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公开(公告)号：US10861731B2
公开(公告)日：2020-12-08
申请号：US15872543
申请日：2018-01-16
发明人： John F. Baggett , Billy Benoit
IPC分类号： H01L21/683 , H01L21/687 , H01L21/265 , H01L21/67 , H01L21/677 , H01J37/32
摘要： A workpiece processing system and method comprises transferring a workpiece to a vacuum chamber. A heated chuck is configured to selectively clamp a workpiece to a clamping surface thereof, wherein the heated chuck is configured to selectively heat the clamping surface. A workpiece transfer apparatus has an end effector configured to transfer the workpiece to the heated chuck, wherein the workpiece rests on the end effector. A controller selectively position the workpiece with respect to the heated chuck via a control of the workpiece transfer apparatus, wherein the controller is configured to position the workpiece at a predetermined distance from the clamping surface, wherein the predetermined distance generally determines an amount of radiation received by the workpiece from the heated chuck, and wherein the controller is further configured to place the workpiece on the surface of the heated chuck via a control of the workpiece transfer apparatus.
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公开(公告)号：US20190304820A1
公开(公告)日：2019-10-03
申请号：US16367948
申请日：2019-03-28
IPC分类号： H01L21/67 , H01L21/683 , H01L21/687 , H01J37/317 , H01J37/20
摘要： A thermal chuck selectively retains a workpiece on a clamping surface. The thermal chuck has one or more heaters to selectively heat the clamping surface and the workpiece. A thermal monitoring device determines a temperature of a surface of the workpiece when the workpiece resides on the clamping surface, defining one or more measured temperatures. A controller selectively energizes the one or more heaters based on the one or more measured temperatures. The thermal monitoring device may be one or more of a thermocouple or RTD in selective contact with the surface of the workpiece and an emissivity sensor or pyrometer not in contact with the surface. The thermal chuck can be part of an ion implantation system configured to implant ions into the workpiece. The controller can be further configured to control the heaters based on the measured temperatures.
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公开(公告)号：US20180094921A1
公开(公告)日：2018-04-05
申请号：US15281757
申请日：2016-09-30
发明人： John F. Baggett , Joseph Ferrara
CPC分类号： G01B11/272 , G01N21/59 , G01N21/84 , G01N21/9505 , G01N2021/8416 , H01L21/67242 , H01L21/681
摘要： A workpiece alignment system has a workpiece support to support a workpiece. A first light emitter directs a first light beam toward the workpiece. A first light receiver receives the first light beam. A rotation device rotates the workpiece support about a support axis. A second light emitter directs a second light beam toward a peripheral region of the workpiece. A second light receiver receives the second light beam concurrent with the rotation of the workpiece. A controller determines a transmissivity of the workpiece based on a total initial emittance of the first light beam a transmission of the first light beam through the workpiece. The controller determines a position of the workpiece with respect to the support axis based, at least in part, on a rotational position of the workpiece, a portion of the second light beam received, and the determined transmissivity.
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公开(公告)号：US10714317B1
公开(公告)日：2020-07-14
申请号：US16239995
申请日：2019-01-04
发明人： John F. Baggett
IPC分类号： H01J37/32 , H01L21/265 , H01L21/67 , H01J37/317 , H01L21/683
摘要： A workpiece processing system has a chamber with one or more chamber walls defining surfaces enclosing a chamber volume. One or more chamber wall heaters selectively heat the chamber walls to a chamber wall temperature. A workpiece support within the chamber selectively supports a workpiece having one or more materials having a respective condensation temperature, above which, the one or more materials are respectively in a gaseous state. A heater apparatus selectively heats the workpiece to a predetermined temperature. A controller heats the workpiece to the predetermined temperature by controlling the heater apparatus, heating the one or more materials to respectively form one or more outgassed materials within the chamber volume. The controller further controls the chamber wall temperature by controlling the chamber wall heaters, where the chamber wall temperature is greater than a condensation temperature of the outgassed materials, preventing condensation of the outgassed material on the chamber surfaces.
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公开(公告)号：US10679818B2
公开(公告)日：2020-06-09
申请号：US16100645
申请日：2018-08-10
发明人： John F. Baggett , Neil Colvin
IPC分类号： H01J37/08 , H01J37/317
摘要： An insulator for an ion source is positioned between the apertured ground electrode and apertured suppression electrode. The insulator has an elongate body having a first end and a second end, where one or more features are defined in the elongate body and increase a gas conductance path along a surface of the elongate body from the first end to the second end. One or more of the features is an undercut extending generally axially or at a non-zero angle from an axis of the elongate body into the elongate body. One of the features can be a rib extending from a radius of the elongate body.
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公开(公告)号：US10041789B2
公开(公告)日：2018-08-07
申请号：US15281757
申请日：2016-09-30
发明人： John F. Baggett , Joseph Ferrara
摘要： A workpiece alignment system has a workpiece support to support a workpiece. A first light emitter directs a first light beam toward the workpiece. A first light receiver receives the first light beam. A rotation device rotates the workpiece support about a support axis. A second light emitter directs a second light beam toward a peripheral region of the workpiece. A second light receiver receives the second light beam concurrent with the rotation of the workpiece. A controller determines a transmissivity of the workpiece based on a total initial emittance of the first light beam a transmission of the first light beam through the workpiece. The controller determines a position of the workpiece with respect to the support axis based, at least in part, on a rotational position of the workpiece, a portion of the second light beam received, and the determined transmissivity.
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公开(公告)号：US20180204755A1
公开(公告)日：2018-07-19
申请号：US15872543
申请日：2018-01-16
发明人： John F. Baggett , Billy Benoit
IPC分类号： H01L21/683 , H01L21/687 , H01L21/265 , H01L21/67 , H01L21/677
摘要： A workpiece processing system and method comprises transferring a workpiece to a vacuum chamber. A heated chuck is configured to selectively clamp a workpiece to a clamping surface thereof, wherein the heated chuck is configured to selectively heat the clamping surface. A workpiece transfer apparatus has an end effector configured to transfer the workpiece to the heated chuck, wherein the workpiece rests on the end effector. A controller selectively position the workpiece with respect to the heated chuck via a control of the workpiece transfer apparatus, wherein the controller is configured to position the workpiece at a predetermined distance from the clamping surface, wherein the predetermined distance generally determines an amount of radiation received by the workpiece from the heated chuck, and wherein the controller is further configured to place the workpiece on the surface of the heated chuck via a control of the workpiece transfer apparatus.
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公开(公告)号：US10903097B2
公开(公告)日：2021-01-26
申请号：US16367948
申请日：2019-03-28
IPC分类号： H01L21/67 , H01J37/20 , H01J37/317 , H01L21/683 , H01L21/687 , G01K13/00
摘要： A thermal chuck selectively retains a workpiece on a clamping surface. The thermal chuck has one or more heaters to selectively heat the clamping surface and the workpiece. A thermal monitoring device determines a temperature of a surface of the workpiece when the workpiece resides on the clamping surface, defining one or more measured temperatures. A controller selectively energizes the one or more heaters based on the one or more measured temperatures. The thermal monitoring device may be one or more of a thermocouple or RTD in selective contact with the surface of the workpiece and an emissivity sensor or pyrometer not in contact with the surface. The thermal chuck can be part of an ion implantation system configured to implant ions into the workpiece. The controller can be further configured to control the heaters based on the measured temperatures.
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9.发明申请公开(公告)号：US20200219705A1
公开(公告)日：2020-07-09
申请号：US16239995
申请日：2019-01-04
发明人： John F. Baggett
IPC分类号： H01J37/32 , H01L21/265 , H01L21/683 , H01L21/67 , H01J37/317 , H01J37/18
摘要： A workpiece processing system has a chamber with one or more chamber walls defining surfaces enclosing a chamber volume. One or more chamber wall heaters selectively heat the chamber walls to a chamber wall temperature. A workpiece support within the chamber selectively supports a workpiece having one or more materials having a respective condensation temperature, above which, the one or more materials are respectively in a gaseous state. A heater apparatus selectively heats the workpiece to a predetermined temperature. A controller heats the workpiece to the predetermined temperature by controlling the heater apparatus, heating the one or more materials to respectively form one or more outgassed materials within the chamber volume. The controller further controls the chamber wall temperature by controlling the chamber wall heaters, where the chamber wall temperature is greater than a condensation temperature of the outgassed materials, preventing condensation of the outgassed material on the chamber surfaces.
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10.发明申请公开(公告)号：US20190120617A1
公开(公告)日：2019-04-25
申请号：US16170085
申请日：2018-10-25
发明人： John F. Baggett , Billy Thomas Benoit , Joe Ferrara , Brian Terry
IPC分类号： G01B11/27
摘要： A workpiece alignment system is provided has a light emission apparatus that directs a light beam at a plurality of wavelengths along a path at a shallow angle toward a first side of a workpiece plane at a peripheral region. A light receiver apparatus, receives the light beam on a second side opposite the first side. A rotation device selectively rotates a workpiece support. According controller determines a position of the workpiece based on an amount of the light beam received through the workpiece when the workpiece intersects the path. A sensitivity of the light receiver apparatus is controlled based on a transmissivity of the workpiece. A position of the workpiece is determined when the workpiece is rotated based on the rotational position, an amount of the light beam received, the transmissivity of the workpiece, detection of a workpiece edge, and the controlled sensitivity of the light receiver apparatus.
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