公开(公告)号：US20240242921A1

公开(公告)日：2024-07-18

申请号：US18618957

申请日：2024-03-27

申请人： ASML Netherlands B.V.

发明人： Mans Johan Bertil OSTERBERG ,  Koen SCHUURBIERS

IPC分类号： H01J37/147

CPC分类号： H01J37/1474 ,  H01J2237/0268 ,  H01J2237/0453 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/04926 ,  H01J2237/1534 ,  H01J2237/2801

摘要： A charged particle apparatus configured to project a multi-beam of charged particles along a multi-beam path toward a sample, the charged particle apparatus comprising: a charged particle source configured to emit a charged particle beam toward a sample; a charged particle-optical device configured to project sub-beams of a multi-beam of charged particles along the multi-beam path toward the sample, the sub-beams of the multi-beam of charged particles derived from the charged particle beam; a tube surrounding the multi-beam path configured to operate at a first potential difference from a ground potential; and a support configured to support the sample at a second potential difference from the ground potential, the first potential difference and the second potential difference having a difference so as to accelerate the multi-beam of charged particles towards the sample; wherein the first potential difference is greater than the second potential difference.

公开(公告)号：US09194038B2

公开(公告)日：2015-11-24

申请号：US12974245

申请日：2010-12-21

申请人： Akihiro Egami ,  Toshikazu Nakazawa ,  Katsuhiro Suzuki ,  Shinya Hasegawa

发明人： Akihiro Egami ,  Toshikazu Nakazawa ,  Katsuhiro Suzuki ,  Shinya Hasegawa

IPC分类号： C23C14/00 ,  C23C14/34 ,  C23C14/56 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  H01J37/32 ,  H01J37/34

CPC分类号： C23C14/564 ,  C23C14/0036 ,  C23C14/34 ,  C23C16/4401 ,  C23C16/45591 ,  C23C16/4585 ,  H01J37/32477 ,  H01J37/32651 ,  H01J37/3405 ,  H01J37/3411 ,  H01J37/3441 ,  H01J2237/026 ,  H01J2237/0268

摘要： The inventors of this invention conducted a test and found out that to prevent peel-off of an adherent film, it is not of essential importance to set the radius of curvature equal to or larger than a predetermined threshold. The inventors of the present invention also found out that peel-off of an adherent film occurs in the region in which the curvature of a shield changes and is less likely to occur when the change in curvature of the shield is small. Accordingly, the key to the problem is the magnitude of a change in curvature of the shield, so changing the curvature stepwise makes it possible to suppress a large change in curvature, and thus to prevent peel-off of an adherent film free from any disadvantages such as deterioration in film thickness distribution, which may occur due to an increase in size of the shield.

摘要翻译： 本发明人进行了测试，发现为了防止粘附膜的剥离，将曲率半径设定为等于或大于预定阈值不是重要的。 本发明的发明人还发现，粘合膜的剥离发生在屏蔽的曲率变化的区域中，并且当屏蔽的曲率变化小时不太可能发生。 因此，问题的关键在于屏蔽体的曲率变化的大小，因此逐渐改变曲率使得可以抑制曲率的大的变化，从而防止粘附膜的剥离没有任何缺点 例如由于屏蔽件的尺寸增加而可能发生的膜厚分布的劣化。

公开(公告)号：US07807984B2

公开(公告)日：2010-10-05

申请号：US12003852

申请日：2008-01-02

申请人： Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

发明人： Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

IPC分类号： H01J37/304

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/028 ,  H01J2237/24405 ,  H01J2237/31701 ,  H01J2237/31705

摘要： Components in an ion implanter that may see incidence of the ion beam include a chamber having an elongate slot opening defined by edges so that a central portion of the ion beam enters the component through the opening with the edges clipping at least a peripheral portion of the ion beam. The arrangement mitigates the problem of sputtered material escaping back out from the component and becoming entrained in the ion beam.

摘要翻译： 可以看到离子束的入射的离子注入机中的部件包括具有由边缘限定的细长狭缝开口的室，使得离子束的中心部分通过开口进入部件，边缘至少限定 离子束。 该装置减轻了溅射材料从组件中退出并被夹带在离子束中的问题。

公开(公告)号：US20090179158A1

公开(公告)日：2009-07-16

申请号：US12353642

申请日：2009-01-14

申请人： Lyudmila Stone ,  Julian G. Blake ,  Dale K. Stone ,  Ron S. Serisky

发明人： Lyudmila Stone ,  Julian G. Blake ,  Dale K. Stone ,  Ron S. Serisky

IPC分类号： H01J27/00 ,  G21K1/00 ,  H01J49/00

CPC分类号： H01J37/3171 ,  H01J37/16 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/31705

摘要： This device has a liner disposed on a face in a vacuum chamber. A component in the vacuum chamber defines the face. The liner is configured to protect the workpiece from contamination or to prevent blistering of the face caused by implantation of atoms or ions into the face. The liner may be disposable and removed from the face in the vacuum chamber and replaced with a new liner in some embodiments. This liner may be a polymer with a roughened surface, be carbon-based, or be composed of carbon nanotubes in some embodiments.

摘要翻译： 该装置具有设置在真空室中的表面上的衬垫。 真空室中的部件限定了面。 衬套被配置为保护工件免受污染或防止由于将原子或离子注入到面中引起的起泡。 在一些实施例中，衬垫可以是一次性的并且从真空室中的表面移除并替换为新衬里。 在一些实施方案中，该衬垫可以是具有粗糙表面的聚合物，为碳基，或由碳纳米管组成。

公开(公告)号：US07462845B2

公开(公告)日：2008-12-09

申请号：US11422092

申请日：2006-06-05

申请人： Alan Michael Chandler ,  Tushar Desai ,  Ellis Craig Hayford ,  Nicholas Mone, Jr. ,  James Spiros Nakos

发明人： Alan Michael Chandler ,  Tushar Desai ,  Ellis Craig Hayford ,  Nicholas Mone, Jr. ,  James Spiros Nakos

IPC分类号： H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/16 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268

摘要： A method of improving the performance of a charged beam apparatus. The method including: providing a chamber having an interior surface; providing a pump port for evacuating the chamber; providing a substrate holder within the chamber; forming a charged particle beam within the chamber, the charged beam generated by a source and the charged particle beam striking the substrate; and placing one or more liners in contact with one or more different regions of the interior surface of the chamber, the liners preventing material generated by interaction of the charged beam and the substrate from coating the one or more different regions of the interior surface of the chamber.

摘要翻译： 一种提高带电束装置性能的方法。 该方法包括：提供具有内表面的室; 提供用于抽空腔室的泵口; 在所述室内提供衬底保持器; 在室内形成带电粒子束，由源产生的带电束和带电粒子束撞击衬底; 并且将一个或多个衬垫放置成与腔室的内表面的一个或多个不同区域接触，衬垫防止由带电束和衬底的相互作用产生的材料涂覆在腔室内表面的一个或多个不同区域 房间。

公开(公告)号：US20080258081A1

公开(公告)日：2008-10-23

申请号：US12167271

申请日：2008-07-03

申请人： Alan Michael Chandler ,  Tushar Desai ,  Ellis Craig Hayford ,  Nicholas Mone ,  James Spiros Nakos

发明人： Alan Michael Chandler ,  Tushar Desai ,  Ellis Craig Hayford ,  Nicholas Mone ,  James Spiros Nakos

IPC分类号： H01J37/30 ,  H05H1/00

CPC分类号： H01J37/3171 ,  H01J37/16 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268

摘要： A method of improving the performance of charged beam apparatus. The method including: providing the apparatus, the apparatus comprising: a chamber having an interior surface; a pump port for evacuating the chamber; a substrate holder within the chamber; and a charged particle beam within the chamber, the charged beam generated by a source and the charged particle beam striking the substrate; and positioning one or more liners in contact with one or more different regions of the interior surface of the chamber, the liners preventing material generated by interaction of the charged beam and the substrate from coating the one or more different regions of the interior surface of the chamber.

摘要翻译： 一种提高带电束装置性能的方法。 该方法包括：提供该装置，该装置包括：具有内表面的腔室; 用于抽空室的泵口; 腔室内的衬底保持器; 以及室内的带电粒子束，由源产生的带电束和带电粒子束撞击衬底; 并且将一个或多个衬垫定位成与腔室的内表面的一个或多个不同区域接触，衬垫防止由带电束和衬底的相互作用产生的材料涂覆在腔室的内表面的一个或多个不同区域 房间。

公开(公告)号：US20230420222A1

公开(公告)日：2023-12-28

申请号：US17851385

申请日：2022-06-28

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Po-Hsiang Wang ,  Min-Chang Ching ,  Kuo Liang Lu ,  Bo-Han Chu

IPC分类号： H01J37/32

CPC分类号： H01J37/3244 ,  H01J2237/0268 ,  H01J2237/0203

摘要： The present disclosure relates to an integrated chip processing tool. The integrated chip processing tool includes a gas distribution ring configured to extend along a perimeter of a process chamber. The gas distribution ring includes a lower ring extending around the process chamber. The lower ring has a plurality of gas inlets arranged along a bottom surface of the lower ring and a plurality of gas conveyance channels arranged along an upper surface of the lower ring directly over the plurality of gas inlets. The gas distribution ring further includes an upper ring disposed on the upper surface of the lower ring and covering the plurality of gas conveyance channels. A plurality of gas outlets are arranged along opposing ends of the plurality of gas conveyance channels. A plurality of gas conveyance paths extending between the plurality of gas inlets and the plurality of gas outlets have approximately equal lengths.

公开(公告)号：US20230317425A1

公开(公告)日：2023-10-05

申请号：US18130879

申请日：2023-04-04

申请人： Tokyo Electron Limited

发明人： Ryoya ABE ,  Tetsuji SATO ,  Shin MATSUURA

IPC分类号： H01J37/32

CPC分类号： H01J37/32633 ,  H01J2237/0268 ,  H01J2237/334

摘要： A plasma processing apparatus comprising: a plasma processing chamber; a substrate support; and a baffle structure to surround the substrate support. The baffle structure includes an upper baffle plate having a plurality of first openings, each of the plurality of first openings having a first width, and a lower baffle plate having a plurality of second openings, each of the plurality of second openings having an upper opening portion and a lower opening portion. A liner structure surrounds a plasma processing space disposed above the substrate support, and includes an inner cylindrical liner and an outer cylindrical liner. The inner cylindrical liner has a plurality of third openings, each of the plurality of third openings having a fourth width. The outer cylindrical liner has a plurality of fourth openings, each of the plurality of fourth openings having an inner opening portion and an outer opening portion.

公开(公告)号：US20150179393A1

公开(公告)日：2015-06-25

申请号：US14135754

申请日：2013-12-20

申请人： Axcelis Technologies, Inc.

发明人： Neil Colvin ,  Tseh-Jen Hsieh

IPC分类号： H01J37/08

CPC分类号： H01J37/08 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/0268 ,  H01J2237/082 ,  H01J2237/31705

摘要： An ion source chamber for ion implantation system includes a housing that at least partially bounds an ionization region through which high energy electrons move from a cathode to ionize gas molecules injected into an interior of the housing; a liner section defining one or more interior walls of the housing interior, wherein each liner section includes a interiorly facing surface exposed to the ionization region during operation the ion implantation system; a cathode shield disposed about the cathode; a repeller spaced apart from the cathode; a plate including a source aperture for discharging ions from the ion source chamber; wherein at least one of the repeller, the liner section, the cathode shield; the plate, or an insert in the plate defining the source aperture comprise silicon carbide, wherein the silicon carbide is a non-stoichiometric sintered material having excess carbon.

摘要翻译： 用于离子注入系统的离子源室包括壳体，该壳体至少部分地界定电离区域，高能电子通过该电离区域从阴极移动到电离注入壳体内部的气体分子; 限定所述壳体内部的一个或多个内壁的衬里部分，其中每个衬里部分包括在所述离子注入系统的操作期间暴露于所述电离区域的面向内的表面; 围绕阴极设置的阴极屏蔽; 与阴极间隔开的推斥器; 包括用于从离子源室排出离子的源孔的板; 其中所述推斥板，所述衬套部分，所述阴极罩中的至少一个; 该板或限定源孔的板中的插入物包括碳化硅，其中碳化硅是具有过量碳的非化学计量烧结材料。

公开(公告)号：US20130306863A1

公开(公告)日：2013-11-21

申请号：US13895576

申请日：2013-05-16

申请人： Pavel ADAMEC ,  Carlo SALVESEN

发明人： Pavel ADAMEC ,  Carlo SALVESEN

IPC分类号： H01J37/141

CPC分类号： H01J37/141 ,  H01J37/1475 ,  H01J37/16 ,  H01J2237/0268

摘要： A deflector system for fast magnetic deflection of a charged particle beam is described. The deflector system includes a tube for separating the beam from the magnetic deflector coil arrangement, the tube having a middle section, at least a first end section, and a second end section, wherein a wall thickness of the middle section is lower than a wall thickness of at least one of the first end section and the second end section.

摘要翻译： 描述了用于带电粒子束的快速磁偏转的偏转器系统。 偏转器系统包括用于将光束与磁偏转线圈装置分离的管，该管具有中间部分，至少第一端部部分和第二端部部分，其中中间部分的壁厚低于壁 第一端部和第二端部中的至少一个的厚度。