公开(公告)号：US20240352385A1

公开(公告)日：2024-10-24

申请号：US18762456

申请日：2024-07-02

申请人： NuGeneration Technologies, LLC dba NuGenTec

发明人： Donato Polignone ,  Stephen Utschig-Samuels

IPC分类号： C11D7/50 ,  B08B3/08 ,  C09D9/00 ,  C11D17/00

CPC分类号： C11D7/5031 ,  B08B3/08 ,  C09D9/005 ,  C11D7/5009 ,  C11D7/5022 ,  C11D17/0043 ,  C11D2111/22

摘要： A solvent composition has an oxygenated solvent and a siloxane solvent. In one embodiment, the oxygenated solvent is propylene glycol methyl ether and the siloxane solvent is hexamethyldisiloxane or octamethyltrisiloxane. In another embodiment, the solvent composition is an azeotrope of propylene glycol n-butyl ether and decamethyltetrasiloxane. The siloxane solvent can be used in any situation where one desires to remove a silicone deposit, e.g., conformal coatings, adhesives, sealants, greases, heat transfer fluids, paints, oils, etc.

公开(公告)号：US11891592B2

公开(公告)日：2024-02-06

申请号：US17812969

申请日：2022-07-15

申请人： NuGeneration Technologies, LLC

发明人： Donato Polignone ,  Stephen Utschig-Samuels

IPC分类号： C11D9/36 ,  C11D7/50 ,  B08B3/08 ,  C11D17/00 ,  C09D9/00 ,  C11D11/00

CPC分类号： C11D7/5031 ,  B08B3/08 ,  C09D9/005 ,  C11D7/5009 ,  C11D7/5022 ,  C11D11/0047 ,  C11D17/0043

摘要： A solvent composition has an oxygenated solvent and a siloxane solvent. In one embodiment, the oxygenated solvent is propylene glycol methyl ether and the siloxane solvent is hexamethyldisiloxane or octamethyltrisiloxane. In another embodiment, the solvent composition is an azeotrope of propylene glycol n-butyl ether and decamethyltetrasiloxane. The siloxane solvent can be used in any situation where one desires to remove a silicone deposit, e.g., conformal coatings, adhesives, sealants, greases, heat transfer fluids, paints, oils, etc.

公开(公告)号：US20230193161A1

公开(公告)日：2023-06-22

申请号：US18108122

申请日：2023-02-10

申请人： Central Glass Company, Limited

发明人： Kanako OSAFUNE ,  Masamune OKAMOTO ,  Kohei SUMIDA ,  Naoki NISHINAKA

IPC分类号： C11D3/24 ,  C11D17/00 ,  C11D7/50 ,  F03B17/00

CPC分类号： C11D3/245 ,  C11D17/0043 ,  C11D7/5009 ,  F03B17/005

摘要： An object is to provide a hydrofluoroolefin-based or hydrochlorofluoroolefin-based azeotropic or azeotropic-like composition. The azeotropic or azeotropic-like composition contains trans-1-chloro-3,3,3-trifluoropropene and 1-chloro-1,3,3,3-tetrafluoropropene. In the azeotropic or azeotropic-like composition, 1-chloro-1,3,3,3-tetrafluoropropene exists in an effective amount to form an azeotropic or azeotropic-like mixture with trans-1-chloro-3,3,3-trifluoropropene.

公开(公告)号：US09920280B2

公开(公告)日：2018-03-20

申请号：US15053477

申请日：2016-02-25

申请人： El Sayad Arafat

发明人： El Sayad Arafat

IPC分类号： C11D3/43 ,  C11D9/36 ,  C11D3/16

CPC分类号： C11D3/162 ,  C11D3/43 ,  C11D7/5009 ,  C23G5/032

摘要： This invention relates to non aqueous non-volatile alkylated siloxane compositions having low VOC and vapor pressure of about 31 millimeters of mercury at 20° C. consisting essentially of a mixture of a linear or open-chain methyl alkylated siloxane having two silicon atoms and a siloxane having three silicon atoms alkylated with methyl groups.

公开(公告)号：US20170322495A1

公开(公告)日：2017-11-09

申请号：US15393586

申请日：2016-12-29

申请人： UNIVERSITY-INDUSTRY FOUNDATION, YONSEI UNIVERSITY

发明人： Sang Woo LIM ,  Eun Seok OH

IPC分类号： G03F7/42 ,  H01L21/027 ,  B08B3/08

CPC分类号： G03F7/426 ,  C11D7/5009 ,  C11D7/5013 ,  C11D11/0047 ,  G03F7/422 ,  G03F7/423 ,  G03F7/425 ,  H01L21/31133

摘要： Provided are a composition for removing a photoresist and a method for removing a photoresist using the same. According to the method, a high-dose ion implanted photoresist may be effectively removed without damage such as etching or oxidation of a semiconductor substrate.

公开(公告)号：US20160339704A1

公开(公告)日：2016-11-24

申请号：US15137151

申请日：2016-04-25

申请人： CANON KABUSHIKI KAISHA

发明人： Kyosuke Nagaoka

IPC分类号： B41J2/16 ,  C11D7/50 ,  C11D7/10 ,  B08B3/08 ,  B08B3/10

CPC分类号： B41J2/1631 ,  B41J2/1603 ,  B41J2/1623 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645 ,  C11D7/08 ,  C11D7/10 ,  C11D7/5004 ,  C11D7/5009 ,  C11D7/5013 ,  C11D7/5022 ,  H01L21/02063

摘要： A method for manufacturing a liquid ejection head including a substrate having a terminal for electrical connection to an external device, an inorganic material layer on the substrate, and a flow path member disposed on the inorganic material layer and containing an organic material, and the manufacturing method includes a cleaning step of removing a silane coupling agent attached to the terminal by using a solution containing hydrogen fluoride, ammonium fluoride, and a water-soluble organic solvent.

摘要翻译： 一种液体喷射头的制造方法，其特征在于，具有：具有与外部装置电气连接的端子的基板，所述基板上的无机材料层以及设置在所述无机材料层上并含有有机材料的流路构件的基板， 方法包括通过使用含有氟化氢，氟化铵和水溶性有机溶剂的溶液除去附着于末端的硅烷偶联剂的清洗步骤。

公开(公告)号：US09158202B2

公开(公告)日：2015-10-13

申请号：US13834513

申请日：2013-03-15

申请人： Dynaloy, LLC

发明人： Richard Dalton Peters ,  Travis Acra ,  Yuanmei Cao ,  Spencer Erich Hochstetler ,  Michael Tod Phenis ,  Kimberly Dona Pollard

IPC分类号： G03F7/42 ,  C11D7/32 ,  C11D11/00

CPC分类号： G03F7/422 ,  C11D7/3218 ,  C11D7/3263 ,  C11D7/3281 ,  C11D7/5009 ,  C11D7/5013 ,  C11D11/0047 ,  G03F7/425

摘要： Compositions are described that are useful for removing organic and organometallic substances from substrates, for example, photoresist wafers. Processes are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added and the organic or organometallic substances are completely removed by rinsing. The compositions and processes may be suitable for removing and, in some instances, completely dissolving photoresists of the positive and negative varieties, and specifically negative dry film photoresist from electronic devices.

摘要翻译： 描述了可用于从基底例如光致抗蚀剂晶片去除有机和有机金属物质的组合物。 给出了将最小体积的组合物作为涂层施加到无机基底上的方法，从而加入足够的热量，并通过漂洗完全除去有机或有机金属物质。 组合物和方法可适用于从电子设备中去除和在一些情况下完全溶解正和负变种的光致抗蚀剂，特别是负的干膜光致抗蚀剂。

公开(公告)号：US20150044839A1

公开(公告)日：2015-02-12

申请号：US14381039

申请日：2013-03-18

申请人： BASF SE

发明人： Simon Braun ,  Christian Bittner ,  Andreas Klipp

IPC分类号： G03F7/42 ,  H01L29/161 ,  H01L29/16 ,  H01L21/02 ,  H01L21/265 ,  H01L21/266 ,  H01L21/027 ,  C11D7/50 ,  H01L29/66

CPC分类号： G03F7/426 ,  C11D7/5004 ,  C11D7/5009 ,  C11D7/5013 ,  C11D7/5022 ,  C11D11/0047 ,  G03F7/425 ,  H01L21/02057 ,  H01L21/0271 ,  H01L21/26513 ,  H01L21/266 ,  H01L21/31133 ,  H01L29/16 ,  H01L29/161 ,  H01L29/66477

摘要： A photoresist stripping and cleaning composition free from N-alkylpyrrolidones and added quaternary ammonium hydroxides comprising a component (A) which comprises the polar organic solvents N-methylimidazole, dimethylsulfoxide and 1-aminopropane-2-ol.

摘要翻译： 不含N-烷基吡咯烷酮的光致抗蚀剂剥离和清洁组合物和加入的季铵氢氧化物，其包含组分（A），其包含极性有机溶剂N-甲基咪唑，二甲基亚砜和1-氨基丙烷-2-醇。

公开(公告)号：US20140142017A1

公开(公告)日：2014-05-22

申请号：US13834513

申请日：2013-03-15

申请人： DYNALOY, LLC

发明人： Richard Dalton Peters ,  Travis Acra ,  Yuanmei Cao ,  Spencer Erich Hochstetler ,  Michael Tod Phenis ,  Kimberly Dona Pollard

IPC分类号： G03F7/42

CPC分类号： G03F7/422 ,  C11D7/3218 ,  C11D7/3263 ,  C11D7/3281 ,  C11D7/5009 ,  C11D7/5013 ,  C11D11/0047 ,  G03F7/425

摘要： Compositions are described that are useful for removing organic and organometallic substances from substrates, for example, photoresist wafers. Processes are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added and the organic or organometallic substances are completely removed by rinsing. The compositions and processes may be suitable for removing and, in some instances, completely dissolving photoresists of the positive and negative varieties, and specifically negative dry film photoresist from electronic devices.

摘要翻译： 描述了可用于从基底例如光致抗蚀剂晶片去除有机和有机金属物质的组合物。 给出了将最小体积的组合物作为涂层施加到无机基底上的方法，从而加入足够的热量，并通过漂洗完全除去有机或有机金属物质。 组合物和方法可适用于从电子设备中去除和在一些情况下完全溶解正和负变种的光致抗蚀剂，特别是负的干膜光致抗蚀剂。

公开(公告)号：US20140135251A1

公开(公告)日：2014-05-15

申请号：US14123848

申请日：2012-06-04

申请人： Andreas Köllnberger

发明人： Andreas Köllnberger

IPC分类号： C11D7/50

CPC分类号： C11D7/5009 ,  C08K3/32 ,  C08L83/04

摘要： A composition comprising a phosphonitrile halide and an oligomeric organopolysiloxanes having from 10 to 50 Si units is effective to remove silicone residues from substrates with minimal swelling of thin polymer substrates.

摘要翻译： 包含磷腈卤化物和具有10至50个Si单元的低聚有机聚硅氧烷的组合物有效地从基材中除去薄的聚合物基材溶胀的硅氧烷残余物。