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71.
公开(公告)号:US11848390B2
公开(公告)日:2023-12-19
申请号:US17853998
申请日:2022-06-30
发明人: Chen-Hao Huang , Hau-Yan Lu , Sui-Ying Hsu , YuehYing Lee , Chien-Ying Wu , Chia-Ping Lai
IPC分类号: H01L31/0203 , H01L31/0312 , H01L31/18 , H01L31/103 , H01L31/105 , H01L31/0352
CPC分类号: H01L31/0203 , H01L31/0312 , H01L31/035281 , H01L31/105 , H01L31/1037 , H01L31/1812
摘要: At least one doped silicon region is formed in a silicon layer of a semiconductor substrate, and a silicon oxide layer is formed over the silicon layer. A germanium-containing material portion is formed in the semiconductor substrate to provide a p-n junction or a p-i-n junction including the germanium-containing material portion and one of the at least one doped silicon region. A capping material layer that is free of germanium is formed over the germanium-containing material portion. A first dielectric material layer is formed over the silicon oxide layer and the capping material layer. The first dielectric material layer includes a mesa region that is raised from the germanium-containing material portion by a thickness of the capping material layer. The capping material layer may be a silicon capping layer, or may be subsequently removed to form a cavity. Dark current is reduced for the germanium-containing material portion.
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公开(公告)号:US11848352B2
公开(公告)日:2023-12-19
申请号:US17467686
申请日:2021-09-07
发明人: Po-Chia Lai , Chun-Yen Lee , Stefan Rusu
IPC分类号: H01L23/522 , H01L21/768 , H01L49/02 , H01L27/08
CPC分类号: H01L28/60 , H01L21/76838 , H01L23/5223 , H01L23/5226 , H01L27/0805
摘要: Integrated circuit (IC) devices include a metal-insulator-metal (MIM) capacitor having a top electrode plate, a bottom electrode plate, and a plurality of intermediate electrode plates between the top electrode plate and the bottom electrode plate. A plurality of dielectric layers may separate each of the electrode plates of the MIM capacitor from adjacent plates of the MIM capacitor. Each of the intermediate electrode plates may have a thickness that is greater than a thickness of the top electrode plate and the bottom electrode plate. By providing multiple intermediate electrode plates between the top and bottom electrode plates of the MIM capacitor, and allocating the greatest plate thicknesses to the intermediate plates, the capacitance density may be increased in a given area of the IC device, which may provide increased performance for the IC device.
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73.
公开(公告)号:US11848291B2
公开(公告)日:2023-12-19
申请号:US17470174
申请日:2021-09-09
发明人: Jheng-Hong Jiang , Shing-Huang Wu , Chia-Wei Liu
IPC分类号: H01L23/66 , H01L23/522 , H01L49/02 , H01L21/768
CPC分类号: H01L23/66 , H01L21/76849 , H01L23/5226 , H01L28/90 , H01L2223/6616 , H01L2223/6672 , H01L2223/6688
摘要: Devices and methods of manufacture for a graduated, “step-like,” semiconductor structure having two or more resonator trenches. A semiconductor structure may comprise a first resonator and a second resonator. The first resonator comprising a first metallic resonance layer and a capping plate having a bottom surface that is a first distance from a distal end of the first metallic resonance layer 128. The second resonator comprising a second metallic resonance layer and the capping plate, in which the bottom surface is a second distance from a from a distal end of the second metallic resonance layer 128b, and in which first distance is different from the second distance.
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公开(公告)号:US11848047B2
公开(公告)日:2023-12-19
申请号:US17010901
申请日:2020-09-03
IPC分类号: G11C11/419 , G11C7/12
CPC分类号: G11C11/419 , G11C7/12
摘要: In one embodiment, a static random access memory (SRAM) device is provided. The SRAM device includes a memory cell, a bit line couple to the memory cell, a voltage supply line coupled to the memory cell, a control circuitry. The control circuitry is configured to charge a voltage supply line while the voltage supply line is electrically isolated from a bit line. A portion of the charge is transferred from the voltage supply line to the bit line. The voltage supply line is recharged while the voltage supply line is electrically isolated from the bit line storing the transferred portion of the charge. The memory cell is accessed using the recharge on the voltage supply line.
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公开(公告)号:US11843050B2
公开(公告)日:2023-12-12
申请号:US17397035
申请日:2021-08-09
发明人: Pei-Yu Wang , Sai-Hooi Yeong
IPC分类号: H01L29/78 , H01L29/786 , H01L29/08 , H01L29/165 , H01L21/02 , H01L29/66 , H01L29/06 , H01L29/423
CPC分类号: H01L29/7848 , H01L21/02488 , H01L21/02529 , H01L21/02532 , H01L21/02535 , H01L29/0673 , H01L29/0847 , H01L29/165 , H01L29/42392 , H01L29/66636 , H01L29/66742 , H01L29/66795 , H01L29/7843 , H01L29/7851 , H01L29/78618 , H01L29/78696
摘要: A method for forming a semiconductor arrangement comprises forming a fin over a semiconductor layer. A gate structure is formed over a first portion of the fin. A second portion of the fin adjacent to the first portion of the fin and a portion of the semiconductor layer below the second portion of the fin are removed to define a recess. A stress-inducing material is formed in the recess. A first semiconductor material is formed in the recess over the stress-inducing material. The first semiconductor material is different than the stress-inducing material.
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公开(公告)号:US11837619B2
公开(公告)日:2023-12-05
申请号:US17458720
申请日:2021-08-27
发明人: Feng-Chien Hsieh , Yun-Wei Cheng , Kuo-Cheng Lee , Cheng-Ming Wu
IPC分类号: H01L27/146
CPC分类号: H01L27/1463 , H01L27/14649 , H01L27/14683
摘要: A semiconductor arrangement includes a photodiode extending to a first depth from a first side in a substrate. An isolation structure laterally surrounds the photodiode and includes a first well that extends into a first side of the substrate. A deep trench isolation extends into a second side of the substrate and at least a portion of the deep trench isolation underlies the first well.
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77.
公开(公告)号:US20230389341A1
公开(公告)日:2023-11-30
申请号:US18362192
申请日:2023-07-31
发明人: Chao-I WU , Yu-Ming LIN
IPC分类号: H10B99/00
CPC分类号: H10B99/00
摘要: A disclosed memory structure includes a first memory region including a first memory array of SRAM memory devices, a second memory region including a second memory array of 1T1C memory devices, and a third memory region including a third memory array of FeFET memory devices. The memory structure further includes at least one data bus laterally extending across the first memory region, the second memory region, and third memory region and configured to provide data transfer among the first memory array, the second memory array, and the third memory array. The memory structure further includes a plurality of peripheral circuit devices formed at a semiconductor material layer of the memory structure, the peripheral circuit devices configured to control the first memory array, the second memory array, and the third memory array. At least one of the second memory array and the third memory array may be a 3-dimensional memory array.
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78.
公开(公告)号:US20230386946A1
公开(公告)日:2023-11-30
申请号:US17828064
申请日:2022-05-31
发明人: Hsien-Wei Chen , Meng-Liang Lin , Shin-Puu Jeng
IPC分类号: H01L23/13 , H01L25/065 , H01L23/498 , H01L21/48
CPC分类号: H01L23/13 , H01L25/0655 , H01L23/49816 , H01L23/49822 , H01L23/49833 , H01L23/49838 , H01L21/4853 , H01L24/73
摘要: A semiconductor structure includes a packaging substrate containing at least one trench located between a first region and a second region, a first chip module bonded to the first region of the packaging substrate through first solder material portions, and a second chip module bonded to the second region of the packaging substrate through second solder material portions. A first underfill material portion laterally surrounds the first solder material portions and extends into a first portion of the at least one trench. A second underfill material portion laterally surrounds the second solder material portions and extends into a second portion of the at least one trench. The at least one trench is used to absorb stress to the underfill material portions.
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79.
公开(公告)号:US20230386945A1
公开(公告)日:2023-11-30
申请号:US17898834
申请日:2022-08-30
发明人: Wensen Hung , Tsung-Yu Chen , Hsuan-Ning Shih , Wen-Hsin Wei
IPC分类号: H01L23/053 , H01L25/18 , H01L23/538 , H01L23/367 , H01L23/42 , H01L23/00 , H01L21/52
CPC分类号: H01L23/053 , H01L25/18 , H01L23/5383 , H01L23/5385 , H01L23/367 , H01L23/42 , H01L24/32 , H01L21/52 , H01L24/29 , H01L24/83 , H01L2224/32245 , H01L2224/2929 , H01L2224/29386 , H01L2224/29339 , H01L2224/29347 , H01L2224/29324 , H01L2224/8385
摘要: A chip package structure includes an assembly containing an interposer and semiconductor dies; a packaging substrate attached to the assembly through solder material portions; and a lid structure attached to the packaging substrate. The lid structure includes: a first plate portion having a first thickness and located in an interposer-projection region having an areal overlap with the interposer in a plan view; a second plate portion having a second thickness that is less than the first thickness, laterally surrounding, and adjoined to, the first plate portion, and located outside the interposer-projection region; and a plurality of foot portions adjoined to the second plate portion, laterally spaced from the first plate portion, and attached to a respective top surface segment of the packaging substrate through a respective adhesive portion.
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80.
公开(公告)号:US20230380126A1
公开(公告)日:2023-11-23
申请号:US18230782
申请日:2023-08-07
发明人: Ming-Chih YEW , Shu-Shen YEH , Chin-Hua WANG , Po-Yao LIN , Shin-Puu JENG
IPC分类号: H10B10/00 , H01L21/56 , H01L23/528 , H01L23/535 , H01L23/538 , H01L23/00 , H01L25/065
CPC分类号: H10B10/00 , H01L21/563 , H01L23/5283 , H01L23/535 , H01L23/5386 , H01L24/09 , H01L24/32 , H01L25/0655 , H01L2224/02379 , H01L2224/32137
摘要: A fan-out package includes a redistribution structure having redistribution-side bonding structures, a plurality of semiconductor dies including a respective set of die-side bonding structures that is attached to a respective subset of the redistribution-side bonding structures through a respective set of solder material portions, and an underfill material portion laterally surrounding the redistribution-side bonding structures and the die-side bonding structures of the plurality of semiconductor dies. A subset of the redistribution-side bonding structures is not bonded to any of the die-side bonding structures of the plurality of semiconductor dies and is laterally surrounded by the underfill material portion, and is used to provide uniform distribution of the underfill material during formation of the underfill material portion.
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