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公开(公告)号：US20240185885A1
公开(公告)日：2024-06-06
申请号：US18516140
申请日：2023-11-21
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , Thomas Chang , Kim Yang Lee , XiaoMin Yang , Jiansheng Wu
Abstract: A method of forming patterned magnetic media disclosed herein includes patterning a guiding layer on a substrate to form a nucleation guiding pattern. A layer of magnetic material is formed over the nucleation guiding pattern. The magnetic material may comprise a non-magnetic segregant. Magnetic grains are grown in a down-track direction and in a cross-track direction responsive to the nucleation guiding pattern and the non-magnetic segregant forms grain boundaries between the magnetic grains.
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公开(公告)号：US10056102B2
公开(公告)日：2018-08-21
申请号：US14950688
申请日：2015-11-24
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Kaori Kimura , Kazutaka Takizawa , Akira Watanabe , Takeshi Iwasaki , Akihiko Takeo
Abstract: According to one embodiment, a magnetic recording medium including a substrate and a magnetic recording layer formed on the substrate and including a plurality of projections is obtained. The array of the plurality of projections includes a plurality of domains in which the projections are regularly arranged, and a boundary region between the domains, in which the projections are irregularly arranged. The boundary region is formed along a perpendicular bisector of a line connecting the barycenters of adjacent projections.
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公开(公告)号：US10018909B2
公开(公告)日：2018-07-10
申请号：US14373533
申请日：2013-01-09
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tsuyoshi Arai
IPC: B29C59/02 , G03F7/00 , G11B5/84 , G11B5/855 , B29C43/00 , B41L19/00 , B29C43/58 , B82Y10/00 , B82Y40/00 , B29C59/00 , G01B21/08
CPC classification number: G03F7/0002 , B29C43/00 , B29C43/58 , B29C59/002 , B41L19/00 , B82Y10/00 , B82Y40/00 , G01B21/08 , G11B5/84 , G11B5/855
Abstract: The present invention provides an imprint apparatus which performs an imprint process of transferring a pattern onto a substrate, the apparatus comprising a deforming unit configured to deform the pattern surface by applying a force to the mold, an obtaining unit configured to obtain thickness information of the mold, a calculation unit configured to calculate a force to be applied to the mold based on the thickness information of the mold obtained by the obtaining unit, so that the pattern surface has a target shape in the imprint process, and a control unit configured to control the deforming unit to apply the force calculated by the calculation unit to the mold in the imprint process.
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公开(公告)号：US09934806B2
公开(公告)日：2018-04-03
申请号：US15403040
申请日：2017-01-10
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , David S. Kuo , XiaoMin Yang , Kim Y. Lee , Yautzong Hsu , Koichi Wago
CPC classification number: G11B5/59638 , G11B5/59655 , G11B5/746 , G11B5/84 , G11B5/855 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.
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公开(公告)号：US20180011400A1
公开(公告)日：2018-01-11
申请号：US15714080
申请日：2017-09-25
Applicant: CANON KABUSHIKI KAISHA
Inventor： Yoshihiro Shiode
CPC classification number: G03F7/0002 , B29C59/026 , B29C2059/023 , B29K2101/00 , B82Y10/00 , B82Y40/00 , G03F9/7023 , G03F9/703 , G03F9/7049 , G11B5/855
Abstract: The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.
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Patent Agency Ranking
公开(公告)号：US09865294B2
公开(公告)日：2018-01-09
申请号：US15233277
申请日：2016-08-10
Applicant: Seagate Technology LLC
Inventor： ShuaiGang Xiao , XiaoMin Yang , David S. Kuo , Kim Yang Lee , Yautzong Hsu
CPC classification number: G11B5/855 , G11B5/59633 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.
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公开(公告)号：US09798231B2
公开(公告)日：2017-10-24
申请号：US14372595
申请日：2013-01-09
Applicant: CANON KABUSHIKI KAISHA
Inventor： Yoshihiro Shiode
CPC classification number: G03F7/0002 , B29C59/026 , B29C2059/023 , B29K2101/00 , B82Y10/00 , B82Y40/00 , G03F9/7023 , G03F9/703 , G03F9/7049 , G11B5/855
Abstract: The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.
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公开(公告)号：US09773520B2
公开(公告)日：2017-09-26
申请号：US14158611
申请日：2014-01-17
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , HongYing Wang , Kim Y. Lee
CPC classification number: G11B5/855 , G03F7/0002
Abstract: The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.
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公开(公告)号：US09660185B2
公开(公告)日：2017-05-23
申请号：US15157120
申请日：2016-05-17
Applicant: Applied Materials, Inc.
Inventor： Roman Gouk , Steven Verhaverbeke , Alexander Kontos , Adolph Miller Allen , Kevin Moraes
IPC: B44C1/22 , H01L43/12 , G11B5/74 , G11B5/855 , H01F41/34 , H01L21/285 , H01L21/308
CPC classification number: H01L43/12 , G11B5/746 , G11B5/855 , G11C11/16 , H01F41/34 , H01L21/2855 , H01L21/3081
Abstract: A method and apparatus for forming a magnetic layer having a pattern of magnetic properties on a substrate is described. The method includes using a metal nitride hardmask layer to pattern the magnetic layer by plasma exposure. The metal nitride layer is patterned using a nanoimprint patterning process with a silicon oxide pattern negative material. The pattern is developed in the metal nitride using a halogen and oxygen containing remote plasma, and is removed after plasma exposure using a caustic wet strip process. All processing is done at low temperatures to avoid thermal damage to magnetic materials.
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公开(公告)号：US09646642B2
公开(公告)日：2017-05-09
申请号：US14170009
申请日：2014-01-31
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
Abstract: A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.
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