Invention Grant
US09449792B2 Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method
有权
带电粒子束写入装置，孔径单元和带电粒子束写入方法
- Patent Title: Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method
- Patent Title (中): 带电粒子束写入装置，孔径单元和带电粒子束写入方法
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Application No.: US14193182Application Date: 2014-02-28
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Publication No.: US09449792B2Publication Date: 2016-09-20
- Inventor: Tetsuro Nishiyama
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-048756 20130312
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01J37/317 ; H01J37/09 ; H01L21/263
Abstract:
A charged particle beam writing apparatus according to an embodiment includes: a beam emitter configured to emit a charged particle beam; an aperture having an opening portion through which the charged particle beam emitted by the beam emitter passes; an aperture beam tube being provided on a surface of the aperture and functioning as a thermally conductive member having thermal conductivity; and a heater provided on a surface of the aperture beam tube and configured to supply heat to the aperture via the aperture beam tube.
Public/Granted literature
- US20140273536A1 CHARGED PARTICLE BEAM WRITING APPARATUS, APERTURE UNIT, AND CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2014-09-18
Information query
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