公开(公告)号：US20160004173A1

公开(公告)日：2016-01-07

申请号：US14850997

申请日：2015-09-11

Applicant: Mapper Lithography IP B.V.

Inventor： Vincent Sylvester KUIPER ,  Erwin SLOT ,  Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER ,  Hendrik Jan DE JONG

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

Abstract: An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

Abstract translation: 一种用于将基板或基板支撑结构的目标（例如基板被夹紧到其上的基板）从基板传送系统传送到光刻系统的真空室的装置。 该装置包括用于将目标物输入和离开真空室的装载锁定室。 所述装载锁定室包括具有第一通道的第一壁，所述第一通道提供机器人空间与所述装载锁定室的内部之间的通路;第二壁，其具有提供在所述负载锁定室的内部与所述真空室之间的通路的第二通道，以及 用于传送所述目标的多个处理机器人包括：可在所述机器人空间内移动的第一处理机器人，以接近所述基板传送系统和所述第一通道; 以及第二处理机器人，其能够在所述加载锁定室内移动以接近所述第一通道和所述第二通道。

公开(公告)号：US20140185028A1

公开(公告)日：2014-07-03

申请号：US14135372

申请日：2013-12-19

Applicant: Mapper Lithography IP B.V.

Inventor： Guido DE BOER ,  Michel Pieter DANSBERG ,  Pieter KRUIT

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

Abstract translation: 本发明涉及一种光刻系统，例如用于将图像或图像图案投射到诸如晶片的目标（1）上，所述目标通过目标台（2）包括在所述系统中，夹紧装置是 用于将所述目标夹持在所述台上。 所述夹紧装置包括固定液体层（3），其包括在目标台和目标台之间的这样的厚度上，其设置有液体（C）的材料和目标（1）的相应的接触面（A，B） 和目标表（2），出现压降（PCap）。

公开(公告)号：US20140176920A1

公开(公告)日：2014-06-26

申请号：US14135378

申请日：2013-12-19

Applicant: Mapper Lithography IP B.V.

Inventor： Guido DE BOER ,  Michel Pieter DANSBERG ,  Pieter KRUIT

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer or stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

Abstract translation: 本发明涉及一种光刻系统，例如用于将图像或图像图案投射到诸如晶片的目标（1）上，所述目标通过目标台（2）包括在所述系统中，夹紧装置是 用于将所述目标夹持在所述台上。 所述夹紧装置包括层或固定液体（3），其包括在目标台和目标台之间的这样的厚度上，其提供液体（C）的材料和目标（1）的相应的接触面（A，B） 和目标表（2），出现压降（PCap）。

公开(公告)号：US20150190994A1

公开(公告)日：2015-07-09

申请号：US14662346

申请日：2015-03-19

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Guido DE BOER ,  Ralph VAN MELLE ,  Teunis VAN DE PEUT ,  Henk DERKS ,  Frederik Matthias SPIEGELHALDER ,  Roy Josephus Stephanus DERKS ,  Edwin Johannes Theodorus SMULDERS

IPC: B32B37/14 ,  B32B38/00 ,  B32B37/12

CPC classification number: B32B37/142 ,  B32B37/1284 ,  B32B37/1292 ,  B32B38/0012 ,  B32B2551/00 ,  B82Y10/00 ,  B82Y40/00 ,  G02B6/3612 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/2482 ,  Y10T156/1002

Abstract: A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted second fiber is bent in conformity with a shape of the first fiber, such that the fiber abuts a side wall of the second aperture at a predetermined position. The bent fibers are bonded together using an adhesive material.

Abstract translation: 一种形成光纤阵列的方法。 提供具有第一表面和相对的第二表面的基板。 衬底设置有从第一表面延伸穿过衬底到第二表面的多个孔。 另外，提供多根纤维。 纤维具有直径小于孔的最小直径的纤维端。 第一光纤从衬底的第一表面侧插入到第一对应的孔中，使得光纤端位于紧邻第二表面的位置。 所插入的第一纤维沿预定方向弯曲，使得纤维在预定位置处抵靠第一孔的侧壁。 在第一纤维弯曲之后，第二纤维从衬底的第一表面侧插入到第二对应的孔中，使得光纤端位于紧邻第二表面的位置。 插入的第二纤维与第一纤维的形状一致地弯曲，使得纤维在预定位置处抵靠第二孔的侧壁。 弯曲的纤维使用粘合剂材料粘合在一起。

公开(公告)号：US20150309424A1

公开(公告)日：2015-10-29

申请号：US14738962

申请日：2015-06-15

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER

IPC: G03F7/20

CPC classification number: G06F9/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70483 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70991 ,  G05B19/41865 ,  G06F9/4881 ,  H01J37/3177

Abstract: A lithography system having one or more lithography elements Each lithography element has a plurality of lithography subsystems. The lithography system further has a control network forming a control network path between the plurality of the lithography subsystems and at least one element control unit for communication of control information. The lithography system is arranged for: issuing control information to the at least one element control unit to control operation of one or more of the lithography subsystems for exposure of one or more wafers; issuing a process program to the element control unit. The process program has a set of predefined commands and associated parameters. The element control unit is arranged to transmit a command of the process program to a lithography subsystem to be executed by the lithography subsystem, regardless of an execution status of a preceding command transmitted to the lithography subsystem.

Abstract translation: 具有一个或多个光刻元件的光刻系统每个光刻元件具有多个光刻子系统。 光刻系统还具有形成多个光刻子系统之间的控制网络路径的控制网络和用于通信控制信息的至少一个元件控制单元。 光刻系统被布置为：向至少一个元件控制单元发出控制信息，以控制用于一个或多个晶片曝光的一个或多个光刻子系统的操作; 向元件控制单元发出处理程序。 过程程序具有一组预定义的命令和相关参数。 元件控制单元布置成将处理程序的命令发送到光刻子系统以由光刻子系统执行，而不管传送到光刻子系统的先前命令的执行状态如何。

公开(公告)号：US20150177625A1

公开(公告)日：2015-06-25

申请号：US14630678

申请日：2015-02-25

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Guido DE BOER ,  Niels VERGEER

IPC: G03F7/20

CPC classification number: G03F9/7076 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7046 ,  G03F9/7084 ,  H01J37/3045 ,  H01J37/3174

Abstract: The invention relates to a substrate comprising an optical position mark for being read-out by an optical recording head for emitting light of predetermined wavelength, preferably red or infra-red light, more in particular of 635 nm light, the optical position mark having a mark height, a mark length and a predetermined known position on the substrate, the optical position mark extending along a longitudinal direction and being arranged for varying a reflection coefficient of the position mark along said longitudinal direction, wherein the optical position mark comprises: a first region having a first reflection coefficient and a first width; a second region neighboring the first region and forming a first region pair, the second region having a second reflection coefficient and a second width, and the second reflection coefficient being different from the first reflection coefficient, wherein the first region comprises sub-wavelength structures in comparison with a wavelength of the predetermined wavelength light.

Abstract translation: 本发明涉及一种包括光学位置标记的基板，该光学位置标记由用于发射预定波长的光的光学位置标记读出，优选为红色或红外光，特别是635nm的光，光学位置标记具有 标记高度，标记长度和预定的已知位置，所述光学位置标记沿着纵向方向延伸并且被布置成用于改变位置标记沿着所述纵向方向的反射系数，其中所述光学位置标记包括：第一 区域具有第一反射系数和第一宽度; 与所述第一区域相邻并形成第一区域对的第二区域，所述第二区域具有第二反射系数和第二宽度，并且所述第二反射系数与所述第一反射系数不同，其中所述第一区域包括： 与预定波长的光的波长进行比较。