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1.发明公开公开(公告)号：US20240352382A1
公开(公告)日：2024-10-24
申请号：US18762815
申请日：2024-07-03
Applicant: ECOLAB USA INC.
Inventor： Jesus Cabanas , Gerald Phan , Yoshiyuki Sato , Tomoko Nakabayashi , Masahiro Takaoka , John Mansergh , Carter M. Silvernail
CPC classification number: C11D3/3761 , C11D1/72 , C11D3/10 , C11D3/33 , C11D3/386 , C11D17/044
Abstract: Solid detergent compositions designed to maintain solid integrity throughout production of the pressed solid, during mechanical conveying and during ejection from molds, are disclosed. Solid detergent compositions having unexpected immediate block hardness without a curing step are provided by inclusion of a hardness additive composition comprising a synergistic ratio of polycarboxylic acid polymer chelants to aminocarboxylate chelants. Methods of making solid detergent compositions and solid detergent compositions having at least substantially similar cleaning performance to solid detergent compositions without the hardness additive composition are also provided.
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公开(公告)号：US20240352379A1
公开(公告)日：2024-10-24
申请号：US18686100
申请日：2022-09-26
Applicant: Chemetall GMBH
Inventor： Berit ROESNER , Carola KOMP
CPC classification number: C11D3/10 , C11D3/0047 , C11D3/06 , C11D3/08 , C11D17/0008 , C23G1/14 , C11D2111/16
Abstract: Disclosed herein is a borate-free, aqueous cleaning and treating composition including at least one metasilicate (A); at least one orthophosphate (B); at least one phosphate (C); at least one surfactant (D); and where the aqueous cleaning and treating composition has a pH value at 20° C. in a range from 11.0 to 12.8; and possesses a molar ratio of Si atoms to P atoms being from 0.75:1 to 1:0.75, based on the sum of the Si-containing metasilicates (A) and the sum of the P-containing orthophosphates (B), diphosphates (C) and triphosphates (C). Further disclosed herein are solid mixtures. Additionally disclosed herein are a method for cleaning and treating metallic substrates by using the compositions and a method of using the compositions to clean metallic substrates and treat metallic substrates by forming a Si-containing layer on the surface of the metallic substrates.
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3.发明授权
公开(公告)号：US12122982B2
公开(公告)日：2024-10-22
申请号：US17446748
申请日：2021-09-02
Applicant: ECOLAB USA INC.
Inventor： Clinton Hunt, Jr. , Benjamin Conway , Victor Fuk-Pong Man , Nathan D. Peitersen , Tsvetelina Baryakova , Owen Kinsky , Kimberly D'Aloia , Deborah Ihns
IPC: C11D3/00 , C11D1/66 , C11D3/10 , C11D3/22 , C11D3/30 , B08B1/12 , B08B3/08 , C11D1/12 , C11D1/22 , C11D3/43
CPC classification number: C11D3/222 , C11D1/662 , C11D3/0057 , C11D3/10 , C11D3/225 , C11D3/30 , B08B1/12 , B08B3/08 , C11D1/12 , C11D1/123 , C11D1/22 , C11D1/66 , C11D3/43 , C11D2111/14
Abstract: Cleaning compositions and methods of use thereof for cleaning fryers and other hard surfaces soiled by grease, shortening, oils and other soils commonly encountered in the food service industry are disclosed. Cleaning compositions and methods of use which beneficially remove soils from vertical and/or inverted surfaces, reduce the cleaning time required for removing such difficult to remove and baked on soils, reduce exposure to hot surfaces by allowing cleaning at or near room temperature, reduce exposure to caustic chemicals, and/or eliminate the need for personal protective equipment (PPE) for use of the cleaning compositions are disclosed.
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公开(公告)号：US20240336878A1
公开(公告)日：2024-10-10
申请号：US18747970
申请日：2024-06-19
Applicant: ECOLAB USA INC.
Inventor： David Dotzauer , John Mansergh , Krista Otting , Tobias Neil Foster
CPC classification number: C11D3/393 , B08B3/08 , C11D3/06 , C11D3/10 , C11D3/33 , C11D3/3932 , C11D7/12 , C11D7/16 , C11D7/3245 , C11D2111/24
Abstract: The present invention relates to a detergent composition comprising alkali metal carbonate, a chelant selected from the group consisting of MGDA, alkali metal tripolyphosphate, GLDA, and mixtures thereof, alkali metal percarbonate, and a peroxidation catalyst, wherein the molar ratio of chelant to alkali metal percarbonate is in the range of 1.8 to 3.4. The detergent composition is particularly suited for the removal of tea and coffee stains.
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公开(公告)号：US12060543B2
公开(公告)日：2024-08-13
申请号：US17071039
申请日：2020-10-15
Applicant: Sterilex, LLC
Inventor： Edward Fu , Mark Wozniak , Chris Bergstrom
IPC: C11D3/10 , C11D1/60 , C11D1/62 , C11D1/722 , C11D3/00 , C11D3/20 , C11D3/30 , C11D3/33 , C11D3/36 , C11D3/37 , C11D3/39 , C11D3/40 , C11D7/12 , C11D7/14 , C11D17/06
CPC classification number: C11D3/3902 , C11D1/60 , C11D1/62 , C11D1/722 , C11D3/0047 , C11D3/10 , C11D3/2003 , C11D3/2065 , C11D3/30 , C11D3/33 , C11D3/361 , C11D3/3707 , C11D3/3942 , C11D3/40 , C11D7/12 , C11D7/14 , C11D17/06 , C11D2111/20
Abstract: Ambient moisture-activatable surface treatment powders containing persalt, positively charged phase transfer agent and alkaline pH buffering may be activatable without the addition of liquid. Some ambient moisture-activatable surface treatment powders are substantially free of bleach activators and/or chlorine. Methods of use of ambient moisture activatable powders include applying them to the surfaces to be treated.
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公开(公告)号：US20240254021A1
公开(公告)日：2024-08-01
申请号：US18630402
申请日：2024-04-09
Applicant: Silk Water Solutions Inc.
Inventor： Colin Frank Taylor
CPC classification number: C02F1/66 , C02F1/68 , C02F5/105 , C11D1/66 , C11D3/10 , C11D3/2075 , C02F2103/42 , C02F2209/06 , C02F2303/04 , C02F2303/22
Abstract: A water conditioning composition includes water, at least one gluconate compound, at least one carbonate compound, a non-ionic preservative, and a citrate compound. For example, the composition can include 87-95 wt. % water, 0.5 to 1.5 wt. % gluconate compound, 3 to 8 wt. % carbonate compound, 0.5 to 1.5 wt. % non-ionic preservative, and 0.5 to 2.5 wt. % citrate compound.
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公开(公告)号：US20240240113A1
公开(公告)日：2024-07-18
申请号：US18539868
申请日：2023-12-14
Applicant: Henkel AG & Co. KGaA
Inventor： Janet Coope-Epstein , Adam Winfield Germain
Abstract: The present disclosure provides aqueous liquid detergent and liquid unit dose detergent compositions comprising at least one surfactant wherein at least 20% of the carbon content of the surfactant is derived from bio-content and accounted for using a mass balanced allocation method; at least one additive; and water.
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公开(公告)号：US20240191159A1
公开(公告)日：2024-06-13
申请号：US18587282
申请日：2024-02-26
Applicant: ECOLAB USA INC.
Inventor： Erik C. Olson , David Riehm , Carter M. Silvernail , Olivia N. L. Finster , Michael S. Rischmiller , Timothy Meier
IPC: C11D3/386 , A61L2/23 , C11D1/66 , C11D1/722 , C11D1/88 , C11D1/94 , C11D3/10 , C11D3/20 , C11D3/30 , C11D3/33 , C11D3/48 , C11D17/00
CPC classification number: C11D3/38609 , A61L2/23 , C11D1/66 , C11D1/722 , C11D1/88 , C11D1/94 , C11D3/10 , C11D3/2082 , C11D3/30 , C11D3/33 , C11D3/386 , C11D3/38627 , C11D3/38645 , C11D3/48 , C11D17/00 , A61L2202/24
Abstract: The present disclosure relates to a solid, enzymatic detergent compositions and methods of making and using the same. In a preferred embodiment, the detergent compositions are particularly useful for cleaning medical and dental instruments. In a preferred embodiment the compositions are particularly use for cleaning ware.
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公开(公告)号：US12006491B2
公开(公告)日：2024-06-11
申请号：US17838150
申请日：2022-06-10
Applicant: ONE HOME BRANDS, INC.
Inventor： Syed Humza Naqvi
IPC: C11D3/386 , C11D1/83 , C11D3/10 , C11D3/12 , C11D3/20 , C11D3/22 , C11D11/00 , C11D17/00 , C11D1/14 , C11D1/66
CPC classification number: C11D3/38609 , C11D1/83 , C11D3/10 , C11D3/124 , C11D3/2086 , C11D3/222 , C11D3/386 , C11D3/38645 , C11D17/006 , C11D1/146 , C11D1/662 , C11D2111/12
Abstract: The invention relates to stable, anhydrous laundry detergent concentrated formulation in solid forms.
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10.发明授权
公开(公告)号：US11981880B2
公开(公告)日：2024-05-14
申请号：US17512097
申请日：2021-10-27
Applicant: TOKYO OHKA KOGYO CO., LTD.
Inventor： Isao Hirano , Yasuo Suzuki
IPC: C11D3/39 , C11D1/00 , C11D1/22 , C11D3/00 , C11D3/04 , C11D3/10 , C11D3/20 , C11D3/28 , C11D3/395
CPC classification number: C11D1/22 , C11D1/00 , C11D3/0094 , C11D3/04 , C11D3/10 , C11D3/2075 , C11D3/2079 , C11D3/2082 , C11D3/2086 , C11D3/28 , C11D3/3902 , C11D3/3942 , C11D2111/22
Abstract: Provided is a cleaning composition for a component of a semiconductor manufacturing process chamber including: a foaming agent; an oxidizing agent; and an acidic compound, in which a value of (Number of moles of the acidic compound contained in the cleaning composition×acid valence of the acidic compound)/(Number of moles of the foaming agent contained in the cleaning composition×Base valence of the foaming agent) is more than 0.1 and less than 1.5.
