Magnetoresistive Memory Element having a Metal Oxide Tunnel Barrier
    4.
    发明申请
    Magnetoresistive Memory Element having a Metal Oxide Tunnel Barrier 审中-公开
    具有金属氧化物隧道屏障的磁阻存储元件

    公开(公告)号:US20160172582A1

    公开(公告)日:2016-06-16

    申请号:US15043633

    申请日:2016-02-15

    摘要: A magnetoresistive memory array including a plurality of magnetoresistive memory elements wherein each magnetoresistive memory element comprises a free layer including at least one ferromagnetic layer having perpendicular magnetic anisotropy, a fixed layer, and a tunnel barrier, disposed between and in contact with the free and fixed layers. The tunnel barrier includes a first metal-oxide layer, having a thickness between 1 and 10 Angstroms, a second metal-oxide layer, having a thickness between 3 and 6 Angstroms, disposed on the first metal-oxide layer, and a third metal-oxide layer, having a thickness between 3 and 6 Angstroms, disposed over the second metal-oxide layer. In one embodiment, the third metal-oxide layer is in contact with the free layer or fixed layer. The tunnel barrier may also include a fourth metal-oxide layer, having a thickness between 1 and 10 Angstroms, disposed between the second and third metal-oxide layers.

    摘要翻译: 一种包括多个磁阻存储元件的磁阻存储器阵列,其中每个磁阻存储元件包括自由层,该自由层包括至少一个具有垂直磁各向异性的铁磁层,固定层和隧道势垒,该自由层设置在自由和固定 层。 隧道势垒包括设置在第一金属氧化物层上的第一金属氧化物层,其厚度为1至10埃,厚度为3埃至6埃的第二金属氧化物层,以及第三金属氧化物层, 氧化物层,其厚度为3埃至6埃,设置在第二金属氧化物层上。 在一个实施例中,第三金属氧化物层与自由层或固定层接触。 隧道势垒还可以包括设置在第二和第三金属氧化物层之间的厚度在1埃和10埃之间的第四金属氧化物层。

    Magnetoresistive stack and method of fabricating same

    公开(公告)号:US10347828B2

    公开(公告)日:2019-07-09

    申请号:US16230031

    申请日:2018-12-21

    摘要: A magnetoresistive element (e.g., a spin-torque magnetoresistive memory element) includes a fixed magnetic layer, a free magnetic layer, having a high-iron alloy interface region located along a surface of the free magnetic layer, wherein the high-iron alloy interface region has at least 50% iron by atomic composition, and a first dielectric, disposed between the fixed magnetic layer and the free magnetic layer. The magnetoresistive element further includes a second dielectric, having a first surface that is in contact with the surface of the free magnetic layer, and an electrode, disposed between the second dielectric and a conductor. The electrode includes: (i) a non-ferromagnetic portion having a surface that is in contact with a second surface of the second dielectric, and (ii) a second portion having at least one ferromagnetic material disposed between the non-ferromagnetic portion of the electrode and the conductor.

    MAGNETORESISTIVE STACK AND METHOD OF FABRICATING SAME

    公开(公告)号:US20180226574A1

    公开(公告)日:2018-08-09

    申请号:US15941153

    申请日:2018-03-30

    摘要: A magnetoresistive element (e.g., a spin-torque magnetoresistive memory element) includes a fixed magnetic layer, a free magnetic layer, having a high-iron alloy interface region located along a surface of the free magnetic layer, wherein the high-iron alloy interface region has at least 50% iron by atomic composition, and a first dielectric, disposed between the fixed magnetic layer and the free magnetic layer. The magnetoresistive element further includes a second dielectric, having a first surface that is in contact with the surface of the free magnetic layer, and an electrode, disposed between the second dielectric and a conductor. The electrode includes: (i) a non-ferromagnetic portion having a surface that is in contact with a second surface of the second dielectric, and (ii) a second portion having at least one ferromagnetic material disposed between the non-ferromagnetic portion of the electrode and the conductor.