公开(公告)号：US08083562B2

公开(公告)日：2011-12-27

申请号：US12355376

申请日：2009-01-16

申请人： Hiromasa Mitani ,  Masato Muraki

发明人： Hiromasa Mitani ,  Masato Muraki

IPC分类号： H01J9/26 ,  H01J9/32

CPC分类号： H01J9/261 ,  H01J29/90 ,  H01J31/127

摘要： A manufacturing method of an image display apparatus having a substrate and a conductive supporting frame formed at a periphery of the substrate includes steps of forming a wiring on the substrate, and forming an insulating layer on the wiring. The insulating layer includes a silicon nitride or a silicon oxide deposited by a sputtering technique. The insulating layer is seal-bonded with the conductive supporting frame.

摘要翻译： 具有形成在基板的周边的基板和导电支撑框架的图像显示装置的制造方法包括在基板上形成布线的步骤，以及在布线上形成绝缘层。 绝缘层包括通过溅射技术沉积的氮化硅或氧化硅。 绝缘层与导电支撑框架密封接合。

公开(公告)号：US20100078555A1

公开(公告)日：2010-04-01

申请号：US12630346

申请日：2009-12-03

申请人： Ryo FUJITA ,  Haruo Yoda ,  Kimiaki Ando ,  Yuji Inoue ,  Masato Muraki

发明人： Ryo FUJITA ,  Haruo Yoda ,  Kimiaki Ando ,  Yuji Inoue ,  Masato Muraki

IPC分类号： G01N23/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31762 ,  H01J2237/31769

摘要： High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering using an inverse characteristic of exposure characteristics of the electron beams. Furthermore, in pattern inspection, electron beams are irradiated based on a result of filtering for obtaining a peripheral region of an edge of the pattern formed.

摘要翻译： 通过使用小剂量的电子束进行高对比度曝光，以高精度在晶片上形成图案，进行高精度检查。 在图案形成中，执行邻近效应校正处理。 此外，基于使用电子束的曝光特性的逆特性的滤波结果来执行电子束的曝光。 此外，在图案检查中，基于滤波结果照射电子束，以获得形成的图案的边缘的周边区域。

公开(公告)号：US20080067403A1

公开(公告)日：2008-03-20

申请号：US11762182

申请日：2007-06-13

申请人： Masato Muraki ,  Haruo Yoda

发明人： Masato Muraki ,  Haruo Yoda

IPC分类号： H01J3/14

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/043 ,  H01J2237/24507 ,  H01J2237/3045 ,  H01J2237/30455 ,  H01J2237/30477 ,  H01J2237/30483

摘要： An exposure apparatus which draws a pattern on a substrate with a charged particle beam is disclosed. The exposure apparatus includes a detector which detects a charged particle beam, a deflector which deflects the charged particle beam to scan the substrate or the detector with the charged particle beam, and a controller which controls the deflector to scan each of a plurality of scanning ranges on the detector with the charged particle beam, and calculates, on the basis of the charged particle beam amount detected by the detector upon scanning the plurality of scanning ranges, the intensity distribution of the charged particle beam which strikes the detector.

摘要翻译： 公开了一种在具有带电粒子束的基板上绘制图案的曝光装置。 曝光装置包括检测带电粒子束的检测器，使带电粒子束偏转以利用带电粒子束扫描基板或检测器的偏转器，以及控制偏转器扫描多个扫描范围中的每一个的控制器 在具有带电粒子束的检测器上，并且基于扫描多个扫描范围时由检测器检测到的带电粒子束量计算撞击检测器的带电粒子束的强度分布。

公开(公告)号：US07126141B2

公开(公告)日：2006-10-24

申请号：US11168425

申请日：2005-06-29

申请人： Haruhito Ono ,  Masato Muraki

发明人： Haruhito Ono ,  Masato Muraki

IPC分类号： G21K5/00

CPC分类号： H01J37/12 ,  G01N23/00 ,  H01J9/14 ,  H01J9/18 ,  H01J37/3007 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1534 ,  H01J2237/3175 ,  H01J2237/31774

摘要： A charged-particle beam exposure apparatus includes a charged-particle beam source for emitting a charged-particle beam, an electrooptic system array which has a plurality of electron lenses and forms a plurality of intermediate images of the charged-particle beam source by the plurality of electron lenses, and a projection electrooptic system for projecting on a substrate the plurality of intermediate images formed by the electrooptic system array. The electrooptic system array includes at least two electrodes arranged along paths of a plurality of charged-particle beams, each of the at least two electrodes having a plurality of apertures on the paths of the plurality of charged-particle beams, and a shield electrode which is interposed between the at least two electrodes and has a plurality of shields corresponding to the respective paths of the plurality of charged-particle beams.

摘要翻译： 带电粒子束曝光装置包括用于发射带电粒子束的带电粒子束源，具有多个电子透镜并由多个电子透镜形成带电粒子束源的多个中间图像的电光系统阵列 的电子透镜，以及用于在基板上投影由电光系统阵列形成的多个中间图像的投射电光系统。 电光系统阵列包括沿着多个带电粒子束的路径布置的至少两个电极，所述至少两个电极中的每一个在所述多个带电粒子束的路径上具有多个孔，以及屏蔽电极， 设置在所述至少两个电极之间并且具有对应于所述多个带电粒子束的相应路径的多个屏蔽。

公开(公告)号：US07049610B2

公开(公告)日：2006-05-23

申请号：US10885665

申请日：2004-07-08

申请人： Masato Muraki ,  Haruo Yoda

发明人： Masato Muraki ,  Haruo Yoda

IPC分类号： H01J37/305

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0435 ,  H01J2237/083 ,  H01J2237/30477

摘要： In a charged particle beam exposure method of applying/not applying charged particle beams to expose a substrate by deflecting the charged particle beams to move the charged particle beams on a blanking aperture stop, the size of the charged particle beams on the blanking aperture stop is made larger than the size of the blanking aperture stop.

摘要翻译： 在通过使带电粒子束偏转以使带电粒子束移动到消隐孔径光阑上而施加/不施加带电粒子束以暴露衬底的带电粒子束曝光方法中，消隐孔径光阑上的带电粒子束的尺寸为 制成大于冲孔孔径的尺寸。

公开(公告)号：US07038226B2

公开(公告)日：2006-05-02

申请号：US10454576

申请日：2003-06-05

申请人： Haruhito Ono ,  Masato Muraki

发明人： Haruhito Ono ,  Masato Muraki

IPC分类号： H01J3/14 ,  H01J37/00 ,  A61N5/00 ,  G21G5/00

CPC分类号： H01J37/12 ,  G01N23/00 ,  H01J9/14 ,  H01J9/18 ,  H01J37/3007 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1534 ,  H01J2237/3175 ,  H01J2237/31774

摘要： A semiconductor manufacturing factory includes a plurality of semiconductor manufacturing apparatuses including an exposure apparatus for exposing a substrate by using a plurality of charged particle beams, a local area network for connecting the plurality of semiconductor manufacturing apparatuses, and a gateway for connecting the local area network to an external network of the semiconductor manufacturing factory. The exposure apparatus includes a lens array, which has a plurality of lenses and directs a plurality of charged particle beams onto a substrate. The lens array includes at least two electrodes having a plurality of apertures on the paths of the plurality of charged-particle beams, and a shield electrode interposed between the at least two electrodes.

摘要翻译： 一种半导体制造工厂包括多个半导体制造装置，其包括通过使用多个带电粒子束使基板曝光的曝光装置，用于连接多个半导体制造装置的局域网，以及用于连接局域网 到半导体制造工厂的外部网络。 曝光装置包括具有多个透镜并将多个带电粒子束引导到基板上的透镜阵列。 透镜阵列包括在多个带电粒子束的路径上具有多个孔的至少两个电极以及插在该至少两个电极之间的屏蔽电极。

公开(公告)号：US06784442B2

公开(公告)日：2004-08-31

申请号：US10329388

申请日：2002-12-27

申请人： Masato Muraki ,  Hiroya Ohta ,  Shin-ichi Hashimoto

发明人： Masato Muraki ,  Hiroya Ohta ,  Shin-ichi Hashimoto

IPC分类号： G21G500

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/30472

摘要： This invention provides a multi-charged-particle beam exposure apparatus capable of easily correcting at a high precision the electron-optic characteristics of each column which constitutes an electron-optic system. The exposure apparatus has magnetic lens arrays (ML1, ML2, ML3, and ML4) which commonly adjust the electron-optic characteristics of a plurality of columns which constitute the electron-optic system, and dynamic focus lenses or deflector arrays which individually correct the electron-optic characteristics of the columns.

摘要翻译： 本发明提供一种能够以高精度容易地校正构成电子光学系统的各列的电子光学特性的多电荷粒子束曝光装置。 曝光装置具有通常调整构成电子光学系统的多个列的电子光学特性的磁透镜阵列（ML1，ML2，ML3和ML4），以及单独校正电子的动态聚焦透镜或偏转器阵列 - 列的光学特性。

公开(公告)号：US06768118B2

公开(公告)日：2004-07-27

申请号：US10350188

申请日：2003-01-24

申请人： Yoshinori Nakayama ,  Yasunari Sohda ,  Hiroya Ohta ,  Norio Saitou ,  Masato Muraki ,  Masaki Takakuwa

发明人： Yoshinori Nakayama ,  Yasunari Sohda ,  Hiroya Ohta ,  Norio Saitou ,  Masato Muraki ,  Masaki Takakuwa

IPC分类号： H01J326

CPC分类号： H01J37/244 ,  H01J2237/24405 ,  H01J2237/31774

摘要： The present invention provides a beam monitoring sensor which can offer both high beam monitoring precision and high speed monitoring in a multi-electron beam writing system and a monitoring method using the same. In a Faraday cup for electron beam monitoring, tantalum or a heavy metal material having an atomic number larger than that of tantalum is used to provide a Faraday cup construction having a high aspect ratio. The micro Faraday cup permits electron beam monitoring having less beam leak to a high acceleration electron beam.

摘要翻译： 本发明提供了一种能够在多电子束书写系统中提供远光监测精度和高速监测的光束监测传感器以及使用其的监测方法。在用于电子束监测的法拉第杯中，钽或重金属 使用原子序数大于钽的材料来提供具有高纵横比的法拉第杯结构。 微法拉第杯允许电子束监测具有较少的光束泄漏到高加速度电子束。

公开(公告)号：US06472674B1

公开(公告)日：2002-10-29

申请号：US09627789

申请日：2000-07-27

申请人： Masato Muraki

发明人： Masato Muraki

IPC分类号： H01J3730

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/31762

摘要： An electron beam exposure system which includes a plurality of electron beam exposure apparatuses and achieves reduction in the memory of an electron beam exposure apparatus by eliminating data transfer/data conversion for each electron beam exposure apparatus. The plurality of electron beam exposure apparatuses of the electron beam exposure system deflect an electron beam on the basis of control data and expose a pattern onto an object to be exposed, and a data control device sends, on the basis of pattern information of a pattern to be exposed which is sent out from one of the electron beam exposure apparatuses, control data corresponding to the pattern to be exposed to the electron beam exposure apparatus which has sent the pattern information. Also disclosed is a method of manufacturing devices, which utilizes a plurality of electron beam exposure apparatuses.

摘要翻译： 一种电子束曝光系统，其包括多个电子束曝光装置，并且通过消除每个电子束曝光装置的数据传送/数据转换来实现电子束曝光装置的存储器的减少。 电子束曝光系统的多个电子束曝光装置基于控制数据偏转电子束，并将图案曝露在要曝光的对象上，数据控制装置根据图案的图案信息发送 从电子束曝光装置之一发出的被曝光的控制数据对应于要发送图案信息的电子束曝光装置曝光的图案的控制数据。 还公开了利用多个电子束曝光装置的制造装置的方法。

公开(公告)号：US06472672B1

公开(公告)日：2002-10-29

申请号：US09629902

申请日：2000-07-31

申请人： Masato Muraki

发明人： Masato Muraki

IPC分类号： H01J3730

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/31764

摘要： An electron beam exposure apparatus for drawing a pattern on an object to be exposed using a plurality of electron beams. The apparatus includes an electron beam source for emitting electrons, a plurality of elementary electron optical systems for respectively forming intermediate images of the electron source, a projection electron optical system for projecting the plurality of intermediate images onto the object to be exposed and an adjustment unit for dynamically adjusting sizes of dot patterns formed on the object to be exposed upon projection of the intermediate images in correspondence with fields to be exposed of the pattern to be drawn by exposure on the object to be exposed.

摘要翻译： 一种电子束曝光装置，用于使用多个电子束在待曝光的物体上绘制图案。 该装置包括用于发射电子的电子束源，用于分别形成电子源的中间图像的多个基本电子光学系统，用于将多个中间图像投影到待曝光的物体上的投射电子光学系统和调节单元 用于动态地调整形成在待曝光物体上的点阵图形的大小，该中心图像对应于要暴露在被曝光物体上的要被绘制的图案曝光的场。