Plasma densification method
    41.
    发明授权

    公开(公告)号:US09999118B2

    公开(公告)日:2018-06-12

    申请号:US15469636

    申请日:2017-03-27

    摘要: The plasma is formed between electrodes to be energized from an electric power source, containing a partially ionized mass having a luminescence region including neutral atoms (NA), primary electrons (PE), secondary electrons (SE), and ions. The method comprises the steps of: accelerating the primary electrons (PE) toward one of said electrodes polarized by a positive high voltage pulse impacting primary electrons (PE) against said electrode and ejecting secondary electrons (SE) from it; subsequently, accelerating the secondary electrons (SE) toward the luminescence region by polarization of said electrode by a negative voltage to collide the secondary electrons with neutral atoms (NA) and producing positive ions (PI) and derived electrons (DE); repeating the previous steps in order to obtain a steady state plasma with a desired degree of ionization.

    Two-dimensional mass resolving slit mechanism for semiconductor processing systems
    46.
    发明授权
    Two-dimensional mass resolving slit mechanism for semiconductor processing systems 有权
    用于半导体处理系统的二维质量分辨率缝隙机构

    公开(公告)号:US09496117B2

    公开(公告)日:2016-11-15

    申请号:US14158972

    申请日:2014-01-20

    摘要: An adjustable mass-resolving slit assembly includes an aperture portion and an actuation portion. The aperture portion includes first and second shield members that define an aperture therebetween for receiving an ion beam during semiconductor processing operations. The actuation portion is coupled to the aperture portion and selectively and independently adjusts the position of the first and second shield members along first and second non-parallel axes. Adjusting the position of the first and second shield members along the first axis adjusts a width of the aperture. Adjusting the position of the first and second shield members along the second axis adjusts a region of the first and second shield members impinged by the ion beam. Methods for using the adjustable mass-resolving slit assembly are also disclosed.

    摘要翻译: 可调节的质量分辨率狭缝组件包括孔部分和致动部分。 开口部分包括在半导体处理操作期间限定其间用于接收离子束的孔的第一和第二屏蔽构件。 致动部分联接到开口部分,并且选择性地和独立地调节第一和第二屏蔽部件沿第一和第二非平行轴线的位置。 沿着第一轴线调节第一和第二屏蔽件的位置调整孔径的宽度。 沿着第二轴调整第一和第二屏蔽构件的位置调节由离子束撞击的第一和第二屏蔽构件的区域。 还公开了使用可调节质量分辨率缝隙组件的方法。

    Switchable gas cluster and atomic ion gun, and method of surface processing using the gun
    47.
    发明授权
    Switchable gas cluster and atomic ion gun, and method of surface processing using the gun 有权
    可切换气体簇和原子离子枪,以及使用枪的表面处理方法

    公开(公告)号:US09478388B2

    公开(公告)日:2016-10-25

    申请号:US13823499

    申请日:2011-10-10

    申请人: Bryan Barnard

    发明人: Bryan Barnard

    摘要: A method of processing one or more surfaces is provided, comprising: providing a switchable ion gun which is switchable between a cluster mode setting for producing an ion beam substantially comprising ionized gas clusters for irradiating a surface and an atomic mode setting for producing an ion beam substantially comprising ionized gas atoms for irradiating a surface; and selectively operating the ion gun in the cluster mode by mass selecting ionized gas clusters using a variable mass selector thereby irradiating a surface substantially with ionized gas clusters or the atomic mode by mass selecting ionized gas atoms using a variable mass selector thereby irradiating a surface substantially with ionized gas atoms. Also provided is a switchable ion gun comprising: a gas expansion nozzle for producing gas clusters; an ionization chamber for ionizing the gas clusters and gas atoms; and a variable (preferably a magnetic sector) mass selector for mass selecting the ionized gas clusters and ionized gas atoms to produce an ion beam variable between substantially comprising ionized gas clusters and substantially comprising ionized gas atoms. Preferably, the gun comprises an electrically floating flight tube for adjusting the energy of the ions while within the mass selector.

    摘要翻译: 提供一种处理一个或多个表面的方法,包括:提供可切换离子枪,其可在用于产生基本上包括用于照射表面的电离气体簇的离子束的簇模式设置和用于产生离子束的原子模式设置之间切换 基本上包括用于照射表面的电离气体原子; 并且通过使用可变质量选择器大量选择离子化气体簇来选择性地操作离子枪,由此通过使用可变质量选择器大量选择电离气体原子,基本上用离子化气体簇或原子模式照射表面,从而基本上照射表面 与电离气体原子。 还提供了一种可切换离子枪,包括:用于产生气体团的气体膨胀喷嘴; 用于电离气团和气原子的电离室; 以及用于质量选择电离气体团簇和离子化气体原子以产生基本上包括电离气体簇并且基本上包含电离气体原子的离子束可变的变量(优选磁性扇形体)选择器。 优选地,枪包括电浮动飞行管,用于在质量选择器内调节离子的能量。

    Analyser arrangement for particle spectrometer
    48.
    发明授权
    Analyser arrangement for particle spectrometer 有权
    分析仪布置用于粒子光谱仪

    公开(公告)号:US09437408B2

    公开(公告)日:2016-09-06

    申请号:US14363405

    申请日:2012-03-06

    申请人: Björn Wannberg

    发明人: Björn Wannberg

    摘要: The present invention relates to a method for determining at least one parameter related to charged particles emitted from a particle emitting sample. The method comprises guiding a beam of charged particles into an entrance of a measurement region by means of a lens system, and detecting positions of the particles indicative of said at least one parameter within the measurement region. Furthermore, the method comprises deflecting the particle beam at least twice in the same coordinate direction before entrance of the particle beam into the measurement region. Thereby, both the position and the direction of the particle beam at the entrance of the measurement region can be controlled in a way that to some extent eliminates the need for physical manipulation of the sample. This in turn allows the sample to be efficiently cooled such that the energy resolution in energy measurements can be improved.

    摘要翻译: 本发明涉及一种用于确定与从发射颗粒发射的样品发射的带电粒子有关的至少一个参数的方法。 该方法包括通过透镜系统将带电粒子束引导到测量区域的入口,以及在测量区域内检测指示所述至少一个参数的粒子的位置。 此外,该方法包括在粒子束进入测量区域之前将粒子束在相同坐标方向上偏转至少两次。 因此,能够以在某种程度上消除对样品的物理操作的需要的方式来控制测量区域入口处的粒子束的位置和方向。 这反过来允许样品被有效地冷却,从而能够提高能量测量中的能量分辨率。

    Method and Compound System for Inspecting and Reviewing Defects
    49.
    发明申请
    Method and Compound System for Inspecting and Reviewing Defects 有权
    检查和检查缺陷的方法和复合系统

    公开(公告)号:US20160163502A1

    公开(公告)日:2016-06-09

    申请号:US14964316

    申请日:2015-12-09

    发明人: Shuai Li

    摘要: The present invention provides an improved electron-optical apparatus for the inspection and review of the specimen, and for the defect inspection, an inspection mode of operation is performed to generate inspection data, wherein the large beam current is formed by a magnetic immersion lens to scan the specimen, and preferably the objective lens system, a swing objective retarding immersion lens, focuses the beam current and generates the large scanning field, and for the defect review, the review mode of operation is performed to analyze the defects, wherein the large beam current is abandoned and the small beam current is adopted to examine the specimen without a large scanning field, and in order to properly select and detect signal charged particles excited from the specimen, a first Wien filter is utilized to select the acquired signal particles and a second Wien filter is used to compensate the aberrations induced when the signal particles pass through the first Wien filter.

    摘要翻译: 本发明提供了一种用于检查和检查样本的改进的电子光学装置,并且为了进行缺陷检查,执行检查操作模式以产生检查数据,其中大的光束电流由磁性浸没透镜形成 扫描样本,优选物镜系统,摆动物镜延迟浸没透镜,聚焦光束电流并产生大扫描场,为了进行缺陷检查,执行审查操作模式以分析缺陷,其中大 射束电流被放弃,采用小束电流检测样本,而没有大的扫描场,为了适当地选择和检测从样品激发的信号带电粒子,使用第一维恩滤波器来选择所获取的信号粒子, 第二维恩滤波器用于补偿信号粒子通过第一维恩滤波器时所引起的像差。

    Electron microscope and method of adjusting monochromator
    50.
    发明授权
    Electron microscope and method of adjusting monochromator 有权
    电子显微镜和调光单色仪的方法

    公开(公告)号:US09362082B2

    公开(公告)日:2016-06-07

    申请号:US14823141

    申请日:2015-08-11

    申请人: JEOL Ltd.

    发明人: Masaki Mukai

    IPC分类号: H01J47/00 H01J37/05 H01J37/21

    摘要: An electron microscope is offered which can facilitate adjusting a monochromator. The electron microscope (100) includes the monochromator (20) having an energy filter (22) for dispersing the beam (EB) according to energy and a slit plate (24) disposed on an energy dispersive plane. The slit plate (24) is provided with plural energy-selecting slits (25) which are different in width taken in a direction where the beam (EB) is dispersed. The microscope (100) further includes a lens system (30) on which the beam impinges after being monochromatized by the monochromator (20), a first measuring section (50) for measuring the intensity of the beam (EB) emitted from an electron beam source (10), a second measuring section (60) for measuring the intensity of the beam (EB) that has passed through an active one (25-L) of the energy-selecting slits (25), and a slit identifying portion (72) for identifying the active energy-selecting slit (25-L) from the plural energy-selecting slits (25) on the basis of the results of measurements made by the first and second measuring sections (50, 60).

    摘要翻译: 提供了一种可以方便调整单色仪的电子显微镜。 电子显微镜(100)包括具有用于根据能量分散光束(EB)的能量过滤器(22)和设置在能量分散平面上的狭缝板(24)的单色仪(20)。 狭缝板(24)设置有多个能量选择狭缝(25),其沿着分散光束(EB)的方向而具有不同的宽度。 所述显微镜(100)还包括透镜系统(30),所述透镜系统(30)在由所述单色仪(20)单色化之后入射到所述透镜系统(30)上;第一测量部分(50),用于测量从电子束 源极(10),用于测量已经穿过能量选择狭缝(25)的有源(25-L)的光束(EB)的强度的第二测量部分(60)和狭缝识别部分 72),用于基于由第一和第二测量部(50,60)进行的测量结果,从多个能量选择缝(25)识别活动能量选择缝(25-L)。