Abstract:
An apparatus and methods for small-angle electron beam scattering measurements in a reflection or a backscattering mode are provided. The apparatus includes an electron source, electron collimation optics before a sample, electron projection optics after the sample, a sample stage capable of holding the sample, and a electron detector module. The electrons emitted from the source are collimated and positioned to impinge nanostructures on the sample. The signals resulting from the interactions between the impinging electrons and the nanostructures are further magnified by the electron projection optics to reach a sufficient angular resolution before recorded by the electron detector module.
Abstract:
A specimen of thin film of a material having a crystal structure and exhibiting an absorption in ultraviolet region is irradiated with electron beams and the energy loss spectrum of the reflected electrons is observed and utilized. For example, the correlations of (1) the energy of the plasmon peak and the relative intensity of the plasmon peak to the elastic peak or the profile thereof, (2) the energy (loss energy being between 4 and 8 eV) of the peak attributed to &pgr;→&pgr;* transition and the relative intensity of the &pgr;→&pgr;* peak to the elastic peak or the profile thereof and (3) the profile of the background of the continuous spectrum formed by inelastic scattering of electrons or the relative intensity of a point to the elastic peak and the average crystallite size of the material of the specimen are used to determine the crystallite size of the material.
Abstract translation:用电子束照射具有晶体结构且在紫外线区域呈现吸收的材料的薄膜样本,并观察并利用反射电子的能量损失谱。 例如,(1)等离子体激元峰的能量与等离子体激元峰的相对强度与弹性峰值或其轮廓的相关性,(2)峰值的能量(损耗能量在4和8eV之间) 归因于pi-> pi *转变和pi-> pi *峰相对于弹性峰或其轮廓的相对强度,以及(3)由电子或相对的非弹性散射形成的连续光谱的背景分布 使用试样的材料的弹性峰点和平均微晶尺寸的强度来确定材料的微晶尺寸。
Abstract:
An apparatus and methods for small-angle electron beam scattering measurements in a reflection or a backscattering mode are provided. The apparatus includes an electron source, electron collimation optics before a sample, electron projection optics after the sample, a sample stage capable of holding the sample, and a electron detector module. The electrons emitted from the source are collimated and positioned to impinge nanostructures on the sample. The signals resulting from the interactions between the impinging electrons and the nanostructures are further magnified by the electron projection optics to reach a sufficient angular resolution before recorded by the electron detector module.
Abstract:
An improved RHEED apparatus and a method for observing step-like surface irregularities of a sample by the use of the improved RHEED apparatus.
Abstract:
The present inventions are related to systems and methods for determining characteristics of a material. The characteristics may include, but are not limited to, crystallographic texture.
Abstract:
Large data sets are analyzed by hierarchical clustering using correlation as a similarity measure. This provides results that are superior to those obtained using a Euclidean distance similarity measure. A spatial continuity constraint may be applied in hierarchical clustering analysis of images.
Abstract:
One embodiment relates to a scanning electron beam apparatus having curved electron-optical axes. An electron gun and illumination electron optics are configured to generate a primary electron beam along a first axis. Objective electron optics is configured about a second axis to receive the primary electron beam, to focus the incident electron beam onto the substrate, and to retrieve an emitted beam of scattered electrons from the substrate. Detection electron optics is configured about a third axis to receive the emitted beam and to focus the emitted beam onto a detector. A beam separator is coupled to and interconnecting the illumination electron optics, the objective electron optics, and the detection electron optics in such a way that there is a same angle between the first and second axes as between the second and third axes. A beam deflector is configured to controllably scan the primary electron beam across the substrate and to de-scan the emitted electron beam. Other embodiments are also disclosed.
Abstract:
An apparatus and method for imaging on a detector a particle beam of charged particles having a distinct energy distribution and a distinct angle distribution. The apparatus has deflectors which are provided to create in the particle beam essentially parallel particle paths spaced to correspond to their original angle distribution. The deflectors also direct the particle beam to semi-transmissive, aligned filter electrodes, which produce a potential difference to create a deceleration field to allow the particles to pass through by means of energy selectivity.
Abstract:
The atoms constituting a surface of a solid sample are identified by first forming, on the surface, island-like deposits of a substance capable of generating fluorescent X-rays upon being energized by an electron beam. The deposits are then energized with the electron beam so that fluorescent X-rays are emitted therefrom and reflected on the surface. From the critical angle for total reflection of the fluorescent X-rays reflected on that portion of the surface of the sample on which no deposits are present, the atoms constituting the surface may be determined. An apparatus for carrying out the above method is also disclosed which is a modification of the conventional RHEED/TRAXS device.