公开(公告)号：US20040108457A1

公开(公告)日：2004-06-10

申请号：US10631748

申请日：2003-08-01

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer ,  Heiko Muller

IPC: H01J037/256

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/1472 ,  H01J2237/2817

Abstract: A particle-optical apparatus is disclosed which combines the functions of an energy selector 27 and a beam splitter 21. The particle-optical apparatus is used in an electron microscopy system and serves to separate and superimpose, respectively, beam paths of a primary electron beam 11 and a secondary electron beam 13.

Abstract translation: 公开了一种组合了能量选择器27和分束器21的功能的粒子光学装置。该粒子光学装置用于电子显微镜系统中，用于分别并分别叠加一次电子束的光束路径 11和二次电子束13。

公开(公告)号：US20040075054A1

公开(公告)日：2004-04-22

申请号：US10636626

申请日：2003-08-08

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Rainer Knippelmeyer

IPC: H01J037/256

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28

Abstract: A probe-forming electron microscopy system 1 (SEM) is proposed which comprises a position-sensitive detector 15. As a result, position-dependent secondary electron intensities in the object plane 7 or angle-dependent secondary electron intensities in the object plane 7 may be observed.

Abstract translation: 提出了一种包括位置敏感检测器15的探针形成电子显微镜系统1（SEM）。结果，物平面7中的位置相关二次电子强度或物平面7中的取决于角度的二次电子强度可以 被观察。

公开(公告)号：US20040056193A1

公开(公告)日：2004-03-25

申请号：US10619690

申请日：2003-07-16

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer

IPC: G01N023/00

CPC classification number: H01J37/141 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/121 ,  H01J2237/28 ,  H01J2237/3175

Abstract: A particle-optical apparatus is proposed which comprises a particle-optical lens for deflecting a plurality of separate beam-charged particles which is provided by a plurality of finger electrodes provided along an opening of the lens.

Abstract translation: 提出了一种粒子光学装置，其包括用于偏转由沿着透镜的开口设置的多个指状电极提供的多个单独的束带电粒子的粒子光学透镜。

公开(公告)号：US20040065827A1

公开(公告)日：2004-04-08

申请号：US10614825

申请日：2003-07-09

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer ,  Ingo Muller

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J37/28 ,  H01J2237/2817

Abstract: A method for the electron-microscopic observation of a semiconductor arrangement is provided. It includes providing an electron microscopy optics for imaging secondary electrons emanating from the semiconductor arrangement within an extended object field on a position-sensitive detector, providing an illumination device for emitting a primary energy beam, directing the primary energy beam to at least the object field for extracting there secondary electrons from the semiconductor arrangement. The semiconductor arrangement comprises a region with an upper surface provided by a first material and a recess with a high aspect ratio which is surrounded by the upper surface and has a bottom provided by a second material.

Abstract translation: 提供了一种用于电子显微镜观察半导体装置的方法。 它包括提供电子显微镜光学器件，用于对在位置敏感检测器上的扩展物体场内的半导体布置发射的二次电子进行成像，提供用于发射一次能量束的照明装置，将一次能量束引导至少一个物场 用于从半导体装置中提取二次电子。 半导体装置包括具有由第一材料提供的上表面的区域和具有高纵横比的凹槽，其被上表面包围并具有由第二材料提供的底部。

公开(公告)号：US20040113092A1

公开(公告)日：2004-06-17

申请号：US10639741

申请日：2003-08-13

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Rainer Knippelmeyer

IPC: H01J037/147

CPC classification number: H01J37/141 ,  G21K1/08 ,  H01J37/12 ,  H01J37/14 ,  H01J37/1475 ,  H01J37/1477 ,  H01J2237/121 ,  H01J2237/1504

Abstract: An apparatus and a method to manipulate at least one beam of charged particles are provided. The apparatus comprises two rows of field source members 13 which are disposed periodically at a distance from each other such that there exist planes of symmetry S, Snull with respect to which the field source members 13 are symmetrically disposed. The field has a component which is displaceable in the x-direction. To provide such field, a pattern of source strengths according to the formula F1(x)nullFm(x)nullFc(x) is applied to the field source members, wherein Fm is a component which is substantially independent of the displacement x0 and Fc is a correction component which is dependent on x0.

Abstract translation: 提供了一种操纵至少一个带电粒子束的装置和方法。 该装置包括两排场源元件13，它们周期性地彼此间隔设置，使得存在对称S，S'的平面，场源元件13对称地设置对准面。 该场具有可在x方向上移位的分量。 为了提供这种场，根据公式F1（x）= Fm（x）+ Fc（x）的源强度的图案被施加到场源成分，其中Fm是基本上与位移x0无关的分量， Fc是依赖于x0的校正分量。

公开(公告)号：US20040105160A1

公开(公告)日：2004-06-03

申请号：US10639592

申请日：2003-08-13

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer

IPC: G02B027/10

CPC classification number: H01J37/10 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/147 ,  H01J37/28 ,  H01J37/3175 ,  H01J2237/03 ,  H01J2237/1202 ,  H01J2237/121 ,  H01J2237/1215 ,  H01J2237/1504 ,  H01J2237/1516 ,  H01J2237/244 ,  H01J2237/303 ,  H01J2237/31774

Abstract: A particle-optical apparatus is provided for directing a beam of charged particles on an object plane or to image the object plane with the beam onto an image plane or intermediate image plane. The apparatus comprises a stack of lens assemblies which are disposed in beam direction at a fixed distances spaced apart from which other and are controllable for providing successively adjustable deflection fields for a beam traversing the stack. Each lens assembly provides at least one field source member for a magnetic or electric field. In particular, two rows of a plurality of field source members per lens assembly can be provided.

Abstract translation: 提供了一种粒子光学装置，用于将带电粒子束引导到物体平面上，或者将物体平面与光束成像到图像平面或中间像平面上。 该装置包括一组透镜组件，它们以光束方向设置成一定距离，间隔开并且可控制，以便为穿过堆叠的光束提供连续可调的偏转场。 每个透镜组件为磁场或电场提供至少一个场源元件。 特别地，可以提供每个透镜组件的两排多个场源元件。

公开(公告)号：US20040084621A1

公开(公告)日：2004-05-06

申请号：US10638328

申请日：2003-08-12

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer ,  Stephan Uhlemann ,  Max Haider ,  Heiko Muller

IPC: H01J037/147 ,  H01J037/28

CPC classification number: H01J37/153 ,  H01J37/1472 ,  H01J37/28

Abstract: An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.

Abstract translation: 电子显微镜系统包括物镜（19），该物镜成像在固定光束轴线（17）上在x方向上可移位的场。 物镜具有散光效果，其通过固定轴上的光束整形器（63）补偿。 此外，透镜配置可以选择性地作用于一次电子束或二次电子束。