公开(公告)号：US20240076586A1

公开(公告)日：2024-03-07

申请号：US18459859

申请日：2023-09-01

Applicant: Hangzhou Joinleader New Materials Co., Ltd.

Inventor： Cheng FU ,  Shengyu GE ,  Huijun GUO ,  Liang ZHAO

IPC: C11D7/50 ,  C11D7/24 ,  C11D7/26 ,  C11D7/34 ,  C11D11/00

CPC classification number: C11D7/5009 ,  C11D7/24 ,  C11D7/263 ,  C11D7/34 ,  C11D7/5027 ,  C11D11/0029 ,  C11D11/0035

Abstract: The present disclosure provides a formula of a remover reagent for a cured silicone sealant and a method using the same. The remover reagent is prepared from an acid catalyst and a solvent each having a high boiling point and a high flash point. The acid catalyst is benzenesulfonic acid or alkylbenzenesulfonic acid. The solvent is mineral oil and/or silicone oil. The cured silicone sealant is first soaked with the remover reagent for 30 to 120 min, and then baked at a high temperature of 80 to 120° C. for 10 min or above into debris or powder, whereby the cured silicone sealant with a thickness of 10 mm or above can be removed. Moreover, the remover reagent has the advantages of readily available raw materials, high safety, environmentally friendliness, convenient preparation and good sealant removal effect, and thus, has good application prospects.

公开(公告)号：US09932255B2

公开(公告)日：2018-04-03

申请号：US15196779

申请日：2016-06-29

Applicant: Ecolab USA Inc.

Inventor： John E. Hoots ,  Edward Maharajh ,  Anthony G. Sommese ,  Timothy S. Keizer

IPC: C11D9/24 ,  C11D3/18 ,  C11D3/43 ,  C02F5/14 ,  C02F5/10 ,  C11D7/26 ,  C11D7/50 ,  C11D11/00 ,  C11D3/37 ,  C02F101/10 ,  C02F103/10

CPC classification number: C02F5/14 ,  C02F5/10 ,  C02F2101/10 ,  C02F2103/10 ,  C02F2303/10 ,  C11D3/3703 ,  C11D3/3707 ,  C11D7/263 ,  C11D7/5027 ,  C11D11/0041 ,  Y02W10/30

Abstract: The present invention generally relates to methods for removing an organic deposit or for inhibiting deposition of deposit-forming comprising contacting a cleaning composition or an anti-coking composition with a surface. The surface can have an organic deposit or be susceptible to forming an organic deposit and the surface can be in contact with a liquid containing organics. The liquid can be produced from a thermal recovery system, and the surface can be an internal surface of a piece of steam-generating or vapor-generating equipment.

公开(公告)号：US20170216471A1

公开(公告)日：2017-08-03

申请号：US15485525

申请日：2017-04-12

Applicant: American Sterilizer Company

Inventor： Phillip P. Franciskovich ,  Donald G. Rosenhamer ,  Kathleen A. Fix

IPC: A61L2/18 ,  C11D1/72 ,  C11D1/75 ,  C11D1/66 ,  C11D3/00 ,  A61B1/005 ,  C11D3/386 ,  C11D3/20 ,  A01N59/00 ,  B08B3/08 ,  A61B1/12 ,  C11D3/48 ,  C11D3/30

CPC classification number: A61L2/18 ,  A01N37/02 ,  A01N37/16 ,  A01N59/00 ,  A01N59/02 ,  A61B1/005 ,  A61B1/125 ,  A61L2/186 ,  A61L2202/17 ,  A61L2202/24 ,  B08B3/08 ,  C11D1/66 ,  C11D1/662 ,  C11D1/72 ,  C11D1/722 ,  C11D1/75 ,  C11D1/88 ,  C11D1/90 ,  C11D3/0073 ,  C11D3/046 ,  C11D3/2068 ,  C11D3/2075 ,  C11D3/2082 ,  C11D3/2086 ,  C11D3/225 ,  C11D3/28 ,  C11D3/30 ,  C11D3/33 ,  C11D3/361 ,  C11D3/364 ,  C11D3/365 ,  C11D3/3707 ,  C11D3/38618 ,  C11D3/38627 ,  C11D3/38636 ,  C11D3/3947 ,  C11D3/48 ,  C11D7/10 ,  C11D7/263 ,  C11D7/265 ,  C11D7/3218 ,  C11D7/3245 ,  C11D7/3281 ,  C11D7/36 ,  C11D11/0041

Abstract: The disclosed invention relates to a two-part liquid composition for cleaning and disinfecting a substrate, comprising: (A) a disinfectant medium comprising peracetic acid; and (B) a supplemental medium comprising a non-enzymatic cleaner, a corrosion inhibitor, and a chelator. The supplemental medium (B) may further comprise an enzymatic cleaner, a surfactant, a buffer, a pH modifier, or a mixture of two or more thereof. The substrate may be a medical device, for example, an endoscope.

公开(公告)号：US20170001894A1

公开(公告)日：2017-01-05

申请号：US15196779

申请日：2016-06-29

Applicant: Ecolab USA Inc.

Inventor： John E. Hoots ,  Edward Maharajh ,  Anthony G. Sommese ,  Timothy S. Keizer

IPC: C02F5/14 ,  C11D11/00 ,  C11D7/50 ,  C02F5/10 ,  C11D7/26

CPC classification number: C02F5/14 ,  C02F5/10 ,  C02F2101/10 ,  C02F2103/10 ,  C02F2303/10 ,  C11D3/3703 ,  C11D3/3707 ,  C11D7/263 ,  C11D7/5027 ,  C11D11/0041 ,  Y02W10/30

Abstract: The present invention generally relates to methods for removing an organic deposit or for inhibiting deposition of deposit-forming comprising contacting a cleaning composition or an anti-coking composition with a surface. The surface can have an organic deposit or be susceptible to forming an organic deposit and the surface can be in contact with a liquid containing organics. The liquid can be produced from a thermal recovery system, and the surface can be an internal surface of a piece of steam-generating or vapor-generating equipment.

Abstract translation: 本发明一般涉及去除有机沉积物或抑制沉积物形成沉积的方法，包括使清洁组合物或抗焦化组合物与表面接触。 表面可以具有有机沉积物或易于形成有机沉积物，并且表面可以与含有液体的物质接触。 液体可以由热回收系统生产，并且表面可以是一片蒸汽发生或蒸汽发生设备的内表面。

公开(公告)号：US09328320B2

公开(公告)日：2016-05-03

申请号：US14783276

申请日：2014-04-15

Applicant: AGFA GRAPHICS NV

Inventor： Raphael Voets ,  Jaymes Van Luppen ,  Eric Hoes ,  Johan Loccufier

IPC: B41J2/165 ,  C11D7/50 ,  C11D7/04 ,  C09D9/00 ,  C09D103/08 ,  C09D11/54

CPC classification number: C11D7/5022 ,  B41J2/16552 ,  B41J11/002 ,  B41J2002/16558 ,  C09D9/005 ,  C09D11/54 ,  C09D103/08 ,  C11D7/04 ,  C11D7/263 ,  C11D7/266 ,  C11D11/0041

Abstract: A maintenance liquid for inkjet printers includes at least 50 wt % of at least one ether solvent according to Formula (I) or (II) with the wt % based on the total weight of the maintenance liquid: R1(CO)x(OR2)yOR3  Formula (I), and R4CO(OR5)zOCOR6  Formula (II), wherein R1, R4 and R6 independently represent an alkyl group having 1 to 4 carbon atoms; R2 rand R5 independently represent an ethylene group or a propylene group; R3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; x represents an integer of 0 or 1; y and z independently represent an integer of 1 to 4; and wherein the maintenance liquid contains no more than 25 ppm of peroxide expressed as hydrogen peroxide.

Abstract translation: 用于喷墨打印机的维护液体包含至少50重量％的至少一种根据式（I）或（II）的醚溶剂，其重量％基于维护液的总重量：R1（CO）x（OR2） YOR 3式（I）和R 4 CO（OR 5）zOCOR 6式（II）其中R 1，R 4和R 6独立地表示具有1至4个碳原子的烷基; R2 rand R5独立地表示亚乙基或亚丙基; R3表示氢原子或碳原子数1〜4的烷基。 x表示0或1的整数; y和z独立地表示1〜4的整数。 并且其中维持液含有不超过25ppm的过氧化氢表示的过氧化物。

公开(公告)号：US20160068790A1

公开(公告)日：2016-03-10

申请号：US14783276

申请日：2014-04-15

Applicant: AGFA GRAPHICS NV

Inventor： Raphaël VOETS ,  Jaymes VAN LUPPEN ,  Eric HOES ,  Johan LOCCUFIER

IPC: C11D7/50 ,  C11D7/04 ,  B41J2/165

CPC classification number: C11D7/5022 ,  B41J2/16552 ,  B41J11/002 ,  B41J2002/16558 ,  C09D9/005 ,  C09D11/54 ,  C09D103/08 ,  C11D7/04 ,  C11D7/263 ,  C11D7/266 ,  C11D11/0041

Abstract: A maintenance liquid for inkjet printers includes at least 50 wt % of at least one ether solvent according to Formula (I) or (II) with the wt % based on the total weight of the maintenance liquid: R1(CO)x(OR2)yOR3   Formula (I), and R4CO(OR5)zOCOR6   Formula (II), wherein R1, R4 and R6 independently represent an alkyl group having 1 to 4 carbon atoms; R2 rand R5 independently represent an ethylene group or a propylene group; R3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; x represents an integer of 0 or 1; y and z independently represent an integer of 1 to 4; and wherein the maintenance liquid contains no more than 25 ppm of peroxide expressed as hydrogen peroxide.

Abstract translation: 用于喷墨打印机的维护液体包含至少50重量％的至少一种根据式（I）或（II）的醚溶剂，其重量％基于维护液体的总重量：R1（CO）x（OR2） YOR 3式（I）和R 4 CO（OR 5）zOCOR 6式（II）其中R 1，R 4和R 6独立地表示具有1至4个碳原子的烷基; R2 rand R5独立地表示亚乙基或亚丙基; R3表示氢原子或碳原子数1〜4的烷基。 x表示0或1的整数; y和z独立地表示1〜4的整数。 并且其中维持液含有不超过25ppm的过氧化氢表示的过氧化物。

公开(公告)号：US09165760B2

公开(公告)日：2015-10-20

申请号：US14054833

申请日：2013-10-16

Applicant: UWIZ Technology Co., Ltd.

Inventor： Yu-Chi Fu ,  Wen-Tsai Tsai ,  Ming-Hui Lu ,  Song-Yuan Chang

IPC: H01L21/02 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  C11D11/00

CPC classification number: H01L21/02082 ,  C11D7/263 ,  C11D7/3209 ,  C11D7/3245 ,  C11D7/5022 ,  C11D11/0047 ,  H01L21/02074

Abstract: A cleaning composition is provided. The cleaning composition includes at least one polyamino-polycarboxylic acid or at least one salt thereof, at least one solvent, at least one substituted or non-substituted phenethylamine and water. The solvent is selected from a group consisting of glycols.

Abstract translation: 提供清洁组合物。 清洁组合物包括至少一种聚氨基多羧酸或其至少一种盐，至少一种溶剂，至少一种取代或未取代的苯乙胺和水。 溶剂选自二醇类。

公开(公告)号：US09034108B2

公开(公告)日：2015-05-19

申请号：US12736446

申请日：2009-02-27

Applicant: Konrad Geissler ,  Marius Kuemin

Inventor： Konrad Geissler ,  Marius Kuemin

IPC: B08B3/08 ,  B08B3/14 ,  C11D7/26 ,  C11D7/50 ,  D06F43/00 ,  D06L1/02 ,  D06L1/10

CPC classification number: B08B3/08 ,  B08B3/14 ,  C11D7/263 ,  C11D7/5022 ,  D06F43/007 ,  D06L1/02 ,  D06L1/10

Abstract: Embodiments of the present disclosure include cleaning processes, closed loop cleaning machines, and methods of cleaning an article. The cleaning process includes contacting a surface of an article with a cleaning composition in a cleaning chamber, where the cleaning composition includes at least about 85 percent by weight organic solvents, based on total weight of the cleaning composition, and where at least about 5 percent by weight of the organic solvents is propylene glycol, based on total weight of the organic solvents, to clean the surface of the article, collecting the cleaning composition including contaminants, and recovering the cleaning composition via distillation, where a distillation apparatus removes the contaminants from the cleaning composition and is connected to the cleaning chamber by a process stream.

Abstract translation: 本公开的实施例包括清洁过程，闭环清洁机器和清洁制品的方法。 清洁过程包括将制品的表面与清洁组合物接触，其中清洁组合物基于清洁组合物的总重量包含至少约85重量％的有机溶剂，并且其中至少约5重量％ 的有机溶剂是基于有机溶剂的总重量的丙二醇，以清洁制品的表面，收集包括污染物的清洁组合物，并通过蒸馏回收清洁组合物，其中蒸馏装置将污染物从 清洁组合物并通过工艺流连接到清洁室。

公开(公告)号：US20150094248A1

公开(公告)日：2015-04-02

申请号：US14558071

申请日：2014-12-02

Applicant: ENTEGRIS, INC.

Inventor： Melissa K. RATH ,  David D. BERNHARD ,  Thomas H. BAUM ,  David W. MINSEK

IPC: C11D11/00 ,  C11D7/28 ,  C11D7/34 ,  C11D7/10 ,  C11D7/08 ,  C11D7/26

CPC classification number: C11D11/0047 ,  C11D7/08 ,  C11D7/10 ,  C11D7/261 ,  C11D7/263 ,  C11D7/265 ,  C11D7/28 ,  C11D7/34 ,  C11D7/50 ,  G03F7/423

Abstract: A liquid removal composition and process for removing sacrificial anti-reflective coating (SARC) material from a substrate having same thereon. The liquid removal composition includes at least one fluoride-containing compound, at least one organic solvent, optionally water, and optionally at least one chelating agent. The composition achieves at least partial removal of SARC material in the manufacture of integrated circuitry with minimal etching of metal species on the substrate, such as aluminum, copper and cobalt alloys, and without damage to low-k dielectric materials employed in the semiconductor architecture.

Abstract translation: 一种液体去除组合物和从其上具有其的基材去除牺牲抗反射涂层（SARC）材料的方法。 液体去除组合物包括至少一种含氟化物的化合物，至少一种有机溶剂，任选的水和任选的至少一种螯合剂。 该组合物在集成电路的制造中至少部分去除SARC材料，同时对基板上的金属物质（例如铝，铜和钴合金）进行最小蚀刻，并且不损坏在半导体结构中使用的低k电介质材料。

公开(公告)号：US08901056B2

公开(公告)日：2014-12-02

申请号：US13484694

申请日：2012-05-31

Applicant: Gregory G. Griese ,  Mark D. Levitt ,  Carter M. Silvernail

Inventor： Gregory G. Griese ,  Mark D. Levitt ,  Carter M. Silvernail

IPC: C11D3/44 ,  C09D11/328 ,  C11D7/50 ,  C11D3/20 ,  C11D7/26 ,  C09D7/00 ,  C11D3/43 ,  C09D11/326 ,  A01N25/02

CPC classification number: C11D3/43 ,  A01N25/02 ,  C09D7/20 ,  C09D11/326 ,  C09D11/328 ,  C11D3/2068 ,  C11D7/263 ,  C11D7/5022

Abstract: A solvent or composition that includes a glycerin short-chain aliphatic ether may be used in a method for coupling, coalescing or adjusting viscosity of a composition.

Abstract translation: 包含甘油短链脂族醚的溶剂或组合物可用于偶联，聚结或调节组合物粘度的方法。