公开(公告)号：US20160071696A1

公开(公告)日：2016-03-10

申请号：US14787775

申请日：2014-05-05

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Vincent Sylvester KUIPER ,  Erwin SLOT

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/09 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.

Abstract translation: 一种用于从一个或多个带电粒子束形成多个子光束的子光束孔径阵列。 子光束孔径阵列包括一个或多个光束区域，每个光束区域包括以非正六边形图案布置的多个子光束孔径，子光束孔径布置成使得当沿第一方向投影到 线平行于第二方向，子光束孔沿着线均匀间隔开，并且其中第一方向不同于第二方向。 该系统还包括具有以一组或多组布置的多个子束孔的子束孔阵列。 子束孔径阵列被布置成接收子束并在子束阵列的子束孔的位置处形成多个子束。

公开(公告)号：US20160004173A1

公开(公告)日：2016-01-07

申请号：US14850997

申请日：2015-09-11

Applicant: Mapper Lithography IP B.V.

Inventor： Vincent Sylvester KUIPER ,  Erwin SLOT ,  Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER ,  Hendrik Jan DE JONG

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

Abstract: An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

Abstract translation: 一种用于将基板或基板支撑结构的目标（例如基板被夹紧到其上的基板）从基板传送系统传送到光刻系统的真空室的装置。 该装置包括用于将目标物输入和离开真空室的装载锁定室。 所述装载锁定室包括具有第一通道的第一壁，所述第一通道提供机器人空间与所述装载锁定室的内部之间的通路;第二壁，其具有提供在所述负载锁定室的内部与所述真空室之间的通路的第二通道，以及 用于传送所述目标的多个处理机器人包括：可在所述机器人空间内移动的第一处理机器人，以接近所述基板传送系统和所述第一通道; 以及第二处理机器人，其能够在所述加载锁定室内移动以接近所述第一通道和所述第二通道。