Abstract:
Integrated circuit (IC) packages employing split, double-sided IC metallization structures to facilitate a semiconductor die (“IC die”) module employing stacked dice, and related fabrication methods are disclosed. Multiple IC dice in the IC package are stacked and bonded together in a back-to-back, top and bottom IC die configuration in an IC die module, which can minimize the overall height of the IC package. The metallization structure is split between separate top and bottom metallization structures adjacent to respective top and bottom surfaces of the IC die module to facilitate die-to-die and external electrical connections to the dice. The top and bottom metallization structures can be double-sided by exposing substrate interconnects on respective inner and outer surfaces for respective die and external electrical interconnections. In other exemplary aspects, the top and bottom metallization structures can include redistribution layers (RDLs) to provide increased electrical conductivity between die interconnects and substrate interconnects.
Abstract:
A package may include a substrate and a semiconductor die with the substrate having a smaller width than the semiconductor die and encapsulated in a mold compound. In one example, the package may be a wafer level package that allows an external connection on the backside of the package to enable manufacturing in a panel or wafer form.
Abstract:
A high density fan out package structure may include a contact layer. The contact layer includes a conductive interconnect layer having a first surface facing an active die and a second surface facing a redistribution layer. The high density fan out package structure has a barrier layer on the first surface of the conductive interconnect layer. The high density fan out package structure may also include the redistribution layer, which has conductive routing layers. The conductive routing layers may be configured to couple a first conductive interconnect to the conductive interconnect layer. The high density fan out package structure may further include a first via coupled to the barrier liner and configured to couple with a second conductive interconnect to the active die.
Abstract:
Some implementations provide a semiconductor device (e.g., die, wafer) that includes a substrate, that is configured with trenches that are dry-etched into a surface of the substrate inside an area defined by scribe lines of the substrate. A crack stop structure is provided for the semiconductor device that includes a polymer dielectric layer coating that fills the trenches with a polymer dielectric material and provides a dielectric layer over the surface of the substrate inside the area. The polymer dielectric layer coating and trenches are configured to reduce cracking or chipping of the substrate in the area defined by scribe lines after cutting.
Abstract:
A package substrate that includes a first portion and a redistribution portion. The first portion is configured to operate as a capacitor. The first portion includes a first dielectric layer, a first set of metal layers in the dielectric layer, a first via in the dielectric layer, a second set of metal layers in the dielectric layer, and a second via in the dielectric layer. The first via is coupled to the first set of metal layers. The first via and the first set of metal layers are configured to provide a first electrical path for a ground signal. The second via is coupled to the second set of metal layers. The second via and the second set of metal layers are configured to provide a second electrical path for a power signal. The redistribution portion includes a second dielectric layer, and a set of interconnects.
Abstract:
An embedded multi-terminal capacitor embedded in a substrate cavity includes at least one metal layer patterned into a plurality of power rails and a plurality of ground rails. The substrate includes an external power network.
Abstract:
A substrate includes a plurality of vias that are lined with dielectric polymer having a substantially uniform thickness. This substantial uniform thickness provides a lumen within each dielectric-polymer-layer-lined via that is substantially centered within the via. Subsequent deposition of metal into the lumen for each dielectric-polymer-layer-lined via thus provides conductive vias having substantially centered metal conductors.
Abstract:
Provided herein is an integrated device that includes a substrate, a die, a heat-dissipation layer located between the substrate and the die, and a first interconnect configured to couple the die to the heat-dissipation layer. The heat-dissipation layer may be configured to provide an electrical path for a ground signal. The first interconnect may be further configured to conduct heat from the die to the heat-dissipation layer. The integrated device may also include a second interconnect configured to couple the die to the substrate. The second interconnect may be further configured to conduct a power signal between the die and the substrate. The integrated device may also include a dielectric layer located between the heat-dissipation layer and the substrate, and a solder-resist layer located between the die and the heat-dissipation layer.
Abstract:
An integrated device package includes a first die, a second die, an encapsulation portion coupled to the first die and the second die, and a redistribution portion coupled to the encapsulation portion. The encapsulation portion includes an encapsulation layer, a bridge, and a first via. The bridge is at least partially embedded in the encapsulation layer. The bridge is configured to provide a first electrical path for a first signal between the first die and the second die. The first via is in the encapsulation layer. The first via is coupled to the bridge. The first via and the bridge are configured to provide a second electrical path for a second signal to the first die. The redistribution portion includes at least one dielectric layer, and at least one interconnect, in the dielectric layer, coupled to the first via.
Abstract:
Some novel features pertain to an integrated device that includes a substrate, a first interconnect coupled to the substrate, and a second interconnect surrounding the first interconnect. The second interconnect may be configured to provide an electrical connection to ground. In some implementations, the second interconnect includes a plate. In some implementations, the integrated device also includes a dielectric material between the first interconnect and the second interconnect. In some implementations, the integrated device also includes a mold surrounding the second interconnect. In some implementations, the first interconnect is configured to conduct a power signal in a first direction. In some implementations, the second interconnect is configured to conduct a grounding signal in a second direction. In some implementations, the second direction is different from the first direction. In some implementations, the integrated device may be a package-on-package (PoP) device.