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    Pattern Dimension Measurement Method Using Electron Microscope, Pattern Dimension Measurement System, and Method for Monitoring Changes in Electron Microscope Equipment Over Time
    1.
    发明申请
    Pattern Dimension Measurement Method Using Electron Microscope, Pattern Dimension Measurement System, and Method for Monitoring Changes in Electron Microscope Equipment Over Time 有权
    使用电子显微镜的图案尺寸测量方法，图案尺寸测量系统以及随时间监测电子显微镜设备变化的方法

    公开(公告)号：US20130166240A1

    公开(公告)日：2013-06-27

    申请号：US13807281

    申请日：2011-05-20

    申请人： Chie Shishido ,  Maki Tanaka ,  Katsuhiro Sasada

    发明人： Chie Shishido ,  Maki Tanaka ,  Katsuhiro Sasada

    IPC分类号： G01Q40/00

    CPC分类号： G01B15/04 ,  G01Q40/00 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/22 ,  H01J2237/24514 ,  H01J2237/24578 ,  H01J2237/2823 ,  H01J2237/2826

    摘要： Beforehand, the device characteristic patterns of each critical dimension SEM are measured, a sectional shape of an object to undergo dimension measurement is presumed by a model base library (MBL) matching system, dimension measurements are carried out by generating signal waveforms through SEM simulation by inputting the presumed sectional shapes and the device characteristic parameters, and differences in the dimension measurement results are registered as machine differences. In actual measurements, from the dimension measurement results in each critical dimension SEM, machine differences are corrected by subtracting the registered machine differences. Furthermore, changes in critical dimension SEM's over time are monitored by periodically measuring the above-mentioned device characteristic parameters and predicting the above-mentioned dimension measurement results. According to the present invention, actual measurements of machine differences, which require considerable time and effort, are unnecessary. In addition, the influence of changes in samples over time, which is problematic in monitoring changes in devices over time, can be eliminated.

    摘要翻译： 之前，测量每个临界尺寸SEM的器件特征图案，通过模型基本库（MBL）匹配系统推测进行尺寸测量的物体的截面形状，通过SEM模拟产生信号波形来进行尺寸测量 输入推定的截面形状和装置特性参数，将尺寸测量结果的差异作为机器差异进行登记。 在实际测量中，从每个临界尺寸SEM的尺寸测量结果可以看出，通过减去注册的机器差异来校正机器差异。 此外，通过周期性地测量上述器件特性参数并预测上述尺寸测量结果来监测临界尺寸SEM随时间变化的变化。 根据本发明，需要相当多的时间和精力的机器差异的实际测量是不必要的。 另外，随着时间的推移，随着时间的推移，随着时间的推移，随着时间的推移，样品随着时间变化的变化也受到影响。

    Scanning electron microscope and image signal processing method
    2.
    发明授权
    Scanning electron microscope and image signal processing method 有权
    扫描电子显微镜和图像信号处理方法

    公开(公告)号：US08362426B2

    公开(公告)日：2013-01-29

    申请号：US11520802

    申请日：2006-09-14

    申请人： Atsushi Kobaru ,  Katsuhiro Sasada ,  Hiroki Kawada

    发明人： Atsushi Kobaru ,  Katsuhiro Sasada ,  Hiroki Kawada

    IPC分类号： G01N23/00

    CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2448 ,  H01J2237/24585

    摘要： The SEM has a dynamic range reference value setting unit for setting dynamic range reference values, a dynamic range adjustment unit for receiving an observation image signal delivered out of a secondary electron detector, adjusting the dynamic range of the observation image signal on the basis of the dynamic range reference values and outputting the thus adjusted observation image signal as an observation image signal after adjustment, a display image generation unit for determining luminous intensity levels of individual pixels of an image to be displayed based on the observation image signal after adjustment to generate a display image, a histogram generation unit for generating a histogram of luminous intensity levels of the display image and extracting, as a luminous intensity peak value, at which the frequency of luminous intensity is maximized, and a display unit for displaying the generated histogram and the extracted luminous intensity peak value.

    摘要翻译： SEM具有用于设定动态范围基准值的动态范围基准值设定单元，用于接收从二次电子检测器输出的观察图像信号的动态范围调整单元，基于该观测图像信号调整观测图像信号的动态范围 动态范围基准值，并输出调整后的观察图像信号作为调整后的观察图像信号;显示图像生成单元，其根据调整后的观察图像信号，决定要显示的图像的各个像素的发光强度水平，生成 显示图像，直方图生成单元，用于生成显示图像的发光强度级别的直方图，并且提取作为发光强度的频率最大化的发光强度峰值，以及用于显示所生成的直方图的显示单元和 提取发光强度峰值。

    Scanning electron microscope alignment method and scanning electron microscope
    3.
    发明授权
    Scanning electron microscope alignment method and scanning electron microscope 有权
    扫描电子显微镜对准方法和扫描电子显微镜

    公开(公告)号：US08188427B2

    公开(公告)日：2012-05-29

    申请号：US12182704

    申请日：2008-07-30

    申请人： Junichi Kakuta ,  Kazuhiro Ueda ,  Tatsuya Maeda ,  Hiroyuki Saito ,  Katsuhiro Sasada

    发明人： Junichi Kakuta ,  Kazuhiro Ueda ,  Tatsuya Maeda ,  Hiroyuki Saito ,  Katsuhiro Sasada

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： G01N23/225 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1532

    摘要： A method and apparatus for alignment and astigmatism correction for a scanning electron microscope can prevent an alignment or correction error attributable to the conditions of a particular specimen. First, a difference is determined between optimal values acquired from an automatic axis alignment result on a standard sample, and those obtained from each of a plurality automatic axis alignment results on a observation target sample. An optimal value is then adjusted using the standard sample, by use of the difference thus obtained. Correspondingly, an optimal stigmator value (astigmatism correction signal) is acquired by using the standard sample, and storing the optimal stigmator value as a default value. The optimal stigmator value and the default value depending on the height of an observation target sample pattern are added, and an astigmatism correction is performed on the basis of the resultant stigmator value.

    摘要翻译： 用于扫描电子显微镜的对准和像散校正的方法和装置可以防止由特定样品的条件引起的对准或校正误差。 首先，在从标准样品的自动轴对准结果获得的最佳值与从观察对象样本的多个自动轴对准结果中得到的最佳值之间确定差异。 然后使用标准样品通过使用由此获得的差异来调整最佳值。 相应地，通过使用标准样品获取最佳标称值（像散校正信号），并将最佳标定值存储为默认值。 添加根据观察目标样本图案的高度的最佳标称值和默认值，并根据得到的标示符值进行像散校正。

    Electron microscope
    4.
    发明授权
    Electron microscope 有权
    电子显微镜

    公开(公告)号：US07626166B2

    公开(公告)日：2009-12-01

    申请号：US12038076

    申请日：2008-02-27

    申请人： Hiroyuki Saito ,  Katsuhiro Sasada

    发明人： Hiroyuki Saito ,  Katsuhiro Sasada

    IPC分类号： H01J37/16 ,  H01J3/14 ,  G01N23/04

    CPC分类号： G01N23/225 ,  H01J37/10 ,  H01J37/18 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/204 ,  H01J2237/2817

    摘要： An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the objective lens or electrode plate from dropping onto the surface of a sample and adhering there during observation of the sample.To achieve the above object, an electron microscope in which, when a sample to be measured is moved away from below an objective lens, an exciting current to the objective lens of a scanning electron microscope is turned off or excitation thereof is made weaker than before the sample to be measured being moved away, or an applied voltage to an acceleration cylinder for accelerating an electron beam is turned off or made lower than before the sample to be measured being moved away is proposed.

    摘要翻译： 本发明的目的是防止被物镜的磁场或电极板的电场所吸引的异物附着在物镜或电极板的表面上，从而落在样品的表面上并粘附 在样品观察期间。 为了实现上述目的，一种电子显微镜，其中当待测量的样品从物镜的下方移开时，扫描电子显微镜的物镜的激励电流被关闭或使其激发弱于之前 要测量的样本被移开，或提供加速电子束的加速气缸的施加电压被关闭或低于被测量样品移开之前。

    Electron beam apparatus and method for production of its specimen chamber
    5.
    发明授权
    Electron beam apparatus and method for production of its specimen chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号：US07566892B2

    公开(公告)日：2009-07-28

    申请号：US11907375

    申请日：2007-10-11

    申请人： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

    发明人： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

    IPC分类号： G01N23/00

    CPC分类号： H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

    摘要： A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    摘要翻译： 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Electron Microscope
    6.
    发明申请
    Electron Microscope 有权
    电子显微镜

    公开(公告)号：US20080203301A1

    公开(公告)日：2008-08-28

    申请号：US12038076

    申请日：2008-02-27

    申请人： Hiroyuki Saito ,  Katsuhiro Sasada

    发明人： Hiroyuki Saito ,  Katsuhiro Sasada

    IPC分类号： G01N23/04 ,  H01J3/14

    CPC分类号： G01N23/225 ,  H01J37/10 ,  H01J37/18 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/204 ,  H01J2237/2817

    摘要： An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the objective lens or electrode plate from dropping onto the surface of a sample and adhering there during observation of the sample.To achieve the above object, an electron microscope in which, when a sample to be measured is moved away from below an objective lens, an exciting current to the objective lens of a scanning electron microscope is turned off or excitation thereof is made weaker than before the sample to be measured being moved away, or an applied voltage to an acceleration cylinder for accelerating an electron beam is turned off or made lower than before the sample to be measured being moved away is proposed.

    摘要翻译： 本发明的目的是防止被物镜的磁场或电极板的电场所吸引的异物附着在物镜或电极板的表面上，从而落在样品的表面上并粘附 在样品观察期间。 为了实现上述目的，一种电子显微镜，其中当待测量的样品从物镜的下方移开时，扫描电子显微镜的物镜的激励电流被关闭或使其激发弱于之前 要测量的样本被移开，或提供加速电子束的加速气缸的施加电压被关闭或低于被测量样品移开之前。

    Electron beam apparatus
    10.
    发明授权
    Electron beam apparatus 失效
    电子束装置

    公开(公告)号：US5598002A

    公开(公告)日：1997-01-28

    申请号：US632664

    申请日：1996-03-28

    申请人： Hideo Todokoro ,  Tadashi Otaka ,  Tatsuya Maeda ,  Katsuhiro Sasada

    发明人： Hideo Todokoro ,  Tadashi Otaka ,  Tatsuya Maeda ,  Katsuhiro Sasada

    IPC分类号： H01J37/141 ,  H01J37/20 ,  H01J37/21 ,  H01L21/027 ,  G02B21/18

    CPC分类号： H01J37/21 ,  H01J2237/216 ,  H01J2237/2482

    摘要： An electron beam apparatus focusses an electron beam onto a specimen by means of an objective magnetic lens. In order to detect changes in the height of the specimen, a laser light beam from a laser source is incident on the specimen and the reflected laser beam is detected by a light detector. Any change in the height of the specimen changes the path of the laser beam to the detector. Therefore, by monitoring the detector, the focussing of the electron beam on the specimen can be controlled by varying the current to an excitation coil of the objective magnetic lens or by moving the specimen via a mounting stage. At least one of the pole pieces of the objective lens is on the opposite side of the path of the laser beam to the source of the electron beam, so that the objective magnetic lens may be close to the specimen, permitting a short focal length. Thus, the laser beam may pass between the pole pieces. An optical microscope may also be provided to permit the specimen to be viewed. The viewing path of the optical microscope extends through an opening in one or both of the pole pieces of the objective magnetic lens.

    摘要翻译： 电子束装置通过物镜磁性透镜将电子束聚焦在样本上。 为了检测样品的高度变化，来自激光源的激光束入射到样品上，并且通过光检测器检测反射的激光束。 样品高度的任何变化会改变激光束到检测器的路径。 因此，通过监视检测器，可以通过改变到物镜磁性透镜的激励线圈的电流或通过安装级移动样本来控制电子束在样本上的聚焦。 物镜的极片中的至少一个位于激光束到电子束源的路径的相对侧，使得物镜磁性透镜可能靠近样本，允许短焦距。 因此，激光束可以在极片之间通过。 还可以提供光学显微镜以允许观察样品。 光学显微镜的观察路径延伸穿过物镜磁性透镜的一个或两个极片中的开口。