公开(公告)号：US20140185028A1

公开(公告)日：2014-07-03

申请号：US14135372

申请日：2013-12-19

Applicant: Mapper Lithography IP B.V.

Inventor： Guido DE BOER ,  Michel Pieter DANSBERG ,  Pieter KRUIT

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

Abstract translation: 本发明涉及一种光刻系统，例如用于将图像或图像图案投射到诸如晶片的目标（1）上，所述目标通过目标台（2）包括在所述系统中，夹紧装置是 用于将所述目标夹持在所述台上。 所述夹紧装置包括固定液体层（3），其包括在目标台和目标台之间的这样的厚度上，其设置有液体（C）的材料和目标（1）的相应的接触面（A，B） 和目标表（2），出现压降（PCap）。

公开(公告)号：US20140176920A1

公开(公告)日：2014-06-26

申请号：US14135378

申请日：2013-12-19

Applicant: Mapper Lithography IP B.V.

Inventor： Guido DE BOER ,  Michel Pieter DANSBERG ,  Pieter KRUIT

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer or stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

Abstract translation: 本发明涉及一种光刻系统，例如用于将图像或图像图案投射到诸如晶片的目标（1）上，所述目标通过目标台（2）包括在所述系统中，夹紧装置是 用于将所述目标夹持在所述台上。 所述夹紧装置包括层或固定液体（3），其包括在目标台和目标台之间的这样的厚度上，其提供液体（C）的材料和目标（1）的相应的接触面（A，B） 和目标表（2），出现压降（PCap）。