知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

728 records (took 0.039 seconds)

    Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method
    21.
    发明授权
    Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method 有权
    带电粒子束写入装置，孔径单元和带电粒子束写入方法

    公开(公告)号：US09449792B2

    公开(公告)日：2016-09-20

    申请号：US14193182

    申请日：2014-02-28

    Applicant: NuFlare Technology, Inc.

    Inventor： Tetsuro Nishiyama

    IPC: H01L21/00 ,  H01J37/317 ,  H01J37/09 ,  H01L21/263

    CPC classification number: H01J37/3174 ,  H01J37/09 ,  H01J2237/022 ,  H01J2237/0451 ,  H01L21/2636

    Abstract: A charged particle beam writing apparatus according to an embodiment includes: a beam emitter configured to emit a charged particle beam; an aperture having an opening portion through which the charged particle beam emitted by the beam emitter passes; an aperture beam tube being provided on a surface of the aperture and functioning as a thermally conductive member having thermal conductivity; and a heater provided on a surface of the aperture beam tube and configured to supply heat to the aperture via the aperture beam tube.

    Abstract translation: 根据实施例的带电粒子束写入装置包括：被配置为发射带电粒子束的射束发射器; 具有开口部分的孔，由射束发射器发射的带电粒子束通过该开口部分; 孔径管设置在孔的表面上并用作具有导热性的导热构件; 以及加热器，其设置在所述孔径光束管的表面上并且经配置以经由所述孔径管向所述孔提供热量。

    Adjustable Mass Resolving Aperture
    22.
    发明申请
    Adjustable Mass Resolving Aperture 审中-公开
    可调节质量分辨孔径

    公开(公告)号：US20160240350A1

    公开(公告)日：2016-08-18

    申请号：US15136524

    申请日：2016-04-22

    Applicant: Glenn Lane Family Limited Liability Limited Partnership

    Inventor： Glenn E. LANE

    IPC: H01J37/317

    CPC classification number: H01J37/3007 ,  C23C14/48 ,  C23C14/54 ,  H01J37/08 ,  H01J37/09 ,  H01J37/3171 ,  H01J49/062 ,  H01J49/26 ,  H01J2237/0213 ,  H01J2237/04 ,  H01J2237/0455 ,  H01J2237/152 ,  H01J2237/31701 ,  H01L21/265

    Abstract: Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ion species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (CPC) superconductor, or boson energy transmission system.

    Abstract translation: 本发明的实施例涉及可用于离子注入系统中的质量分辨孔径，该离子注入系统基于离子束中不需要的注入质量比（和/或质荷比）来选择性地排除离子种类 部件。 本发明的实施例涉及一种质量分辨孔径，该质量分辨孔径被分段，可调节和/或呈现出将撞击孔的迎面而来的离子物质的曲面。 本发明的实施例还涉及通过封闭的等离子体通道（CPC）超导体或玻色子能量传输系统对带电粒子的流过滤。

    Electron Microscope
    25.
    发明申请
    Electron Microscope 有权
    电子显微镜

    公开(公告)号：US20160196952A1

    公开(公告)日：2016-07-07

    申请号：US14916529

    申请日：2014-05-16

    Applicant: HIitachi High-Technologies Corporation

    Inventor： Hiroaki MATSUMOTO ,  Takeshi SATO ,  Yoshifumi TANIGUCHI ,  Ken HARADA

    IPC: H01J37/10 ,  H01J37/147 ,  H01J37/05 ,  H01J37/285

    CPC classification number: H01J37/10 ,  G01N23/20058 ,  G01N2223/418 ,  H01J37/04 ,  H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J37/285 ,  H01J37/295 ,  H01J2237/21 ,  H01J2237/2614

    Abstract: The present invention relates to a lens-less Foucault method wherein a transmission electron microscope objective lens (5) is turned off, an electron beam crossover (11, 13) is matched with a selected area aperture (65), and the focal distance of a first imaging lens (61) can be changed to enable switching between a sample image observation mode and a sample diffraction pattern observation mode, characterized in that a deflector (81) is disposed in a stage following the first imaging lens (61), and conditions for an irradiating optical system (4) can be fixed after conditions for the imaging optical system have been determined. This allows a lens-less Foucault method to be implemented in a common general-use transmission electron microscope with no magnetic shielding lens equipped, without burdening the operator.

    Abstract translation: 本发明涉及一种无透镜Foucault方法，其中透射电子显微镜物镜（5）被关闭，电子束交叉（11,13）与所选区域孔径（65）匹配，并且焦距 可以改变第一成像透镜（61）以在样本图像观察模式和样本衍射图案观察模式之间切换，其特征在于，偏转器（81）设置在跟随第一成像透镜（61）的阶段中，以及 可以在确定成像光学系统的条件之后固定照射光学系统（4）的条件。 这样就可以在没有磁屏蔽透镜的公共通用透射电子显微镜中实现无镜头福柯方法，而不会对操作者造成负担。

    Electron beam writing apparatus and electron beam writing method
    26.
    发明授权
    Electron beam writing apparatus and electron beam writing method 有权
    电子束写入装置和电子束写入方法

    公开(公告)号：US09373424B2

    公开(公告)日：2016-06-21

    申请号：US13768258

    申请日：2013-02-15

    Applicant: NuFlare Technology, Inc.

    Inventor： Takanao Touya ,  Takahito Nakayama

    IPC: H01J37/09 ,  H01J37/12 ,  H01J37/317 ,  G21K5/08 ,  B82Y10/00 ,  B82Y40/00

    CPC classification number: G21K5/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3174

    Abstract: An electron beam writing apparatus comprising a stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, and a voltage supply device for applying positive voltage constantly to the electrostatic lens. A shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a positive voltage constantly to the electrostatic lens.

    Abstract translation: 一种电子束写入装置，包括放置样品的电极，电子光学柱，发射设置在光学柱中的电子束的电子枪，设置有沿着电子束的轴向排列的电极的静电透镜， 光学柱，以及用于向静电透镜恒定施加正电压的电压供给装置。 屏蔽板设置在XY平台和电子光学柱之间以阻挡通过用电子束照射到样品产生的反射电子或二次电子。 静电透镜设置在屏蔽板的正上方，以改变电子束的焦点位置。 电压供给装置将静电透镜恒定地施加正电压。

    Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements
    27.
    发明申请
    Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements 有权
    这种系统和布置的粒子 - 光学系统和布置和粒子 - 光学部件

    公开(公告)号：US20160155603A1

    公开(公告)日：2016-06-02

    申请号：US15016743

    申请日：2016-02-05

    Applicant: Applied Materials Israel Ltd. ,  Carl Zeiss Microscopy GMBH

    Inventor： Dirk Zeidler ,  Thomas KEMEN ,  Anger Pascal ,  Antonio Casares ,  Christof Riedesel

    IPC: H01J37/09 ,  H01J37/21

    CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

    Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a easier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

    Abstract translation: 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 更容易（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

    Charged particle inspection method and charged particle system
    28.
    发明授权
    Charged particle inspection method and charged particle system 有权
    带电粒子检测方法和带电粒子系统

    公开(公告)号：US09324537B2

    公开(公告)日：2016-04-26

    申请号：US14309452

    申请日：2014-06-19

    Applicant: Carl Zeiss Microscopy GmbH ,  Applied Materials Israel, Ltd.

    Inventor： Thomas Kemen ,  Rainer Knippelmeyer ,  Stefan Schubert

    IPC: H01J37/00 ,  H01J37/04 ,  H01J37/09 ,  H01J37/317

    CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

    Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

    Abstract translation: 带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔 板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心 的第二多孔板的孔径。 本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数量的带电粒子子束检查物体的带电粒子检查方法。

    BEAM GRID LAYOUT
    30.
    发明申请
    BEAM GRID LAYOUT 有权
    梁网布置

    公开(公告)号：US20160071696A1

    公开(公告)日：2016-03-10

    申请号：US14787775

    申请日：2014-05-05

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Vincent Sylvester KUIPER ,  Erwin SLOT

    IPC: H01J37/317 ,  H01J37/30

    CPC classification number: H01J37/3177 ,  H01J37/09 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/3175 ,  H01J2237/31774

    Abstract: A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.

    Abstract translation: 一种用于从一个或多个带电粒子束形成多个子光束的子光束孔径阵列。 子光束孔径阵列包括一个或多个光束区域，每个光束区域包括以非正六边形图案布置的多个子光束孔径，子光束孔径布置成使得当沿第一方向投影到 线平行于第二方向，子光束孔沿着线均匀间隔开，并且其中第一方向不同于第二方向。 该系统还包括具有以一组或多组布置的多个子束孔的子束孔阵列。 子束孔径阵列被布置成接收子束并在子束阵列的子束孔的位置处形成多个子束。

Patent Agency Ranking