-
公开(公告)号：US20130182236A1
公开(公告)日：2013-07-18
申请号：US13812844
申请日：2011-06-14
申请人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
发明人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
IPC分类号： G03F7/00
CPC分类号： G03F7/7035 , B29C43/021 , B29C43/04 , B29C43/14 , B29C2043/142 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70775 , G03F7/70825 , G03F7/7085 , G03F7/709 , G03F9/7042
摘要： An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
摘要翻译： 一种压印光刻设备，具有要安装在地板上的第一框架，通过运动耦合安装在第一框架上的第二框架，安装在第二框架上的对准传感器，以将压印光刻模板布置与目标部分对准 基板和位置传感器，用于测量压印光刻模板布置和/或基板台相对于第二框架的位置。
-
公开(公告)号：US20080170210A1
公开(公告)日：2008-07-17
申请号：US11654037
申请日：2007-01-17
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70841 , G03F7/70858
摘要： A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.
摘要翻译： 一种装置的制造方法，其特征在于，使光刻投影装置的真空室内的压力达到温度稳定化压力范围; 将真空室内的压力保持在温度稳定压力范围内一段时间，以稳定真空室中的温度; 将真空室内的压力降低到生产压力范围; 用辐射系统产生辐射束; 图案化辐射束; 并将图案化的辐射束通过真空室投射到基底上的辐射敏感材料层的目标部分上。
-
公开(公告)号：US20110001254A1
公开(公告)日：2011-01-06
申请号：US12820492
申请日：2010-06-22
申请人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
摘要翻译： 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
-
公开(公告)号：US09310700B2
公开(公告)日：2016-04-12
申请号：US13810384
申请日：2011-07-18
CPC分类号： G03F7/70875 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70783
摘要： In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load.
摘要翻译： 在一个实施例中，公开了一种光刻方法，其包括提供向物体的第一区域提供第一热负荷并且向物体的第二区域提供第二热负荷，其中第二热负荷被配置为确保 通过提供第一热负荷和第二热负荷而引起的物体的第一区域的变形小于由仅提供第一热负荷引起的物体的第一区域的变形。
-
公开(公告)号：US09304401B2
公开(公告)日：2016-04-05
申请号：US14001478
申请日：2012-02-22
申请人： Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
发明人： Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
CPC分类号： G03F7/70133 , G03F7/70275 , G03F7/70375 , G03F7/70391 , G03F7/704 , G03F7/70516 , G03F7/708 , G03F7/7085 , G03F9/7019
摘要： A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
摘要翻译： 一种用于光刻设备的辐射点测量系统，该系统具有目标，光刻设备的辐射系统可以在其上投射用于测量过程的辐射点，目标具有测量目标。 该系统还包括用于检测来自一个点的辐射的辐射检测器，以及用于从辐射检测器接收信息并确定相对于辐射点的预期位置的辐射点的位置的控制器。
-
6.发明授权公开(公告)号：US09122173B2
公开(公告)日：2015-09-01
申请号：US13398890
申请日：2012-02-17
申请人： Hans Butler , Martinus Agnes Willem Cuijpers , Christiaan Alexander Hoogendam , Robertus Johannes Marinus De Jongh , Michael Jozef Mathijs Renkens , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etiënne Wijckmans , Robertus Leonardus Tousain , Ronald Petrus Hendricus Faassen , Adrianus Hendrik Koevoets
发明人： Hans Butler , Martinus Agnes Willem Cuijpers , Christiaan Alexander Hoogendam , Robertus Johannes Marinus De Jongh , Michael Jozef Mathijs Renkens , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etiënne Wijckmans , Robertus Leonardus Tousain , Ronald Petrus Hendricus Faassen , Adrianus Hendrik Koevoets
CPC分类号： G03F7/709 , G03F7/70758 , G03F7/70766
摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.
摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第一致动器施加在平衡块上的致动力引起的扭矩。
-
公开(公告)号：US20130335721A1
公开(公告)日：2013-12-19
申请号：US14001478
申请日：2012-02-22
申请人： Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
发明人： Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70275 , G03F7/70375 , G03F7/70391 , G03F7/704 , G03F7/70516 , G03F7/708 , G03F7/7085 , G03F9/7019
摘要： A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
摘要翻译： 一种用于光刻设备的辐射点测量系统，该系统具有目标，光刻设备的辐射系统可以在其上投射用于测量过程的辐射点，目标具有测量目标。 该系统还包括用于检测来自一个点的辐射的辐射检测器，以及用于从辐射检测器接收信息并确定相对于辐射点的预期位置的辐射点的位置的控制器。
-
公开(公告)号：US07554105B2
公开(公告)日：2009-06-30
申请号：US11263012
申请日：2005-11-01
申请人： Dominicus Jacobus Petrus A. Franken , Erik Roelof Loopstra , Pertrus Rutgerus Bartray , Marc Wilhelmus Maria Van Der Wijst , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Juliana Dries
发明人： Dominicus Jacobus Petrus A. Franken , Erik Roelof Loopstra , Pertrus Rutgerus Bartray , Marc Wilhelmus Maria Van Der Wijst , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Juliana Dries
IPC分类号： G21K5/10
CPC分类号： G03F7/70833 , G03F7/709
摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
摘要翻译： 光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。 基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。
-
9.发明授权公开(公告)号：US07119886B2
公开(公告)日：2006-10-10
申请号：US10833340
申请日：2004-04-28
申请人： Martinus Hendrikus Antonius Leenders , Hendricus Johannes Maria Meijer , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Theo Anjes Maria Ruijl
发明人： Martinus Hendrikus Antonius Leenders , Hendricus Johannes Maria Meijer , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Theo Anjes Maria Ruijl
CPC分类号： G03F7/70258 , G03F7/7085
摘要： In a lithographic projection apparatus, a measuring system configured to measure the position of the projection system relative to a reference frame includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table position. An angular encoder which sends light from a target down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system about its optical axis.
摘要翻译： 在光刻投影设备中，被配置为测量投影系统相对于参考框架的位置的测量系统包括相对于测量衬底台位置的测量系统的对应传感器刚性地安装的传感器。 使用角度编码器，其从目标向下发射具有相对于倾斜的灵敏度的两个光路的光，以测量投影系统绕其光轴的旋转。
-
10.发明授权公开(公告)号：US07102729B2
公开(公告)日：2006-09-05
申请号：US10769992
申请日：2004-02-03
申请人： Michael Jozef Mathijs Renkens , Alexander Matthijs Struycken , Ruben Jan Kok , Martinus Cornells Maria Verhagen
发明人： Michael Jozef Mathijs Renkens , Alexander Matthijs Struycken , Ruben Jan Kok , Martinus Cornells Maria Verhagen
CPC分类号： G03F7/70775
摘要： The invention pertains to a measurement system for measuring displacement of a moveable object relative to a base in at least a first direction of measurement, the moveable object having at least one reference part that is moveable in a plane of movement relative to the base, the actual movements of the reference part being within an area of said plane of movement that is bounded by a closed contour having a shape. The measurement system comprises a sensor head that operatively communicates with a planar element. The sensor head is mounted onto the base and the planar element being mounted onto the reference part of the moveable object or the other way around, wherein the planar element has a shape that is essentially identical to the shape of the closed contour.
摘要翻译： 本发明涉及一种用于在至少第一测量方向上测量可移动物体相对于基座的位移的测量系统，所述可移动物体具有至少一个可在相对于基座的运动平面中移动的参考部分， 参考部分的实际运动在由具有形状的封闭轮廓界定的所述运动平面的区域内。 测量系统包括与平面元件可操作地连通的传感器头。 传感器头安装在基座上，平面元件安装在可移动物体的参考部分上，或者相反地安装在其上，其中平面元件具有与封闭轮廓的形状基本相同的形状。
-
-
-
-
-
-
-
-
-
搜索结果
16 条记录 (耗时 0.023 秒)
