公开(公告)号：US20240176133A1

公开(公告)日：2024-05-30

申请号：US18433680

申请日：2024-02-06

申请人： SUZHOU 3N BIOLOGICAL TECHNOLOGY CO., LTD.

发明人： Ruichun SUN ,  Bixia SUN

IPC分类号： G02B27/00 ,  B08B3/08 ,  C11D7/28 ,  C12N9/36 ,  G01M11/02 ,  G02C7/04

CPC分类号： G02B27/0006 ,  B08B3/08 ,  C11D7/28 ,  C12N9/2462 ,  C12Y302/01017 ,  G01M11/0257 ,  G02C7/04

摘要： A method of protein deposition for detecting a protein removal effect, a protein culture solution, and a protein cleaning and testing instrument, including preparing a protein culture solution: mixing a protein and a deionized water to obtain a diluted protein solution and adjusting a PH value of the diluted protein solution, to obtain the protein culture solution; and culturing the corneal contact lens using the protein culture solution: placing the corneal contact lens and the protein culture solution in a culture container for sealed culture within a culture temperature range for a time duration, to obtain a protein deposited corneal contact lens. The method is more suitable to be used as a testing sample of a protein removal effect testing experiment, reducing the difficulty in testing and judging of the degree of fouling of the corneal contact lens and the cleaning effect of the protein removal effect testing experiment.

公开(公告)号：US11981883B2

公开(公告)日：2024-05-14

申请号：US17267199

申请日：2019-08-05

申请人： DAIKIN INDUSTRIES, LTD.

发明人： Daisuke Karube ,  Yuuko Tsutsui

IPC分类号： C11D3/24 ,  B08B3/04 ,  B08B3/08 ,  C07C21/18 ,  C11D7/28 ,  C11D7/30 ,  C11D7/50 ,  C11D9/28

CPC分类号： C11D7/5018 ,  B08B3/08 ,  C11D7/30 ,  B08B2220/00

摘要： A composition containing 1,2-dichloro-3,3,3-trifluoropropene (HCFO-1223xd) and a fluorine-based oil.

公开(公告)号：US20240120212A1

公开(公告)日：2024-04-11

申请号：US18452977

申请日：2023-08-21

申请人： SCREEN Holdings Co., Ltd.

发明人： Shogo KUNIEDA ,  Yuta SASAKI ,  Yosuke HANAWA

IPC分类号： H01L21/67 ,  C11D7/26 ,  C11D7/28 ,  C11D7/50 ,  C11D11/00 ,  H01L21/02

CPC分类号： H01L21/67028 ,  C11D7/261 ,  C11D7/28 ,  C11D7/5018 ,  C11D11/0023 ,  H01L21/02057 ,  B08B3/022

摘要： A substrate treating method according to the present invention is a substrate treating method for treating a pattern-formed surface of a substrate W, the substrate treating method including: a supply process of supplying a substrate treating liquid containing a sublimable substance and a solvent to the pattern-formed surface; a solidification process of evaporating the solvent in a liquid film of the substrate treating liquid supplied to the pattern-formed surface in the supply process, depositing the sublimable substance, and forming a solidified film containing the sublimable substance; and a sublimation process of sublimating the solidified film and removing the solidified film, in which the sublimable substance contains at least one of 2,5-dimethyl-2,5-hexanediol and 3-trifluoromethylbenzoic acid.

公开(公告)号：US11773352B2

公开(公告)日：2023-10-03

申请号：US17416830

申请日：2019-12-20

申请人： 3M INNOVATIVE PROPERTIES COMPANY

发明人： Sean M. Smith ,  Michael J. Bulinski ,  Michael G. Costello ,  Forrest A. Coughlin ,  Hui Ren ,  Zai-Ming Qiu

IPC分类号： C09K5/04 ,  C11D7/50 ,  C07C43/17 ,  C07C43/172 ,  C11D7/28 ,  C11D11/00

CPC分类号： C11D7/5018 ,  C07C43/17 ,  C07C43/172 ,  C11D7/28 ,  C11D11/0047

摘要： A composition including a compound having structural formula (I): Rf is a linear or branched perfluoroalkyl group having 1-3 atoms; n is 0-2; x is 1-3; and Rf′ and Rf″ are (i) independently, a linear or branched perfluoroalkyl group having 1-8 carbon atoms; or (ii) are bonded together to form a ring structure having 4-8 carbon atoms. The composition further includes a hydrocarbon contaminant.

公开(公告)号：US11613720B2

公开(公告)日：2023-03-28

申请号：US17049828

申请日：2019-04-25

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Toshiyuki Oie ,  Akinobu Horita ,  Takahiro Kikunaga ,  Kenji Yamada

IPC分类号： C11D7/08 ,  C11D7/10 ,  C11D7/28 ,  C11D7/36 ,  C11D11/00 ,  C11D17/00 ,  H01L21/308

摘要： An aqueous composition includes (A) from 0.001 to 20 mass % of one or more kinds of fluorine-containing compounds selected from tetrafluoroboric acid, hexafluorosilicic acid, hexafluoroaluminic acid, hexafluorotitanic acid and a salt thereof, with respect to the total amount of the aqueous composition; and (B) from 0.0001 to 10 mass % of one or more kinds of compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the aqueous composition.

公开(公告)号：US10883070B2

公开(公告)日：2021-01-05

申请号：US16099518

申请日：2017-05-22

申请人： Firmenich SA

发明人： Denis Shcherbakov ,  Christian Starkenmann ,  Pierre-Etienne Bouquerand ,  Marco Pacchiani ,  Valery Normand

IPC分类号： C11D7/02 ,  C11D7/04 ,  C11D7/54 ,  C11D17/04 ,  C11D3/50 ,  C11D3/395 ,  C11D17/00 ,  C11D17/06 ,  C11D3/22 ,  C11D7/26 ,  C11D7/10 ,  C11D7/28 ,  C11D11/00

摘要： This invention relates to a bleaching composition comprising hypochlorite-based bleach particles and moisture-sensitive particles encapsulating an oil within starch or starch-derivative matrix, the composition being surprisingly stable toward degradation of the starch upon storage.

公开(公告)号：US10787628B2

公开(公告)日：2020-09-29

申请号：US16106331

申请日：2018-08-21

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Thomas Dory ,  Emil A. Kneer ,  Tetsuya Kamimura

IPC分类号： C11D7/50 ,  C11D3/28 ,  C11D3/04 ,  C11D11/00 ,  C11D3/43 ,  C11D7/28 ,  C11D7/10 ,  C11D7/08 ,  C11D7/32 ,  C11D3/20

摘要： The present disclosure is directed to non-corrosive cleaning compositions that are useful, e.g., for removing residues (e.g., plasma etch and/or plasma ashing residues) and/or metal oxides from a semiconductor substrate as an intermediate step in a multistep manufacturing process.

公开(公告)号：US20200255768A1

公开(公告)日：2020-08-13

申请号：US16857274

申请日：2020-04-24

申请人： ECOLAB USA INC.

发明人： XIN SUN ,  JACQUILYNE GANDARA ,  Robert J. Ryther ,  Thomas R. Mohs ,  WALTER D. CUMMINGS

IPC分类号： C11D3/04 ,  C11D3/395 ,  C11D3/06 ,  C11D3/10 ,  C11D3/24 ,  C11D3/28 ,  C11D3/32 ,  C11D7/06 ,  C11D7/12 ,  C11D7/14 ,  C11D7/16 ,  C11D7/28 ,  C11D7/32 ,  B08B3/08 ,  C11D1/75 ,  C11D3/08 ,  C11D3/30

摘要： The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120° F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed.

公开(公告)号：US10329388B2

公开(公告)日：2019-06-25

申请号：US15238508

申请日：2016-08-16

申请人： ZYP COATINGS, INC.

发明人： Cressie E Holcombe

IPC分类号： C08J3/09 ,  C08L33/12 ,  C11D7/50 ,  C08L53/00 ,  C08K5/05 ,  C09J133/12 ,  C09D7/20 ,  C08L53/02 ,  C09J11/06 ,  C09J153/00 ,  C09D133/06 ,  C11D7/26 ,  C11D7/28 ,  C11D7/30

摘要： A solvent composition and method for making same is disclosed having a composition between 26 to 90 weight percent propionate, butyrate, or combination thereof and between 10 to 74 weight percent fluorinated solvent blend, wherein the fluorinated solvent blend includes t-DCE. A polymer solvent system is also disclosed incorporating the solvent composition and dissolved polymers, such as SEBS polymers. The solvent composition and polymer solvent system is minimally combustible or preferably nonflammable.

公开(公告)号：US20190071623A1

公开(公告)日：2019-03-07

申请号：US16180107

申请日：2018-11-05

申请人： FUJIFILM Corporation

发明人： Tetsuya KAMIMURA ,  Tomonori TAKAHASHI

IPC分类号： C11D17/08 ,  C11D7/08 ,  C11D7/28 ,  C11D7/50 ,  C23G1/06 ,  C23F1/26 ,  G03F7/42 ,  H01L21/304 ,  H01L21/308

摘要： A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10−10 to 1.0×10−4.