公开(公告)号：US09822443B1

公开(公告)日：2017-11-21

申请号：US15010653

申请日：2016-01-29

Applicant: Multibeam Corporation

Inventor： Michael C. Smayling ,  Kevin M. Monahan ,  David K. Lam ,  Theodore A. Prescop

IPC: H01J37/30 ,  C23C14/48

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods, devices and systems for targeted, maskless modification of material on or in a substrate using charged particle beams. Electrostatically-deflected charged particle beam columns can be targeted in direct dependence on the design layout database to perform direct and knock-on ion implantation, producing patterned material modifications with selected chemical and 3D-structural profiles. The number of required process steps is reduced, reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Local gas and photon injectors and detectors are local to corresponding individual columns, and support superior, highly-configurable process execution and control. Targeted implantation can be used to prepare the substrate for patterned blanket etch; patterned ALD can be used to prepare the substrate for patterned blanket deposition; neither process requiring photomasks or resist. Arrays of highly configurable beam columns can also be used to perform both positive and negative tone lithography in a single pass.

公开(公告)号：US20170303383A1

公开(公告)日：2017-10-19

申请号：US15623733

申请日：2017-06-15

Applicant: Sean R. Kirkpatrick ,  Richard S. Svrluga

Inventor： Sean R. Kirkpatrick ,  Richard S. Svrluga

IPC: H05H3/00 ,  H01J37/16 ,  H01J37/32

CPC classification number: H05H3/00 ,  H01J37/05 ,  H01J37/08 ,  H01J37/147 ,  H01J37/16 ,  H01J37/317 ,  H01J37/3171 ,  H01J37/32 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01J2237/31701 ,  H01J2237/334 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/324 ,  H01L29/36 ,  H05H2245/123 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A method of forming a patterned hard mask on a surface of a substrate uses an accelerated neutral beam with carbon atoms.

公开(公告)号：US20170259239A1

公开(公告)日：2017-09-14

申请号：US15601939

申请日：2017-05-22

Applicant: XYLECO, INC.

Inventor： Marshall Medoff

IPC: B01J19/08 ,  C12P3/00 ,  C10L1/02 ,  C12P7/02

CPC classification number: B01J19/081 ,  B01J19/085 ,  B01J19/10 ,  B01J19/12 ,  B01J2219/0879 ,  B01J2219/12 ,  C10L1/02 ,  C10L5/44 ,  C10L9/00 ,  C10L2200/0469 ,  C10L2290/26 ,  C10L2290/36 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  H01J37/05 ,  Y02E50/30

Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

公开(公告)号：US20170207059A1

公开(公告)日：2017-07-20

申请号：US15411194

申请日：2017-01-20

Applicant: Gatan, Inc.

Inventor： Colin Trevor ,  Matthew Lent ,  Alexander Jozef Gubbens ,  Edward James ,  Ray Dudley Twesten ,  Roice Joseph ,  SanJay Parekh ,  Thomas Sha

IPC: H01J37/05 ,  H01J37/244 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/05 ,  H01J2237/057 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24495 ,  H01J2237/24585 ,  H01J2237/2802

Abstract: An electron energy loss spectrometer is described having a direct detection sensor, a high speed shutter and a sensor processor wherein the sensor processor combines images from individual sensor read-outs and converts a two dimensional image from said sensor into a one dimensional spectrum and wherein the one dimensional spectrum is output to a computer and operation of the high speed shutter is integrated with timing of imaging the sensor. The shutter is controlled to allow reduction in exposure of images corresponding to the individual sensor readouts. A plurality of images are exposed by imaging less than the full possible exposure and wherein the plurality of images are combined to form a composite image. The plurality of images can be comprised of images created by exposing the sensor for different exposure times.

公开(公告)号：US09653265B2

公开(公告)日：2017-05-16

申请号：US14341409

申请日：2014-07-25

Applicant: Peter F. Vandermeulen

Inventor： Peter F. Vandermeulen

IPC: H01J37/32 ,  H01J37/05 ,  H01J37/08 ,  H01P3/12 ,  H01Q21/00 ,  C23C16/511 ,  C23C16/513 ,  H01P3/127

CPC classification number: H01J37/32229 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32669 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/3323 ,  H01P3/12 ,  H01P3/127 ,  H01Q21/0043

Abstract: This application is directed to an apparatus for creating microwave radiation patterns for an object detection system. The apparatus includes a waveguide conduit having first slots at one side of the conduit and corresponding second slots at an opposite side of the conduit. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of first slots. A plunger is moveably positioned in the waveguide conduit from one end thereof. The plunger allows the waveguide conduit to be tuned to generally optimize the power of the microwaves exiting the first slots. Secondary plungers are each fitted in one of the second slots to independently tune or detune microwave emittance through a corresponding first slot.

公开(公告)号：US20170123309A1

公开(公告)日：2017-05-04

申请号：US15403964

申请日：2017-01-11

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick

IPC: G03F1/80 ,  G03F1/82 ,  H05H3/02

CPC classification number: G03F1/80 ,  B24B37/04 ,  G03F1/82 ,  H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01L21/02115 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31105 ,  H01L21/31111 ,  H01L29/36 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A method for treating a substrate surface uses Neutral Beam irradiation derived from a gas-cluster ion-beam and articles produced thereby including lithography photomask substrates.

公开(公告)号：US09601312B2

公开(公告)日：2017-03-21

申请号：US15052650

申请日：2016-02-24

Applicant: FEI Company

Inventor： Brian Roberts Routh, Jr.

IPC: H01J37/30 ,  H01J37/305 ,  H01J37/147 ,  H01J37/10 ,  H01J37/077 ,  H01J37/08 ,  H01J37/285 ,  H01J27/16 ,  H01J37/05 ,  H01J37/304 ,  G01T1/28 ,  H01J37/26

CPC classification number: H01J37/285 ,  G01T1/28 ,  H01J27/16 ,  H01J37/05 ,  H01J37/077 ,  H01J37/08 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/265 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3056 ,  H01J2237/0817 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/31749

Abstract: A single column charged particle source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the source to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.

公开(公告)号：US09496117B2

公开(公告)日：2016-11-15

申请号：US14158972

申请日：2014-01-20

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Jason M. Schaller ,  Robert B. Vopat

IPC: G21K1/04 ,  H01J37/05 ,  H01J37/317 ,  H01J37/09

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/057 ,  H01J2237/1501

Abstract: An adjustable mass-resolving slit assembly includes an aperture portion and an actuation portion. The aperture portion includes first and second shield members that define an aperture therebetween for receiving an ion beam during semiconductor processing operations. The actuation portion is coupled to the aperture portion and selectively and independently adjusts the position of the first and second shield members along first and second non-parallel axes. Adjusting the position of the first and second shield members along the first axis adjusts a width of the aperture. Adjusting the position of the first and second shield members along the second axis adjusts a region of the first and second shield members impinged by the ion beam. Methods for using the adjustable mass-resolving slit assembly are also disclosed.

Abstract translation: 可调节的质量分辨率狭缝组件包括孔部分和致动部分。 开口部分包括在半导体处理操作期间限定其间用于接收离子束的孔的第一和第二屏蔽构件。 致动部分联接到开口部分，并且选择性地和独立地调节第一和第二屏蔽部件沿第一和第二非平行轴线的位置。 沿着第一轴线调节第一和第二屏蔽件的位置调整孔径的宽度。 沿着第二轴调整第一和第二屏蔽构件的位置调节由离子束撞击的第一和第二屏蔽构件的区域。 还公开了使用可调节质量分辨率缝隙组件的方法。

公开(公告)号：US09478388B2

公开(公告)日：2016-10-25

申请号：US13823499

申请日：2011-10-10

Applicant: Bryan Barnard

Inventor： Bryan Barnard

IPC: H01J37/08 ,  H01J27/02 ,  H01J49/14 ,  H01J37/05 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J27/026 ,  H01J37/05 ,  H01J37/3171 ,  H01J49/142 ,  H01J2237/057 ,  H01J2237/0812 ,  H01J2237/0827

Abstract: A method of processing one or more surfaces is provided, comprising: providing a switchable ion gun which is switchable between a cluster mode setting for producing an ion beam substantially comprising ionized gas clusters for irradiating a surface and an atomic mode setting for producing an ion beam substantially comprising ionized gas atoms for irradiating a surface; and selectively operating the ion gun in the cluster mode by mass selecting ionized gas clusters using a variable mass selector thereby irradiating a surface substantially with ionized gas clusters or the atomic mode by mass selecting ionized gas atoms using a variable mass selector thereby irradiating a surface substantially with ionized gas atoms. Also provided is a switchable ion gun comprising: a gas expansion nozzle for producing gas clusters; an ionization chamber for ionizing the gas clusters and gas atoms; and a variable (preferably a magnetic sector) mass selector for mass selecting the ionized gas clusters and ionized gas atoms to produce an ion beam variable between substantially comprising ionized gas clusters and substantially comprising ionized gas atoms. Preferably, the gun comprises an electrically floating flight tube for adjusting the energy of the ions while within the mass selector.

Abstract translation: 提供一种处理一个或多个表面的方法，包括：提供可切换离子枪，其可在用于产生基本上包括用于照射表面的电离气体簇的离子束的簇模式设置和用于产生离子束的原子模式设置之间切换 基本上包括用于照射表面的电离气体原子; 并且通过使用可变质量选择器大量选择离子化气体簇来选择性地操作离子枪，由此通过使用可变质量选择器大量选择电离气体原子，基本上用离子化气体簇或原子模式照射表面，从而基本上照射表面 与电离气体原子。 还提供了一种可切换离子枪，包括：用于产生气体团的气体膨胀喷嘴; 用于电离气团和气原子的电离室; 以及用于质量选择电离气体团簇和离子化气体原子以产生基本上包括电离气体簇并且基本上包含电离气体原子的离子束可变的变量（优选磁性扇形体）选择器。 优选地，枪包括电浮动飞行管，用于在质量选择器内调节离子的能量。

公开(公告)号：US20160279591A1

公开(公告)日：2016-09-29

申请号：US15178958

申请日：2016-06-10

Applicant: XYLECO, INC.

Inventor： Marshall Medoff

IPC: B01J19/08 ,  B01J19/10

CPC classification number: B01J19/081 ,  B01J19/085 ,  B01J19/10 ,  B01J19/12 ,  B01J2219/0879 ,  B01J2219/12 ,  C10L1/02 ,  C10L5/44 ,  C10L9/00 ,  C10L2200/0469 ,  C10L2290/26 ,  C10L2290/36 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  H01J37/05 ,  Y02E50/30

Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

Abstract translation: 诸如生物质（例如，植物生物量，动物生物质和城市废物生物质）和含烃材料的材料被加工以产生有用的产品，例如燃料。 例如，描述了可以使用诸如纤维素和/或木质纤维素材料和/或淀粉质材料或油砂，油页岩，焦油砂，沥青和煤的原料的材料来生产改变的材料例如燃料（例如， 乙醇和/或丁醇）。 该处理包括将材料暴露于离子束。