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    HIGH THROUGHPUT SEM TOOL
    142.
    发明申请
    HIGH THROUGHPUT SEM TOOL 有权
    高通量扫描仪刀具

    公开(公告)号：US20100320382A1

    公开(公告)日：2010-12-23

    申请号：US12528307

    申请日：2008-02-22

    Applicant: Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

    Inventor： Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

    IPC: G01N23/00 ,  H01J37/147

    CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

    Abstract: A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

    Abstract translation: 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

    Charged-particle beam system
    143.
    发明授权
    Charged-particle beam system 有权
    带电粒子束系统

    公开(公告)号：US07820978B2

    公开(公告)日：2010-10-26

    申请号：US11959966

    申请日：2007-12-19

    Applicant: Kazuya Goto

    Inventor： Kazuya Goto

    IPC: H01J3/14

    CPC classification number: H01J37/153 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/153 ,  H01J2237/28

    Abstract: A charged-particle beam system has a demagnifying lens for reducing the dimensions of an electron beam produced from an electron beam source, an objective lens for focusing the demagnified beam onto the surface of a target, a first deflector located before the demagnifying lens, a second deflector placed such that the deflection field produced by it is totally or partially superimposed on the objective lens field, and a third deflector located in a stage following the second deflector. An image of the light source is created by the demagnifying lens. An image of the light source image is formed on the target by the objective lens.

    Abstract translation: 带电粒子束系统具有用于减小从电子束源产生的电子束的尺寸的缩小透镜，用于将缩小的光束聚焦到目标表面上的物镜，位于缩小透镜之前的第一偏转器， 第二偏转器被放置成使得其产生的偏转场全部或部分地叠加在物镜视场上，而第三偏转器位于跟随第二偏转器的阶段中。 光源的图像由缩小透镜产生。 通过物镜在目标上形成光源图像的图像。

    Electron microscope
    145.
    发明授权
    Electron microscope 有权
    电子显微镜

    公开(公告)号：US07626166B2

    公开(公告)日：2009-12-01

    申请号：US12038076

    申请日：2008-02-27

    Applicant: Hiroyuki Saito ,  Katsuhiro Sasada

    Inventor： Hiroyuki Saito ,  Katsuhiro Sasada

    IPC: H01J37/16 ,  H01J3/14 ,  G01N23/04

    CPC classification number: G01N23/225 ,  H01J37/10 ,  H01J37/18 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/204 ,  H01J2237/2817

    Abstract: An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the objective lens or electrode plate from dropping onto the surface of a sample and adhering there during observation of the sample.To achieve the above object, an electron microscope in which, when a sample to be measured is moved away from below an objective lens, an exciting current to the objective lens of a scanning electron microscope is turned off or excitation thereof is made weaker than before the sample to be measured being moved away, or an applied voltage to an acceleration cylinder for accelerating an electron beam is turned off or made lower than before the sample to be measured being moved away is proposed.

    Abstract translation: 本发明的目的是防止被物镜的磁场或电极板的电场所吸引的异物附着在物镜或电极板的表面上，从而落在样品的表面上并粘附 在样品观察期间。 为了实现上述目的，一种电子显微镜，其中当待测量的样品从物镜的下方移开时，扫描电子显微镜的物镜的激励电流被关闭或使其激发弱于之前 要测量的样本被移开，或提供加速电子束的加速气缸的施加电压被关闭或低于被测量样品移开之前。

    Electron Microscope
    146.
    发明申请
    Electron Microscope 有权
    电子显微镜

    公开(公告)号：US20080203301A1

    公开(公告)日：2008-08-28

    申请号：US12038076

    申请日：2008-02-27

    Applicant: Hiroyuki Saito ,  Katsuhiro Sasada

    Inventor： Hiroyuki Saito ,  Katsuhiro Sasada

    IPC: G01N23/04 ,  H01J3/14

    CPC classification number: G01N23/225 ,  H01J37/10 ,  H01J37/18 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/204 ,  H01J2237/2817

    Abstract: An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the objective lens or electrode plate from dropping onto the surface of a sample and adhering there during observation of the sample.To achieve the above object, an electron microscope in which, when a sample to be measured is moved away from below an objective lens, an exciting current to the objective lens of a scanning electron microscope is turned off or excitation thereof is made weaker than before the sample to be measured being moved away, or an applied voltage to an acceleration cylinder for accelerating an electron beam is turned off or made lower than before the sample to be measured being moved away is proposed.

    Abstract translation: 本发明的目的是防止被物镜的磁场或电极板的电场所吸引的异物附着在物镜或电极板的表面上，从而落在样品的表面上并粘附 在样品观察期间。 为了实现上述目的，一种电子显微镜，其中当待测量的样品从物镜的下方移开时，扫描电子显微镜的物镜的激励电流被关闭或使其激发弱于之前 要测量的样本被移开，或提供加速电子束的加速气缸的施加电压被关闭或低于被测量样品移开之前。

    Beam optical component for charged particle beams
    147.
    发明申请
    Beam optical component for charged particle beams 有权
    用于带电粒子束的光束组件

    公开(公告)号：US20070125954A1

    公开(公告)日：2007-06-07

    申请号：US10578206

    申请日：2004-11-04

    Applicant: Juergen Frosien

    Inventor： Juergen Frosien

    IPC: H01J3/14

    CPC classification number: H01J9/18 ,  H01J37/02 ,  H01J37/10 ,  H01J2237/036

    Abstract: The present invention relates to a beam optical component (1, 201) for acting on a charged particle beam (63) including a first element (3; 203) having a first opening (9; 209) for acting on the charged particle beam (63), at least a second element (5; 205) for acting on the charged particle beam (63); at least one distance piece (20a, 20b, 20c) positioned between the first element (3; 203) and the second element (5; 205) to define a minimum distance between the first element (3; 203) and the second element (5; 205); and a first holding piece (30a; 30b; 30c) for abutting the first element (3) to the at least one distance piece (20a, 20b, 20c), whereby the first holding piece (30a; 30b; 30c) is attached to the at least one distance piece (20a, 20b, 20c). First and second elements (3; 203; 5; 205) are preferably electrodes or pole pieces to act on the charged particle beam by an electrostatic or magnetic force. With the first holding piece (30a; 30b; 30c) attached to the at least one distance piece, distorting mechanical forces on the first and second elements (3, 5) are reduced which improves the performance of the respective beam optical components (1; 201).

    Abstract translation: 本发明涉及一种用于作用在带电粒子束（63）上的束光学部件（1,201），其包括具有用于作用在带电粒子束上的第一开口（9; 209）的第一元件（3; 203） 至少一个用于作用在带电粒子束（63）上的第二元件（5; 205）; 定位在所述第一元件（3; 203）和所述第二元件（5; 205）之间的至少一个距离件（20a，20b，20c），以限定所述第一元件（3; 203）和所述第二元件 第二元件（5; 205）; 以及用于将所述第一元件（3）抵靠所述至少一个距离件（20a，20b，20b）的第一保持件（30a; 30b; 30c），由此所述第一保持件（30A; 30b; 30c）连接到所述至少一个距离件（20A，20b，20c）。 第一和第二元件（3; 203; 5; 205）优选地是通过静电或磁力作用在带电粒子束上的电极或极片。 利用附接到所述至少一个距离件的第一保持件（30a; 30b; 30c），减小所述第一和第二元件（3,5）上的机械力的变形，这改善了各个光束部件 （1; 201）。

    High resolution atom probe
    148.
    发明申请
    High resolution atom probe 有权
    高分辨率原子探针

    公开(公告)号：US20060113470A1

    公开(公告)日：2006-06-01

    申请号：US10559733

    申请日：2004-05-26

    Applicant: Tye Gribb

    Inventor： Tye Gribb

    IPC: G21K7/00 ,  G21K5/10 ,  G21K5/08

    CPC classification number: H01J37/285 ,  B82Y15/00 ,  H01J37/05 ,  H01J37/10 ,  H01J2237/024 ,  H01J2237/0492 ,  H01J2237/053 ,  H01J2237/244

    Abstract: A three dimensional atom probe comprising a sharp specimen (10) coupled to a mounting means (12) where emission of charged particles is caused by application of a potential to the specimen tip (10) such that charged particles are influenced by filtering electrodes (206, 204) before impingement on a detection screen (202).

    Abstract translation: 一种三维原子探针，其包括耦合到安装装置（12）的尖锐的样本（10），其中通过向所述样本末端（10）施加电位而引起带电粒子的发射，使得带电粒子受到过滤电极（206 ，204），然后冲击到检测屏（202）上。

    Detector objective for particle beam apparatus
    149.
    发明授权
    Detector objective for particle beam apparatus 失效
    粒子束装置的检测器物镜

    公开(公告)号：US4831266A

    公开(公告)日：1989-05-16

    申请号：US130028

    申请日：1987-12-08

    Applicant: Juergen Frosien ,  Hans-Peter Feuerbaum

    Inventor： Juergen Frosien ,  Hans-Peter Feuerbaum

    IPC: H01J37/141 ,  G01Q30/02 ,  G01Q90/00 ,  H01J37/10 ,  H01J37/145 ,  H01J37/244

    CPC classification number: H01J37/10 ,  H01J37/244 ,  H01J2237/2441 ,  H01J2237/2443 ,  H01J2237/24435 ,  H01J2237/24465 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/24507

    Abstract: A detector objective forms a component of an electron-optical column of a scanning electron microscope, the detector objective being composed of an asymmetrical magnetic lens, an electrostatic immersion lens generating a substantially rotationally symmetrical field, and an annular detector disposed immediately above the magnetic lens body. An electrode of the electrostatic immersion lens is formed as a truncated cone and is arranged in insulated fashion in an upper pole piece of the magnetic lens. The lower pole piece forms the second electrode of the immersion lens. The first and second electrodes are charged with potentials that establish an electrical field for decelerating the primary electrons, the electrical field overlying the focusing magnetic field.

    Abstract translation: 检测器物镜形成扫描电子显微镜的电子 - 光学柱的分量，检测器物镜由不对称的磁性透镜，产生大致旋转对称的场的静电浸没透镜和设置在磁性透镜的正上方的环形探测器组成 身体。 静电浸没透镜的电极形成为截头圆锥体，并以绝缘方式设置在磁性透镜的上极片中。 下极片形成浸没透镜的第二电极。 第一和第二电极充有电位，这些电位建立用于使一次电子减速的电场，覆盖聚焦磁场的电场。

    Spectrometer objective for particle beam measurement technique
    150.
    发明授权
    Spectrometer objective for particle beam measurement technique 失效
    粒子束测量技术的光谱仪物镜

    公开(公告)号：US4551625A

    公开(公告)日：1985-11-05

    申请号：US513605

    申请日：1983-07-14

    Applicant: Burkhard Lischke ,  Erich Plies

    Inventor： Burkhard Lischke ,  Erich Plies

    IPC: G01N23/22 ,  G01R19/155 ,  G01R31/302 ,  H01J37/05 ,  H01J37/10 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J49/48

    CPC classification number: H01J37/244 ,  H01J37/05 ,  H01J37/10 ,  H01J37/266 ,  H01J49/488 ,  H01J2237/2443

    Abstract: An arrangement for particle beam measurement utilizes, an objective for the imaging of primary probe particles on a specimen and a spectrometer for the detection of secondary particles. The arrangement also utilizes the superposition of the electric field of the spectrometer with the electric field of the objective lens to render possible an effective increase of the probe current and/or an improved potential resolution. A portion of the field of the objective is provided for the focusing of the secondary particles onto an electrode for determining energy selection.

    Abstract translation: 用于粒子束测量的布置利用了用于在样本上成像初级探针颗粒的目标和用于检测次级颗粒的光谱仪。 该装置还利用光谱仪的电场与物镜的电场的叠加使得探针电流的有效增加和/或改进的电位分辨率成为可能。 目标场的一部分用于将二次粒子聚焦到用于确定能量选择的电极上。

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