发明授权
- 专利标题: Lithographic apparatus, measurement system, and device manufacturing method
- 专利标题(中): 光刻设备,测量系统和器件制造方法
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申请号: US10769992申请日: 2004-02-03
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公开(公告)号: US07102729B2公开(公告)日: 2006-09-05
- 发明人: Michael Jozef Mathijs Renkens , Alexander Matthijs Struycken , Ruben Jan Kok , Martinus Cornells Maria Verhagen
- 申请人: Michael Jozef Mathijs Renkens , Alexander Matthijs Struycken , Ruben Jan Kok , Martinus Cornells Maria Verhagen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G01B11/00
摘要:
The invention pertains to a measurement system for measuring displacement of a moveable object relative to a base in at least a first direction of measurement, the moveable object having at least one reference part that is moveable in a plane of movement relative to the base, the actual movements of the reference part being within an area of said plane of movement that is bounded by a closed contour having a shape. The measurement system comprises a sensor head that operatively communicates with a planar element. The sensor head is mounted onto the base and the planar element being mounted onto the reference part of the moveable object or the other way around, wherein the planar element has a shape that is essentially identical to the shape of the closed contour.
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