Abstract:
Ion implantation systems and beamline assemblies therefor are provided, in which multi-cusped magnetic fields are provided in a beamguide and the beamguide is energized to provide microwave electric fields in a traveling wave along the beamguide passageway. The magnetic and electric fields interact to provide an electron-cyclotron resonance condition for beam containment in the beamguide passageway.
Abstract:
An electron beam apparatus for irradiating a target with an electron beam includes a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface of the reference sample; and an adjustment section for adjusting the electron beam by irradiating the evaluation surface with the electron beam on the basis of electrons generated from the reference sample.
Abstract:
There are disclosed particle-optical beam splitters providing at least three beam-manipulating regions having magnetic fields of different field strengths provided therein for at least one particle beam passing the beam splitter. The beam splitter is, in first order, free of dispersion, astigmatism and distortion.
Abstract:
A Wien filter is provided in which a less amount of secondary aberration is produced than conventional. This filter has 12 poles. These poles have front ends facing the optical axis. These front ends have a 12-fold rotational symmetry about the optical axis within the XY-plane perpendicular to the optical axis.
Abstract:
A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.
Abstract:
An ion focussing and conveying device 10 comprises a plurality of electrodes 12 in series. Means is provided to apply a first alternating voltage waveform to each electrode 12, the phase of the alternating voltage in the first waveform is applied to each electrode 12 in the series being ahead of the phase of the first alternating voltage waveform applied to the preceding electrode 12 in the series by less than 180null, preferably by 90null or less, such that ions are focussed onto an axis of travel and impelled along the series of electrodes 12.
Abstract:
A septum electromagnet deflects and splits a particle beam. A preferred embodiment of the septum electromagnet comprises a septum conductor that divides the septum electromagnet to define first and second beam deflecting magnetic pole spaces. First and second magnetic fields are generated in, respectively, the first and second beam deflecting magnetic pole spaces by electric currents flowing through the coils associated with the septum conductor. The direction of the first magnetic field is opposite to the direction of the second magnetic field, such that a particle beam passing through the first beam deflecting magnetic pole space is angularly deflected by an amount and a particle beam passing through the second beam deflecting magnetic pole space is angularly deflected by an opposite amount.
Abstract:
An apparatus and a method are disclosed for producing a magnetic deflection field in an ion implanter that drives a secondary solenoid field 90 degrees out of phase with the magnetic deflection field. The apparatus has a magnetic structure including two cores and a yoke, the two cores defining a gap therebetween. The magnetic structure being constructed of a ferrimagnetic material to reduce eddy currents. A deflection coil is positioned inside the gap for producing a time-varying magnetic field in the gap and a secondary helical coil is also positioned inside the gap and extends longitudinally for a portion of the gap. The secondary helical coil produces a solenoid magnetic field that is coupled to the magnetic field associated with the deflection coil. A capacitor is associated with the secondary helical coil and tunes the solenoid magnetic field to the fundamental frequency of the magnetic field associated with the deflection coil.
Abstract:
An apparatus and a method to manipulate at least one beam of charged particles are provided. The apparatus comprises two rows of field source members 13 which are disposed periodically at a distance from each other such that there exist planes of symmetry S, Snull with respect to which the field source members 13 are symmetrically disposed. The field has a component which is displaceable in the x-direction. To provide such field, a pattern of source strengths according to the formula F1(x)nullFm(x)nullFc(x) is applied to the field source members, wherein Fm is a component which is substantially independent of the displacement x0 and Fc is a correction component which is dependent on x0.
Abstract:
An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.