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    HYDRAULIC FEED SYSTEM FOR AN ION SOURCE
    1.
    发明公开
    HYDRAULIC FEED SYSTEM FOR AN ION SOURCE 审中-公开

    公开(公告)号：US20230245859A1

    公开(公告)日：2023-08-03

    申请号：US17588999

    申请日：2022-01-31

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil J. Bassom ,  Joshua Abeshaus ,  David Sporleder ,  Neil Colvin ,  Joseph Valinski ,  Michael Cristoforo ,  Vladimir Romanov ,  Pradeepa Kowrikan Subrahmnya

    IPC: H01J37/32 ,  H01J37/08

    CPC classification number: H01J37/32412 ,  H01J37/08

    Abstract: An ion source has an arc chamber defining an arc chamber volume. A reservoir is coupled to the arc chamber, defining a reservoir volume. The reservoir receives a source species to define a liquid within the reservoir volume. A conduit fluidly couples the reservoir volume to the arc chamber volume. First and second openings of the conduit are open to the respective reservoir and arc chamber volume. A heat source selectively heats the reservoir to melt the source species at a predetermined temperature. A liquid control apparatus controls a first volume of the liquid within the reservoir volume to define a predetermined supply of the liquid to the arc chamber volume. The liquid control apparatus is a pressurized gas source fluidly coupled to the reservoir to supply a gas to the reservoir and provide a predetermined amount of liquid to the arc chamber.

    Low conductance self-shielding insulator for ion implantation systems
    2.
    发明授权
    Low conductance self-shielding insulator for ion implantation systems 有权

    公开(公告)号：US10679818B2

    公开(公告)日：2020-06-09

    申请号：US16100645

    申请日：2018-08-10

    Applicant: Axcelis Technologies, Inc.

    Inventor： John F. Baggett ,  Neil Colvin

    IPC: H01J37/08 ,  H01J37/317

    Abstract: An insulator for an ion source is positioned between the apertured ground electrode and apertured suppression electrode. The insulator has an elongate body having a first end and a second end, where one or more features are defined in the elongate body and increase a gas conductance path along a surface of the elongate body from the first end to the second end. One or more of the features is an undercut extending generally axially or at a non-zero angle from an axis of the elongate body into the elongate body. One of the features can be a rib extending from a radius of the elongate body.

    REDUCED TRACE METALS CONTAMINATION ION SOURCE FOR AN ION IMPLANTATION SYSTEM
    4.
    发明申请
    REDUCED TRACE METALS CONTAMINATION ION SOURCE FOR AN ION IMPLANTATION SYSTEM 有权
    减少跟踪金属污染离子源离子植入系统

    公开(公告)号：US20150179393A1

    公开(公告)日：2015-06-25

    申请号：US14135754

    申请日：2013-12-20

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil Colvin ,  Tseh-Jen Hsieh

    IPC: H01J37/08

    CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/0268 ,  H01J2237/082 ,  H01J2237/31705

    Abstract: An ion source chamber for ion implantation system includes a housing that at least partially bounds an ionization region through which high energy electrons move from a cathode to ionize gas molecules injected into an interior of the housing; a liner section defining one or more interior walls of the housing interior, wherein each liner section includes a interiorly facing surface exposed to the ionization region during operation the ion implantation system; a cathode shield disposed about the cathode; a repeller spaced apart from the cathode; a plate including a source aperture for discharging ions from the ion source chamber; wherein at least one of the repeller, the liner section, the cathode shield; the plate, or an insert in the plate defining the source aperture comprise silicon carbide, wherein the silicon carbide is a non-stoichiometric sintered material having excess carbon.

    Abstract translation: 用于离子注入系统的离子源室包括壳体，该壳体至少部分地界定电离区域，高能电子通过该电离区域从阴极移动到电离注入壳体内部的气体分子; 限定所述壳体内部的一个或多个内壁的衬里部分，其中每个衬里部分包括在所述离子注入系统的操作期间暴露于所述电离区域的面向内的表面; 围绕阴极设置的阴极屏蔽; 与阴极间隔开的推斥器; 包括用于从离子源室排出离子的源孔的板; 其中所述推斥板，所述衬套部分，所述阴极罩中的至少一个; 该板或限定源孔的板中的插入物包括碳化硅，其中碳化硅是具有过量碳的非化学计量烧结材料。

    Hydraulic feed system for an ion source
    5.
    发明授权
    Hydraulic feed system for an ion source 有权

    公开(公告)号：US12154763B2

    公开(公告)日：2024-11-26

    申请号：US18336337

    申请日：2023-06-16

    Applicant: Axcelis Technologies, Inc.

    Inventor： Neil J. Bassom ,  Joshua Abeshaus ,  David Sporleder ,  Neil Colvin ,  Joseph Valinski ,  Michael Cristoforo ,  Vladimir Romanov ,  Pradeepa Kowrikan Subrahmnya

    IPC: H01J37/32 ,  H01J37/08

    Abstract: An ion source has an arc chamber defining an arc chamber volume. A reservoir is coupled to the arc chamber, defining a reservoir volume. The reservoir receives a source species to define a liquid within the reservoir volume. A conduit fluidly couples the reservoir volume to the arc chamber volume. First and second openings of the conduit are open to the respective reservoir and arc chamber volume. A heat source selectively heats the reservoir to melt the source species at a predetermined temperature. A liquid control apparatus controls a first volume of the liquid within the reservoir volume to define a predetermined supply of the liquid to the arc chamber volume. The liquid control apparatus is a pressurized gas source fluidly coupled to the reservoir to supply a gas to the reservoir and provide a predetermined amount of liquid to the arc chamber.

    ION SOURCE REPELLER
    9.
    发明申请
    ION SOURCE REPELLER 有权

    公开(公告)号：US20220319796A1

    公开(公告)日：2022-10-06

    申请号：US17223360

    申请日：2021-04-06

    Applicant: Axcelis Technologies, Inc.

    Inventor： Steven T. Drummond ,  Neil Colvin ,  Paul Silverstein

    IPC: H01J37/08 ,  H01L21/225 ,  H01J27/14 ,  H01J37/317

    Abstract: An ion source has an arc chamber having one or more arc chamber walls defining and interior region of the arc chamber. A cathode electrode is disposed along an axis. A repeller has a repeller shaft and a ceramic target member separated by a gap. The repeller shaft is not in electrical or mechanical contact with the target member, and the repeller shaft is configured to indirectly heat the target member. The target member, can be a cylinder encircling the repeller shaft, where the gap separates the cylinder from the repeller shaft. A top cap can enclose the cylinder can be separated from a top repeller surface of the repeller shaft by the gap. A target hole can be in the top cap. The target member can be supported by a bottom liner of the arc chamber or a support member mechanically and electrically coupled to the repeller shaft.

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