公开(公告)号：US09922796B1

公开(公告)日：2018-03-20

申请号：US15366455

申请日：2016-12-01

Applicant: APPLIED MATERIALS ISRAEL LTD. ,  Technische Universiteit Delft

Inventor： Jürgen Frosien ,  Pieter Kruit

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/145 ,  H01J37/09 ,  H01J37/22

CPC classification number: H01J37/145 ,  H01J37/09 ,  H01J37/1474 ,  H01J37/153 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2817

Abstract: A method for inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device having an optical axis. The method includes generating a primary charged particle beam; illuminating a multi-aperture lens plate with the primary charged particle beam to generate the array of primary charged particle beamlets; and correcting a field curvature of the charged particle beam device with a first and a second field curvature correction electrode. The method further includes applying a voltage to the first and to the second field curvature correction electrode. At least one of the field strength provided by the first and the second field curvature correction electrode varies in a plane perpendicular to the optical axis of the charged particle beam device. The method further includes focusing the primary charged particle beamlets on separate locations on the specimen with an objective lens.

公开(公告)号：US09583306B2

公开(公告)日：2017-02-28

申请号：US14964274

申请日：2015-12-09

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: G21K5/04 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J37/145 ,  H01J37/21

CPC classification number: H01J37/1478 ,  H01J37/145 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1508 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2801 ,  H01J2237/2811

Abstract: A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.

Abstract translation: 具有摆动物镜（SOL）的扫描电子显微镜（SEM）减小了偏差以提高图像分辨率，并且扩展了电子束扫描角度。 扫描电子显微镜包括带电粒子源，加速电极和包括预偏转单元，摆动偏转单元和物镜的摆动物镜系统，它们都相对于光轴旋转对称。 摆动偏转单元的上部内表面与SEM的外侧倾斜角度θ，其下部内表面平行于光轴。 提供了用于摆动物镜的第一和第二聚焦场的分布以限制偏差并且可以由单个摆动偏转单元执行。 优选地，两个聚焦场彼此重叠至少80％。

公开(公告)号：US20160379797A1

公开(公告)日：2016-12-29

申请号：US14902436

申请日：2014-06-25

Applicant: HITACHI HIGH-TECNOLOGIES CORPORATION

Inventor： Tsunenori NOMAGUCHI ,  Toshihide AGEMURA ,  Zulihuma YASENJIANG

IPC: H01J37/244 ,  H01J37/141 ,  H01J37/285 ,  H01J37/22

CPC classification number: H01J37/244 ,  H01J37/141 ,  H01J37/145 ,  H01J37/1471 ,  H01J37/22 ,  H01J37/226 ,  H01J37/285 ,  H01J2237/12 ,  H01J2237/14

Abstract: Disclosed is a charged particle beam apparatus wherein charged particles emitted from a sample are efficiently acquired at a position as close as possible to the sample, said position being in the objective lens. This charged particle beam apparatus is provided with: a charged particle beam receiving surface that is provided with a scintillator that emits light by means of charged particles; a photodetector that detects light emitted from the scintillator; a mirror that guides, to the photodetector, the light emitted from the scintillator; and an objective lens for focusing the charged particle beam to a sample. A distance (Lsm) between the charged particle beam receiving surface and the mirror is longer than a distance (Lpm) between the photodetector and the mirror, and the charged particle beam receiving surface, the mirror, and the photodetector are stored in the objective lens.

Abstract translation: 公开了一种带电粒子束装置，其中从样品发射的带电粒子在尽可能靠近样品的位置被有效地获取，所述位置在物镜中。 该带电粒子束装置具有：带电粒子束接收面，其具有通过带电粒子发光的闪烁器; 检测从闪烁体发出的光的光检测器; 向所述光电检测器引导从所述闪烁体发射的光的反射镜; 以及用于将带电粒子束聚焦到样品的物镜。 带电粒子束接收表面和反射镜之间的距离（Lsm）长于光电检测器和反射镜之间的距离（Lpm），并且带电粒子束接收表面，反射镜和光电检测器被存储在物镜 。

公开(公告)号：US09390888B2

公开(公告)日：2016-07-12

申请号：US14720122

申请日：2015-05-22

Applicant: Industrial Technology Research Institute

Inventor： Wen-Li Wu ,  Yun-San Chien ,  Wei-En Fu ,  Yen-Song Chen ,  Hsin-Chia Ho

IPC: H01J37/00 ,  H01J37/29 ,  H01J37/06 ,  H01J37/145 ,  H01J37/04 ,  H01J37/295 ,  G01N23/20

CPC classification number: H01J37/29 ,  G01N23/20058 ,  H01J37/04 ,  H01J37/06 ,  H01J37/145 ,  H01J37/295 ,  H01J2237/0492 ,  H01J2237/255

Abstract: An apparatus and methods for small-angle electron beam scattering measurements in a reflection or a backscattering mode are provided. The apparatus includes an electron source, electron collimation optics before a sample, electron projection optics after the sample, a sample stage capable of holding the sample, and a electron detector module. The electrons emitted from the source are collimated and positioned to impinge nanostructures on the sample. The signals resulting from the interactions between the impinging electrons and the nanostructures are further magnified by the electron projection optics to reach a sufficient angular resolution before recorded by the electron detector module.

Abstract translation: 提供了一种用于反射或后向散射模式的小角度电子束散射测量的装置和方法。 该装置包括电子源，样品前的电子准直光学器件，样品后的电子投影光学器件，能够保持样品的样品台，以及电子检测器模块。 从源发射的电子被准直并定位成将纳米结构撞击在样品上。 由撞击电子和纳米结构之间的相互作用产生的信号被电子投影光学器件进一步放大，以在由电子检测器模块记录之前达到足够的角度分辨率。

公开(公告)号：US20160172150A1

公开(公告)日：2016-06-16

申请号：US14964274

申请日：2015-12-09

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/147 ,  H01J37/145 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/1478 ,  H01J37/145 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1508 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2801 ,  H01J2237/2811

Abstract: A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.

Abstract translation: 具有摆动物镜（SOL）的扫描电子显微镜（SEM）减小了偏差以提高图像分辨率，并且扩展了电子束扫描角度。 扫描电子显微镜包括带电粒子源，加速电极和包括预偏转单元，摆动偏转单元和物镜的摆动物镜系统，它们都相对于光轴旋转对称。 摆动偏转单元的上内表面倾斜一角度; 到SEM的外侧，并且其下内表面平行于光轴。 提供了用于摆动物镜的第一和第二聚焦场的分布以限制偏差并且可以由单个摆动偏转单元执行。 优选地，两个聚焦场彼此重叠至少80％。

公开(公告)号：US09324537B2

公开(公告)日：2016-04-26

申请号：US14309452

申请日：2014-06-19

Applicant: Carl Zeiss Microscopy GmbH ,  Applied Materials Israel, Ltd.

Inventor： Thomas Kemen ,  Rainer Knippelmeyer ,  Stefan Schubert

IPC: H01J37/00 ,  H01J37/04 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

Abstract translation: 带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔 板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心 的第二多孔板的孔径。 本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数量的带电粒子子束检查物体的带电粒子检查方法。

公开(公告)号：US20160104597A1

公开(公告)日：2016-04-14

申请号：US14787263

申请日：2014-04-14

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuta IMAI ,  Takashi OHSHIMA ,  Hideo MORISHITA

IPC: H01J37/073 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J29/48 ,  H01J27/02

CPC classification number: H01J37/073 ,  H01J27/02 ,  H01J27/26 ,  H01J29/481 ,  H01J37/06 ,  H01J37/063 ,  H01J37/08 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/0802 ,  H01J2237/1508 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.

Abstract translation: 本发明的目的是提供一种仅使用静电透镜的带电粒子枪，所述带电粒子枪相对较小并且具有较小的像差，并且提供即使具有高电流也具有高亮度的场致发射型带电粒子枪 。 该带电粒子枪具有：带电粒子源; 加速电极，其加速从带电粒子源发射的带电粒子; 控制电极，其设置成比加速电极更加朝向带电粒子源侧，并且具有比加速电极的开口直径大的孔径; 以及控制单元，其基于对加速电极施加的电位控制施加到控制电极的电位。

公开(公告)号：US20160042911A1

公开(公告)日：2016-02-11

申请号：US14534815

申请日：2014-11-06

Applicant: NATIONAL TSING HUA UNIVERSITY

Inventor： WEI-YU CHANG ,  FU-RONG CHEN ,  TE-HUI LEE ,  TSU-WEI HUANG

IPC: H01J37/141 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/14 ,  H01J37/141 ,  H01J37/1413 ,  H01J37/145 ,  H01J37/26 ,  H01J2237/141 ,  H01J2237/1415

Abstract: A combined round-multipole magnetic lens comprises a coil bracket, a first pole piece and a second pole piece. At least a first pole shoe of the first pole piece on the coil support and at least a second pole shoe of the second pole piece under the coil support respectively extend towards the central axis. The first pole shoe and the second pole shoe are symmetric according to the central axis, or the first pole shoes and the second pole shoes are respectively symmetrically arranged, and the angle difference between the first pole shoe and the adjacent second pole shoes is 360/2N degrees. A magnetic circuit gap is formed between the first pole shoe and the adjacent second pole shoe, for generating a magnetic field distribution of multi-poles and reducing the volume and the number of power supplies.

Abstract translation: 组合的圆形多极磁性透镜包括线圈支架，第一极靴和第二极靴。 线圈支撑件上的第一极靴的至少第一极靴和线圈支撑件下方的第二极靴的至少第二极靴分别朝向中心轴线延伸。 第一极靴和第二极靴根据中心轴对称，或第一极靴和第二极靴分别对称布置，第一极靴和相邻的第二极靴之间的角度差为360 / 2N度。 在第一极靴和相邻的第二极靴之间形成磁路间隙，用于产生多极的磁场分布并减小电源的体积和数量。

公开(公告)号：US20150008331A1

公开(公告)日：2015-01-08

申请号：US14309452

申请日：2014-06-19

Applicant: Carl Zeiss SMT GmbH ,  Applied Materials Israel, Ltd.

Inventor： Thomas KEMEN ,  Rainer KNIPPELMEYER ,  Stefan SCHUBERT

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

Abstract translation: 带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔 板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心 的第二多孔板的孔径。 本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数量的带电粒子子束检查物体的带电粒子检查方法。

公开(公告)号：US08785890B2

公开(公告)日：2014-07-22

申请号：US13871624

申请日：2013-04-26

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Tomoyasu Shojo ,  Noritsugu Takahashi

IPC: A61N5/00 ,  G21G5/00

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/145 ,  H01J2237/21 ,  H01J2237/28

Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

Abstract translation: 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。