Abstract:
An integrated circuit having a CMOS circuit constituted by electrically connecting an n-type well 2, in which p-channel transistor Tp of the CMOS circuit is set, with a supply line Vdd through switching transistor Tps, and electrically connecting a p-type well 3, in which n-channel transistor Tn of the CMOS circuit is set, with supply line Vss through switching transistor Tns. Thermal runaway due to leakage current can be controlled by turning off switching transistors Tps and Tns and supplying potentials suitable for a test to the n-type well 2 and the p-type well 3 from an external unit when the integrated circuit is being tested. Fluctuations of the latch-up phenomenon and operation speed can be prevented by turning on switching transistors Tps and Tns and setting the n-type well 2 and the p-type well 3 to the voltages Vdd and Vss, respectively.
Abstract:
A high-frequency signal from a tape-shaped line section having a surface layer signal lead and surface layer GND lead disposed on both sides thereof is directly inputted to a semiconductor chip via a signal surface layer wiring of a package substrate and through solder bump electrodes. Alternatively, a high-frequency signal from the semiconductor chip is outputted to the outside via the tape-shaped line section in reverse. Owing to the transmission of the high-frequency signal by only a microstrip line at the whole surface layer of the package substrate, the high-frequency signal can be transmitted by only the microstrip line at the surface layer without through vias or the like. Accordingly, the high-frequency signal can be transmitted without a loss in frequency characteristic, and a high-quality high-frequency signal can be transmitted with a reduction in loss at high-frequency transmission.
Abstract:
A semiconductor device design method useful for the design of microprocessor, ASIC, and high-speed high-performance LSI is intended to enhance the accuracy of delay calculation and crosstalk noise calculation, and enhance the accuracy of assessment of delay variation caused by crosstalk and checking of malfunctioning caused by crosstalk. The method calculates the delay by using the total capacitance in consideration of the actual load after the layout and wiring, carries out the layout, wiring and modification of wiring repeatedly until targeted in-cycle transfer becomes attainable, calculates the delay by using the total capacitance in consideration of the actual load and crosstalk, carries out the modification of wiring repeatedly until targeted in-cycle transfer becomes attainable, calculates the crosstalk noise by using the total capacitance and coupling capacitance in consideration of the actual load, carries out the modification of wiring repeatedly until malfunctioning subsides, and uses data after the final layout and wiring for mask data.
Abstract:
A semiconductor integrated circuit device having a memory portion and a logic circuit portion formed with a same semiconductor substrate comprising a first logic circuit block, a second logic circuit block disposed in an area different from an area in which the first logic circuit block is disposed, and a pair of memory blocks oppositely disposed so that the second logic circuit block comes in between. Data stored in the pair of memory blocks are transmitted to the second logic circuit block for processing via a memory peripheral circuit provided on the second logic circuit block. A result of the data processing is transmitted to the first logic circuit block or an external device via an input/output circuit provided in the second logic circuit block.
Abstract:
A semiconductor IC device has an input/output circuit and an internal logic circuit connected with the input/output circuit formed in a main surface of a semiconductor substrate of a generally rectangular shape. The input/output circuit is divided into at least two input/output circuit blocks in such a manner that edges of the logic circuit blocks defined by the division on the main surface of the substrate extend in a direction substantially parallel with a pair of opposite sides of the substrate. The internal logic circuit is divided into at least three logic circuit blocks in such a manner that edges of the logic circuit blocks defined by the division on the main surface of the substrate extend in the above-mentioned direction. Each of the input/output circuit blocks is sandwiched by and electrically connected with adjacently arranged two of the logic circuit blocks.
Abstract:
Disclosed is a semiconductor integrated circuit wherein a logic circuit for exchanging signals with RAMS, with the RAMS being disposed centrally on the semiconductor chip or substrate, is divided into a plurality of logic circuits in accordance with the kind of signals and the divided logic circuits are disposed around the RAM in such a manner as to minimize the distance of signal transmission paths with the RAM and in order to attain high speed access to RAMS.
Abstract:
A semiconductor integrated circuit device includes an element separating first and second grooves formed to surround active regions to be formed with a semiconductor element. In addition a third groove is formed to surround at least a portion of the first groove, when viewed from a plane view. In the semiconductor integrated circuit device, the active regions and an element separating region of a silicon layer are insulated from each other by the separating grooves extending from the main surface of the silicon layer to an underlying insulating layer, and are fed with a common fixed potential.
Abstract:
A semiconductor integrated circuit device has a circuit construction which is devised with an output circuit for feeding an output current to an operating supply voltage in response to an output signal of a current switch circuit responding to an input signal. A constant current element for producing the operating current of the current switch circuit is fed with a constant voltage through a resistance element. A capacitor is coupled between the input of the constant current element and the operating supply voltage so that it constructs a time constant circuit together with the resistance element. The time constant circuit has a time constant set longer than the period of the output signal of the output circuit.
Abstract:
In a gate array with a RAM, by-pass signal lines which interconnect a logic section and I/O unit circuit of the gate array are disposed so as to extend above the RAM. In order to minimize mutual interference, signal lines formed from a layer which is adjacent to the by-pass signal lines are disposed so as to intersect the latter at right angles. In addition, interconnection pitches in different layers which extend parallel with each other are set so that noises are canceled in differential sense circuits.
Abstract:
An integrated circuit having a CMOS circuit constituted by electrically connecting an n-type well 2, in which p-channel transistor Tp of the CMOS circuit is set, with a supply line Vdd through switching transistor Tps, and electrically connecting a p-type well 3, in which n-channel transistor Tn of the CMOS circuit is set, with supply line Vss through switching transistor Tns. Thermal runaway due to leakage current can be controlled by turning off switching transistors Tps and Tns and supplying potentials suitable for a test to the n-type well 2 and the p-type well 3 from an external unit when the integrated circuit is being tested. Fluctuations of the latch-up phenomenon and operation speed can be prevented by turning on switching transistors Tps and Tns and setting the n-type well 2 and the p-type well 3 to the voltages Vdd and Vss, respectively.