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公开(公告)号：US11949900B2
公开(公告)日：2024-04-02
申请号：US18190571
申请日：2023-03-27
Inventor： Ye-Kui Wang , Zhipin Deng
IPC: H04N19/31 , C09K13/06 , C23F1/26 , C23F1/28 , H01L21/3213 , H04N19/169 , H04N19/46
CPC classification number: H04N19/46 , C09K13/06 , C23F1/26 , C23F1/28 , H01L21/32134 , H04N19/188
Abstract: Systems, methods and apparatus for encoding, decoding or transcoding digital video are described. One example method of video processing includes performing a conversion between a video and a bitstream of the video, wherein the bitstream conforms to an order of a sub-bitstream extraction process that is defined by a rule that specifies (a) the sub-bitstream extraction process excludes an operation that removes all supplemental enhancement information (SEI) network abstraction layer (NAL) units, which satisfy a condition, from an output bitstream or (b) the order of the sub-bitstream extraction process includes replacing parameter sets with replacement parameter sets prior to removing, from an output bitstream, the SEI NAL units.
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公开(公告)号：US20240044015A1
公开(公告)日：2024-02-08
申请号：US18266888
申请日：2021-12-13
Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
Inventor： Kazuhiko IKEDA , Tomoko FUJII , Hiroshi MATSUNAGA
IPC: C23F1/28
CPC classification number: C23F1/28
Abstract: The problem of the present invention is to provide an aqueous composition with which the surface of stainless steel is sufficiently roughened in an efficient manner with few steps, while maintaining good quality (e.g., thickness) of the stainless steel after treatment. The above problem is solved by the following aqueous composition for roughening the surface of stainless steel. Namely, the aqueous composition comprises 0.1% to 10% by mass of hydrogen peroxide based on the total amount of the aqueous composition, 1% to 30% by mass of halide ions based on the total amount of the aqueous composition, and 0% to 3% by mass of copper ions based on the total amount of the aqueous composition.
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公开(公告)号：US11827992B2
公开(公告)日：2023-11-28
申请号：US18153878
申请日：2023-01-12
Applicant: IMEC VZW , Katholieke Universiteit Leuven, KU LEUVEN R&D
Inventor： Stanislaw Piotr Zankowski , Philippe M. Vereecken
IPC: C25D11/04 , C25D11/02 , C25D11/12 , C25D11/18 , C25D11/34 , C25D11/10 , C25D11/24 , C23F1/20 , C25D1/00 , C25D9/02 , C25D9/06 , H01M4/66 , H01M8/0232 , H01M8/0247 , C23F1/28 , C25D3/12 , H01M4/04 , H01M4/80 , C25D1/08 , H01B1/02 , H01B5/00 , B82Y30/00 , B82Y40/00
CPC classification number: C25D11/045 , C23F1/20 , C23F1/28 , C25D1/006 , C25D1/08 , C25D3/12 , C25D9/02 , C25D9/06 , C25D11/022 , C25D11/024 , C25D11/10 , C25D11/12 , C25D11/18 , C25D11/24 , C25D11/34 , H01B1/02 , H01B5/002 , H01M4/0404 , H01M4/045 , H01M4/0407 , H01M4/0442 , H01M4/0452 , H01M4/0471 , H01M4/661 , H01M4/80 , H01M8/0232 , H01M8/0247 , B82Y30/00 , B82Y40/00
Abstract: At least one embodiment relates to a method for transforming at least part of a valve metal layer into a template that includes a plurality of spaced channels aligned longitudinally along a first direction. The method includes a first anodization step that includes anodizing the valve metal layer in a thickness direction to form a porous layer that includes a plurality of channels. Each channel has channel walls and a channel bottom. The channel bottom is coated with a first insulating metal oxide barrier layer as a result of the first anodization step. The method also includes a protective treatment. Further, the method includes a second anodization step after the protective treatment. The second anodization step substantially removes the first insulating metal oxide barrier layer, induces anodization, and creates a second insulating metal oxide barrier layer. In addition, the method includes an etching step.
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公开(公告)号：US11814719B2
公开(公告)日：2023-11-14
申请号：US17655388
申请日：2022-03-18
Applicant: Dai Nippon Printing Co., Ltd.
Inventor： Chikao Ikenaga , Takanori Maruoka , Sachiyo Matsuura
IPC: C23C14/04 , C23F1/28 , H05B33/10 , C23F1/02 , C23C14/24 , C23C14/12 , B05C21/00 , C30B25/04 , C23C16/04 , H05K3/14 , B05B12/20 , H10K50/00 , C22C38/08 , B05D1/32 , H10K71/00 , H10K71/16
CPC classification number: C23C14/042 , B05B12/20 , B05C21/005 , C23C14/04 , C23C14/12 , C23C14/243 , C23C16/04 , C23F1/02 , C23F1/28 , C30B25/04 , H05B33/10 , H05K3/143 , H10K50/00 , B05D1/32 , C22C38/08 , C23C14/24 , H10K71/00 , H10K71/166
Abstract: A deposition mask in which deformation of long sides is restrained is manufactured. A manufacturing method of a deposition mask includes a step of preparing a metal plate; a processing step of processing the metal plate into an intermediate product comprising: a plurality of deposition mask portions each including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and a support portion that surrounds the plurality of deposition mask portions, and is partially connected to the short sides of the plurality of deposition mask portions; and a separation step of separating the deposition mask portions from the support portion to obtain the deposition mask. In the intermediate product, the long sides of the deposition mask portions are not connected to the support portion.
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公开(公告)号：US11781224B2
公开(公告)日：2023-10-10
申请号：US17542043
申请日：2021-12-03
Applicant: LG INNOTEK CO., LTD.
Inventor： Jee Heum Paik , Yoon Tai Kim
CPC classification number: C23F1/28 , B32B15/015 , C23C14/042 , C23F1/02 , C25D5/12 , C25D5/50 , C25D7/0614 , C23C14/12
Abstract: Discussed is a deposition mask including a metal plate having a first surface and a second surface opposite to the first surface, wherein the metal plate including an invar, wherein the metal plate includes a plurality of through-hole, wherein the through-hole includes a first surface hole forming in the first surface, a second surface hole forming in the second surface, and a connecting part through which the first surface hole and the second surface hole communicate with each other, and wherein an angle formed by a virtual line connecting the end of the connecting part and the end of the second surface hole, and a virtual line extending in a direction parallel to the second face from the end of the second surface hole is 30 to 60 degrees.
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Patent Agency Ranking
公开(公告)号：US20230144037A1
公开(公告)日：2023-05-11
申请号：US18153878
申请日：2023-01-12
Applicant: IMEC VZW , Katholieke Universiteit Leuven, KU LEUVEN R&D
Inventor： Stanislaw Piotr Zankowski , Philippe M. Vereecken
IPC: C25D11/04 , C23F1/20 , C25D1/00 , C25D9/02 , C25D11/02 , C25D11/12 , C25D11/18 , C25D11/34 , C25D9/06 , C25D11/10 , H01M4/66 , H01M8/0232 , H01M8/0247 , C23F1/28 , C25D3/12 , C25D11/24 , H01M4/04 , H01M4/80 , C25D1/08 , H01B1/02 , H01B5/00
CPC classification number: C25D11/045 , C23F1/20 , C25D1/006 , C25D9/02 , C25D11/024 , C25D11/12 , C25D11/18 , C25D11/34 , C25D9/06 , C25D11/10 , H01M4/661 , H01M8/0232 , H01M8/0247 , C23F1/28 , C25D3/12 , C25D11/24 , H01M4/0404 , H01M4/0407 , H01M4/0442 , H01M4/045 , H01M4/0452 , H01M4/0471 , H01M4/80 , C25D1/08 , C25D11/022 , H01B1/02 , H01B5/002 , B82Y30/00
Abstract: At least one embodiment relates to a method for transforming at least part of a valve metal layer into a template that includes a plurality of spaced channels aligned longitudinally along a first direction. The method includes a first anodization step that includes anodizing the valve metal layer in a thickness direction to form a porous layer that includes a plurality of channels. Each channel has channel walls and a channel bottom. The channel bottom is coated with a first insulating metal oxide barrier layer as a result of the first anodization step. The method also includes a protective treatment. Further, the method includes a second anodization step after the protective treatment. The second anodization step substantially removes the first insulating metal oxide barrier layer, induces anodization, and creates a second insulating metal oxide barrier layer. In addition, the method includes an etching step.
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公开(公告)号：US20180311998A1
公开(公告)日：2018-11-01
申请号：US15965867
申请日：2018-04-28
Applicant: Zhejiang Yotrio Group Co., Ltd.
Inventor： Hao Zhu , Jianping Xie
Abstract: This invention provides a metal sheet preparing process with a surface having wood grain, and the process includes the following steps: spraying photosensitive ink on the metal sheet; pasting a designed film on a surface of the metal sheet sprayed with the photosensitive ink; exposing the metal sheet pasted with the film in an ultraviolet light for 1-15 min; spray developing the surface of the metal sheet with sodium carbonate solution, and exiting the film after developing; etching the metal sheet exited the film after developing with a mixed aqueous solution of ferric trichloride and copper sulfate, and a corrosive temperature being 30-50° C. which lasts for 5-8 min; and washing corrosive liquid on the grain and cured films of the photosensitive ink out of the grain with sodium hydroxide solution of 5-8% wt %.
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8.发明申请公开(公告)号：US20180222097A1
公开(公告)日：2018-08-09
申请号：US15426996
申请日：2017-02-07
Applicant: Ching-Chuan Hsieh
Inventor： Ching-Chuan Hsieh
CPC classification number: B29C45/14311 , B29C2045/14803 , B29C2045/14868 , B29C2071/022 , B29K2081/04 , B29K2705/12 , C23F1/28 , C23F17/00 , C25F3/06
Abstract: A stainless steel and synthetic resin composite molded body and preparation method thereof. After the surface of the flat and even stainless steel had anchor effect, it was connected with various synthetic resin pieces by means of insertion molding. Regardless of the material of the stainless steel pi ece, the indenting test proved that the strength, of over 15 N/mm2 after connection enabled stable tightness. With insertion molding of the stainless steel piece having anchor effect in the present invention, composite molded products comprising various resin parts can be produced if no displacement or height difference occurs.
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公开(公告)号：US10005991B2
公开(公告)日：2018-06-26
申请号：US15028573
申请日：2014-10-09
Applicant: E. I. DU PONT DE NEMOURS AND COMPANY , EKC TECHNOLOGY INC
Inventor： Hua Cui
IPC: C11D7/32 , C11D11/00 , G03F7/42 , H01L21/02 , H01L21/3213 , C23F1/18 , C23F1/26 , C23F1/28 , C23F1/34 , C23F1/38 , C23F1/40 , C11D3/39 , C11D7/26 , B08B3/08 , C11D7/04 , B08B3/10 , C11D3/20 , H01L21/768 , H01L21/311
CPC classification number: C11D11/0047 , B08B3/08 , B08B3/10 , C11D3/2082 , C11D3/3942 , C11D3/3947 , C11D7/04 , C11D7/265 , C11D7/3209 , C11D7/3218 , C11D7/3245 , C11D7/3281 , C23F1/18 , C23F1/26 , C23F1/28 , C23F1/34 , C23F1/38 , C23F1/40 , G03F7/423 , G03F7/425 , G03F7/426 , H01L21/02057 , H01L21/02063 , H01L21/31111 , H01L21/31144 , H01L21/32134 , H01L21/76807 , H01L21/76814
Abstract: The present disclosure relates to a method for removing a hard mask consisting essentially of TiN, TaN, TiNxOy, TiW, W, Ti and alloys of Ti and W from a semiconductor substrate. The method comprising contacting the semiconductor substrate with a removal composition. The removal composition comprises 0.1 wt % to 90 wt % of an oxidizing agent; 0.0001 wt % to 50 wt % of a carboxylate; and the balance up to 100 wt % of the removal composition comprising deionized water.
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公开(公告)号：US20180135186A1
公开(公告)日：2018-05-17
申请号：US15572368
申请日：2016-04-27
Inventor： Wataru SASAKI , Tomoko TAMURA , Noriyuki HIRAMATSU , Osamu MORII
Abstract: An oxide film removing method is a method of removing an oxide film formed in a surface of a superalloy part that contains a first metal as a base metal and a second metal different from the first metal. The oxide film removing method includes arranging the superalloy part inside a heating chamber; reducing the oxide of the base metal to the base metal by heating the inside of the heating chamber in a condition that a reduction gas atmosphere or a vacuum atmosphere is maintained; and carrying out acid processing to apply acid solution to the superalloy part after the reduction. The oxide film formed in the surface of the superalloy is removed effectively without using a highly toxic gaseous fluoride.
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