公开(公告)号：US09525076B2

公开(公告)日：2016-12-20

申请号：US13960256

申请日：2013-08-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jae-ho Lee ,  Hyun-jong Chung ,  Seong-jun Park ,  Kyung-eun Byun ,  David Seo ,  Hyun-jae Song ,  Jin-seong Heo

IPC: H01L29/792 ,  B82Y10/00 ,  H01L21/28 ,  H01L29/47 ,  H01L29/788 ,  H01L29/16 ,  G11C11/40 ,  H01L29/778 ,  G11C16/04 ,  H01L51/05

CPC classification number: H01L29/792 ,  B82Y10/00 ,  G11C11/40 ,  G11C16/0466 ,  H01L21/28273 ,  H01L29/1606 ,  H01L29/47 ,  H01L29/7781 ,  H01L29/788 ,  H01L51/0512 ,  Y10S977/734 ,  Y10S977/938

Abstract: A graphene memory includes a source and a drain spaced apart from each other on a conductive semiconductor substrate, a graphene layer contacting the conductive semiconductor substrate and spaced apart from and between the source and the drain, and a gate electrode on the graphene layer. A Schottky barrier is formed between the conductive semiconductor substrate and the graphene layer such that the graphene layer is used as a charge-trap layer for storing charges.

Abstract translation: 石墨烯存储器包括在导电半导体衬底上彼此间隔开的源极和漏极，与导电半导体衬底接触并与源极和漏极间隔开并且在源极和漏极之间以及在石墨烯层上的栅电极的石墨烯层。 在导电半导体衬底和石墨烯层之间形成肖特基势垒，使得石墨烯层用作用于存储电荷的电荷捕获层。

公开(公告)号：US09312368B2

公开(公告)日：2016-04-12

申请号：US14334028

申请日：2014-07-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jae-ho Lee ,  Kyung-eun Byun ,  Hyun-jae Song ,  Hyeon-jin Shin ,  Min-Hyun Lee ,  In-kyeong Yoo ,  Seong-jun Park

IPC: H01L29/06 ,  H01L29/66 ,  H01L29/78 ,  H01L29/16 ,  H01L29/165 ,  H01L29/267

CPC classification number: H01L29/66977 ,  H01L21/76224 ,  H01L21/764 ,  H01L29/0649 ,  H01L29/1606 ,  H01L29/165 ,  H01L29/267 ,  H01L29/42364 ,  H01L29/66045 ,  H01L29/778 ,  H01L29/78

Abstract: A graphene device including separated junction contacts and a method of manufacturing the same are disclosed. The graphene device is a field effect transistor (FET) in which graphene is used as a channel. A source electrode and a drain electrode do not directly contact the graphene channel, and junction contacts formed by doping semiconductor are separately disposed between the graphene channel and the source electrode and between the graphene channel and the drain electrode. Therefore, in an off state where a voltage is not applied to a gate electrode, due to a barrier between the graphene channel and the junction contacts, carriers may not move. As a result, the graphene device may have low current in the off state.

Abstract translation: 公开了一种包括分离的接点的石墨烯器件及其制造方法。 石墨烯装置是其中使用石墨烯作为通道的场效应晶体管（FET）。 源电极和漏电极不直接接触石墨烯通道，并且由掺杂半导体形成的结接点分别设置在石墨烯通道和源电极之间以及石墨烯通道和漏电极之间。 因此，在由于石墨烯通道和接合点之间的阻挡而不向栅电极施加电压的关闭状态下，载体可能不移动。 结果，石墨烯器件在断开状态下可能具有低电流。

公开(公告)号：US09281404B2

公开(公告)日：2016-03-08

申请号：US13733304

申请日：2013-01-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin-seong Heo ,  Seong-jun Park ,  Kyung-eun Byun ,  David Seo ,  Hyun-jae Song ,  Hee-jun Yang ,  Hyun-jong Chung

IPC: H01L29/06 ,  H01L29/08 ,  H01L29/786 ,  H01L29/423

CPC classification number: H01L29/78684 ,  H01L29/0673 ,  H01L29/42392 ,  H01L29/78696

Abstract: A switching device includes a semiconductor layer, a graphene layer, a gate insulation layer, and a gate formed in a three-dimensional stacking structure between a first electrode and a second electrode formed on a substrate.

Abstract translation: 开关器件包括在第一电极和形成在衬底上的第二电极之间的三维堆叠结构中形成的半导体层，石墨烯层，栅极绝缘层和栅极。

公开(公告)号：US09040957B2

公开(公告)日：2015-05-26

申请号：US13772693

申请日：2013-02-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jae-ho Lee ,  Seong-jun Park ,  Kyung-eun Byun ,  David Seo ,  Hyun-jae Song ,  Hyung-cheol Shin ,  Jae-hong Lee ,  Hyun-jong Chung ,  Jin-seong Heo

IPC: H01L29/06 ,  H01L29/78 ,  H01L29/66 ,  H01L29/786 ,  H01L29/16 ,  B82Y10/00 ,  H01L29/10

CPC classification number: H01L29/78696 ,  B82Y10/00 ,  H01L29/1095 ,  H01L29/1606 ,  H01L29/66045 ,  H01L29/66477 ,  H01L29/78 ,  H01L29/78684 ,  Y10S977/734 ,  Y10S977/842 ,  Y10S977/938

Abstract: According to example embodiments, a field effect transistor includes a graphene channel layer on a substrate. The graphene channel layer defines a slit. A source electrode and a drain electrode are spaced apart from each other and arranged to apply voltages to the graphene channel layer. A gate insulation layer is between the graphene channel layer and a gate electrode.

Abstract translation: 根据示例性实施例，场效应晶体管包括在衬底上的石墨烯通道层。 石墨烯通道层限定狭缝。 源电极和漏极彼此间隔开并布置成向石墨烯通道层施加电压。 栅极绝缘层在石墨烯沟道层和栅电极之间。

公开(公告)号：US09105556B2

公开(公告)日：2015-08-11

申请号：US13906657

申请日：2013-05-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin-seong Heo ,  Seong-jun Park ,  Kyung-eun Byun ,  David Seo ,  Hyun-jae Song ,  Jae-ho Lee ,  Hyun-jong Chung

IPC: H01L29/06 ,  H01L29/66 ,  H01L21/336 ,  H01L29/16 ,  H01L29/786 ,  H01L29/08 ,  H01L29/78 ,  H01L29/739 ,  B82Y99/00

CPC classification number: H01L29/16 ,  B82Y99/00 ,  H01L29/0895 ,  H01L29/1606 ,  H01L29/7391 ,  H01L29/78 ,  H01L29/78681 ,  H01L29/78684 ,  H01L29/7869 ,  H01L29/78696

Abstract: According to example embodiments, a tunneling field-effect transistor (TFET) includes a first electrode on a substrate, a semiconductor layer on a portion of the first electrode, a graphene channel on the semiconductor layer, a second electrode on the graphene channel, a gate insulating layer on the graphene channel, and a gate electrode on the gate insulating layer. The first electrode may include a portion that is adjacent to the first area of the substrate. The semiconductor layer may be between the graphene channel and the portion of the first electrode. The graphene channel may extend beyond an edge of at least one of the semiconductor layer and the portion of the first electrode to over the first area of the substrate.

Abstract translation: 根据示例性实施例，隧道场效应晶体管（TFET）包括衬底上的第一电极，第一电极的一部分上的半导体层，半导体层上的石墨烯通道，石墨烯通道上的第二电极， 栅极绝缘层，栅极绝缘层上的栅电极。 第一电极可以包括与衬底的第一区域相邻的部分。 半导体层可以在石墨烯通道和第一电极的部分之间。 石墨烯通道可以延伸超过半导体层和第一电极的至少一个的边缘到衬底的第一区域之上。

公开(公告)号：US09048310B2

公开(公告)日：2015-06-02

申请号：US13964353

申请日：2013-08-12

Applicant: Samsung Electronics Co., Ltd. ,  Seoul National University R & DB Foundation

Inventor： Jae-ho Lee ,  Seong-jun Park ,  Kyung-eun Byun ,  David Seo ,  Hyun-jae Song ,  Hyung-cheol Shin ,  Jae-hong Lee ,  Hyun-jong Chung ,  Jin-seong Heo

IPC: H01L29/02 ,  H01L29/78

CPC classification number: H01L29/78 ,  H01L29/1606 ,  H01L29/407 ,  H01L29/66977 ,  H01L29/772 ,  H01L29/872 ,  H01L29/88

Abstract: According to example embodiments, a graphene switching devices having a tunable barrier includes a semiconductor substrate that includes a first well doped with an impurity, a first electrode on a first area of the semiconductor substrate, an insulation layer on a second area of the semiconductor substrate, a graphene layer on the insulation layer and extending onto the semiconductor substrate toward the first electrode, a second electrode on the graphene layer and insulation layer, a gate insulation layer on the graphene layer, and a gate electrode on the gate insulation layer. The first area and the second area of the semiconductor substrate may be spaced apart from each other. The graphene layer is spaced apart from the first electrode. A lower portion of the graphene layer may contact the first well. The first well is configured to form an energy barrier between the graphene layer and the first electrode.

Abstract translation: 根据示例实施例，具有可调谐屏障的石墨烯开关器件包括半导体衬底，其包括掺杂有杂质的第一阱，在半导体衬底的第一区域上的第一电极，在半导体衬底的第二区域上的绝缘层 在所述绝缘层上的石墨烯层，并且朝向所述第一电极延伸到所述半导体衬底上，所述石墨烯层和绝缘层上的第二电极，所述石墨烯层上的栅极绝缘层和所述栅极绝缘层上的栅极电极。 半导体衬底的第一区域和第二区域可以彼此间隔开。 石墨烯层与第一电极间隔开。 石墨烯层的下部可以接触第一孔。 第一阱被配置为在石墨烯层和第一电极之间形成能量势垒。

公开(公告)号：US09306005B2

公开(公告)日：2016-04-05

申请号：US14103079

申请日：2013-12-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyung-eun Byun ,  Seong-jun Park ,  David Seo ,  Hyun-jae Song ,  Jae-ho Lee ,  Hyun-jong Chung ,  Jin-seong Heo

IPC: H01L29/06 ,  H01L29/16 ,  H01L29/45 ,  H01L29/739 ,  H01L29/786 ,  H01L29/78 ,  H01L29/10

CPC classification number: H01L29/1606 ,  H01L29/1087 ,  H01L29/45 ,  H01L29/452 ,  H01L29/456 ,  H01L29/458 ,  H01L29/7391 ,  H01L29/78 ,  H01L29/78618

Abstract: According to example embodiments, an electronic device includes: a semiconductor layer; a graphene directly contacting a desired (and/or alternatively predetermined) area of the semiconductor layer; and a metal layer on the graphene. The desired (and/or alternatively predetermined) area of the semiconductor layer include one of: a constant doping density, a doping density that is equal to or less than 1019 cm−3, and a depletion width of less than or equal to 3 nm.

Abstract translation: 根据示例性实施例，电子设备包括：半导体层; 直接接触所述半导体层的期望（和/或备选地预定）区域的石墨烯; 和石墨烯上的金属层。 半导体层的期望（和/或备选地）预定区域包括以下之一：恒定的掺杂密度，等于或小于1019cm-3的掺杂密度以及小于或等于3nm的耗尽宽度 。

公开(公告)号：US09214559B2

公开(公告)日：2015-12-15

申请号：US13659131

申请日：2012-10-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Joo-ho Lee ,  Chang-seung Lee ,  Yong-sung Kim ,  Hyun-jae Song

IPC: B29C65/52 ,  B29C65/54 ,  B32B37/26 ,  B32B38/10 ,  H01L29/786 ,  H01L29/423 ,  H01L29/66 ,  H01L29/778 ,  H01L29/16

CPC classification number: H01L29/78603 ,  H01L29/1606 ,  H01L29/42384 ,  H01L29/66742 ,  H01L29/7781 ,  H01L29/78684 ,  Y10T428/24917

Abstract: Graphene transferring members, graphene transferrer, methods of transferring graphene, and methods of fabricating a graphene device, may include a metal thin-film layer pattern and a graphene layer sequentially stacked on an adhesive member. The metal thin-film layer and the graphene layer may have the same shape. After transferring the graphene layer onto a transfer-target substrate during the fabrication of a graphene device, the metal thin-film layer is patterned to form electrodes on respective ends of the graphene layer by removing a portion of the metal thin-film layer.

Abstract translation: 石墨烯转移剂，石墨烯转移剂，转移石墨烯的方法以及制造石墨烯装置的方法可以包括金属薄膜层图案和依次层叠在粘合剂构件上的石墨烯层。 金属薄膜层和石墨烯层可以具有相同的形状。 在制造石墨烯装置期间将石墨烯层转印到转印对象基板上之后，通过去除金属薄膜层的一部分，对金属薄膜层进行图案化以在石墨烯层的各个端部上形成电极。

公开(公告)号：US09053932B2

公开(公告)日：2015-06-09

申请号：US13917786

申请日：2013-06-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dong Wook Lee ,  Hyeon-jin Shin ,  Seong-jun Park ,  Kyung-eun Byun ,  David Seo ,  Hyun-jae Song ,  Yun-sung Woo ,  Jae-ho Lee ,  Hyun-jong Chung ,  Jin-seong Heo

IPC: H01L21/20 ,  H01L21/36 ,  C01B31/04 ,  H01L21/02 ,  H01L29/16

CPC classification number: H01L21/02527 ,  H01L21/0242 ,  H01L21/02529 ,  H01L21/02612 ,  H01L21/02656 ,  H01L29/1606

Abstract: A method of preparing graphene includes forming a silicon carbide thin film on a substrate, forming a metal thin film on the silicon carbide thin film, and forming a metal composite layer and graphene on the substrate by heating the silicon carbide thin film and the metal thin film.

Abstract translation: 制备石墨烯的方法包括在基板上形成碳化硅薄膜，在碳化硅薄膜上形成金属薄膜，通过加热碳化硅薄膜和金属薄膜，在基板上形成金属复合层和石墨烯 电影。

公开(公告)号：US09373685B2

公开(公告)日：2016-06-21

申请号：US14180928

申请日：2014-02-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyeon-jin Shin ,  Kyung-eun Byun ,  Hyun-jae Song ,  Seong-jun Park ,  David Seo ,  Yun-sung Woo ,  Dong-wook Lee ,  Jae-ho Lee ,  Hyun-jong Chung ,  Jin-seong Heo ,  In-kyeong Yoo

IPC: H01L29/78 ,  H01L29/16 ,  H01L51/00 ,  H01L51/42 ,  H01L51/50 ,  H01L51/05 ,  H01L29/786 ,  H01L31/028 ,  H01L33/34 ,  H01L31/08

CPC classification number: H01L29/1606 ,  H01L29/786 ,  H01L29/78642 ,  H01L29/78684 ,  H01L31/028 ,  H01L31/08 ,  H01L33/34 ,  H01L51/0046 ,  H01L51/0504 ,  H01L51/0558 ,  H01L51/0562 ,  H01L51/0566 ,  H01L51/057 ,  H01L51/428 ,  H01L51/50

Abstract: A graphene device and an electronic apparatus including the same are provided. According to example embodiments, the graphene device includes a transistor including a source, a gate, and a drain, an active layer through which carriers move, and a graphene layer between the gate and the active layer. The graphene layer may be configured to function both as an electrode of the active layer and a channel layer of the transistor.

Abstract translation: 提供了石墨烯装置和包括该石墨烯装置的电子装置。 根据示例性实施例，石墨烯装置包括晶体管，其包括源极，栅极和漏极，载流子移动的有源层以及栅极和有源层之间的石墨烯层。 石墨烯层可以被配置为既用作有源层的电极和晶体管的沟道层。