Abstract:
A semiconductor integrated circuit device includes a die pad and a semiconductor chip mounted over the die pad, having a main surface with surface electrodes and a back surface. Suspension leads support the die pad, and leads are arranged around the semiconductor chip, each of the leads having inner and outer lead portions. A first plating layer is formed at a part of the inner lead portions and a second plating layer is formed over the outer lead portion. Wires electrically connect the surface electrodes with the inner lead portions through the first plating layer. A resin body seals the die pad, the chip, the wires and the inner lead portions. The second plating layer is comprised of different materials than the first plating layer, and is a Pb-free metal layer.
Abstract:
Arrangements are provided to effectively prevent wire disconnection generated due to an increase of heat applied to a semiconductor integrated circuit device The semiconductor integrated circuit device is structured such that a metal layer containing a Pd layer is provided in a portion to which a connecting member having a conductivity is connected, and an alloy layer having a melting point higher than that of an Sn—Pb eutectic solder and containing no Pb as a main composing metal is provided outside a portion molded by a resin. Further, a metal layer in which a thickness in a portion to which the connecting member having the conductivity is adhered is equal to or more than 10 μm is provided in the connecting member.
Abstract:
Arrangements are provided to effectively prevent wire disconnection generated due to an increase of heat applied to a semiconductor integrated circuit device. The semiconductor integrated circuit device is structured such that a metal layer containing a Pd layer is provided in a portion to which a connecting member having a conductivity is connected, and an alloy layer having a melting point higher than that of an Sn—Pb eutectic solder and containing no Pb as a main composing metal is provided outside a portion molded by a resin. Further, a metal layer in which a thickness in a portion to which the connecting member having the conductivity is adhered is equal to or more than 10 μm is provided in the connecting member.
Abstract:
A semiconductor integrated circuit device is provided which includes a wire having a diameter equal to or less than 30 nullm, and a connected member molded by a resin. The connected member includes a metal layer including a palladium layer provided at a portion to which said wire is connected. A solder containing Pb as a main composition metal is provided at a portion outside a portion molded by the resin.
Abstract:
Arrangements are provided to effectively prevent wire disconnection generated due to an increase of heat applied to a semiconductor integrated circuit device The semiconductor integrated circuit device is structured such that a metal layer containing a Pd layer is provided in a portion to which a connecting member having a conductivity is connected, and an alloy layer having a melting point higher than that of an SnnullPb eutectic solder and containing no Pb as a main composing metal is provided outside a portion molded by a resin. Further, a metal layer in which a thickness in a portion to which the connecting member having the conductivity is adhered is equal to or more than 10 nullm is provided in the connecting member.
Abstract:
A bond pad sealing arrangement and method that utilizes ball bonds to protect a bond pad is described. A relatively large free air ball is formed at a distal end of a bonding wire used for ball bonding. The free air ball is pressed against a bond pad and ultrasonically welded to form a ball bond. The bonding parameters utilized during the ball bonding are selected such that excess ball material passes is squashed outward beyond the capillary tip and overflows the periphery of the bond pad thereby completely covering and sealing the bond pad. The described structure works well to protect aluminum and other bond pads that are subject to corrosion if left exposed. In one preferred arrangement the capillary used to form the ball bond includes a cavity arrangement that molds a central portion of the ball bond to form a good intermetallic bond between the bond pad and the bonding wire.
Abstract:
A method, which is for forming accurate low wire loop shapes or short wire loop shapes which are stable and which have a high shape retention force in devices in which height differences between first and second bonding points are small and the wiring distance is short, including the steps of bonding a ball formed at the end of the wire extending out of the capillary to the first bonding point, raising the capillary while delivering the wire, moving the capillary toward the second bonding point, and then raising the capillary diagonally upward.
Abstract:
A multifaceted capillary that can be used in a wire-bonding machine to create a multi-segment wire-bond is disclosed. The multifaceted capillary is shaped to apply added pressure and thickness to an outer segment of the multi-segment wire-bond that is closest to the wire loop. The added pressure eliminates a gap under a heel portion of the multi-segment wire-bond and the added thickness increases a mechanical strength of the heel portion. As a result, a pull test of the multi-segment wire-bond may be higher than a single-segment wire-bond and the multi-segment wire-bond may resist cracking, lifting, or breaking.
Abstract:
A semiconductor device according to the present invention includes a semiconductor chip, an electrode pad made of a metal material containing aluminum and formed on a top surface of the semiconductor chip, an electrode lead disposed at a periphery of the semiconductor chip, a bonding wire having a linearly-extending main body portion and having a pad bond portion and a lead bond portion formed at respective ends of the main body portion and respectively bonded to the electrode pad and the electrode lead, and a resin package sealing the semiconductor chip, the electrode lead, and the bonding wire, the bonding wire is made of copper, and the entire electrode pad and the entire pad bond portion are integrally covered by a water-impermeable film.
Abstract:
In order to inhibit a crack under a pad opening without increasing a chip size, a protective film (6) includes a pad opening (9) that exposes a part of a topmost layer metal film (3). The pad opening (9) is rectangular and square, and has an opening width of d0. A second metal film (2) has an opening under the pad opening (9). The opening is rectangular and square, and has an opening width of d4. A distance between an opening edge of the protective film (6) and an opening edge of the second metal film (2) is d3. The second metal film (2) has a rectangular donut shape, and protrudes to an inner side of the pad opening (9) by the distance d3.