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    EMBOSSED ELECTROSTATIC CHUCK
    4.
    发明申请
    EMBOSSED ELECTROSTATIC CHUCK 审中-公开
    嵌入式静电切割机

    公开(公告)号：US20090122458A1

    公开(公告)日：2009-05-14

    申请号：US12269394

    申请日：2008-11-12

    Applicant: D. Jeffrey Lischer ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen ,  Julian G. Blake

    Inventor： D. Jeffrey Lischer ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen ,  Julian G. Blake

    IPC: H01L21/683

    CPC classification number: H01L21/6831

    Abstract: An electrostatic chuck includes a layer having a plurality of protrusions to support a workpiece, wherein at least a portion of the layer has a first plurality of the plurality of protrusions. The first plurality of protrusions is spaced to geometrically form a pattern of hexagons. The first plurality of protrusions may be spaced an equal distance from adjacent protrusions and the equal distance may be about 4.0 millimeters from a center of one protrusion to a center of another protrusion. The present disclosure reduces peak mechanical stress levels conventionally present along an edge of each protrusion. Reducing such mechanical stress levels helps reduce backside damage to a supported workpiece, which in turn can reduce the generation of unwanted particles caused by such damage.

    Abstract translation: 静电卡盘包括具有多个突起以支撑工件的层，其中该层的至少一部分具有第一多个多个突起。 第一多个突起间隔几何形成六边形图案。 第一多个突起可以与相邻的突起间隔开相等的距离，并且等距离可以是距离一个突起的中心到另一个突起的中心的约4.0毫米。 本公开减少了沿着每个突起的边缘常规存在的峰值机械应力水平。 降低这种机械应力水平有助于减少支撑的工件的背面损坏，这又可以减少由这种损坏引起的不想要的颗粒的产生。

    Bellows liner for an ion beam implanter
    5.
    发明授权
    Bellows liner for an ion beam implanter 失效
    用于离子束注入机的波纹管衬垫

    公开(公告)号：US07205556B2

    公开(公告)日：2007-04-17

    申请号：US10956817

    申请日：2004-10-01

    Applicant: Lyudmila Stone ,  Scott T. Barusso ,  Dale K. Stone ,  Alexander S. Perel

    Inventor： Lyudmila Stone ,  Scott T. Barusso ,  Dale K. Stone ,  Alexander S. Perel

    IPC: H01J37/317

    CPC classification number: H01J37/3171

    Abstract: An ion beam implanter includes ion beam forming and directing apparatus and an implantation station where workpieces are implanted with ions from an ion beam. The beam travels along an evacuated path from an ion source to the implantation station. A flexible bellows couples the implantation station to the beam forming and directing apparatus permitting the implantation station to be pivoted with respect to the beam forming and directing apparatus and thereby change an implantation orientation of the workpieces with respect to the ion beam. A replaceable, flexible bellows liner is disposed within an interior region of the bellows to reduce the volume of implantation byproducts deposited on an interior surface of the bellows.

    Abstract translation: 离子束注入机包括离子束形成和引导装置以及其中用离子束注入离子的工件的注入站。 光束沿着从离子源到注入站的抽真空路径行进。 柔性波纹管将植入站耦合到波束形成和引导装置，允许植入站相对于波束形成和引导装置枢转，从而改变相对于离子束的工件的注入取向。 可替换的柔性波纹管衬套设置在波纹管的内部区域内，以减小沉积在波纹管内表面上的植入副产物的体积。

    Method for capturing and removing contaminant particles from an interior region of an ion implanter
    6.
    发明授权
    Method for capturing and removing contaminant particles from an interior region of an ion implanter 失效
    从离子注入机的内部区域捕获和去除污染物颗粒的方法

    公开(公告)号：US5670217A

    公开(公告)日：1997-09-23

    申请号：US762320

    申请日：1996-12-09

    Applicant: Julian G. Blake ,  Robert Becker ,  David Chipman ,  Mary Jones ,  Lyudmila Menn ,  Frank Sinclair ,  Dale K. Stone

    Inventor： Julian G. Blake ,  Robert Becker ,  David Chipman ,  Mary Jones ,  Lyudmila Menn ,  Frank Sinclair ,  Dale K. Stone

    IPC: C23C14/48 ,  H01J37/16 ,  H01J37/18 ,  H01J37/30 ,  H01J37/317 ,  H01L21/265 ,  B05D5/12

    CPC classification number: H01J37/3002 ,  H01J37/3171 ,  H01J2237/022

    Abstract: A method of capturing and removing contaminant particles moving within an evacuated interior region of an ion beam implanter is disclosed. The steps of the method include: providing a particle collector having a surface to which contaminant particles readily adhere; securing the particle collector to the implanter such that particle adhering surface is in fluid communication to the contaminant particles moving within the interior region; and removing the particle collector from the implanter after a predetermined period of time. An ion implanter in combination with a particle collector for trapping and removing contaminant particles moving in an evacuated interior region of the implanter traversed by an ion beam is also disclosed, the particle collector including a surface to which the contaminant particles readily adhere and securement means for releasably securing the particle collector to the implanter such that the particle adhering surface is in fluid communication with the evacuated interior region of the implanter.

    Abstract translation: 公开了一种捕获和去除在离子束注入机的抽空的内部区域内移动的污染物颗粒的方法。 该方法的步骤包括：提供具有污染物颗粒容易粘附的表面的颗粒收集器; 将颗粒收集器固定到注入机，使得颗粒粘附表面与在内部区域内移动的污染物颗粒流体连通; 并且在预定时间段之后从所述注入机移除所述颗粒收集器。 还公开了一种与用于捕获和去除在离子束穿过的注入器的抽空的内部区域中移动的污染物颗粒的离子注入机，该颗粒收集器包括污染物颗粒易于粘附的表面和用于 将颗粒收集器可释放地固定到注入机，使得颗粒粘附表面与注入机的抽空的内部区域流体连通。

    TRIBOELECTRIC CHARGE CONTROLLED ELECTROSTATIC CLAMP
    8.
    发明申请
    TRIBOELECTRIC CHARGE CONTROLLED ELECTROSTATIC CLAMP 有权
    TRIBOELECTRIC CHARGE控制静电夹

    公开(公告)号：US20120200980A1

    公开(公告)日：2012-08-09

    申请号：US13021838

    申请日：2011-02-07

    Applicant: Julian Blake ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen ,  Shigeo Oshiro

    Inventor： Julian Blake ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen ,  Shigeo Oshiro

    IPC: H05F3/02

    CPC classification number: H01L21/6831

    Abstract: An electrostatic clamp which more effectively removes built up charge from a substrate prior to removal is disclosed. Currently, the lift pins and the ground pins are the only mechanism used to remove charge from the substrate after implantation. The present discloses describes an electrostatic chuck in which the top dielectric surface has an embedded conductive region, such as a ring shaped conductive region in the sealing ring. Thus, regardless of the orientation of the substrate during release, at least a portion of the substrate will contain the conductive region on the dielectric layer of the workpiece support. This conductive region may be connected to ground through the use of conductive vias in the dielectric layer. In some embodiments, these conductive vias are the fluid conduits used to supply gas to the back side of the substrate.

    Abstract translation: 公开了一种在去除之前更有效地从衬底去除积聚电荷的静电夹。 目前，升降针和接地引脚是用于在植入后从衬底去除电荷的唯一机制。 本公开描述了一种静电卡盘，其中顶部电介质表面具有嵌入的导电区域，例如密封环中的环形导电区域。 因此，无论衬底在释放过程中的取向如何，衬底的至少一部分将包含工件支撑体的电介质层上的导电区域。 该导电区域可以通过使用电介质层中的导电通孔而连接到地。 在一些实施例中，这些导电通孔是用于向衬底的背侧供应气体的流体导管。

    PLATEN FOR REDUCING PARTICLE CONTAMINATION ON A SUBSTRATE AND A METHOD THEREOF
    9.
    发明申请
    PLATEN FOR REDUCING PARTICLE CONTAMINATION ON A SUBSTRATE AND A METHOD THEREOF 有权
    减少颗粒污染基板的方法及其方法

    公开(公告)号：US20090317964A1

    公开(公告)日：2009-12-24

    申请号：US12487444

    申请日：2009-06-18

    Applicant: David E. SUURONEN ,  Dale K. Stone ,  Shigeo Oshiro ,  Arthur P. Riaf ,  Edward D. MacIntosh

    Inventor： David E. SUURONEN ,  Dale K. Stone ,  Shigeo Oshiro ,  Arthur P. Riaf ,  Edward D. MacIntosh

    IPC: H01L21/265 ,  F28D15/00

    CPC classification number: H01L21/67109 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01L21/6875

    Abstract: Techniques for reducing particle contamination on a substrate are disclosed. In one particular exemplary embodiment, the technique may be realized with a platen having different regions, where the pressure levels in the regions may be substantially equal. For example, the platen may comprise a platen body comprising first and second recesses, the first recess defining a fluid region for holding fluid for maintaining a temperature of the substrate at a desired temperature, the second recess defining a first cavity for holding a ground circuit; a first via defined in the platen body, the first via having first and second openings, the first opening proximate to the fluid region and the second opening proximate to the first cavity, wherein pressure level of the fluid region may be maintained at a level that is substantially equal to pressure level of the first cavity.

    Abstract translation: 公开了用于减少衬底上的颗粒污染的技术。 在一个特定的示例性实施例中，该技术可以利用具有不同区域的压板来实现，其中区域中的压力水平可以基本相等。 例如，压盘可以包括压板本体，该压板本体包括第一和第二凹槽，第一凹槽限定用于保持流体的流体区域，以将衬底的温度保持在期望温度，第二凹槽限定用于保持接地电路的第一腔体 ; 第一通孔限定在压板本体中，第一通孔具有第一和第二开口，第一开口靠近流体区域，第二开口接近第一腔体，其中流体区域的压力水平可以保持在 基本上等于第一腔的压力水平。

    Wafer sensing and clamping monitor
    10.
    发明授权
    Wafer sensing and clamping monitor 失效
    晶圆感测和夹紧监视器

    公开(公告)号：US5436790A

    公开(公告)日：1995-07-25

    申请号：US005030

    申请日：1993-01-15

    Applicant: Julian G. Blake ,  Weilin Tu ,  Dale K. Stone ,  Scott C. Holden

    Inventor： Julian G. Blake ,  Weilin Tu ,  Dale K. Stone ,  Scott C. Holden

    IPC: B23Q3/15 ,  G01R27/26 ,  H01L21/265 ,  H01L21/683 ,  H02N13/00

    CPC classification number: H01L21/67259 ,  H01L21/6831

    Abstract: A wafer position and clamp sensor. A circuit monitors capacitance between two electrodes within a wafer support. With no wafer on the support, the capacitance falls in one range, with the wafer in place but not clamped, the capacitance falls in a second range and with the wafer held in place by an electrostatic attraction the capacitance falls in a third range. The sensed capacitance is converted to a frequency and then a DC voltage level that can easily be sensed and used to confirm wafer placement and then confirm wafer clamping.

    Abstract translation: 晶圆位置和钳位传感器。 电路监测晶片支架内的两个电极之间的电容。 在支撑体上没有晶片的情况下，电容落在一个范围内，晶片就位，但没有被夹紧，电容下降到第二范围，并且晶片通过静电吸引保持在适当的位置，电容落在第三范围内。 感测到的电容被转换成一个频率，然后转换成一个直流电压电平，可以很容易地被感测并用于确认晶片放置，然后确认晶片钳位。

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