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    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
    23.
    发明申请
    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
    充电颗粒光束写字装置和充电颗粒光束写字方法

    公开(公告)号：US20150279611A1

    公开(公告)日：2015-10-01

    申请号：US14620402

    申请日：2015-02-12

    Applicant: NuFlare Technology, Inc.

    Inventor： Hironobu Matsumoto

    IPC: H01J37/147 ,  H01J37/317

    CPC classification number: H01J37/147 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/1504 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31776

    Abstract: A charged particle beam writing apparatus includes plural conversion processing units to perform data conversion processing in parallel for writing data of each processing region obtained by virtually dividing the writing region of a target object into plural processing regions, a transmission unit to input a part of processing data of one of the plural processing regions for which data conversion processing has been performed, one part at a time, totally as n divided processing data, and sequentially transmit the n divided processing data such that the (n−1) th divided processing data is transmitted while the n-th divided processing data is being input, a deflection control circuit to control a deflection amount for deflecting a charged particle beam, based on one of the n divided processing data transmitted sequentially, and a writing unit to write a pattern by deflecting the charged particle beam based on the deflection amount.

    Abstract translation: 带电粒子束写入装置包括多个转换处理单元，用于并行地执行数据转换处理，以将通过将目标对象的写入区域虚拟地分割成多个处理区域而获得的每个处理区域的数据进行写入;传输单元，用于输入处理的一部分 已经执行数据转换处理的多个处理区域之一的数据一次一个地完全分配为n个分割处理数据，并且顺序地发送n个分割的处理数据，使得第（n-1）个划分的处理数据 在输入第n个分割处理数据的同时发送偏转控制电路，根据顺序发送的n个分割处理数据之一来控制用于偏转带电粒子束的偏转量的偏转控制电路和写入图案的写入单元 通过基于偏转量偏转带电粒子束。

    Pattern modification schemes for improved FIB patterning
    24.
    发明授权
    Pattern modification schemes for improved FIB patterning 有权
    用于改进FIB图案化的图案修改方案

    公开(公告)号：US08314409B2

    公开(公告)日：2012-11-20

    申请号：US12870816

    申请日：2010-08-28

    Applicant: Tom Miller ,  Gene Mirro ,  Cornelis Sander Kooijman ,  Hendrik Jan de Vos

    Inventor： Tom Miller ,  Gene Mirro ,  Cornelis Sander Kooijman ,  Hendrik Jan de Vos

    IPC: H01J3/14

    CPC classification number: H01J3/26 ,  H01J37/1472 ,  H01J37/1477 ,  H01J37/3026 ,  H01J2237/1504 ,  H01J2237/1518 ,  H01J2237/1526 ,  H01J2237/30416 ,  H01J2237/3045 ,  H01J2237/30461

    Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.

    Abstract translation: 引导带电粒子束的改进方法，其补偿带电粒子通过改变一个或多个偏转器信号而穿过系统所需的时间。 根据本发明的一个实施例，在数模（D / A）转换之前，将数字滤波器应用于扫描图案，以便减少或消除可能由TOF误差引起的过拍影响。 在其他实施例中，也可以使用模拟滤波器或具有较低带宽的信号放大器的使用来补偿TOF误差。 通过改变扫描图案，可以显着减少或消除超拍效果。

    Charged particle beam writing method and apparatus
    25.
    发明授权
    Charged particle beam writing method and apparatus 有权
    带电粒子束写入方法和装置

    公开(公告)号：US07601968B2

    公开(公告)日：2009-10-13

    申请号：US11563109

    申请日：2006-11-24

    Applicant: Takayuki Abe ,  Jun Yashima

    Inventor： Takayuki Abe ,  Jun Yashima

    IPC: G21K1/087

    CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/045 ,  H01J37/24 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/30472

    Abstract: A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an optical path of the charged particle beam to write a pattern on a target object, wherein any one of the plurality of deflectors controls deflection of a charged particle beam of a shot different from a shot which is controlled in deflection by another deflector in the same period.

    Abstract translation: 带电粒子束写入方法包括照射带电粒子束的镜头，并且使用布置在带电粒子束的光路上的多个偏转器偏转拍摄的带电粒子束以将目标物体写入图案，其中 所述多个偏转器中的任何一个控制在相同的周期内不同于由另一偏转器偏转控制的镜头的镜头的带电粒子束的偏转。

    Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams
    26.
    发明授权
    Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams 失效
    方法和精准控制准直器，用于准确的准直和扫描离子束的精确平行排列

    公开(公告)号：US07105839B2

    公开(公告)日：2006-09-12

    申请号：US10807772

    申请日：2004-03-24

    Applicant: Nicholas R. White

    Inventor： Nicholas R. White

    IPC: H01J37/317

    CPC classification number: H01J37/3171 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/3045 ,  H01J2237/1501 ,  H01J2237/1504 ,  H01J2237/1508 ,  H01J2237/152

    Abstract: In system for implanting workpieces with an accurately parallel scanned ion beam, a fine-control collimator construct is used to reduce the deviation of the scanned ion beam from a specified axis of parallelism and thereby improve its collimation. The shape of the fine-control collimator matches the ribbon shape of the beam and correction of parallelism in two orthogonal directions is possible. Measurement of the non-parallelism is accomplished by sampling the scanned beam in two planes and comparing timing information; and such measurement is calibrated to the orientation of the workpiece in the plane where ion implantation occurs. Measurement of non-uniformity in the doping profile is accomplished using the same means; and the scan waveform is adjusted to substantially remove any non-uniformity in the doping profile.

    Abstract translation: 在用于用精确平行的扫描离子束注入工件的系统中，使用精细控制准直器构造来减少扫描的离子束与特定的平行轴的偏离，从而改善其准直。 精细准直器的形状与光束的色带形状匹配，并且可以在两个正交方向上校正平行度。 通过在两个平面中采样扫描光束并比较定时信息来实现非平行度的测量; 并且这样的测量被校准为在离子注入发生的平面中的工件的取向。 使用相同的方法测量掺杂分布中的不均匀性; 并且调整扫描波形以基本上消除掺杂分布中的任何不均匀性。

    Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method
    27.
    发明授权
    Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method 有权
    电子束曝光装置，偏转装置和电子束曝光方法

    公开(公告)号：US06919574B2

    公开(公告)日：2005-07-19

    申请号：US10672469

    申请日：2003-09-26

    Applicant: Shin-ichi Hashimoto ,  Haruo Yoda ,  Masato Muraki

    Inventor： Shin-ichi Hashimoto ,  Haruo Yoda ,  Masato Muraki

    IPC: G03F7/20 ,  H01J3/14 ,  H01J37/147 ,  H01J37/302 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/1477 ,  H01J37/3177 ,  H01J2237/1504

    Abstract: An electron beam exposure apparatus for exposing a wafer by an electron beam incorporates a circuit structure for conducting a scan test to self-diagnose the electrical connections. The electron beam exposure apparatus includes: an electron beam generating section for generating the electron beam; a plurality of deflectors for deflecting the corresponding electron beams; a deflection control section for outputting a deflection control signal for causing the deflector to deflect the electron beam; and a control signal storage section for storing a value of the deflection control signal output from the deflection control section. The control signal storage section connects the plurality of deflectors in series when conducting the scan test. The control signal storage section and the deflector may be monolithically integrated on a semiconductor substrate.

    Abstract translation: 用于通过电子束曝光晶片的电子束曝光设备结合了用于进行扫描测试以自诊断电连接的电路结构。 电子束曝光装置包括：用于产生电子束的电子束产生部分; 用于偏转对应的电子束的多个偏转器; 偏转控制部分，用于输出用于使偏转器偏转电子束的偏转控制信号; 以及控制信号存储部分，用于存储从偏转控制部分输出的偏转控制信号的值。 控制信号存储部在进行扫描试验时，串联连接多个导流板。 控制信号存储部分和偏转器可以单片集成在半导体衬底上。

    Particle-optical apparatus and method for operating the same
    29.
    发明申请
    Particle-optical apparatus and method for operating the same 失效
    粒子光学装置及其操作方法

    公开(公告)号：US20040113092A1

    公开(公告)日：2004-06-17

    申请号：US10639741

    申请日：2003-08-13

    Applicant: LEO Elektronenmikroskopie GmbH

    Inventor： Rainer Knippelmeyer

    IPC: H01J037/147

    CPC classification number: H01J37/141 ,  G21K1/08 ,  H01J37/12 ,  H01J37/14 ,  H01J37/1475 ,  H01J37/1477 ,  H01J2237/121 ,  H01J2237/1504

    Abstract: An apparatus and a method to manipulate at least one beam of charged particles are provided. The apparatus comprises two rows of field source members 13 which are disposed periodically at a distance from each other such that there exist planes of symmetry S, Snull with respect to which the field source members 13 are symmetrically disposed. The field has a component which is displaceable in the x-direction. To provide such field, a pattern of source strengths according to the formula F1(x)nullFm(x)nullFc(x) is applied to the field source members, wherein Fm is a component which is substantially independent of the displacement x0 and Fc is a correction component which is dependent on x0.

    Abstract translation: 提供了一种操纵至少一个带电粒子束的装置和方法。 该装置包括两排场源元件13，它们周期性地彼此间隔设置，使得存在对称S，S'的平面，场源元件13对称地设置对准面。 该场具有可在x方向上移位的分量。 为了提供这种场，根据公式F1（x）= Fm（x）+ Fc（x）的源强度的图案被施加到场源成分，其中Fm是基本上与位移x0无关的分量， Fc是依赖于x0的校正分量。

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