System and method to enable detection of viral infection by users of electronic communication devices
    2.
    发明授权
    System and method to enable detection of viral infection by users of electronic communication devices 有权
    用于电子通信设备的用户检测病毒感染的系统和方法

    公开(公告)号:US09075909B2

    公开(公告)日:2015-07-07

    申请号:US13680289

    申请日:2012-11-19

    CPC classification number: G16H50/20 G06F19/00 G16H50/80 Y02A90/24

    Abstract: A non-transitory computer readable medium that stores instructions for causing a computerized system to perform the following operations: determining, by the computerized system, that a first person is infected by a first infectious disease; wherein the determination is associated with a first person infection probability attribute; detecting, by the computerized system, based upon location information collected during at least a portion of a first infectious disease manifestation period, the location information being indicative of locations of the first person and other persons, a second person that was within an infection distance from the first person and is potentially infected by the first infectious disease; calculating, by the computerized system, a second person infection probability attribute; and updating, by the computerized system, the first person infection probability attribute in response to the second person infection probability attribute.

    Abstract translation: 存储用于使计算机化系统执行以下操作的指令的非暂时计算机可读介质:由计算机化系统确定第一人被第一感染性疾病感染; 其中所述确定与第一人感染概率属性相关联; 由所述计算机化系统基于在第一感染性疾病表现期间的至少一部分期间收集的位置信息来检测所述位置信息,所述位置信息指示所述第一人和其他人的位置,所述位置信息在距离 第一个人并且可能被第一感染性疾病感染; 通过计算机化系统计算第二人感染概率属性; 并且由所述计算机化系统更新响应于所述第二人感染概率属性的所述第一人感染概率属性。

    CHARGED PARTICLE DETECTOR ASSEMBLY, CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR GENERATING AN IMAGE
    7.
    发明申请
    CHARGED PARTICLE DETECTOR ASSEMBLY, CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR GENERATING AN IMAGE 有权
    充电颗粒检测器组件,充电颗粒光束装置和用于产生图像的方法

    公开(公告)号:US20080191134A1

    公开(公告)日:2008-08-14

    申请号:US11923421

    申请日:2007-10-24

    Abstract: A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.

    Abstract translation: 带电粒子检测器组件包括粒子检测器,该粒子检测器具有至少一个用于检测带电粒子的空间分布的至少一部分的粒子敏感区域,并用于产生与检测到的空间分布相关的二维光信号。 此外,图像导管具有耦合到粒子检测器的粒子敏感区域的输入端,用于将二维光信号传输到至少一个光学检测器。 此外,选择装置适于选择二维光信号的至少一部分。

    System and method for process variation monitor
    9.
    发明授权
    System and method for process variation monitor 有权
    过程变化监测系统和方法

    公开(公告)号:US07054480B2

    公开(公告)日:2006-05-30

    申请号:US11038449

    申请日:2005-01-18

    Abstract: A method to extend the process monitoring capabilities of a semiconductor wafer optical inspection system so as to be able to detect low-resolution effects of process variations over the surface of a wafer at much higher sensitivity than heretofore possible. The method consists, in essence, of grouping sensed pixels by geometric blocks over the inspected surface and comparing each block with a corresponding one from another die on the same wager, from another wager of from a stored model image. In one embodiment of the invention, pixel values are compared directly and differences are thresholded at a considerably lower level than during a defects detection process. In another embodiment, there is calculated a signature for each block, based on the sensed light intensity values, and corresponding signatures are compared.

    Abstract translation: 扩展半导体晶片光学检查系统的过程监控能力的方法,以便能够以比以前更高的灵敏度检测晶片表面上的工艺变化的低分辨率效应。 本方法基本上包括通过检查表面上的几何块对感测像素进行分组,并且从相同下注的另一个模具中将每个块与来自另一个管芯的对应的块相比较,从另一个来自存储的模型图像的冲量。 在本发明的一个实施例中,像素值被直接比较,并且差异以比在缺陷检测处理期间低得多的阈值阈值化。 在另一个实施例中,基于感测的光强度值计算每个块的签名,并对相应的签名进行比较。

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