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330 条记录 (耗时 0.035 秒)

    Arrangement for mounting an optical element
    121.
    发明授权
    Arrangement for mounting an optical element 有权
    用于安装光学元件的布置

    公开(公告)号：US09448384B2

    公开(公告)日：2016-09-20

    申请号：US13903563

    申请日：2013-05-28

    申请人： Carl Zeiss SMT GmbH

    发明人： Michael Erath ,  Florian Bach ,  Ulrich Schoenhoff ,  Rodolfo Rabe ,  Norbert Muehlberger ,  Dirk Eicher ,  Jasper Wesselingh

    IPC分类号： G02B7/182 ,  G02B7/02 ,  G03F7/20 ,  G02B3/00 ,  G02B5/08

    CPC分类号： G02B7/1828 ,  G02B3/00 ,  G02B5/08 ,  G02B7/023 ,  G03F7/70141 ,  G03F7/708 ,  G03F7/70825

    摘要： The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device for exerting a compensation force on the optical element, wherein the compensation force at least partly compensates for the weight force acting on the optical element, wherein the weight force compensation device has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element, and wherein at least one adjustment element is provided via which the force component generated by the passive magnetic circuit is continuously adjustable.

    摘要翻译： 本发明涉及一种用于安装光学元件的装置，特别是在EUV投影曝光装置中，包括用于对光学元件施加补偿力的重力补偿装置，其中补偿力至少部分地补偿作用的重量 在所述光学元件上，其中所述重力补偿装置具有用于产生作用在所述光学元件上的补偿力的力分量的无源磁路，并且其中提供至少一个调节元件，由所述被动磁体产生的力分量 电路连续可调。

    Reticle Shape Regulation Device and Method, and Exposure Apparatus Using Same
    122.
    发明申请
    Reticle Shape Regulation Device and Method, and Exposure Apparatus Using Same 有权
    光罩形状调节装置和方法以及使用其的曝光装置

    公开(公告)号：US20160147163A1

    公开(公告)日：2016-05-26

    申请号：US14900073

    申请日：2014-06-10

    申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.

    发明人： Xinxin WANG ,  Xuchu JIANG ,  Wenjing ZHU ,  Xiaogang WANG

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70783 ,  G03F7/70191 ,  G03F7/70691 ,  G03F7/707 ,  G03F7/70733 ,  G03F7/70791 ,  G03F7/708 ,  G03F7/70866

    摘要： A reticle shape regulation device includes: an adsorption device having an upper surface and a lower surface; and a limit mechanism having a limit surface. The adsorption device is movable relative to the limit mechanism at least in a vertical direction. The upper surface of the adsorption device faces toward and is engagable with the limit surface. The lower surface of the adsorption device defines a vacuum chamber that is configured for communication with a negative-pressure source so as to adsorb the reticle by a negative pressure. The lower surface of the adsorption device further defines at least one positive-pressure outlet that is in communication with a positive-pressure source and is configured to supply a continuous positive-pressure air flow between the lower surface of the adsorption device and the reticle during the adsorption of the reticle. The positive-pressure air flow is so controlled as to form an air cushion between the lower surface of the adsorption device and the reticle while allowing the adsorption of the reticle by the adsorption device. This can correct deformations of the reticle, thus enabling satisfactory flatness thereof during an exposure process, and can easily create vacuum and an air cushion between a deformed reticle and the adsorption device.

    摘要翻译： 标线形状调节装置包括：具有上表面和下表面的吸附装置; 以及具有极限表面的极限机构。 吸附装置至少在垂直方向上相对于限制机构可移动。 吸附装置的上表面面向极限表面并与其接合。 吸附装置的下表面限定了真空室，其构造成与负压源连通，以便通过负压吸附光罩。 吸附装置的下表面进一步限定至少一个与正压源连通的正压出口，并配置成在吸附装置的下表面和标线之间提供连续的正压气流 掩模版的吸附。 正压空气流被控制成在吸附装置的下表面和掩模版之间形成气垫，同时允许通过吸附装置吸附掩模版。 这可以校正标线的变形，从而在曝光过程中能够令人满意的平坦度，并且可以容易地在变形的标线片和吸附装置之间产生真空和气垫。

    Exposure apparatus, exposure method, and method for producing device
    124.
    发明授权
    Exposure apparatus, exposure method, and method for producing device 有权
    曝光装置，曝光方法和制造装置的方法

    公开(公告)号：US09182684B2

    公开(公告)日：2015-11-10

    申请号：US14268558

    申请日：2014-05-02

    申请人： NIKON CORPORATION

    发明人： Hiroyuki Nagasaka ,  Yasufumi Nishii

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

    CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/708 ,  G03F7/7095

    摘要： An exposure apparatus having a projection system with a final element projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate upper surface. A liquid confinement member has a recovery outlet via which the liquid is removed along with gas, the recovery outlet being arranged such that the substrate upper surface faces the recovery outlet, the recovery outlet surrounding a path of the exposure light and the liquid confinement member confining the liquid to an area that is smaller than an area of the substrate upper surface by removing the liquid from a gap between the confinement member and the substrate upper surface. A first support member supports the projection system, and a second support member supports the liquid confinement member. An anti-vibration system limits vibrations from being transmitted from the second support member to the projection system.

    摘要翻译： 具有最终元件的投影系统的曝光装置通过在最终元件和基板上表面之间的液体将曝光光投射到基板的上表面。 液体限制构件具有回收出口，通过该出口，液体与气体一起被去除，回收出口布置成使得基底上表面面向回收出口，回收出口围绕暴露光的路径和液体限制构件限制 通过从限制部件和基板上表面之间的间隙去除液体，将液体移动到比基板上表面的面积小的区域。 第一支撑构件支撑投影系统，第二支撑构件支撑液体限制构件。 防振系统限制振动从第二支撑构件传递到投影系统。

    BLANK OF TITANIUM-DOPED GLASS WITH A HIGH SILICA CONTENT FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF
    126.
    发明申请
    BLANK OF TITANIUM-DOPED GLASS WITH A HIGH SILICA CONTENT FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF 有权
    具有高二氧化硅含量的钛白粉玻璃用于在EUV光刻中使用的镜面基板及其生产方法

    公开(公告)号：US20150140257A1

    公开(公告)日：2015-05-21

    申请号：US14569535

    申请日：2014-12-12

    申请人： Heraeus Quarzglas GmbH & Co. KG

    发明人： Bodo Kuehn

    IPC分类号： C03B23/20 ,  G02B5/10 ,  G03F7/20 ,  C03C3/06

    CPC分类号： C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

    摘要： On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

    摘要翻译： 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。

    Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
    127.
    发明授权
    Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
    移动体装置，曝光装置，曝光方法以及装置的制造方法

    公开(公告)号：US08902402B2

    公开(公告)日：2014-12-02

    申请号：US12640636

    申请日：2009-12-17

    申请人： Yuichi Shibazaki

    发明人： Yuichi Shibazaki

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/7055 ,  G01B11/002 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/70775 ,  G03F7/708 ,  Y10T29/49826

    摘要： In an exposure station, positional information of a stage holding a wafer is measured by a first fine movement stage position measurement system including a measurement arm, and in a measurement station, positional information of a stage holding a wafer is measured by a second fine movement stage position measurement system including another measurement arm. An exposure apparatus has a third fine movement stage position measurement system which can measure positional information of a stage when the stage is carried from the measurement station to the exposure station. The third fine movement stage measurement system includes an encoder system including a plurality of Y heads and a laser interferometer system including a laser interferometer.

    摘要翻译： 在曝光站中，通过包括测量臂的第一细微移动台位置测量系统测量保持晶片的台的位置信息，并且在测量站中，通过第二细微移动来测量保持晶片的台的位置信息 舞台位置测量系统包括另一个测量臂。 曝光装置具有第三细微移动台位置测量系统，其可以测量当从载物台到曝光站时载物台的位置信息。 第三精细运动台测量系统包括包括多个Y头的编码器系统和包括激光干涉仪的激光干涉仪系统。

    Chamber apparatus and extreme ultraviolet (EUV) light generation apparatus including the chamber apparatus
    129.
    发明授权
    Chamber apparatus and extreme ultraviolet (EUV) light generation apparatus including the chamber apparatus 有权
    包括室装置的室内装置和极紫外（EUV）光发生装置

    公开(公告)号：US08698113B2

    公开(公告)日：2014-04-15

    申请号：US13696517

    申请日：2011-12-13

    申请人： Masato Moriya ,  Osamu Wakabayashi

    发明人： Masato Moriya ,  Osamu Wakabayashi

    IPC分类号： H05G2/00

    CPC分类号： G03F7/708 ,  G03F7/70008 ,  G03F7/70808 ,  G03F7/70833

    摘要： A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.

    摘要翻译： 与激光装置一起使用的室装置可以包括室，扩束光学系统和聚焦光学系统。 该室可以设置有至少一个入口，激光装置输出的激光束通过该入口被引入腔室。 扩束光学系统被配置为直径地扩大激光束。 聚焦光学系统被配置为聚焦已经扩大直径的激光束。