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公开(公告)号：US11846890B2
公开(公告)日：2023-12-19
申请号：US18159912
申请日：2023-01-26
CPC分类号： G03F9/7042 , G03F7/0002 , G03F7/707 , G03F7/70775
摘要： An imprint lithography system includes: a first chuck configured to support a first substrate; a first bushing surrounding the first chuck and configured to pneumatically suspend the first chuck laterally within the first bushing; one or more supportive mechanisms disposed beneath the first chuck and configured to support the first chuck vertically within the first bushing, wherein the first chuck is configured to be forced in a downward direction against first vertical resistive forces provided by the one or more supportive mechanisms, while the first chuck is suspended laterally within the first bushing and while the first chuck is maintained in the first fixed rotational orientation.
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公开(公告)号：US20190204733A1
公开(公告)日：2019-07-04
申请号：US16296695
申请日：2019-03-08
发明人： Yoshiyuki Usui
CPC分类号： G03F7/0002 , G03F9/7042
摘要： An imprint method includes: before contacting a mold with an imprint material on a target shot region, obtaining relative position of the target shot region with respect to the mold, and performing first alignment between the target shot region and the mold by driving a correction unit configured to correct the relative position of the target shot region; after contacting the mold with the imprint material on the target shot region, performing second alignment between the target shot region and the mold by driving the correction unit; and performing the imprint process on the target shot region after the second alignment. The first alignment includes alignment performed based on a driving amount of the correction unit in the second alignment for another shot region where the imprint process has been performed earlier than in the target shot region.
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公开(公告)号：US20180329292A1
公开(公告)日：2018-11-15
申请号：US15775602
申请日：2016-09-30
发明人： Junichi KANEHARA , Hans BUTLER , Paul Cornè Henri DE WIT , Engelbertus Antonius Fransiscus VAN DER PASCH
CPC分类号： G03F7/0002 , G03F7/70341 , G03F7/70733 , G03F7/70925 , G03F9/7042
摘要： A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
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公开(公告)号：US10025206B2
公开(公告)日：2018-07-17
申请号：US15834609
申请日：2017-12-07
发明人： Klaus Simon
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
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公开(公告)号：US10011056B2
公开(公告)日：2018-07-03
申请号：US14796009
申请日：2015-07-10
发明人： Tetsuji Okada , Noriyasu Hasegawa , Tosiya Asano
CPC分类号： B29C43/58 , B29C43/021 , B29C2043/025 , B29C2043/5833 , G03F7/0002 , G03F9/7042
摘要： The present invention provides an imprint apparatus including an amplifier configured to amplify a signal of displacement between a mold and a substrate, and a control unit configured to perform alignment between the mold and the substrate based on the amplified signal, wherein the control unit performs the alignment through a first operation of moving the substrate with respect to the mold in a first direction and a second operation of moving the substrate with respect to the mold in a second direction that is opposite to the first direction, and in the first operation, the control unit sets the gain of the amplifier to a first gain and changes the gain of the amplifier from the first gain to a second gain.
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公开(公告)号：US09964855B2
公开(公告)日：2018-05-08
申请号：US15289505
申请日：2016-10-10
发明人： HongYing Wang , Kim Y. Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
CPC分类号： G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
摘要： A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
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公开(公告)号：US09958774B2
公开(公告)日：2018-05-01
申请号：US15258903
申请日：2016-09-07
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
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公开(公告)号：US20180074419A1
公开(公告)日：2018-03-15
申请号：US15464674
申请日：2017-03-21
申请人： SK hynix Inc.
发明人： Woo Yung JUNG
CPC分类号： G03F9/7042 , G03F7/0002
摘要： A method of forming patterns is provided. The method includes forming a resist layer on a substrate, imprinting transfer patterns of a template on the resist layer, performing an alignment operation to correct a position of the substrate or the template, increasing a viscosity of the resist layer while the alignment operation is performed, and curing the resist layer after the alignment operation terminates.
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公开(公告)号：US09864279B2
公开(公告)日：2018-01-09
申请号：US13812844
申请日：2011-06-14
申请人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
发明人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
CPC分类号： G03F7/7035 , B29C43/021 , B29C43/04 , B29C43/14 , B29C2043/142 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70775 , G03F7/70825 , G03F7/7085 , G03F7/709 , G03F9/7042
摘要： An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US09864271B2
公开(公告)日：2018-01-09
申请号：US15666489
申请日：2017-08-01
发明人： Klaus Simon
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
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