公开(公告)号：US09966219B2

公开(公告)日：2018-05-08

申请号：US15321533

申请日：2015-06-25

Applicant: Gatan, Inc.

Inventor： Alexander Jozef Gubbens ,  Colin Trevor ,  Ray Dudley Twesten ,  Melanie Barfels

IPC: G21K1/08 ,  H01J37/05 ,  H01J37/12 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/053 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/24485 ,  H01J2237/2802

Abstract: An electron energy loss spectrometer for electron microscopy is disclosed having an electrically isolated drift tube extending through the bending magnet and through subsequent optics that focus and magnify the spectrum. An electrostatic or magnetic lens is located either before or after or both before and after the drift tube and the lens or lenses are adjusted as a function of the bending magnet drift tube voltage to maintain a constant net focal length and to avoid defocusing. An energy selecting slit is included in certain embodiments to cleanly cut off electrons dispersed outside the energy range incident on the detector, thereby eliminating artifacts caused by unwanted electrons scattering back into the spectrum.

公开(公告)号：US09870893B2

公开(公告)日：2018-01-16

申请号：US15410707

申请日：2017-01-19

Applicant: Axcelis Technologies, Inc.

Inventor： Neil K Colvin ,  Tseh-Jen Hsieh ,  Paul B. Silverstein

IPC: H01J37/04 ,  H01J37/05 ,  H01J37/317 ,  H01J37/08 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147

CPC classification number: H01J37/045 ,  H01J37/04 ,  H01J37/05 ,  H01J37/08 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/3171 ,  H01J2237/083

Abstract: An optics plate for an ion implantation system, the optics plate comprising a pair of aperture assemblies. Each pair of aperture assemblies respectively comprises a first aperture member, a second aperture member; and an aperture fastener, wherein the aperture fastener fastens the first aperture member to the second aperture member. An aperture tip may be also fastened to the second aperture member. One or more of the first aperture member, second aperture member, aperture tip, and aperture fastener is made of one or more of a refractory metal, tungsten, lanthanated tungsten alloy, yttrium tungsten alloy, and/or graphite and silicon carbide. The aperture assemblies may define an extraction electrode assembly, a ground electrode assembly, or other electrode assembly in the ion implantation system. The aperture fastener may be a screw and a bevel washer. The first aperture member may be operably coupled to a base plate via an aperture assembly fastener.

公开(公告)号：US09824850B2

公开(公告)日：2017-11-21

申请号：US14605985

申请日：2015-01-26

Applicant: Advanced Ion Beam Technology, Inc.

Inventor： Nicholas White ,  Zhimin Wan ,  Erik Collart

IPC: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/317 ,  H01J37/147 ,  H01J37/30

CPC classification number: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

公开(公告)号：US09728390B2

公开(公告)日：2017-08-08

申请号：US14876263

申请日：2015-10-06

Applicant: NISSIN ION EQUIPMENT CO., LTD.

Inventor： Junichi Tatemichi ,  Shojiro Dohi ,  Ippei Nishimura

IPC: H01J49/00 ,  H01J49/30 ,  H01J49/20 ,  H01J37/317 ,  H01J37/147 ,  H01J37/05

CPC classification number: H01J49/30 ,  H01J37/05 ,  H01J37/1472 ,  H01J37/3171 ,  H01J49/20 ,  H01J2237/055 ,  H01J2237/31701

Abstract: A mass analyzing electromagnet is provided. The mass analyzing electromagnet includes an analysis tube having an internal zone formed as a passage for the ion beam; and a shield member mounted to an inner wall surface of the analyzing tube, a portion of the shield member intersecting with a direction perpendicular to a traveling direction of an ion beam and a mass-based separation direction of the ion beam so as to block a portion of the ion beam.

公开(公告)号：US09721750B2

公开(公告)日：2017-08-01

申请号：US14811097

申请日：2015-07-28

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： William Davis Lee ,  Alexandre Likhanskii

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/028

Abstract: Provided herein are approaches for controlling particle trajectory from a beam-line electrostatic element. In an exemplary approach, a beam-line electrostatic element is disposed along a beam-line of an electrostatic filter (EF), and a voltage is supplied to the beam-line electrostatic element to generate an electrostatic field surrounding the beam-line electrostatic element, agitating a layer of contamination particles formed on the beam-line electrostatic element. A trajectory of a set of particles from the layer of contamination particles is then modified to direct the set of particles to a desired location within the EF. In one approach, the trajectory is controlled by providing an additional electrode adjacent the beam-line electrostatic element, and supplying a voltage to the additional electrode to control a local electrostatic field in proximity to the beam-line electrostatic element. In another approach, the trajectory is influenced by one or more geometric features of the beam-line electrostatic element.

公开(公告)号：US20170207058A1

公开(公告)日：2017-07-20

申请号：US15321533

申请日：2015-06-25

Applicant: Gatan, Inc.

Inventor： Alexander Jozef Gubbens ,  Colin Trevor ,  Ray Dudley Twesten ,  Melanie Barfels

IPC: H01J37/05 ,  H01J37/28 ,  H01J37/244 ,  H01J37/12 ,  H01J37/147

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/053 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/24485 ,  H01J2237/2802

Abstract: An electron energy loss spectrometer for electron microscopy is disclosed having an electrically isolated drift tube extending through the bending magnet and through subsequent optics that focus and magnify the spectrum. An electrostatic or magnetic lens is located either before or after or both before and after the drift tube and the lens or lenses are adjusted as a function of the bending magnet drift tube voltage to maintain a constant net focal length and to avoid defocusing. An energy selecting slit is included in certain embodiments to cleanly cut off electrons dispersed outside the energy range incident on the detector, thereby eliminating artifacts caused by unwanted electrons scattering back into the spectrum.

公开(公告)号：US09589761B2

公开(公告)日：2017-03-07

申请号：US14823222

申请日：2015-08-11

Applicant: JEOL Ltd.

Inventor： Masaki Mukai

IPC: H01J37/26 ,  H01J37/05

CPC classification number: H01J37/05 ,  H01J37/265 ,  H01J2237/057

Abstract: An electron microscope is offered which can adjust an energy-selecting slit in a short time by smoothly moving the slit. The electron microscope (100) includes an electron beam source (10) emitting an electron beam (EB), an energy filter (22) producing a deflecting field in the path of the electron beam (EB) to disperse the beam (EB) according to energy, a slit plate (24) disposed on an energy dispersive plane and provided with at least one energy-selecting slit (25), a current measuring section (50) for measuring the electrical current of the beam (EB) absorbed into the slit plate (24), and an energy filter controller (60) for controlling the intensity of the deflecting field of the energy filter (22) on the basis of results of measurements made by the current measuring section (50).

Abstract translation: 提供一种电子显微镜，其可以通过平滑地移动狭缝来在短时间内调节能量选择缝。 电子显微镜（100）包括发射电子束（EB）的电子束源（10），在电子束（EB）的路径中产生偏转场的能量过滤器（22），以使光束（EB）分散 设置在能量分散平面上并且设置有至少一个能量选择狭缝（25）的狭缝板（24），用于测量吸收到所述光束中的所述光束（EB）的电流的电流测量部分（50） 狭缝板（24）和能量过滤器控制器（60），用于根据由电流测量部件（50）进行的测量结果控制能量过滤器（22）的偏转场强度。

公开(公告)号：US20170018394A1

公开(公告)日：2017-01-19

申请号：US15123828

申请日：2015-02-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasunari SOHDA ,  Takeyoshi OHASHI ,  Takafumi MIWA ,  Noritsugu TAKAHASHI ,  Hajime KAWANO

IPC: H01J37/05 ,  H01J37/29 ,  H01J37/145 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/145 ,  H01J37/21 ,  H01J37/263 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/24514

Abstract: A scanning electron microscope according to the present invention includes: an electron source that produces an electron beam; a trajectory dispersion unit that disperses the trajectory of an electron beam of electrons with a different energy value; a selection slit plate having a selection slit that selects the energy range of the dispersed electron beam; and a transmittance monitoring unit that monitors the transmittance of an electron beam, which is being transmitted through the selection slit. Accordingly, there can be provided a scanning electron microscope equipped with an energy filter that implements a stable reduction in energy distribution.

Abstract translation: 根据本发明的扫描电子显微镜包括：产生电子束的电子源; 轨迹分散单元，其分散具有不同能量值的电子束的轨迹; 选择狭缝板，其具有选择所述分散电子束的能量范围的选择狭缝; 以及透射率监视单元，其监视通过选择狭缝传输的电子束的透射率。 因此，可以提供一种装有能量过滤器的扫描电子显微镜，能够实现能量分布的稳定降低。

公开(公告)号：US09466464B1

公开(公告)日：2016-10-11

申请号：US14694710

申请日：2015-04-23

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Michael C. Smayling ,  Theodore A. Prescop

IPC: H01J37/30 ,  H01J37/305 ,  H01J37/22 ,  H01J37/05 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods, devices and systems for patterning of substrates using charged particle beams without photomasks and without a resist layer. Material can be removed from a substrate, as directed by a design layout database, localized to positions targeted by multiple, matched charged particle beams. Reducing the number of process steps, and eliminating lithography steps, in localized material removal has the dual benefit of reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Furthermore, highly localized, precision material removal allows for controlled variation of removal rate and enables creation of 3D structures or profiles. Local gas injectors and detectors, and local photon injectors and detectors, are local to corresponding ones of the columns, and can be used to facilitate rapid, accurate, targeted substrate processing.

Abstract translation: 用于使用没有光掩模并且没有抗蚀剂层的带电粒子束来图案化衬底的方法，装置和系统。 材料可以从设计布局数据库指导的基板上移除，该设计布局数据库被定位到由多个匹配的带电粒子束瞄准的位置。 在局部材料去除中减少工艺步骤的数量和消除光刻步骤具有减少制造周期时间并通过降低缺陷引入概率来提高产量的双重优点。 此外，高度局部化的精密材料去除允许控制的去除速率的变化，并且能够创建3D结构或轮廓。 本地气体注入器和检测器以及本地光子注入器和检测器对应于相应的列是局部的，并且可以用于促进快速，准确的靶向基板处理。

公开(公告)号：US09443696B2

公开(公告)日：2016-09-13

申请号：US14711607

申请日：2015-05-13

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Liqun Han

IPC: H01J37/26 ,  H01J37/05 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/26 ,  H01J37/05 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/057

Abstract: One embodiment relates to a dual Wien-filter monochromator. A first Wien filter focuses an electron beam in a first plane while leaving the electron beam to be parallel in a second plane. A slit opening allows electrons of the electron beam having an energy within an energy range to pass through while blocking electrons of the electron beam having an energy outside the energy range. A second Wien filter focuses the electron beam to become parallel in the first plane while leaving the electron beam to be parallel in the second plane. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及双维尼滤波器单色仪。 第一维恩滤波器将电子束聚焦在第一平面中，同时使电子束在第二平面中平行。 狭缝开口允许具有能量范围内的能量的电子束的电子通过，同时阻挡具有能量范围外的能量的电子束的电子。 第二维恩滤波器将电子束聚焦成在第一平面中平行，同时使电子束在第二平面中平行。 还公开了其它实施例，方面和特征。