公开(公告)号：US20160004173A1

公开(公告)日：2016-01-07

申请号：US14850997

申请日：2015-09-11

Applicant: Mapper Lithography IP B.V.

Inventor： Vincent Sylvester KUIPER ,  Erwin SLOT ,  Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER ,  Hendrik Jan DE JONG

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

Abstract: An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

Abstract translation: 一种用于将基板或基板支撑结构的目标（例如基板被夹紧到其上的基板）从基板传送系统传送到光刻系统的真空室的装置。 该装置包括用于将目标物输入和离开真空室的装载锁定室。 所述装载锁定室包括具有第一通道的第一壁，所述第一通道提供机器人空间与所述装载锁定室的内部之间的通路;第二壁，其具有提供在所述负载锁定室的内部与所述真空室之间的通路的第二通道，以及 用于传送所述目标的多个处理机器人包括：可在所述机器人空间内移动的第一处理机器人，以接近所述基板传送系统和所述第一通道; 以及第二处理机器人，其能够在所述加载锁定室内移动以接近所述第一通道和所述第二通道。

公开(公告)号：US20150309424A1

公开(公告)日：2015-10-29

申请号：US14738962

申请日：2015-06-15

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER

IPC: G03F7/20

CPC classification number: G06F9/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70483 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70991 ,  G05B19/41865 ,  G06F9/4881 ,  H01J37/3177

Abstract: A lithography system having one or more lithography elements Each lithography element has a plurality of lithography subsystems. The lithography system further has a control network forming a control network path between the plurality of the lithography subsystems and at least one element control unit for communication of control information. The lithography system is arranged for: issuing control information to the at least one element control unit to control operation of one or more of the lithography subsystems for exposure of one or more wafers; issuing a process program to the element control unit. The process program has a set of predefined commands and associated parameters. The element control unit is arranged to transmit a command of the process program to a lithography subsystem to be executed by the lithography subsystem, regardless of an execution status of a preceding command transmitted to the lithography subsystem.

Abstract translation: 具有一个或多个光刻元件的光刻系统每个光刻元件具有多个光刻子系统。 光刻系统还具有形成多个光刻子系统之间的控制网络路径的控制网络和用于通信控制信息的至少一个元件控制单元。 光刻系统被布置为：向至少一个元件控制单元发出控制信息，以控制用于一个或多个晶片曝光的一个或多个光刻子系统的操作; 向元件控制单元发出处理程序。 过程程序具有一组预定义的命令和相关参数。 元件控制单元布置成将处理程序的命令发送到光刻子系统以由光刻子系统执行，而不管传送到光刻子系统的先前命令的执行状态如何。