公开(公告)号：US20120001069A1

公开(公告)日：2012-01-05

申请号：US13152331

申请日：2011-06-03

申请人： Mitsuhiro Kashihara

发明人： Mitsuhiro Kashihara

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  G02B21/0004 ,  G02B21/26 ,  H01J37/023 ,  H01J37/16 ,  H01J37/226 ,  H01J37/228 ,  H01J2237/20235

摘要： Observation fields of an electron microscope image and an optical magnifying observation image are smoothly switched. A magnifying observation apparatus includes: a pair of end-face plates closes end faces of a body portion; an electron beam imaging device mounted on a first position of a cylindrical shaped outer surface of the body portion; an optical imaging device mounted on a second position being different from the first position in the outer surface; a rotating device that rotates the both imaging devices along the outer surface such that a distance from each of the both imaging devices to a common rotation axis of the both imaging devices is kept constant and optical axes of the both imaging devices are oriented toward the rotation axis; a specimen stage that is disposed in the chamber, and arranged to a position that is substantially the same to a height of the rotation axis.

摘要翻译： 平滑地切换电子显微镜图像和光学放大观察图像的观察场。 放大观察装置包括：一对端面板封闭主体部分的端面; 安装在所述主体部分的圆柱形外表面的第一位置上的电子束成像装置; 安装在与外表面中的第一位置不同的第二位置的光学成像装置; 旋转装置，其使两个成像装置沿着外表面旋转，使得从两个成像装置中的每一个到两个成像装置的公共旋转轴线的距离保持恒定，并且两个成像装置的光轴朝向旋转 轴; 所述试样台设置在所述室内，并配置在与所述旋转轴的高度大致相同的位置。

公开(公告)号：US08076658B2

公开(公告)日：2011-12-13

申请号：US12502567

申请日：2009-07-14

申请人： Franz Vokurka

发明人： Franz Vokurka

IPC分类号： G21K5/10 ,  B23K15/00

CPC分类号： B23K15/06 ,  B23K15/002 ,  H01J37/023 ,  H01J37/147 ,  H01J37/16 ,  H01J37/315 ,  H01J2237/0245 ,  H01J2237/1503 ,  H01J2237/166

摘要： An electron beam processing device includes a chamber housing that defines a chamber interior space and has a first opening. A carriage is movable along the first opening. An electron beam generator is disposed on the carriage so that the generated electron beam passes through the first opening when the carriage moves along the first opening. A disk is disposed between the chamber housing and the carriage and is rotatable about a rotational axis, which is perpendicular to the first opening, at least between a first rotational position and a second rotational position. The disk has a second opening spaced from the rotational axis of the disk in the radial direction. The rotational axis of the disk is disposed so that the first opening always overlaps the second opening at least along an electron beam propagation axis when the disk rotates between the first and second rotational positions.

摘要翻译： 电子束处理装置包括限定腔室内部空间并具有第一开口的腔室壳体。 托架可沿着第一开口移动。 电子束发生器设置在滑架上，使得当滑架沿着第一开口移动时，所产生的电子束通过第一开口。 盘被布置在腔室壳体和托架之间，并且可绕至少在第一旋转位置和第二旋转位置之间绕与第一开口垂直的旋转轴线旋转。 盘具有沿径向与盘的旋转轴线间隔开的第二开口。 盘的旋转轴线设置成使得当盘在第一和第二旋转位置之间旋转时，至少第一开口总是与电子束传播轴线重叠。

公开(公告)号：US07921465B2

公开(公告)日：2011-04-05

申请号：US12191855

申请日：2008-08-14

申请人： Vladimir Ukraintsev

发明人： Vladimir Ukraintsev

IPC分类号： G01Q40/00

CPC分类号： G01Q70/16 ,  G01Q30/02 ,  H01J37/023 ,  H01J37/067 ,  H01J37/073 ,  H01J37/08 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0807 ,  H01J2237/188

摘要： A system (100) for characterizing surfaces can include a nanotip microscope (104) in a first pressure envelope (102) at a first pressure with an electrically conductive nanotip (110) mounted thereon for characterizing a sample surface. The system can also include an ion imaging system (122, 124, 128) within a second pressure envelope (120) at a second pressure. The second pressure can less than or equal to the first pressure and the pressure envelopes (102, 120) can be separated by a pressure limiting aperture (PLA) (132). The system can further include gas sources (116, 118) for introducing into the first pressure envelope (102) at least one gas, and a voltage supply (114) coupled to the nanotip (110) for generating an electric field between the nanotip (114) and the PLA (132). In the system, the electric field repels and ionizes molecules or atoms of the gas in proximity to the nanotip (110) and the ion imaging system (122, 124, 128) collects at least a portion the repelled and ionized molecules or atoms traversing the PLA (132) to image the nanotip (110).

摘要翻译： 用于表征表面的系统（100）可以包括在第一压力下的第一压力外壳（102）中的纳米管显微镜（104），其上安装有用于表征样品表面的导电纳米尖端（110）。 该系统还可以包括在第二压力下的第二压力封套（120）内的离子成像系统（122,124,128）。 第二压力可以小于或等于第一压力，并且压力包络（102,120）可以通过压力限制孔（PLA）（132）分离。 该系统还可以包括用于将至少一种气体引入第一压力外壳（102）的气体源（116,118），以及耦合到所述纳米尖端（110）的电压源（114），用于在所述纳米尖端 114）和解放军（132）。 在系统中，电场排斥并离子化离子纳米尖端（110）附近的气体的分子或原子，并且离子成像系统（122,124,128）收集至少一部分被排斥和离子化的分子或原子穿过 PLA（132）以对纳米尖端（110）成像。

公开(公告)号：US20110012018A1

公开(公告)日：2011-01-20

申请号：US12837857

申请日：2010-07-16

申请人： Bryan BARNARD ,  Christopher Glenister

发明人： Bryan BARNARD ,  Christopher Glenister

IPC分类号： H01J37/141 ,  H01J47/00 ,  G01N23/22

CPC分类号： H01J37/141 ,  H01J37/023 ,  H01J37/21 ,  H01J37/285 ,  H01J2237/1405

摘要： The invention provides a magnetic lens for generating a magnetic imaging field to focus charged particles emitted from a sample, the lens comprising a central pole piece and an outer pole piece disposed about the central pole piece, wherein the lens comprises a magnetic moveable element for movement relative to at least one of the pole pieces, whereby a focal length of the lens is variable by said movement of the magnetic moveable element, thereby enabling a zoom facility for changing the magnification of an image. The movement of the moveable element preferably changes the magnetic circuit between the pole pieces. Also provided is a method of focusing charged particles emitted from a sample and a charged particle energy analyzer, such as an imaging photoelectron spectroscopy system.

摘要翻译： 本发明提供一种用于产生磁成像场的磁透镜，用于聚焦从样品发射的带电粒子，所述透镜包括中心极片和设置在中心极片周围的外极片，其中所述透镜包括用于移动的磁性可移动元件 相对于极片中的至少一个，由此通过所述磁性可移动元件的移动可以使透镜的焦距变化，由此实现用于改变图像的放大率的变焦设备。 可移动元件的移动优选地改变极片之间的磁路。 还提供了一种聚焦从样品发射的带电粒子和带电粒子能量分析仪（诸如成像光电子能谱系统）的方法。

公开(公告)号：US20100224781A1

公开(公告)日：2010-09-09

申请号：US12711467

申请日：2010-02-24

申请人： Fumio Hosokawa

发明人： Fumio Hosokawa

IPC分类号： G01N23/02

CPC分类号： H01J37/28 ,  H01J37/023 ,  H01J37/09 ,  H01J37/153 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/1534 ,  H01J2237/2802 ,  H01J2237/2823

摘要： An electron microscope is offered which facilitates aberration correction even during high-magnification imaging. The microscope has a spherical aberration corrector, a transfer lens system mounted between the corrector and an objective lens, an aperture stop mounted in a stage preceding the corrector so as to be movable relative to the optical axis, and an angular aperture stop mounted at or near the principal plane of the transfer lens system movably relative to the optical axis to adjust the angular aperture of the electron beam.

摘要翻译： 提供了即使在高倍率成像期间也能进行像差校正的电子显微镜。 显微镜具有球面像差校正器，安装在校正器和物镜之间的转印透镜系统，安装在校正器之前的阶段中以相对于光轴可移动的孔径光阑，以及安装在或 在转移透镜系统的主平面附近相对于光轴可移动地调节电子束的角孔径。

公开(公告)号：US07750321B2

公开(公告)日：2010-07-06

申请号：US11854910

申请日：2007-09-13

申请人： Gabriel Kienlen

发明人： Gabriel Kienlen

IPC分类号： H01J37/317 ,  H01J37/36

CPC分类号： H01J37/023 ,  H01J2237/31701

摘要： A positioning device for positioning an aperture plate in an ion beam of an ion implantation system has two fixture parts that can be moved relative to each other by means of at least one positioning drive, of which the one fixture part can be connected or is connected to an abutment point that is disposed in a fixed location relative to an ion beam source, and the other fixture part can be connected or is connected to the aperture plate. An adjustment device has a fixture device and a display device. By means of the position-changing device, it is possible to change the position of at least one of the fixture parts relative to the positioning drive. By means of the display device it is possible to check whether the fixture parts are in a predetermined position relative to each other. On the first fixture part or in a part that is connected thereto in a fixed position, the display device has at least one reference mark and on the second fixture part at least one optical projection device by which means at least one optical marking that is assigned to a reference mark, of which at least one must be present, can be projected onto the first fixture part.

摘要翻译： 用于将孔板定位在离子注入系统的离子束中的定位装置具有两个固定部件，该固定部件可以通过至少一个定位驱动器相对于彼此移动，一个夹具部件可以连接或连接 到相对于离子束源设置在固定位置的邻接点，并且另一个固定部分可以连接或连接到孔板。 调整装置具有固定装置和显示装置。 通过位置改变装置，可以相对于定位驱动器改变固定部件中的至少一个的位置。 通过显示装置，可以检查夹具部件是否处于相对于彼此的预定位置。 在第一固定部件或与固定位置连接的部件中，显示装置具有至少一个参考标记，并且在第二固定部件上具有至少一个光学投影装置，通过该至少一个光学投影装置，指定至少一个光学标记 到其中至少必须存在的参考标记可以投影到第一固定部件上。

公开(公告)号：US07417227B2

公开(公告)日：2008-08-26

申请号：US11294470

申请日：2005-12-06

申请人： Takao Matsumoto ,  Masanari Koguchi

发明人： Takao Matsumoto ,  Masanari Koguchi

IPC分类号： G01N23/00 ,  G21K7/00

CPC分类号： H01J37/28 ,  G03H5/00 ,  H01J37/023 ,  H01J37/244 ,  H01J2237/1502 ,  H01J2237/1514 ,  H01J2237/225 ,  H01J2237/228 ,  H01J2237/2447 ,  H01J2237/24495 ,  H01J2237/24564 ,  H01J2237/2487 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2803

摘要： The conventional detection technique has the following problems in detecting interference fringes: (1) Setting and adjustment are complex and difficult to conduct; (2) A phase image and an amplitude image cannot be displayed simultaneously; and (3) Detection efficiency of electron beams is low. The invention provides a scanning interference electron microscope which is improved in detection efficiency of electron beam interference fringes, and enables the user to observe electric and magnetic information easily in a micro domain of a specimen as a scan image of a high S/N ratio under optimum conditions.

摘要翻译： 常规检测技术在检测干涉条纹方面存在以下问题：（1）设置和调整复杂，难以进行; （2）相位图像和振幅图像不能同时显示; （3）电子束的检测效率低。 本发明提供了扫描干涉电子显微镜，其提高了电子束干涉条纹的检测效率，并且使得用户能够在样本的微区域中容易地观察电磁信息作为高S / N比的扫描图像 最佳条件。

公开(公告)号：US07230257B2

公开(公告)日：2007-06-12

申请号：US11074645

申请日：2005-03-09

申请人： Shinji Uchida

发明人： Shinji Uchida

IPC分类号： H01J37/304 ,  H01J37/30 ,  G21K5/10

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/023 ,  H01J2237/0216 ,  H01J2237/0245

摘要： An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage 4A arranged in the sample chamber 3 for holding and moving the wafer 10; and first mounting 5A for elastically supporting the column 1 with respect to the sample chamber 3.

摘要翻译： 一种电子束曝光装置，包括：用于将电子束照射到用作样品的晶片10的列1; 样品室3，其具有真空泵40作为用于将内部单元控制到真空气氛的真空耗尽单元; 设置在样品室3中用于保持和移动晶片10的阶段4A; 并且首先安装5A用于相对于样品室3弹性地支撑柱1。

公开(公告)号：US20060113493A1

公开(公告)日：2006-06-01

申请号：US11202111

申请日：2005-08-12

申请人： Mitsuaki Kabasawa ,  Mitsukuni Tsukihara

发明人： Mitsuaki Kabasawa ,  Mitsukuni Tsukihara

IPC分类号： H01J37/08 ,  G21K5/10

CPC分类号： H01J37/3171 ,  H01J27/024 ,  H01J37/023 ,  H01J37/05 ,  H01J37/1474 ,  H01J37/1478 ,  H01J37/15 ,  H01J37/3007 ,  H01J2237/0041 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0458 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/0835 ,  H01J2237/1536 ,  H01J2237/24405 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/30477 ,  H01J2237/31705

摘要： The present invention is a method to enhance accuracy of irradiation with beam for an irradiation system with a beam. The irradiation system comprises a beam generation source, a mass analysis device, a beam transformer, a scanner which swings the beam reciprocally with high speed, a beam parallelizing device, an acceleration/deceleration device, an energy filtering device, and beam monitors. The beam transformer comprises a vertically focusing synchronized quadrupole electromagnet syQD and a horizontally focusing synchronized quadrupole electromagnet syQF. Consequently, it is possible to correct at least one of a deviation in beam divergence angle and a deviation in beam size within a range between a center trajectory and an outer trajectory after swinging of the beam by the scanner.

摘要翻译： 本发明是提高具有光束的照射系统的光束照射精度的方法。 照射系统包括光束产生源，质量分析装置，光束变换器，高速摆动光束的扫描器，光束并行化装置，加速/减速装置，能量过滤装置和光束监视器。 光束变换器包括垂直聚焦同步四极电磁体syQD和水平聚焦同步四极电磁体syQF。 因此，可以通过扫描仪摆动光束之后，在中心轨迹和外部轨迹之间的范围内校正光束发散角的偏差和光束尺寸的偏差中的至少一个。

公开(公告)号：US20060113466A1

公开(公告)日：2006-06-01

申请号：US11202100

申请日：2005-08-12

申请人： Mitsuaki Kabasawa ,  Mitsukuni Tsukihara ,  Hiroshi Sogabe

发明人： Mitsuaki Kabasawa ,  Mitsukuni Tsukihara ,  Hiroshi Sogabe

IPC分类号： B01D59/44

CPC分类号： H01J37/3171 ,  H01J27/024 ,  H01J37/023 ,  H01J37/05 ,  H01J37/09 ,  H01J37/1474 ,  H01J37/1478 ,  H01J37/15 ,  H01J37/3007 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0458 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/0835 ,  H01J2237/1536 ,  H01J2237/24405 ,  H01J2237/24507 ,  H01J2237/30477 ,  H01J2237/31705

摘要： An irradiation system comprises a beam generation source, a mass analysis device, a beam transformer, a deflector for scanning which swings the beam reciprocally, a beam parallelizing device, an acceleration/deceleration device, and an energy filtering device. According to this invention, a hybrid angular energy filter generating both electric and magnetic fields to bend trajectories is provided as the energy filtering device. A pair of multi-surface energy slit units each having a plurality of energy slits that are switchable therebetween depending on an ion species for irradiation are further provided on a downstream side of the hybrid angular energy filter. It is possible to selectively irradiate a target wafer with high-current beams from low energy to high energy in the conditions where contamination such as neutral particles, different kinds of dopants, ions with different energies, metal, and dust particles is extremely small in amount.

摘要翻译： 照射系统包括光束产生源，质量分析装置，光束变换器，用于使光束往复摆动的扫描偏转器，光束并行化装置，加速/减速装置以及能量过滤装置。 根据本发明，提供了产生电场和磁场以弯曲轨迹的混合角能量滤波器作为能量过滤装置。 在混合角能量滤波器的下游侧还设置有一对多表面能量狭缝单元，其具有可根据用于照射的离子种类在其间切换的多个能量狭缝。 在诸如中性粒子，不同种类的掺杂剂，具有不同能量的离子，金属和灰尘颗粒的污染物的量非常小的条件下，可以从具有低能量到高能量的大电流束选择性地照射目标晶片 。