Susceptor cover
    1.
    外观设计

    公开(公告)号:USD1047884S1

    公开(公告)日:2024-10-22

    申请号:US29834638

    申请日:2022-04-13

    摘要: FIG. 1 is a perspective view of a susceptor cover showing our new design,
    FIG. 2 is a front elevational view thereof,
    FIG. 3 is a rear elevational view thereof,
    FIG. 4 is a right side elevational view thereof,
    FIG. 5 is a left side elevational view thereof,
    FIG. 6 is a top plan view thereof, a bottom plan view being a mirror image thereof; and,
    FIG. 7 is an enlarged end face sectional view taken along line 7-7 of FIG. 2.
    The broken lines in FIG. 2 are for the purpose of illustrating portions of the susceptor cover in FIG. 7 and form no part of the claimed design.

    BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING APPARATUS

    公开(公告)号:US20240282550A1

    公开(公告)日:2024-08-22

    申请号:US18635723

    申请日:2024-04-15

    摘要: A blanking aperture array system includes a data output circuit that outputs first data and a first error detection code generated from the first data. A shift register transfers the first data and first error detection code that are input from the data output circuit. A buffer receives the first data from a first register. An electrode receives a voltage based on the first data output from the buffer. An error detection circuit receives the first data and first error detection code from a register of a last stage, generates a second error detection code from the first data received from the register of the last stage, and generate a detection signal indicating a match if the first error detection code from the register of the last stage and the second error detection code match and indicating a mismatch if they do not match.

    MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PARTICLE BEAM WRITING METHOD

    公开(公告)号:US20240242932A1

    公开(公告)日:2024-07-18

    申请号:US18621345

    申请日:2024-03-29

    IPC分类号: H01J37/304 H01J37/317

    摘要: A multi-charged particle beam writing apparatus includes a distribution ratio calculation circuit to calculate, for the each control grid and each combination of combinations, a dose distribution ratio for each beam of at least two beams forming a combination concerned in order to distribute a dose amount, which is to be applied to a control grid concerned, to the at least two beams forming the combination concerned such that a total of distribution dose amounts having been distributed to the at least two beams forming the combination concerned is substantially equivalent to the dose amount to be applied to the control grid concerned, and a combination selection circuit to select, for the each control grid, a combination in which a dose distribution ratio for the first beam is larger than a dose distribution ratio for at least one beam remaining in the at least two beams forming the combination concerned.

    Drawing apparatus and deflector
    4.
    发明授权

    公开(公告)号:US12009174B2

    公开(公告)日:2024-06-11

    申请号:US17651278

    申请日:2022-02-16

    摘要: A blanking deflector according to an embodiment includes: a first electrode comprising a first insulator, a first material film coating all surfaces of the first insulator and having lower resistance than the first insulator, and a first low-resistance film coating part or all of surfaces of the first material film and having lower resistance than the first material film; and a second electrode comprising a second insulator, a second material film coating all surfaces of the second insulator and having lower resistance than the second insulator, and a second low-resistance film coating part or all of surfaces of the second material film and having lower resistance than the second material film, wherein the blanking deflector controls whether to irradiate a specimen with a charged particle beam by causing the charged particle beam to pass between the first electrode and the second electrode.

    HEATER LIFE PREDICTION METHOD, HEAT TREATMENT APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM

    公开(公告)号:US20240186192A1

    公开(公告)日:2024-06-06

    申请号:US18523332

    申请日:2023-11-29

    IPC分类号: H01L21/66 H01L21/67

    摘要: A heater life prediction method includes predicting a life of a heater in a semiconductor manufacturing apparatus including a treatment chamber in which a treatment of a substrate is performed, and the heater configured to heat the substrate loaded into the treatment chamber, and prediction of the life of the heater includes calculating a resistance change amount being a difference between a resistance value of the heater and an initial value of the resistance value, or a resistance change rate obtained by dividing the resistance change amount by the initial value in a step in which constant output control is executed on the heater between the treatments of different substrates, and predicting the life of the heater on the basis of the calculated resistance change amount or the calculated resistance change rate.