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    Hydrogen bleed gas for an ion source housing
    1.
    发明授权
    Hydrogen bleed gas for an ion source housing 有权

    公开(公告)号：US11062873B2

    公开(公告)日：2021-07-13

    申请号：US16409423

    申请日：2019-05-10

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil K Colvin ,  Tseh-Jen Hsieh

    IPC: H01J37/08 ,  H01J37/317

    Abstract: A terminal system for an ion implantation system has an ion source with a housing and extraction electrode assembly having one or more aperture plates. A gas box is electrically coupled to the ion source. A gas source is within the gas box to provide a gas at substantially the same electrical potential as the ion source assembly. A bleed gas conduit introduces the gas to a region internal to the housing of the ion source and upstream of at least one of the aperture plates. The bleed gas conduit has one or more feed-throughs extending through a body of the ion source assembly, such as a hole in a mounting flange of the ion source. The mounting flange may be a tubular portion having a channel. The bleed gas conduit can further have a gas distribution apparatus defined as a gas distribution ring. The gas distribution ring can generally encircle the tubular portion of the mounting flange.

    HYDROGEN GENERATOR FOR AN ION IMPLANTER
    2.
    发明申请
    HYDROGEN GENERATOR FOR AN ION IMPLANTER 有权

    公开(公告)号：US20210090841A1

    公开(公告)日：2021-03-25

    申请号：US16953509

    申请日：2020-11-20

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil K. Colvin ,  Tseh-Jen Hsieh ,  Richard Rzeszut ,  Wendy Colby

    IPC: H01J37/08 ,  H01J37/317

    Abstract: A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing for supporting an ion source configured to form an ion beam. A gas box within the terminal housing has a hydrogen generator configured to produce hydrogen gas for the ion source. The gas box is electrically insulated from the terminal housing, and is further electrically coupled to the ion source. The ion source and gas box are electrically isolated from the terminal housing by a plurality of electrical insulators. A plurality of insulating standoffs electrically isolate the terminal housing from an earth ground. A terminal power supply electrically biases the terminal housing to a terminal potential with respect to the earth ground. An ion source power supply electrically biases the ion source to an ion source potential with respect to the terminal potential. Electrically conductive tubing electrically couples the gas box and ion source.

    REDUCED TRACE METALS CONTAMINATION ION SOURCE FOR AN ION IMPLANTATION SYSTEM
    4.
    发明申请
    REDUCED TRACE METALS CONTAMINATION ION SOURCE FOR AN ION IMPLANTATION SYSTEM 有权
    减少跟踪金属污染离子源离子植入系统

    公开(公告)号：US20150179393A1

    公开(公告)日：2015-06-25

    申请号：US14135754

    申请日：2013-12-20

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil Colvin ,  Tseh-Jen Hsieh

    IPC: H01J37/08

    CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/0268 ,  H01J2237/082 ,  H01J2237/31705

    Abstract: An ion source chamber for ion implantation system includes a housing that at least partially bounds an ionization region through which high energy electrons move from a cathode to ionize gas molecules injected into an interior of the housing; a liner section defining one or more interior walls of the housing interior, wherein each liner section includes a interiorly facing surface exposed to the ionization region during operation the ion implantation system; a cathode shield disposed about the cathode; a repeller spaced apart from the cathode; a plate including a source aperture for discharging ions from the ion source chamber; wherein at least one of the repeller, the liner section, the cathode shield; the plate, or an insert in the plate defining the source aperture comprise silicon carbide, wherein the silicon carbide is a non-stoichiometric sintered material having excess carbon.

    Abstract translation: 用于离子注入系统的离子源室包括壳体，该壳体至少部分地界定电离区域，高能电子通过该电离区域从阴极移动到电离注入壳体内部的气体分子; 限定所述壳体内部的一个或多个内壁的衬里部分，其中每个衬里部分包括在所述离子注入系统的操作期间暴露于所述电离区域的面向内的表面; 围绕阴极设置的阴极屏蔽; 与阴极间隔开的推斥器; 包括用于从离子源室排出离子的源孔的板; 其中所述推斥板，所述衬套部分，所述阴极罩中的至少一个; 该板或限定源孔的板中的插入物包括碳化硅，其中碳化硅是具有过量碳的非化学计量烧结材料。

    Ion source liner having a lip for ion implantation systems
    6.
    发明授权
    Ion source liner having a lip for ion implantation systems 有权

    公开(公告)号：US09978555B2

    公开(公告)日：2018-05-22

    申请号：US15344502

    申请日：2016-11-04

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil K. Colvin ,  Tseh-Jen Hsieh

    IPC: H01J37/08 ,  H01J37/317 ,  H01J27/02

    CPC classification number: H01J37/08 ,  H01J27/022 ,  H01J37/3171 ,  H01J2237/31705

    Abstract: An ion source has an arc chamber having a body defining and interior region. A liner defined an exposure surface of the interior region that is exposed to a plasma generated within the arc chamber. An electrode has a shaft with a first diameter that passes through the body and the liner. The electrode is electrically isolated from the body where the liner is a plate having a first surface with an optional recess having a second surface. A hole is defined through the recess for the shaft to pass through. The hole has a second diameter that is larger than the first diameter, and an annular gap exists between the plate and the shaft. The plate has a lip extending from the second surface toward the first surface that surrounds the hole within the recess and generally prevents particulate contaminants from entering the annular gap.

    IN-SITU CLEANING USING HYDROGEN PEROXIDE AS CO-GAS TO PRIMARY DOPANT OR PURGE GAS FOR MINIMIZING CARBON DEPOSITS IN AN ION SOURCE
    7.
    发明申请
    IN-SITU CLEANING USING HYDROGEN PEROXIDE AS CO-GAS TO PRIMARY DOPANT OR PURGE GAS FOR MINIMIZING CARBON DEPOSITS IN AN ION SOURCE 审中-公开

    公开(公告)号：US20180096828A1

    公开(公告)日：2018-04-05

    申请号：US15281844

    申请日：2016-09-30

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil K. Colvin ,  Tseh-Jen Hsieh

    IPC: H01J37/32 ,  H01J37/317 ,  C23C14/48

    CPC classification number: H01J37/32862 ,  C23C14/48 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/08 ,  H01J2237/18 ,  H01J2237/31705

    Abstract: An ion source assembly and method is provided for improving ion implantation performance. The ion source assembly has an ion source chamber and a source gas supply provides a molecular carbon source gas such as toluene to the ion source chamber. A source gas flow controller controls a flow of the molecular carbon source gas to the ion source chamber. An excitation source excites the molecular carbon source gas, forming carbon ions and atomic carbon. An extraction electrode extracts the carbon ions from the ion source chamber, forming an ion beam. A hydrogen peroxide co-gas supply provides a predetermined concentration of hydrogen peroxide co-gas to the ion source chamber, and a hydrogen peroxide co-gas flow controller controls a flow of the hydrogen peroxide gas to the ion source chamber. The hydrogen peroxide co-gas decomposes within the ion source chamber and reacts with the atomic carbon from the molecular carbon source gas in the ion source chamber, forming hydrocarbons within the ion source chamber. An inert gas is further introduced and ionized to counteract oxidation of a cathode due to the decomposition of the hydrogen peroxide. A vacuum pump system removes the hydrocarbons from the ion source chamber, wherein deposition of atomic carbon within the ion source chamber is reduced and a lifetime of the ion source chamber is increased.

    ION SOURCE LINER HAVING A LIP FOR ION IMPLANTATION SYSTEMS
    8.
    发明申请
    ION SOURCE LINER HAVING A LIP FOR ION IMPLANTATION SYSTEMS 有权

    公开(公告)号：US20170133193A1

    公开(公告)日：2017-05-11

    申请号：US15344502

    申请日：2016-11-04

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil K. Colvin ,  Tseh-Jen Hsieh

    IPC: H01J37/08 ,  H01J37/317

    CPC classification number: H01J37/08 ,  H01J27/022 ,  H01J37/3171 ,  H01J2237/31705

    Abstract: An ion source has an arc chamber having a body defining and interior region. A liner defined an exposure surface of the interior region that is exposed to a plasma generated within the arc chamber. An electrode has a shaft with a first diameter that passes through the body and the liner. The electrode is electrically isolated from the body where the liner is a plate having a first surface with an optional recess having a second surface. A hole is defined through the recess for the shaft to pass through. The hole has a second diameter that is larger than the first diameter, and an annular gap exists between the plate and the shaft. The plate has a lip extending from the second surface toward the first surface that surrounds the hole within the recess and generally prevents particulate contaminants from entering the annular gap.

    Hydrogen generator for an ion implanter
    9.
    发明授权
    Hydrogen generator for an ion implanter 有权

    公开(公告)号：US11276543B2

    公开(公告)日：2022-03-15

    申请号：US16953509

    申请日：2020-11-20

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil K Colvin ,  Tseh-Jen Hsieh ,  Richard Rzeszut ,  Wendy Colby

    IPC: H01J37/08 ,  H01J37/317 ,  H01L21/265

    Abstract: A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing for supporting an ion source configured to form an ion beam. A gas box within the terminal housing has a hydrogen generator configured to produce hydrogen gas for the ion source. The gas box is electrically insulated from the terminal housing, and is further electrically coupled to the ion source. The ion source and gas box are electrically isolated from the terminal housing by a plurality of electrical insulators. A plurality of insulating standoffs electrically isolate the terminal housing from an earth ground. A terminal power supply electrically biases the terminal housing to a terminal potential with respect to the earth ground. An ion source power supply electrically biases the ion source to an ion source potential with respect to the terminal potential. Electrically conductive tubing electrically couples the gas box and ion source.

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