公开(公告)号：US20200090903A1

公开(公告)日：2020-03-19

申请号：US16494595

申请日：2017-03-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryo HIRANO ,  Hideo MORISHITA ,  Toshihide AGEMURA ,  Junichi KATANE ,  Tsunenori NOMAGUCHI

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/145 ,  H01J37/153

Abstract: A charged particle beam device includes: a charged particle source that emits a charged particle beam; a boosting electrode disposed between the charged particle source and a sample to form a path of the charged particle beam and to accelerate and decelerate the charged particle beam; a first pole piece that covers the boosting electrode; a second pole piece that covers the first pole piece; a first lens coil disposed outside the first pole piece and inside the second pole piece to form a first lens; a second lens coil disposed outside the second pole piece to form a second lens; and a control electrode formed between a distal end portion of the first pole piece and a distal end portion of the second pole piece to control an electric field formed between the sample and the distal end portion of the second pole piece.

公开(公告)号：US20170358421A1

公开(公告)日：2017-12-14

申请号：US15671472

申请日：2017-08-08

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori NOMAGUCHI ,  Toshihide AGEMURA

IPC: H01J37/28 ,  G01T1/20 ,  H01J37/30 ,  H01J37/244 ,  H01J37/22 ,  H01J37/24 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/28 ,  G01T1/20 ,  H01J37/10 ,  H01J37/147 ,  H01J37/22 ,  H01J37/24 ,  H01J37/244 ,  H01J37/30 ,  H01J37/3178

Abstract: A composite charged particle beam apparatus modulates an irradiation condition of a charged particle beam at high speed and detects a signal in synchronization with a modulation period to extract a signal arising from a particular charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously. Light emitted from two or more kinds of scintillators having different light emitting properties is dispersed, signal strength is detected, and a signal is processed based on a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone. The apparatus can extract only a signal arising from a desired charged particle beam even when the sample is irradiated with the plurality of charged particle beams simultaneously.

公开(公告)号：US20190385810A1

公开(公告)日：2019-12-19

申请号：US16487566

申请日：2017-02-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryuju SATO ,  Toshihide AGEMURA ,  Tsunenori NOMAGUCHI

IPC: H01J37/244 ,  H01J37/28

Abstract: The charged particle beam device includes a charged particle beam source which emits a primary charged particle beam, an objective lens which focuses the primary charged particle beam on a sample, a passage electrode which is formed of a metal material and is disposed between the charged particle beam source and a tip end of the objective lens, a detector which detects a secondary charged particle emitted from the sample, and an electrostatic field electrode which is electrically insulated from the passage electrode. The passage electrode is formed such that the primary charged particle beam passes through the inside of the passage electrode. The electrostatic field electrode is formed to cover an outer periphery of the passage electrode.

公开(公告)号：US20170345614A1

公开(公告)日：2017-11-30

申请号：US15520953

申请日：2015-10-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Yoshinobu KIMURA ,  Natsuki TSUNO ,  Toshihide AGEMURA ,  Takeshi OGASHIWA ,  Junichiro TOMIZAWA

IPC: H01J37/22 ,  H01J37/06 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/06 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2443 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/24507

Abstract: There is provided a charged particle beam apparatus capable of obtaining a high SN ratio with a small electron irradiation amount. The charged particle beam apparatus includes a charged particle detection device. The charged particle detection device detects an analog pulse waveform signal (110) in a detection of emitted electrons (1 event) when one primary electron enters a sample, converts the analog pulse waveform signal (110) into a digital signal (111), perform a wave height discrimination (112) with the use of a unit peak corresponding electron, and outputs the digital signal (111) as a multilevel count value.

公开(公告)号：US20170330722A1

公开(公告)日：2017-11-16

申请号：US15534219

申请日：2014-12-26

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshihide AGEMURA

IPC: H01J37/073 ,  H01J37/28 ,  H01J37/317 ,  H01J37/30 ,  H01J37/305

CPC classification number: H01J37/073 ,  H01J37/241 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/305 ,  H01J37/317 ,  H01J37/3178 ,  H01J2237/022 ,  H01J2237/28 ,  H01J2237/2814 ,  H01J2237/30472 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: The present invention relates to an automatic sequence for repeatedly performing SEM observation and FIB processing by using a low acceleration voltage for a long time. In order to realize very accurate three-dimensional structure/composition analysis, in the automatic sequence for repeatedly performing sample observation using a scanning electron microscope using a CFE electron source and sample processing using a FIB device, low temperature flushing using the CFE electron source is performed at predetermined timing except for a SEM observation time. According to the present invention, the automatic sequence for repeatedly performing the sample observation using the scanning electron microscope using the CFE electron source and the sample processing using the FIB device can be performed for a long time. Therefore, it is possible to acquire a SEM image which achieves high resolution and improved current stability while the low acceleration voltage is used.

公开(公告)号：US20170309437A1

公开(公告)日：2017-10-26

申请号：US15513695

申请日：2014-10-20

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshihide AGEMURA ,  Masashi SASAKI ,  Daisuke KOBAYASHI ,  Shunsuke SATO

IPC: H01J37/073 ,  H01J37/18 ,  H01J37/28

CPC classification number: H01J37/073 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/06341 ,  H01J2237/1825 ,  H01J2237/2806

Abstract: The purpose of the present invention is to be able to acquire high-resolution images in a scanning electron microscope using a combination of a cold cathode (CFE) electron source and a boosting process, even at low accelerating voltage enhancing the current stability of the CFE electron source. A configuration in which a CFE electron source (101), an anode electrode (103) at positive (+) potential, and an insulator (104) for isolating the anode electrode (103) from ground potential are accommodated within a single vacuum chamber (105), and an ion pump (106) and a non-evaporable getter (NEG) pump (107) are connected to the vacuum chamber (105), is employed.

公开(公告)号：US20200273665A1

公开(公告)日：2020-08-27

申请号：US16646501

申请日：2017-09-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideo MORISHITA ,  Toshihide AGEMURA

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/05 ,  H01J37/14 ,  H01J37/147 ,  H01J37/32

Abstract: Provided is a scanning electron microscope provided with an energy selection and detection function for a SE1 generated on a sample while suppressing the detection amount of a SE3 excited due to a BSE in the scanning electron microscope that does not apply a deceleration method. Provided are: an electron optical system that includes an electron source 21 generating an irradiation electron beam and an objective lens 12 focusing the irradiation electron beam on a sample; a detector 13 that is arranged outside an optical axis of the electron optical system and detects a signal electron generated when the sample is irradiated with the irradiation electron beam; a deflection electrode that forms a deflection field 26 to guide the signal electron to the detector; a disk-shaped electrode 23 that is arranged to be closer to the electron source than the deflection field and has an opening through which the irradiation electron beam passes; and a control electrode arranged along the optical axis to be closer to the sample than the deflection field. The sample and the objective lens are set to a reference potential. A potential lower than the reference potential is applied to the disk-shaped electrode, and a potential higher than the reference potential is applied to the control electrode.

公开(公告)号：US20200211815A1

公开(公告)日：2020-07-02

申请号：US16616097

申请日：2017-06-02

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori NOMAGUCHI ,  Shunichi MOTOMURA ,  Kenichi NISHINAKA ,  Toshihide AGEMURA

IPC: H01J37/244 ,  H01J37/10 ,  H01J37/09 ,  H01J37/147

Abstract: Signal electrons with high energy that pass near an optical axis, for example, backscattered electrons or secondary electrons in a booster optical system, can be detected. Therefore, there is provided a charged particle beam device including: a charged particle beam source configured to generate a charged particle beam; an objective lens configured to focus the charged particle beam to a sample; and a first charged particle detecting element disposed between the charged particle beam source and the objective lens and configured to detect charged particles generated by an interaction between the charged particle beam and the sample, in which a detection surface of the first charged particle detecting element is disposed on a center axis of the objective lens.

公开(公告)号：US20190148105A1

公开(公告)日：2019-05-16

申请号：US16310333

申请日：2016-06-17

Applicant: Hitachi High-Technologies Corporation

Inventor： Munekazu KOYANAGI ,  Wataru SUZUKI ,  Toshihide AGEMURA

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/29

Abstract: In a charged particle beam apparatus is provided with an optical image capturing apparatus having an angle different from that of a column, a sample may collide with other components when the sample is faced toward the optical image capturing apparatus. The charged particle beam apparatus includes a stage configured to place a sample thereon and to move the sample inside a sample chamber; a column configured to observe the sample by irradiating a charged particle beam on the sample; a first image capturing apparatus configured to observe a surface of the sample irradiated with the charged particle beam from an angle different from that of the column; and a control unit configured to, when observing the sample via the first image capturing apparatus, separate the sample from the column and to tilt the sample through the stage to face toward the first image capturing apparatus.

公开(公告)号：US20150364296A1

公开(公告)日：2015-12-17

申请号：US14761963

申请日：2014-01-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori NOMAGUCHI ,  Toshihide AGEMURA

IPC: H01J37/28 ,  G01T1/20 ,  H01J37/147 ,  H01J37/244 ,  H01J37/10 ,  H01J37/30

CPC classification number: H01J37/28 ,  G01T1/20 ,  H01J37/10 ,  H01J37/147 ,  H01J37/22 ,  H01J37/24 ,  H01J37/244 ,  H01J37/30 ,  H01J37/3178

Abstract: The present invention relates to modulating an irradiation condition of a charged particle beam at high speed and detecting a signal in synchronization with a modulation period for the purpose of extracting a signal arising from a certain charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously or, for example, for the purpose of separating a secondary electron signal arising from ion beam irradiation and a secondary electron signal arising from electron beam irradiation in an FIB-SEM system. The present invention further relates to dispersing light emitted from two or more kinds of scintillators having different light emitting properties, detecting each signal strength, and processing a signal on the basis of a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone, the ratio being set by a mechanism. The present invention enables extraction of only a signal arising from a desired charged particle beam even when the sample is irradiated with the plurality of charged particle beams simultaneously. The SEM observation can be performed in the middle of the FIB processing using the secondary electron in the FIB-SEM system, for example.

Abstract translation: 本发明涉及以高速度调制带电粒子束的照射条件，并且与调制周期同步地检测信号，以便在样品被多个照射时提取由某个带电粒子束产生的信号 或者例如为了分离由离子束照射产生的二次电子信号和在FIB-SEM系统中从电子束照射引起的二次电子信号。 本发明还涉及分散具有不同发光特性的两种或更多种闪烁体发射的光，检测每种信号强度，并且基于当样品被照射第一个带电量时的第一信号强度的比例来处理信号 当单独用第二带电粒子束照射样品时，粒子束单独到第二信号强度，该比例由机构设定。 即使当同时对多个带电粒子束照射样品时，本发明仅能够提取由期望的带电粒子束产生的信号。 例如，可以使用FIB-SEM系统中的二次电子在FIB处理的中间进行SEM观察。