公开(公告)号：US20240124809A1

公开(公告)日：2024-04-18

申请号：US17937513

申请日：2022-10-03

申请人： The Goodyear Tire & Rubber Company

发明人： Kelsey Elizabeth Noyes ,  Margaret Flook Vielhaber

IPC分类号： C11D11/00 ,  C08F2/00 ,  C08F36/06 ,  C11D7/26 ,  C11D7/32

CPC分类号： C11D11/0041 ,  C08F2/008 ,  C08F36/06 ,  C11D7/261 ,  C11D7/263 ,  C11D7/3218

摘要： A process of cleaning a reactor includes providing an alcohol-containing material to the reactor; and providing a metathesis catalyst to the reactor. The reactor contains a high molecular weight polymer gel and an organoaluminum material. The alcohol-containing material is not an alkyl tartrate and may be selected from triisopropanolamine, 4-tert-butylcatechol, isopropanol, and phenol formaldehyde resins.

公开(公告)号：US11905491B2

公开(公告)日：2024-02-20

申请号：US17492257

申请日：2021-10-01

申请人： Entegris, Inc.

发明人： Daniela White ,  YoungMin Kim ,  Michael L. White

IPC分类号： C11D3/30 ,  C11D11/00 ,  C11D7/32 ,  C11D7/26 ,  H01L21/02 ,  C11D7/34 ,  C11D7/50

CPC分类号： C11D11/0047 ,  C11D7/263 ,  C11D7/265 ,  C11D7/267 ,  C11D7/3218 ,  C11D7/3281 ,  C11D7/34 ,  C11D7/5022 ,  H01L21/02065

摘要： In general, the invention provides high pH cleaning compositions for dielectric surfaces such as PETEOS, SiO2, thermal oxide, silicon nitride, silicon, etc. The compositions of the invention afford superior surface wetting, dispersion of particles and organic residues, and prevents redeposition and re-agglomeration of the dispersed residue during cleaning to afford superior cleaning and low defectivity.

公开(公告)号：US11899369B2

公开(公告)日：2024-02-13

申请号：US17738699

申请日：2022-05-06

申请人： FUJIFILM Corporation

发明人： Tomonori Takahashi ,  Tetsuya Kamimura

IPC分类号： G03F7/42 ,  C11D11/00 ,  C11D7/50 ,  C11D7/32 ,  C11D7/26 ,  C11D7/34 ,  H01L21/02 ,  C11D3/00 ,  C11D7/04 ,  C11D7/20

CPC分类号： G03F7/425 ,  C11D3/0073 ,  C11D7/04 ,  C11D7/20 ,  C11D7/261 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3227 ,  C11D7/3281 ,  C11D7/34 ,  C11D7/5004 ,  C11D7/5009 ,  C11D7/5022 ,  C11D11/0047 ,  G03F7/423 ,  G03F7/426 ,  H01L21/02063 ,  H01L21/02068

摘要： A treatment liquid for a semiconductor device includes an alkanolamine; a hydroxylamine; an organic solvent; Ca; Fe; and Na, wherein the content of the alkanolamine in the treatment liquid is 0.1% to 5% by mass, the content of the hydroxylamine in the treatment liquid is 0.1% to 30% by mass, and each of the mass ratio of Ca, Fe, and Na with respect to the content of the alkanolamine and the hydroxylamine in the treatment liquid is 10−12 to 10−4.

公开(公告)号：US20230212485A1

公开(公告)日：2023-07-06

申请号：US18158544

申请日：2023-01-24

申请人： FUJIFILM Corporation

发明人： Yasuo SUGISHIMA ,  Atsushi MIZUTANI

IPC分类号： C11D7/50 ,  C11D11/00 ,  C11D7/24 ,  C11D7/26 ,  C11D7/32 ,  H01L21/02

CPC分类号： C11D7/5022 ,  C11D7/244 ,  C11D7/261 ,  C11D7/267 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047 ,  H01L21/02057

摘要： An object of the present invention is to provide a treatment liquid for a semiconductor device, which is excellent in removal performance for residues present on a substrate, and to provide a substrate washing method using the treatment liquid.
The treatment liquid of the present invention is a treatment liquid for a semiconductor device, which includes water, a basic compound, hexylene glycol, and a compound A that is at least one kind selected from the group consisting of isobutene, (E)-2-methyl-1,3-pentadiene, 4-methyl-1,3-pentadiene, 2,2,4-trimethyloxetane, 4-methyl-3-penten-2-ol, and 2,4,4,6-tetramethyl-1,3-dioxane.

公开(公告)号：US20190198315A1

公开(公告)日：2019-06-27

申请号：US16265709

申请日：2019-02-01

申请人： Samsung Electronics Co., Ltd. ,  Soulbrain Co., Ltd.

发明人： Hoyoung KIM ,  Hyo-Sun LEE ,  Soojin KIM ,  Keonyoung KIM ,  JINHYE BAE ,  HOON HAN ,  Tae Soo KWON ,  Jung Hun LIM

IPC分类号： H01L21/02 ,  C11D7/08 ,  C11D7/26 ,  C11D7/32 ,  H01L21/683 ,  H01L23/00 ,  C11D11/00

CPC分类号： H01L21/02068 ,  C11D7/08 ,  C11D7/261 ,  C11D7/264 ,  C11D7/266 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/304 ,  H01L21/30604 ,  H01L21/30625 ,  H01L21/6835 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/81 ,  H01L2221/68327 ,  H01L2221/68381 ,  H01L2224/03002 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/06181 ,  H01L2224/1181 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2224/81193 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06565 ,  H01L2924/10252 ,  H01L2924/10253 ,  H01L2924/15311 ,  H01L2924/3512 ,  H01L2924/37001 ,  H01L2224/11 ,  H01L2224/03

摘要： Embodiments of the inventive concepts provide a method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer. The method includes preparing a semiconductor substrate to which an adhesive layer adheres, removing the adhesive layer from the semiconductor substrate, and applying a cleaning composition to the semiconductor substrate to remove a residue of the adhesive layer. The cleaning composition includes a solvent including a ketone compound and having a content that is equal to or greater than 40 wt % and less thaadminn 90 wt %, quaternary ammonium salt, and primary amine.

公开(公告)号：US20180239256A1

公开(公告)日：2018-08-23

申请号：US15751967

申请日：2016-08-10

申请人： LTC Co., Ltd.

发明人： Ho-Sung Choi ,  Kwang-Hyun Ryu ,  Jong-Il Bae ,  Jong-Soon Lee ,  Sang-Ku Ha ,  Hye-Sung Yang ,  Mi-Yeon Han ,  Hyo-Jin Lee

IPC分类号： G03F7/42 ,  G03F7/32 ,  C11D3/20 ,  H01L21/027 ,  H01L21/311 ,  H01L27/12

CPC分类号： G03F7/425 ,  C11D3/0073 ,  C11D3/2068 ,  C11D7/261 ,  C11D7/3218 ,  C11D7/5004 ,  C11D11/0047 ,  G03F7/32 ,  G03F7/426 ,  H01L21/0273 ,  H01L21/311 ,  H01L21/31133 ,  H01L27/124

摘要： The present disclosure relates to a photoresist stripper composition for manufacturing an LCD, and relates to an integrated photoresist stripper composition capable of being used in all processes for manufacturing a TFT-LCD. More specifically, the present disclosure relates to an aqueous photoresist stripper composition capable of being used in all of transition metal, potential metal and oxide semiconductor wires. The aqueous photoresist stripper composition includes (a) a potential metal and metal oxide corrosion inhibitor, (b) a transition metal corrosion inhibitor, (c) a primary alkanolamine, (d) a cyclic alcohol, (e) water, (f) an aprotic polar organic solvent, and (g) a protic polar organic solvent, and has an excellent ability to remove a degenerated photoresist produced after progressing a hard baked process, an implant process and a dry etch process in a semiconductor or flat display panel process, may be used in aluminum that is a potential metal, copper or silver that is a transition metal, and metal oxide wires at the same time, and may be introduced to organic film and COA processes.

公开(公告)号：US20180187133A1

公开(公告)日：2018-07-05

申请号：US15855362

申请日：2017-12-27

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Takumi Namiki ,  Takayuki Haraguchi ,  Yu-Geng Wu

IPC分类号： C11D7/32 ,  C11D7/26 ,  C11D11/00 ,  H01L21/02

CPC分类号： C11D7/3218 ,  C11D7/06 ,  C11D7/261 ,  C11D7/3209 ,  C11D7/5013 ,  C11D11/0041 ,  C11D11/0047 ,  H01L21/02068

摘要： A cleaning liquid having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), and a basic compound other than the alkanol hydroxyamine. In the formula, Ra1 and Ra2 each independently represents a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, and Ra1 and Ra2 are not simultaneously a hydrogen atom.

公开(公告)号：US10005991B2

公开(公告)日：2018-06-26

申请号：US15028573

申请日：2014-10-09

申请人： E. I. DU PONT DE NEMOURS AND COMPANY ,  EKC TECHNOLOGY INC

发明人： Hua Cui

IPC分类号： C11D7/32 ,  C11D11/00 ,  G03F7/42 ,  H01L21/02 ,  H01L21/3213 ,  C23F1/18 ,  C23F1/26 ,  C23F1/28 ,  C23F1/34 ,  C23F1/38 ,  C23F1/40 ,  C11D3/39 ,  C11D7/26 ,  B08B3/08 ,  C11D7/04 ,  B08B3/10 ,  C11D3/20 ,  H01L21/768 ,  H01L21/311

CPC分类号： C11D11/0047 ,  B08B3/08 ,  B08B3/10 ,  C11D3/2082 ,  C11D3/3942 ,  C11D3/3947 ,  C11D7/04 ,  C11D7/265 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3245 ,  C11D7/3281 ,  C23F1/18 ,  C23F1/26 ,  C23F1/28 ,  C23F1/34 ,  C23F1/38 ,  C23F1/40 ,  G03F7/423 ,  G03F7/425 ,  G03F7/426 ,  H01L21/02057 ,  H01L21/02063 ,  H01L21/31111 ,  H01L21/31144 ,  H01L21/32134 ,  H01L21/76807 ,  H01L21/76814

摘要： The present disclosure relates to a method for removing a hard mask consisting essentially of TiN, TaN, TiNxOy, TiW, W, Ti and alloys of Ti and W from a semiconductor substrate. The method comprising contacting the semiconductor substrate with a removal composition. The removal composition comprises 0.1 wt % to 90 wt % of an oxidizing agent; 0.0001 wt % to 50 wt % of a carboxylate; and the balance up to 100 wt % of the removal composition comprising deionized water.

公开(公告)号：US20170306266A1

公开(公告)日：2017-10-26

申请号：US15493819

申请日：2017-04-21

申请人： Ecolab USA Inc.

发明人： Robert J. Ryther ,  Walter D. Cummings

IPC分类号： C11D3/00 ,  C11D3/30 ,  C11D3/10 ,  C11D3/08 ,  C11D3/06 ,  C11D7/34 ,  C11D3/04

CPC分类号： C11D3/0005 ,  C11D3/044 ,  C11D3/06 ,  C11D3/08 ,  C11D3/10 ,  C11D3/30 ,  C11D3/33 ,  C11D3/3409 ,  C11D3/3757 ,  C11D7/06 ,  C11D7/12 ,  C11D7/14 ,  C11D7/16 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3245 ,  C11D7/34

摘要： The present disclosure relates to high alkaline cleaners, cleaning systems and methods for removing polymerized zero trans fat soils. The high alkaline cleaner of the present invention generally includes one or more alkaline wetting and saponifying agent(s), a chelating/sequestering system and a surface modifying-threshold agent system. In various embodiments, the cleaners may include, at least one cleaning agent comprising a surfactant or surfactant system and/or a solvent or solvent system and/or a cleaning booster such as a peroxide or sulfite type additive. The cleaners may also include one or more components to modify the composition form and/or the application method in some embodiments. All components described above may also be optimized optionally, to provide emulsification of a composition (both as a usable product or a concentrate that can be diluted to form a usable product). The use of the high alkaline cleaner of the present invention has demonstrated enhanced cleaning characteristics especially at higher temperatures (100° F. to about 300° F.) but also shows enhanced cleaning at ambient temperatures.

公开(公告)号：US09790456B2

公开(公告)日：2017-10-17

申请号：US13787890

申请日：2013-03-07

申请人： ECOLAB USA INC.

发明人： Dale Curtis Larson, III ,  Mark Dennis Levitt

IPC分类号： C11D1/66 ,  C11D3/20 ,  C11D3/30 ,  C11D7/32 ,  C11D7/26 ,  C11D3/04 ,  C11D11/00 ,  C11D1/00

CPC分类号： C11D7/3218 ,  C11D1/00 ,  C11D1/66 ,  C11D3/042 ,  C11D3/044 ,  C11D3/046 ,  C11D3/2086 ,  C11D3/30 ,  C11D7/265 ,  C11D11/0023

摘要： A hard surface cleaning composition, namely a bathroom cleaning composition, using fully neutralized ethanolamine citrate salts is disclosed. The cleaning composition is unexpectedly safe to use, environmentally-friendly and efficacious for removal of soap scum and water hardness stains at mildly acidic and/or alkaline pHs. Methods of using the same are disclosed.