Electron beam deflecting apparatus with reduced settling time period
    71.
    发明授权
    Electron beam deflecting apparatus with reduced settling time period 失效
    减少沉降时间的电子束偏转装置

    公开(公告)号:US5530250A

    公开(公告)日:1996-06-25

    申请号:US325871

    申请日:1994-10-19

    Abstract: In an electron beam deflecting apparatus including an electromagnetic deflection unit and a driver for driving the electromagnetic deflection unit in accordance with a main deflection amount, when a current main deflection amount is different from a previous main deflection amount, a corrected main deflection amount, which is an opposite value of the previous main deflection amount with respect to the current main deflection amount, is calculated as the main deflection amount.

    Abstract translation: 在包括电磁偏转单元和用于根据主偏转量驱动电磁偏转单元的驱动器的电子束偏转装置中,当当前主偏转量与先前主偏转量不同时,修正主偏转量, 是相对于当前主偏转量的先前主偏转量的相反值,被计算为主偏转量。

    Phase-compensating vibration cancellation system for scanning electron
microscopes
    72.
    发明授权
    Phase-compensating vibration cancellation system for scanning electron microscopes 失效
    用于扫描电子显微镜的相位补偿振动消除系统

    公开(公告)号:US5049745A

    公开(公告)日:1991-09-17

    申请号:US566591

    申请日:1990-08-13

    CPC classification number: H01J37/1474 H01J37/02 H01J2237/0216 H01J2237/1504

    Abstract: A system for adjusting the scanning pattern of an electron beam in a scanning electron microscope to decrease image sensitivity to vibrations. In the system, a seismometer is connected to sense displacement velocity caused by vibrations, an integrator is provided for integrating signals from the seisometer, and a phase compensation system is provided for operating upon the integrated signals to provide phase compensated signals that are substantialy 180 degrees out of phase with the sensed vibrations. The phase-compensated signals are used for adjusting the normal scanning pattern of the electron beam microscope to reduce the effects of the sensed vibrations on images provided by the microscope.

    Abstract translation: 一种用于在扫描电子显微镜中调整电子束的扫描图案以降低对振动的图像敏感度的系统。 在该系统中,连接地震仪以感测由振动引起的位移速度,提供积分器用于积分来自测距仪的信号,并且提供相位补偿系统用于对积分信号进行操作,以提供大致180度的相位补偿信号 与感测到的振动异相。 相位补偿信号用于调整电子束显微镜的正常扫描图案,以减少感测振动对由显微镜提供的图像的影响。

    CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD
    75.
    发明申请
    CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD 有权
    充电颗粒光束绘图装置和充电颗粒光束绘图方法

    公开(公告)号:US20160343535A1

    公开(公告)日:2016-11-24

    申请号:US15070679

    申请日:2016-03-15

    Inventor: Hideki MATSUI

    Abstract: In one embodiment, a charged particle beam drawing apparatus deflects a charged particle beam with a deflector to draw a pattern. The apparatus includes a storage unit that stores an approximate formula indicating a correspondence relationship between a settling time for a DAC amplifier that controls the deflector, and a position shift amount, from a design position, of a drawn position of each evaluation pattern drawn on a first substrate while the settling time and an amount of deflection by the deflector are changed, a shot position correction unit that creates a correction formula indicating a relationship between an amount of deflection and a shot position shift amount at the settling time, from the approximate formula and the settling time for the DAC amplifier based on an amount of deflection of a shot, obtains a position correction amount by using the amount of deflection of the shot and the correction formula, and corrects a shot position defined by the shot data based on the position correction amount, and a drawing unit that performs drawing by using the shot data with a corrected shot position.

    Abstract translation: 在一个实施例中,带电粒子束描绘装置使带电粒子束偏转导流板以绘制图案。 该装置包括:存储单元,存储表示在控制偏转器的DAC放大器的建立时间之间的对应关系的近似式,以及从设计位置到绘制在每个评估图案的绘制位置的位置偏移量 第一基板,同时改变了偏转器的稳定时间和偏转量;拍摄位置校正单元,从近似公式产生指示偏转量与拍摄位置偏移量之间的关系的校正公式, 并且基于射击偏转量的DAC放大器的建立时间,通过使用镜头的偏转量和校正公式来获得位置校正量,并且基于镜头数据来校正由镜头数据定义的镜头位置 位置校正量,以及通过使用具有校正的拍摄位置的拍摄数据进行绘制的绘图单元。

    Charged Particle Beam Device
    76.
    发明申请
    Charged Particle Beam Device 有权
    带电粒子束装置

    公开(公告)号:US20160329186A1

    公开(公告)日:2016-11-10

    申请号:US15109230

    申请日:2014-12-16

    Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit. In the charged particle beam device that includes an electronic optical system radiating a concentrated electron beam onto a sample placed on a stage to perform scanning and captures an image of the sample, a reference signal and a signal generation unit of a voltage-source control signal applied to the electrostatic deflector generating the electrostatic deflector and a reference signal and a signal generation unit of a current-source control signal applied to the electromagnetic deflector generating a magnetic field are made common in an overlapping-electromagnetic-deflector control unit that controls a path of the secondary electrons/reflected electrons incident on a detector, and frequency characteristics and phase characteristics of the voltage control signal are coincident with those of the current-source control signal.

    Abstract translation: 提供一种处理装置和处理方法,其使用以大角度实现二次电子/反射电子的偏离的带电粒子束装置,并且消除电磁偏转器和静电偏转器的噪声,以抑制初级 电子束由主光束/次光束分离电路的电路噪声引起。 在带电粒子束装置中,包括电子光学系统,该电子光学系统将集中的电子束辐射到放置在载物台上的样品上以进行扫描并捕获样品的图像,参考信号和电压源控制信号的信号产生单元 施加到产生静电偏转器的静电偏转器,并且施加到产生磁场的电磁偏转器的电流源控制信号的参考信号和信号产生单元在控制路径的重叠电磁偏转器控制单元中是共同的 的入射到检测器上的二次电子/反射电子,并且电压控制信号的频率特性和相位特性与电流源控制信号的频率特性和相位特性一致。

    CHARGED PARTICLE BEAM ADJUSTMENT ASSISTANCE DEVICE AND METHOD
    77.
    发明申请
    CHARGED PARTICLE BEAM ADJUSTMENT ASSISTANCE DEVICE AND METHOD 审中-公开
    充电颗粒束调整辅助装置和方法

    公开(公告)号:US20150124077A1

    公开(公告)日:2015-05-07

    申请号:US14397475

    申请日:2013-04-04

    Abstract: A charged particle beam adjustment assistance device that can assist work to adjust a charged particle beam apparatus having a three-dimensional observing function and reduce human labor and man-hours required for adjustment value inputting is provided.An adjustment value acquiring unit generates optimal three-dimensional adjustment value information on the basis of two-dimensional adjustment value information and two/three-dimensional adjustment value correspondence information generated according to information inputted from a charged particle beam adjuster terminal, transmits the three-dimensional adjustment value information to the charged particle beam apparatus, and sets the three-dimensional adjustment value information therein. Therefore, the charged particle beam adjuster can reduce adjusting work required for three-dimensional observation and facilitate the work of observing three-dimensional images.

    Abstract translation: 提供一种带电粒子束调节辅助装置,其能够辅助工作来调整具有三维观察功能的带电粒子束装置,并减少调节值输入所需的人力和工时。 调整值获取单元基于二维调整值信息和根据从带电粒子束调节器终端输入的信息生成的二维/三维调整值对应信息生成最佳三维调整值信息, 将三维调整值信息设置在带电粒子束装置中,并设定三维调整值信息。 因此,带电粒子束调节器可以减少三维观察所需的调整工作,便于观察三维图像的工作。

    PROCESSING APPARATUS AND METHOD USING A SCANNING ELECTRON MICROSCOPE
    78.
    发明申请
    PROCESSING APPARATUS AND METHOD USING A SCANNING ELECTRON MICROSCOPE 有权
    处理装置和使用扫描电子显微镜的方法

    公开(公告)号:US20150041643A1

    公开(公告)日:2015-02-12

    申请号:US14301403

    申请日:2014-06-11

    Abstract: The present invention provides a processing apparatus using a scanning electron microscope, which includes the scanning electron microscope having an electron optical system radiating and scanning a focused electron beam on a sample placed on a stage to image the sample, and an image processing/control section which controls the scanning electron microscope and processes the image obtained by imaging with the scanning electron microscope. The electron optical system of the scanning electron microscope has image shift electrodes comprised of electrostatic electrodes, the image shift electrodes moving a position at which to apply the focused electron beam onto the sample with the stage stopped to thereby shift a region in which the sample is to be imaged.

    Abstract translation: 本发明提供一种使用扫描型电子显微镜的处理装置,该扫描型电子显微镜具有扫描型电子显微镜,该扫描型电子显微镜具有电子光学系统,该放射线照射放置在载置台上的样品上以聚焦的电子束,以对图像进行成像,图像处理/ 其控制扫描电子显微镜并用扫描电子显微镜对通过成像获得的图像进行处理。 扫描电子显微镜的电子光学系统具有由静电电极构成的图像移动电极,图像移动电极移动将聚焦电子束施加到样品上的位置,停止载体,从而移动样品的区域 被成像。

    DA conversion device and electron beam exposure system using the same
    79.
    发明授权
    DA conversion device and electron beam exposure system using the same 有权
    DA转换装置和使用其的电子束曝光系统

    公开(公告)号:US08618970B2

    公开(公告)日:2013-12-31

    申请号:US13682311

    申请日:2012-11-20

    Abstract: A DA conversion device includes a current output type DA converter, a high-speed operational amplifier operating at a low voltage and configured to generate a voltage corresponding to an output current from the DA converter, and a buffer amplifier connected to an output terminal of the high-speed operational amplifier and operating at a high voltage. The device also includes positive and negative floating power supplies separated from a power supply system and provided as power supplies for driving the DA converter and the high-speed operational amplifier. A midpoint between potentials at the floating power supplies is connected to an output terminal of the buffer amplifier to cause the DA converter and the high-speed operational amplifier to operate mainly based on an output voltage from the buffer amplifier.

    Abstract translation: DA转换装置包括电流输出型DA转换器,低电压运行的高速运算放大器,其被配置为产生与来自DA转换器的输出电流相对应的电压;以及缓冲放大器,连接到所述DA转换器的输出端子 高速运算放大器,工作在高电压。 该装置还包括与电源系统分离的正和负浮动电源,并且作为用于驱动DA转换器和高速运算放大器的电源提供。 浮动电源的电位之间的中点连接到缓冲放大器的输出端子,使得DA转换器和高速运算放大器主要基于来自缓冲放大器的输出电压来运行。

    DA CONVERSION DEVICE AND ELECTRON BEAM EXPOSURE SYSTEM USING THE SAME
    80.
    发明申请
    DA CONVERSION DEVICE AND ELECTRON BEAM EXPOSURE SYSTEM USING THE SAME 有权
    DA转换装置和使用其的电子束曝光系统

    公开(公告)号:US20130270449A1

    公开(公告)日:2013-10-17

    申请号:US13682311

    申请日:2012-11-20

    Abstract: A DA conversion device includes a current output type DA converter, a high-speed operational amplifier operating at a low voltage and configured to generate a voltage corresponding to an output current from the DA converter, and a buffer amplifier connected to an output terminal of the high-speed operational amplifier and operating at a high voltage. The device also includes positive and negative floating power supplies separated from a power supply system and provided as power supplies for driving the DA converter and the high-speed operational amplifier. A midpoint between potentials at the floating power supplies is connected to an output terminal of the buffer amplifier to cause the DA converter and the high-speed operational amplifier to operate mainly based on an output voltage from the buffer amplifier.

    Abstract translation: DA转换装置包括电流输出型DA转换器,低电压运行的高速运算放大器,其被配置为产生与来自DA转换器的输出电流相对应的电压;以及缓冲放大器,连接到所述DA转换器的输出端子 高速运算放大器,工作在高电压。 该装置还包括与电源系统分离的正和负浮动电源,并且作为用于驱动DA转换器和高速运算放大器的电源提供。 浮动电源的电位之间的中点连接到缓冲放大器的输出端子,使得DA转换器和高速运算放大器主要基于来自缓冲放大器的输出电压来运行。

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