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    Radiation Source and Method for Lithographic Apparatus for Device Manufacture
    1.
    发明申请
    Radiation Source and Method for Lithographic Apparatus for Device Manufacture 有权
    用于器件制造的平版印刷设备的辐射源和方法

    公开(公告)号：US20140209817A1

    公开(公告)日：2014-07-31

    申请号：US14342007

    申请日：2012-07-27

    申请人： Ronald Johannes Hultermans ,  Antonius Theodorus Wilhelmus Kempen ,  Bernard Van Essen

    发明人： Ronald Johannes Hultermans ,  Antonius Theodorus Wilhelmus Kempen ,  Bernard Van Essen

    IPC分类号： H05G2/00

    CPC分类号： H05G2/006 ,  B22D43/004 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008 ,  Y10S430/146 ,  Y10T29/49826

    摘要： A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporise at least some of said droplets of fuel, whereby radiation is generated. The fuel droplet generator has nozzle, fuel supply line, and reservoir, with a pumping device arranged to supply a flow of molten metal fuel from the reservoir through the fuel feed line and out of the nozzle as a stream of droplets. The fuel droplet generator has a replaceable filter assembly in the fuel feed line, arranged to filter the molten metal fuel in use, to deter nozzle blockage by solid particulate impurities in the fuel.

    摘要翻译： 用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融金属燃料液滴流产生EUV的辐射源具有燃料液滴发生器，其布置成提供燃料液滴流和至少一个配置成在 至少一些所述燃料液滴，从而产生辐射。 燃料液滴发生器具有喷嘴，燃料供应管线和储存器，其中泵送装置被布置成以液滴流的形式从燃料供给管路提供来自储存器的熔融金属燃料流。 燃料液滴发生器在燃料供给管线中具有可替换的过滤器组件，布置成在使用中过滤熔融金属燃料，以阻止喷嘴堵塞燃料中的固体颗粒杂质。

    FILM EXPOSURE METHOD
    2.
    发明申请
    FILM EXPOSURE METHOD 有权
    电影曝光方法

    公开(公告)号：US20130230799A1

    公开(公告)日：2013-09-05

    申请号：US13884192

    申请日：2011-10-24

    申请人： Toshinari Arai ,  Kazushige Hashimoto

    发明人： Toshinari Arai ,  Kazushige Hashimoto

    IPC分类号： G03F7/20

    CPC分类号： G03F7/20 ,  G03B27/10 ,  G03F7/70791 ,  G03F9/00 ,  Y10S430/146

    摘要： On a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material, a colored firing material, colored light-curable material, or colored ink is applied to at least one of two widthwise side edges to form a side part application coating, which is irradiated with laser light by an alignment mark formation unit to form an alignment mark. The alignment mark is then used to detect film meandering and adjust the positions of masks. This makes it easy to form the alignment mark and detect the alignment mark thus formed and makes it possible to accurately correct for meandering of a film and stably expose the film in the process of continuous exposure of a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material.

    摘要翻译： 在膜基材上的曝光图案形成区域中已经形成曝光材料涂层的膜上，将着色的烧成材料，着色的可光固化材料或着色的油墨施加到两个横向侧边缘中的至少一个上以形成 侧面施加涂层，其通过对准标记形成单元用激光照射以形成对准标记。 然后使用对准标记来检测胶片曲折并调整掩模的位置。 这使得容易形成对准标记并检测如此形成的对准标记，并且可以准确地校正膜的曲折并且在已经形成曝光材料涂层的膜的连续曝光过程中稳定地曝光该膜 在膜基材上的曝光图案形成区域中。

    Information recording medium and method of manufacturing resinous substrate for use in the recording medium
    6.
    再颁专利
    Information recording medium and method of manufacturing resinous substrate for use in the recording medium 有权
    信息记录介质和用于记录介质的树脂基板的制造方法

    公开(公告)号：USRE43966E1

    公开(公告)日：2013-02-05

    申请号：US12476428

    申请日：2009-06-02

    申请人： Tadashi Kobayashi ,  Hisashi Yamada

    发明人： Tadashi Kobayashi ,  Hisashi Yamada

    IPC分类号： B32B3/02

    CPC分类号： B29C65/48 ,  B29C45/263 ,  B29C65/521 ,  B29C66/1122 ,  B29C66/452 ,  B29C66/71 ,  B29C66/73161 ,  B29C66/73341 ,  B29C66/73365 ,  B29C66/8322 ,  B29C2045/2653 ,  B29D17/005 ,  B29L2017/005 ,  G11B7/24 ,  G11B7/263 ,  Y10S428/913 ,  Y10S430/146 ,  Y10T428/21 ,  Y10T428/31678 ,  B29K2023/06 ,  B29K2025/04 ,  B29K2025/06 ,  B29K2033/12 ,  B29K2055/02 ,  B29K2059/00 ,  B29K2063/00 ,  B29K2069/00

    摘要： An information recording medium comprising a substrate having a recording surface provided with emboss pits or guiding grooves, a reflective film formed on the recording surface of the substrate, and a first protective film formed on the reflective film. This information recording medium is featured in that both sides of the information recording medium are constituted by a first surface provided with the protective film and by a second surface formed opposite to the first surface, and that an irradiated light beam is irradiated through the first surface, a recorded information being reproduced based on changes in light intensity of the reflected light beam. The distance between the recording surface of the substrate and the light incident surface is smaller than a thickness of the substrate, and a surface roughness “R” of the light incident surface meets a relationship represented by the following formula (1): R≦λ/(8n)   (1) wherein λ is a wavelength of the light beam, and n is a refractive index of the first protective film to a light having the wavelength λ.

    摘要翻译： 一种信息记录介质，包括具有设置有浮雕凹坑或引导槽的记录表面的基板，形成在基板的记录表面上的反射膜和形成在反射膜上的第一保护膜。 该信息记录介质的特征在于信息记录介质的两侧由设置有保护膜的第一表面和与第一表面相对的第二表面构成，照射的光束通过第一表面 基于反射光束的光强度的变化再现被记录的信息。 基板的记录面与光入射面的距离小于基板的厚度，光入射面的表面粗糙度R满足由下式（1）表示的关系：R＆lt; ll;λ/（ 8n）（1）其中λ是光束的波长，n是第一保护膜对具有波长λ的光的折射率。

    Methods of fabricating a photomask and use thereof
    7.
    发明授权
    Methods of fabricating a photomask and use thereof 有权
    制造光掩模的方法及其用途

    公开(公告)号：US08232029B2

    公开(公告)日：2012-07-31

    申请号：US13340977

    申请日：2011-12-30

    申请人： MyoungSoo Lee ,  Byunggook Kim

    发明人： MyoungSoo Lee ,  Byunggook Kim

    IPC分类号： G03F1/38 ,  G03F9/00

    CPC分类号： G03F1/54 ,  G03F1/50 ,  G03F1/70 ,  Y10S430/146

    摘要： A method of correcting patterns includes attaining a correcting amount distribution map using a photo mask, the photo mask including a transparent substrate having first and second surfaces opposite to each other and a mask pattern on the first surface, attaining a plurality of shadowing maps based on the correction amount distribution map, each of the shadowing maps including a unit section having a different plane area, and forming a plurality of shadowing regions with shadowing elements in the transparent substrate of the photo mask using respective shadowing maps.

    摘要翻译： 校正图案的方法包括：使用光掩模获得校正量分布图，所述光掩模包括具有彼此相反的第一和第二表面的透明基板和在所述第一表面上的掩模图案，获得多个基于 校正量分布图，每个阴影图包括具有不同平面区域的单位部分，以及使用各个阴影图在光掩模的透明基板中形成具有阴影元件的多个阴影区域。

    IMAGE PROCESSING METHOD, AND IMAGE PROCESSOR
    8.
    发明申请
    IMAGE PROCESSING METHOD, AND IMAGE PROCESSOR 有权
    图像处理方法和图像处理器

    公开(公告)号：US20120176463A1

    公开(公告)日：2012-07-12

    申请号：US13363507

    申请日：2012-02-01

    申请人： Shinya KAWAHARA ,  Yoshihiko Hotta ,  Tomomi Ishimi

    发明人： Shinya KAWAHARA ,  Yoshihiko Hotta ,  Tomomi Ishimi

    IPC分类号： B41J2/435

    CPC分类号： B41J2/442 ,  B41J2/4753 ,  B41M5/305 ,  Y10S430/146

    摘要： The present invention provides an image processing method which includes at least any one of image recording and image erasing, wherein a light irradiation intensity at a center position of the laser beam irradiated in the image recording is controlled; in the image recording, a first auxiliary line extended by a predetermined distance from a start point of each of image lines constituting an image in the opposite direction from the scanning direction and a second auxiliary line extended by a predetermined distance from an end point of each of the image lines in the scanning direction are prepared, and when the first and second auxiliary lines including an image line are continuously scanned, the image line is scanned with irradiating the laser beam, and the first and the second auxiliary lines are scanned without irradiating the laser beam to thereby record the image.

    摘要翻译： 本发明提供了一种图像处理方法，其包括图像记录和图像擦除中的至少一个，其中控制在图像记录中照射的激光束的中心位置处的光照射强度; 在图像记录中，第一辅助线从构成与扫描方向相反的方向的图像的每个图像线的起始点延伸预定距离，以及从每个的端点延伸预定距离的第二辅助线 准备扫描方向上的图像线，并且当连续扫描包括图像线的第一和第二辅助线时，通过照射激光束扫描图像线，并且扫描第一和第二辅助线，而不照射 激光束从而记录图像。

    Thermoplastic material comprising polychromic substances
    9.
    发明授权
    Thermoplastic material comprising polychromic substances 有权
    包含多色物质的热塑性材料

    公开(公告)号：US08211620B2

    公开(公告)日：2012-07-03

    申请号：US13006495

    申请日：2011-01-14

    申请人： Neil John Rogers ,  Christopher Lamb ,  Anthony Nicholas Jarvis

    发明人： Neil John Rogers ,  Christopher Lamb ,  Anthony Nicholas Jarvis

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20

    CPC分类号： G03C1/73 ,  B29C47/822 ,  B41M5/285 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/145 ,  Y10S430/146

    摘要： The present invention relates to thermoplastic material comprising polymer and at least one polychromic substance, wherein the polychromic substance is a functionalised diacetylene having the formula which has the general structure: X—C≡C—C≡C—Y—(CO)n-QZ wherein X is H or alkyl, Y is a divalent alkylene group, Q is O, S or NR, R is H or alkyl, and Z is alkyl, and n is 0 or 1. The present invention further relates to a method of processing thermoplastic material to form a plastic article, wherein the method comprises the step of processing the thermoplastic material at a temperature greater than the melt temperature of the thermoplastic, wherein the thermoplastic material comprises polymer and at least one polychromic substance as defined above; and further comprising the step of irradiating the plastic article to color at least a region of the plastic article.

    摘要翻译： 本发明涉及包含聚合物和至少一种多色变性物质的热塑性材料，其中多色物质是具有下列通式的官能化二乙炔：具有以下通式的X-C≡C-C≡C-Y-（CO）n- QZ其中X为H或烷基，Y为二价亚烷基，Q为O，S或NR，R为H或烷基，Z为烷基，n为0或1.本发明还涉及 加工热塑性材料以形成塑料制品，其中所述方法包括在大于所述热塑性塑料的熔融温度的温度下加工所述热塑性材料的步骤，其中所述热塑性材料包含聚合物和至少一种如上定义的多色变性物质; 并且还包括照射所述塑料制品以使所述塑料制品的至少一个区域着色的步骤。

    Two-photon or higher-order absorbing optical materials and methods of use
    10.
    发明授权
    Two-photon or higher-order absorbing optical materials and methods of use 有权
    双光子或高阶吸收光学材料及其使用方法

    公开(公告)号：US08197722B2

    公开(公告)日：2012-06-12

    申请号：US09918874

    申请日：2001-07-30

    申请人： Seth Marder ,  Joseph Perry

    发明人： Seth Marder ,  Joseph Perry

    IPC分类号： G03C1/00 ,  G03C1/73 ,  G03G7/00 ,  G03G5/00 ,  G02F1/361 ,  G02B5/22 ,  C07C39/12 ,  C07C39/205 ,  G03H1/00 ,  H01S3/09 ,  H01S3/094

    CPC分类号： G11B7/25 ,  B33Y70/00 ,  B82Y10/00 ,  G11B7/244 ,  G11B7/248 ,  Y10S430/146

    摘要： Compositions capable of simultaneous two-photon absorption and higher order absorptivities are provided. Compounds having a donor-pi-donor or acceptor-pi-acceptor structure are of particular interest, where the donor is an electron donating group, acceptor is an electron accepting group, and pi is a pi bridge linking the donor and/or acceptor groups. The pi bridge may additionally be substituted with electron donating or withdrawing groups to alter the absorptive wavelength of the structure. Also disclosed are methods of generating an excited state of such compounds through optical stimulation with light using simultaneous absorption of photons of energies individually insufficient to achieve an excited state of the compound, but capable of doing so upon simultaneous absorption of two or more such photons. Applications employing such methods are also provided, including controlled polymerization achieved through focusing of the light source(s) used.

    摘要翻译： 提供能够同时进行双光子吸收和高阶吸收的组合物。 具有供体-β-供体或受体 - 受主结构的化合物是特别感兴趣的，其中供体是给电子基团，受体是电子接受基团，并且p1是连接供体和/或受体基团的pi桥 。 pi桥可以另外用给电子或取出基团取代以改变结构的吸收波长。 还公开了通过光的光学刺激来产生这种化合物的激发态的方法，其使用单独不足以实现化合物的激发态的能量的光子的同时吸收，但是能够在同时吸收两种或更多种这样的光子时这样做。 还提供了使用这种方法的应用，包括通过聚焦所使用的光源实现的受控聚合。