摘要:
The invention relates to a process for preparing monofunctional, bifunctional or polyfunctional aromatic olefins of the formula (I) ##STR1## wherein a palladium compound of the formula (IV) ##STR2## is used as a catalyst in the preparation of the compounds of the formula (I).
摘要:
A process is disclosed for the separation of an enantiomerically enriched 1-tosyloxy-2-acyloxy-3-butene and an enantiomerically enriched 1-tosyloxy-2-hydroxy-3-butene from a first mixture containing both compounds. The process includes the steps of:(a) forming a solution of the mixture in an organic solvent;(b) bringing the solution formed in (a) to a temperature wherein most of the enantiomerically enriched 1-tosyloxy-2-hydroxy-3-butene precipates, leaving in solution most of the enantiomerically enriched 1-tosyloxy-2-acyloxy-3-butene; and(c) separating the precipitate formed in (b) from the solution.
摘要:
A method of preparing a photosensitizer condensate comprising: condensing a phenolic compound with a diazo sulfonyl chloride, wherein from about 50 to 100 mole percent of the diazo moiety is 2,1,4-diazo and from 0 to about 50 mole percent of the diazo moiety is 2,1,5 diazo; the phenolic compound having, on average, from about 60 mole percent to about 100 mole percent of its hydroxy groups esterified by the diazo sulfonyl chloride; wherein the condensing is conducted in a lactone solvent in the presence of an acid scavenger; and then subsequently isolating the photosensitizer condensate.
摘要:
The present invention is directed to a polymeric isocyanate modified epoxy blocked sulfonic acid ester as a catalyst for the crosslinking of polymers having hydroxyl, carboxyl, and amide functional groups with a crosslinking agent and resin compositions containing the same. More particularly, the present invention is directed to a polymeric isocyanate modified epoxy blocked sulfonic acid ester with a molecular weight of about 1000 preferably prepared from a sulfonic acid, an epoxy resin and a mono- or di-isocyanate and resin compositions containing the polymeric isocyanate modified epoxy blocked sulfonic acid ester catalyst. The catalyst when used in the crosslinking or curing of hydroxyl, carboxyl or amide containing polymers with an acid catalyzed amino-formaldehyde crosslinking agent, such as hexamethoxymethylmelamine ("HMMA"), produced polymeric film coatings which have superior hardness, impact resistance, adhesion, improved blister resistance, salt spray characteristics and flexibility.
摘要:
The invention relates to 2,3,4-trihydroxy-3'-methyl-, -ethyl-, -propyl- or -isopropylbenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4-sulfonic acid and/or (7-methoxy-1,2-naphthoquinone 2-diazide)-4-sulfonic acid, a radiation-sensitive mixture prepared therewith, and a radiation-sensitive recording material comprising a substrate and a radiation-sensitive layer which is composed of the mixture according to the invention.
摘要:
Ligomeric sulfonic acid derivatives having repeating units of the formula I ##STR1## in which R.sup.1 is an alkyl, haloalkyl or aryl radical,R.sup.2 is a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R.sup.1 --SO.sub.2 --O--).sub.n X--,R.sup.3 is a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl, heteroarylenedialkyl group, alkylene, alkenylene, alkynylene, cycloalkylene or arylene group,X is an alkylene, cycloalkylene or arylene group Y is O, S, CO, CO--O, SO.sub.2, SO.sub.2 --O, NR.sup.4, CO--NH, O--CO--NR.sup.5, NH--CO--NR.sup.5 or NR.sup.5 --CO--O,Z is O, CO--NR.sup.6, O--CO--NR.sup.6 or NH--CO--NR.sup.6,R.sup.4 is an acyl radical,R.sup.5 is a hydrogen atom or an alkyl-, cycloalkyl, alkenyl, alkynyl or aryl radical,R.sup.6 is an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical,k is 0, 1, 2, 3 or 4,m is an integer greater than 1 andn is 1, 2 or 3,generate sulfonic acids under irradiation and are cleavable by the latter. In combination with alkali-soluble binders, they give positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The recording materials are distinguished by a high resolution in conjunction with high image contrast and excellent storage stability.
摘要:
A radiation-sensitive mixture which contains compounds of the formula I which generate under irradiation sulfonic acids and are cleavable by the latter ##STR1## in which R.sup.1 is an unsubstituted or substituted alkyl, fluorinated alkyl, perfluoroalkyl or aryl radical,R.sup.2 is a hydrogen atom, an unsubstituted or substituted alkyl radical, or an unsubstituted or substituted aryl radical, (R.sup.1 --SO.sub.2 --O--).sub.n X--, or R.sub.3 O--,R.sup.3 and R.sup.4 are identical or different and are unsubstituted or substituted alkyl, cycloalkylalkyl, cycloalkenylalkyl or aralkyl radicals, in which 1 to 3 aliphatic CH.sub.2 or CH groups are optionally replaced by one or more of NR.sup.5, O, S, CO, CO--O, CO--NH, O--CO--NH, CO--NH--CO, NH--CO--NH, SO.sub.2, SO.sub.2 --O or SO.sub.2 --NH, or unsubstituted or substituted alkenyl, alkynyl, cycloalkyl or cycloalkenyl radicals, or R.sup.3 and R.sup.4 are mutually linked to form an unsubstituted or substituted heterocyclic ring,R.sup.5 is an acyl radical,n is an integer from 1 to 3, andX is an alkylene, cyloalkylene, or arylene group.and which, in combination with alkali-soluble binders, give positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast and excellent storage stability.
摘要:
Aphidicolane derivatives of the formula: ##STR1## wherein R.sup.1 stands for hydrogen or a hydroxy radical, R.sup.2 stands for a hydroxy or methyl radical, or the group CR.sup.1 R.sup.2 stands for a keto group; R.sup.3 stands for a formyl or hydroxymethyl radical, or for the group --CH.sub.2 O.CO.OR.sup.6, wherein R.sup.6 stands for a defined radical or R.sup.2 and R.sup.3 are joined together to form the group --O.CO.OCH.sub.2 --; R.sup.4 stands for a hydroxy radical; R.sup.5 stands for a formyl radical, a hydroxyalkyl radical --(CH.sub.2).sub.1-3 OH, a radical --CHR.sup.7 OH, wherein R.sup.7 stands for a defined radical, or R.sup.5 stands for an azidomethyl or pyrrolidinylcarbonyloxymethyl radical, or for the group --CH.sub.2 O.CO.OR.sup.8, wherein R.sup.8 stands for a defined radical, or R.sup.5 stands for the group --CH.sub.2 O.CO.(CH.sub.2).sub.m.CR.sup.11 R.sup.12.(CH.sub.2).sub.n.NR.sup.9 R.sup.10, wherein m, n, R.sup.9, R.sup.10, R.sup.11 and R.sup.12 have defined values, or R.sup.5 stands for the group --CH.sub.2 O.SO.sub.2.R.sup.13, wherein R.sup.13 stands for a defined radical; or R.sup.4 and R.sup.5 are joined together to form the group --O.CH.sub.2 -- or --O.CO.OCH.sub.2 --; and, where appropriate, pharmaceutically-acceptable salts thereof. Processes for the preparation of said aphidicolane derivatives. Pharmaceutical compositions comprising one of the compounds and a pharmaceutical diluent or carrier. The compounds exhibit inhibitory activity against DNA-containing viruses and they inhibit the growth of some tumors.
摘要:
Disclosed is, for example, bis(2,5-dimethyl-3-(2-hydroxy-5-ethylbenzyl)-4-hydroxyphenyl)methane and quinonediazide ester thereof. These are used for positive photoresist compositions. According to the invention, positive photoresist compositions having a high definition, a high sensitivity and a large exposure margin can be provided.