公开(公告)号：US20230360878A1

公开(公告)日：2023-11-09

申请号：US18313995

申请日：2023-05-08

Applicant: IMS Nanofabrication GmbH

Inventor： Dietmar Puchberger ,  Johannes Leitner ,  Patrick Mayrhofer ,  Christoph Spengler ,  Elmar Platzgummer

IPC: H01J37/317 ,  H01J37/141 ,  H01J37/143 ,  G03F7/20

CPC classification number: H01J37/143 ,  G03F7/7015 ,  G03F7/704 ,  H01J37/141 ,  H01J37/3177 ,  H01J37/21 ,  H01J2237/1415 ,  H01J2237/1516

Abstract: A fine-adjustable charged particle lens comprises a magnetic circuit assembly including permanent magnets, a yoke body, and a shunting device comprising a shunting component, and this assembly surrounds a beam passage extending along the longitudinal axis (cx). The shunting device is placed in the yoke body besides the permanent magnets and may be composed of several sector components, comprising different high magnetically permeable materials. The permanent magnet and the yoke body form a magnetic circuit having at least two gaps, in order to generate a magnetic field reaching inwards into the beam passage, into which a sleeve insert having electrostatic electrodes can be inserted, which may also generate an electric field spatially overlapping said magnetic field. The shunting device partially bypasses the magnetic flux of said circuit assembly and thus reduces the magnetic field to a desired value.

公开(公告)号：US09823587B2

公开(公告)日：2017-11-21

申请号：US14671898

申请日：2015-03-27

Applicant: CANON KABUSHIKI KAISHA

Inventor： Tadashi Kimura ,  Nobushige Korenaga

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/704 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70841

Abstract: This disclosure provides a lithography apparatus including: a lens barrel having an optical system configured to irradiate a substrate with a beam; and a stage apparatus configured to repeat a long distance movement in a primary scanning direction of the substrate and a short distance movement which is shorter than the long distance movement in terms of the amount of movement in a secondary scanning direction of the substrate, and being configured to form a pattern on the substrate with the beam, wherein the stage apparatus includes: a first moving body configured to move in the primary scanning direction; a floating unit configured to support the first moving body, so as to float by a magnetic force and be movable in the primary scanning direction; a second moving body configured to move in the secondary scanning direction; and a guide using a rolling body configured to support the second moving body in contact therewith so as to be movable in the secondary scanning direction.

公开(公告)号：US09607367B2

公开(公告)日：2017-03-28

申请号：US14382352

申请日：2012-04-20

Applicant: John Christopher Rudin

Inventor： John Christopher Rudin

IPC: G06T7/00 ,  G03F7/20 ,  G01N21/956 ,  G01N21/3563 ,  G01N21/88 ,  G01N21/95

CPC classification number: G06T7/0004 ,  G01N21/3563 ,  G01N21/956 ,  G01N2021/8854 ,  G01N2021/9513 ,  G03F7/704 ,  G03F7/70483

Abstract: Embodiments of the present invention provide systems and method for adaptively generating a pattern for fabricating semiconductor devices, the method comprising obtaining image data of a surface, and dynamically modifying a pattern to be applied to the surface based on the obtained image data.

公开(公告)号：US09427909B2

公开(公告)日：2016-08-30

申请号：US14215894

申请日：2014-03-17

Applicant: II-VI Incorporated

Inventor： David M. Casale ,  Derek S. Rollins

IPC: B23K26/046 ,  B29C59/16 ,  B23K26/08 ,  B23K26/00 ,  G03F7/20 ,  B23K26/36 ,  B29C35/08 ,  G03F7/24

CPC classification number: B29C59/165 ,  B23K26/0823 ,  B23K26/352 ,  B23K26/355 ,  B23K26/361 ,  B23K26/362 ,  B29C2035/0827 ,  B29C2035/0833 ,  B29C2035/0838 ,  B29C2791/009 ,  B29K2995/0005 ,  B29K2995/0006 ,  G03F7/24 ,  G03F7/70383 ,  G03F7/704

Abstract: Disclosed is a system and method for patterning internal and/or external doubly-curved surfaces by use of a light source, three-dimensional scanning optics, computer controller, and a multi-axis robot. The system is capable of digitally receiving shape, location, and pattern data of a three-dimensional doubly-curved surface and applying said pattern over large areas with high precision in a seamless fashion.

Abstract translation: 公开了一种通过使用光源，三维扫描光学器件，计算机控制器和多轴机器人来图形化内部和/或外部双曲面的系统和方法。 该系统能够数字地接收三维双曲面的形状，位置和图案数据，并以高精度以无缝的方式在大面积上应用所述图案。

公开(公告)号：US20160202615A1

公开(公告)日：2016-07-14

申请号：US14836422

申请日：2015-08-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： KAB-JONG SEO ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Ki-Beom Lee

IPC: G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/7005 ,  G03F7/704

Abstract: A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.

Abstract translation: 无掩模曝光装置包括多个曝光头，每个曝光头包括配置成将曝光光束扫描到基板的数字微镜装置，曝光头设置在交错的第一和第二行中，多个反射部件设置在 曝光头的侧表面并且具有彼此平行的反射表面，被配置为对反射构件发光的发光部，以及被配置为经由反射构件接收光的光接收部。

公开(公告)号：US20160161856A1

公开(公告)日：2016-06-09

申请号：US14906875

申请日：2014-06-20

Applicant: Kenneth C. Johnson

Inventor： Kenneth C. Johnson

IPC: G03F7/20

CPC classification number: G03F7/704 ,  G03F7/70291

Abstract: A DUV scanned-spot-array lithography system comprises an array of phase-Fresnel microlenses, which focus multiple radiation beams through intermediate foci at the object surface of a projection system. The intermediate foci are imaged by the projection system onto corresponding focused-radiation spots on an image plane, and the spots expose a photosensitive layer proximate the image plane as the layer is scanned in synchronization with modulation of the beams. The modulators may comprise micromechanical shutters proximate the intermediate foci for ON/OFF switching, in series with transmission grating modulators for gray-level control, and the microlenses may also be actuated to provide dynamic beam centering control. A nodal line printing technique may be used to provide ultra-high-resolution and high-throughput maskless printing capability in conjunction with multi-patterning or dual-wavelength recording processes.

Abstract translation: DUV扫描点阵阵列光刻系统包括相位菲涅尔微透镜的阵列，其将多个辐射束聚焦在投影系统的物体表面处的中间焦点。 中间焦点通过投影系统成像到图像平面上的相应的聚焦辐射点上，并且当该层与光束的调制同步地扫描该层时，该光点在图像平面附近曝光感光层。 调制器可以包括靠近用于ON / OFF切换的中间焦点的微机械百叶窗，与用于灰度级控制的透射光栅调制器串联，并且微透镜也可以被致动以提供动态光束定心控制。 可以使用节点线打印技术来提供与多图案化或双波长记录处理相结合的超高分辨率和高吞吐量的无掩模打印能力。

公开(公告)号：US09341960B2

公开(公告)日：2016-05-17

申请号：US14356124

申请日：2012-11-14

Applicant: ASML Netherlands B.V.

Inventor： Antonius Johannes Josephus Van Dijsseldonk ,  Arno Jan Bleeker

IPC: G03B27/52 ,  G03F7/20 ,  G02B27/12

CPC classification number: G03F7/70425 ,  G02B27/126 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

Abstract: An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.

Abstract translation: 具有投影系统的曝光装置，其配置为将多个辐射束投射到目标物和图像限幅器上。 图像限幅器被布置成反向配置，使得如果由多个分离的图像区域形成的输入图像被提供给图像限幅器，则其将输出由多个图像区域形成的输出图像，每个图像区域布置成邻接 相邻图像区域。 曝光装置被配置为使得每个辐射束在对应于分离的图像区域中的相应一个的位置处被输入到图像限幅器中。

公开(公告)号：US09316926B2

公开(公告)日：2016-04-19

申请号：US13885960

申请日：2011-11-15

Applicant: Erwin John Van Zwet ,  Pieter Willem Herman De Jager ,  Johannes Onvlee ,  Hendrik De Man

Inventor： Erwin John Van Zwet ,  Pieter Willem Herman De Jager ,  Johannes Onvlee ,  Hendrik De Man

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70216 ,  G03F7/70258 ,  G03F7/70266 ,  G03F7/70275 ,  G03F7/70375 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704

Abstract: A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.

Abstract translation: 一种用于控制无掩模光刻设备的焦点的系统，该设备包括将可编程图案形成装置的图像投影到基板上的投影系统。 第一致动器系统被配置为沿着垂直于投影系统的光轴的方向移动投影系统的透镜中的至少一个。 辐射束扩展器被配置为将可编程图案形成装置的图像投影到至少一个透镜上。 第二致动器系统被配置成沿着平行于投影系统的光轴的方向移动辐射束扩展器，以便控制投影到基板上的图像的焦点。

公开(公告)号：US09268211B2

公开(公告)日：2016-02-23

申请号：US14038533

申请日：2013-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Van Eijk ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F1/44 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F1/44 ,  G03B27/42 ,  G03F7/704 ,  G03F7/70516 ,  G03F7/70775 ,  G03F7/7085

Abstract: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.

公开(公告)号：US20150168849A1

公开(公告)日：2015-06-18

申请号：US14628544

申请日：2015-02-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Michael Patra

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70091 ,  G03F7/70116 ,  G03F7/70125 ,  G03F7/70133 ,  G03F7/70358 ,  G03F7/704 ,  G03F7/7055

Abstract: A method of operating a microlithographic apparatus comprises the steps of providing an illumination system comprising an array of tiltable mirrors, wherein a light irradiance distribution on the array varies by at least 50% along a first line; specifying a scan integrated target angular light distribution and a target light energy for a point moving through an illumination field along a second line that extends parallel to a scan direction and is an image of the first line; determining a group of those mirrors through which the first line extends; determining tilt angles of the mirrors of the group such that a real angular light distribution and a real light energy for the point approximate the respective target values; producing the illumination field by forming an image of the array on a mask; and imaging a portion of the mask on a surface while the mask moves along the scan direction.

Abstract translation: 一种操作微光刻设备的方法包括以下步骤：提供包括可倾斜反射镜阵列的照明系统，其中阵列上的光照度分布沿着第一条线变化至少50％; 指定沿着平行于扫描方向延伸的第二线并且是第一行的图像的沿着照明场移动的点的扫描集成目标角度光分布和目标光能量; 确定第一条线延伸通过的那些镜子组; 确定所述组的反射镜的倾斜角，使得所述点的实际角度光分布和实际光能量近似于相应的目标值; 通过在掩模上形成阵列的图像来产生照明场; 并且当掩模沿着扫描方向移动时，将掩模的一部分成像在表面上。