Memory device using ion implant isolated conductive metal oxide
    1.
    发明授权
    Memory device using ion implant isolated conductive metal oxide 有权
    使用离子注入隔离导电金属氧化物的存储器件

    公开(公告)号:US08268667B2

    公开(公告)日:2012-09-18

    申请号:US13215895

    申请日:2011-08-23

    IPC分类号: H01L21/00

    摘要: Memory cell formation using ion implant isolated conductive metal oxide is disclosed, including forming a bottom electrode below unetched conductive metal oxide layer(s), forming the unetched conductive metal oxide layer(s) including depositing at least one layer of a conductive metal oxide (CMO) material (e.g., PrCaMnOx, LaSrCoOx, LaNiOx, etc.) over the bottom electrode. At least one portion of the layer of CMO is configured to act as a memory element without etching, and performing ion implantation on portions of the layer(s) of CMO to create insulating metal oxide (IMO) regions in the layer(s) of CMO. The IMO regions are positioned adjacent to electrically conductive CMO regions in the unetched layer(s) of CMO and the electrically conductive CMO regions are disposed above and in contact with the bottom electrode and form memory elements operative to store non-volatile data as a plurality of conductivity profiles (e.g., resistive states indicative of stored data).

    摘要翻译: 公开了使用离子注入隔离的导电金属氧化物的存储单元形成,包括在未蚀刻的导电金属氧化物层之下形成底部电极,形成未蚀刻的导电金属氧化物层,包括沉积至少一层导电金属氧化物( CMO)材料(例如,PrCaMnOx,LaSrCoOx,LaNiOx等)。 CMO层的至少一部分被配置为用作存储元件而不进行蚀刻,并且在CMO的层的部分上执行离子注入以在层的一个或多个层中形成绝缘金属氧化物(IMO)区域 CMO。 IMO区域邻近CMO的未蚀刻层中的导电CMO区域定位,并且导电CMO区域设置在底部电极的上方并与底部电极接触并且形成用于将非易失性数据存储为多个的存储元件 (例如,表示存储数据的电阻状态)。

    Memory element having islands
    9.
    发明申请
    Memory element having islands 有权
    具有岛的存储元件

    公开(公告)号:US20060028864A1

    公开(公告)日:2006-02-09

    申请号:US11021600

    申请日:2004-12-23

    IPC分类号: G11C11/00

    CPC分类号: G11C11/16

    摘要: A memory array with enhanced functionality is presented. Each cell in the array includes a pair of memory element electrodes. A read current across the pair of memory element electrodes is indicative of stored information and different write voltage levels across the pair of memory element electrodes are employed to store nonvolatile information. The array has at least one enhanced functionality portion that performs operations selected from the group consisting of reference, error correction, device specific storage, defect mapping tables, and redundancy.

    摘要翻译: 介绍了增强功能的内存阵列。 阵列中的每个单元包括一对存储元件电极。 一对存储元件电极上的读取电流表示存储的信息,并且跨该对存储元件电极的不同写入电压电平被用于存储非易失性信息。 该阵列具有至少一个增强功能部分,其执行从由参考,纠错,设备特定存储,缺陷映射表和冗余组成的组中选择的操作。