7/06 ,  H01F7/20 ,  H01J3/14 ,  H01J37/147 ,  H01J37/305 ,  H01L21/027

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01F5/003 ,  H01F7/20 ,  H01F7/202 ,  H01F2041/0711 ,  H01J37/147 ,  H01J37/1475 ,  H01J37/3174 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1526 ,  H01J2237/1534 ,  Y10T29/4902

    Abstract: Deflectors are disclosed that are suitable for use in various charged-particle-beam (CPB) optical systems as used, for example, in CPB microlithography systems. The deflectors produce a strong magnetic beam-deflecting field when energized with a relatively small electrical current. The beam-deflecting field thus produced is stable with respect to temperature changes, is little affected by eddy currents, and exhibits low aberration caused by manufacturing tolerances of the coil and core. In an exemplary method for manufacturing such a deflector, a magnetic-tape laminate is used as the core. Also, high-precision positioning of the coil and the magnetic-tape laminate is performed using photolithography and electrocasting. Positioning of the magnetic-tape laminate can be performed using a resist pattern formed by photolithography.

    Abstract translation: 公开了适用于例如在CPB微光刻系统中使用的各种带电粒子束（CPB）光学系统的偏转器。 当相对较小的电流通电时，偏转器产生强磁场偏转场。 由此产生的光束偏转场相对于温度变化是稳定的，几乎不受涡流的影响，并且表现出由线圈和芯的制造公差引起的低像差。 在制造这种偏转器的示例性方法中，使用磁带层压体作为核心。 此外，使用光刻和电铸来进行线圈和磁带层压体的高精度定位。 可以使用通过光刻形成的抗蚀剂图案来进行磁带层压体的定位。

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